SINGLE LAYER INTEGRATED CIRCUIT PACKAGE

Abstract

An integrated circuit packaging is described, including a plurality of electrical circuits developed using a first patterned conductive layer on a base, wherein an electrical circuit is formed by using a masking material, and an interconnection is developed between the electrical circuits, where the interconnection is disposed on at least one side of the first patterned conductive layer and masking material, in which the interconnection is enclosed with a second masking material to form the integrated circuit packaging.

Claims

1. A method of fabricating an integrated circuit packaging, comprising the steps of: establishing a base; developing a plurality of electrical circuits using a first patterned conductive layer on the base, wherein the electrical circuits are formed by using a masking material; and developing an interconnection between the electrical circuits, where the interconnection is disposed on at least one side of the first patterned conductive layer and masking material, in which the interconnection is enclosed with a second masking material to form the integrated circuit packaging.

2. The method of fabricating an integrated circuit packaging according to claim 1, wherein a thickness of the first patterned conductive layer reduced by trimming or grinding or polishing at least one surface of the first patterned conductive layer.

3. The method of fabricating an integrated circuit packaging according to claim 2, wherein the surface of the first patterned conductive layer is trimmed by using chemical process or mechanical grinding process or laser trimming process or plasma treatment or any combination thereof.

4. The method of fabricating an integrated circuit packaging according to claim 1, wherein the base is completely removed.

5. The method of fabricating an integrated circuit packaging according to claim 1, wherein the base is selectively removed to form at least an internal opening and at least a positioning opening of the first patterned conductive layer area, wherein the internal opening corresponds with an inside area of the first patterned conductive layer, and the positioning opening corresponds with an outside area of the first patterned conductive layer.

6. The method of fabricating an integrated circuit packaging according to claim 1, wherein the base is a charge carrier.

7. An integrated circuit packaging, comprising: a plurality of electrical circuits developed using a first patterned conductive layer on a base, wherein the electrical circuits are formed by using a masking material; and an interconnection developed between the electrical circuits, where the interconnection is disposed on at least one side of the first patterned conductive layer and masking material, in which the interconnection is enclosed with a second masking material to form the integrated circuit packaging.

8. The integrated circuit packaging according to claim 7, wherein a thickness of the first patterned conductive layer reduced by trimming or grinding or polishing at least one surface of the first patterned conductive layer.

9. The integrated circuit packaging according to claim 8, wherein the trimmed surface of the first patterned conductive layer is trimmed by using chemical process, mechanical grinding process, laser trimming process, plasma etching or any combination thereof.

10. The integrated circuit packaging according to claim 7, wherein the base is selectively removed to form at least an internal opening and at least a positioning opening of the first patterned conductive layer exposed area.

11. The integrated circuit packaging according to claim 7, wherein the base is selectively removed to form at least an internal opening and at least a positioning opening of the first patterned conductive layer exposed area, wherein the internal opening corresponds with an inside area of the first patterned conductive layer, and the positioning opening corresponds with an outside area of the first patterned conductive layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0022] FIG. 1 illustrates an integrated circuit package according to at least one embodiment of the present invention.

[0023] FIG. 2 illustrates layers of photo-resist materials being developed on a base, in which the layers are then developed or formed as patterned layers of photo-resist materials.

[0024] FIG. 3 illustrates the development of an electrically conductive layer within the removed or etched part of the layers of photo-resist materials.

[0025] FIG. 4 illustrates layers of photo-resist materials being removed, leaving the electrically conductive layer, wherein the first conductive layer can be used as electrical circuits or electrical routing.

[0026] FIG. 5 illustrates the remaining first photo-resist materials being removed or stripped, leaving the electrically conductive layer along the base.

[0027] FIG. 6 illustrates an epoxy or polymide process being developed or disposed on the base and the electrically conductive layer.

[0028] FIG. 7 illustrates, on the surface of the disposed epoxy molding compound, there is performed a grinding or polishing or trimming process known as surface grinding by either mechanical wheel grinding or chemical etching process.

[0029] FIG. 8 illustrates the performance of surface finishing on the flattened surface fully or selectively.

[0030] FIG. 9 illustrates the process of wire bonding performed on the flattened surface having the electrically conductive layer or patterned electrically conductive layer, wherein the wire bonding process can also be replaced with any other semiconductor interconnection method such as flip-chip method.

[0031] FIG. 10 illustrates, after the process of wire bonding process is performed, a second molding layer is developed enclosing the wire bonded surface area or surrounding areas.

[0032] FIG. 11 illustrates layers of third photo-resist materials being developed on the flat surface area of the surface of the electrically conductive layer and the wire bonded surface as well as bottom portion of the base.

[0033] FIG. 12 illustrates a window etching exposure process where the dry film laminate and UV are exposed on both sides, where the bottom dry film opens after the window etching exposure process.

[0034] FIG. 13 illustrates the base being stripped with the dry film laminate creating an opening exposing at least one part of the bottom portion of the electrically conductive layer and molding compound.

[0035] FIG. 14 illustrates surface finishing being performed on the surface of the second molding layer fully or selectively.

DETAILED DESCRIPTION OF THE INVENTION

[0036] To further clarify various aspects of some embodiments of the present invention, a more particular description of the invention will be rendered by references to specific embodiments thereof, which are illustrated in the appended drawings. It is appreciated that these drawings depict only typical embodiments of the invention and are therefore not to be considered limiting of its scope. The invention will be described and explained with additional specificity and detail through the accompanying drawings in which:

[0037] FIGS. 1-14 are detailed process flowcharts of manufacturing and connecting for an integrated circuit package according to a first embodiment of the invention.

[0038] FIG. 1 illustrates an integrated circuit package according to at least one embodiment of the invention. Firstly, a carrier or base (101) is established or developed, wherein the base (101) is a steel material or copper or conductive material such as charge carrier. Preferably, the carbon steel or steel has thickness in the range of 0.005-0.500 mm, wherein the plated conductive layer has a thickness in the range of 3-120 μm.

[0039] Then, FIG. 2 illustrates layers of photo-resist materials (102) are developed on the base (101), in which the layer is then developed or formed as a patterned layers of photo-resist materials (102). Alternatively, the layers of photo-resist materials (102) are also formed on both surfaces of the carrier or base (101), bottom part and top part. The purpose of photo-resist materials (102) on the top portion is to create a masking for circuit patterning. However, the photo-resist materials (102) on the bottom portion are to avoid unnecessary buildup of plating material to avoid wastage of the plating material. This photo-resist materials (102) has to on the bottom portion of the carrier or base (101) until demasking process. This process also known as dry film laminating process by using dry film laminator process, in which the dry film preferably has a thickness in the range of 5-100 μm.

[0040] FIG. 3 illustrates development of an electrically conductive layer (103) within the removed or etched part of the layers of photo-resist materials (102). The electrically conductive layer (103) developed by using electroplating method. Thereafter, the layers of photo-resist materials (102) will be removed, leaving the electrically conductive layer (103) wherein the first conductive layer and used as electrical circuits or electrical routing as illustrated in FIG. 4. The layers of photo-resist materials (102) on the bottom part of the carrier or base (101) will still remain. Preferably, the layers of photo-resist materials are removed by Ultra Violet (UV) exposure process, in which the unexposed zone will be removed by developer process. Preferably, the development process of the electrically conductive layer (103) is also known as process of tracing conductive plating by using copper plating line, in which the conductive trace has a thickness in the range of 5˜100 μm.

[0041] Then, the electrically conductive layer (103) is develop into a plurality of electrical circuits, which are electrically isolated and used as a package trace layout unit or electrical circuits unit, wherein the electrical circuits unit will be electrically connected to each other. This formation has same pattern to the integrated circuit that are ready for packaging.

[0042] Then the remaining first photo-resist materials (102) will be removed or stripped, leaving the electrically conductive layer (103) along the base (101) as illustrated in FIG. 5. Preferably, this process is known as the process of dry film stripping.

[0043] Then epoxy or polymide process is developed or disposed on the base (101) and the electrically conductive layer (103) as illustrated in FIG. 6. This process is known as an encap process by using an epoxy molding or polymide compound. Preferably, by molding or laminate and curing with b-stage adhesive laminate film or laminate and curing with prepreg resin or laminate and curing with resin. Thereafter, on the surface of the disposed epoxy molding compound is performed a grinding or polishing or trimming process known as surface grinding by either mechanical wheel grinding or chemical etching process as illustrated in FIG. 7. Preferably etching process has a thickness in the control range of 5˜200 um. The surface grinding will flatten the surface of the electrically conductive layer (103) and the disposed epoxy molding compound or polymide laminate to form a flattened surface area, in which the electrically conductive layer (103) will be flatten by grinding or polishing the surface. Then, perform surface finishing on the flatten surface fully or selectively as shown in FIG. 8. FIG. 9 illustrates the process of wire bonding performed on the flattened surface having the electrically conductive layer (103) or patterned electrically conductive layer (103), the wire bonding process can also be replaced with any other semiconductor interconnection method such as flip-chip method. After the process of wire bonding process is performed, a second molding layer is developed enclosing the wire bonded surface area or surrounding areas as shown in FIG. 10.

[0044] Further, the process includes layers of third photo-resist materials (122) is developed on the flat surface area of the surface of the electrically conductive layer (103) and the wire bonded surface as well as bottom portion of the base as illustrated in FIG. 11. This process also known as dry film laminate with a dry film laminator, in which the dry film preferably has a thickness in the range of 15˜63 μm.

[0045] FIG. 12 shows a window etching exposure process where the dry film laminate and UV exposed on both sides, where the bottom dry film opens after the window etching exposure process. Then, the base is stripped with the dry film laminate creating an opening exposing at least one part of the bottom portion of the electrically conductive layer (103) and molding compound as shown in FIG. 13. Finally, surface finishing performed on the surface of the second molding layer fully or selectively as shown in FIG. 14.

[0046] Thereafter, the base (101) can be removed fully or selectively to form at least an internal opening and at least a positioning opening, wherein the internal opening corresponds with an inside area of the first patterned conductive layer (103), and the positioning opening corresponds with an outside area of the first patterned conductive layer (103). The base (101) also can be removing at least one part of the first patterned conductive layer (103), such that the area of the first patterned conductive layer (103) are exposed to form at least an internal opening (107) and at least a positioning opening (107) or at least an internal opening (107) or positioning opening (107) as illustrated in FIGS. 13 and 14.

[0047] The present invention may be embodied in other specific forms without departing from its essential characteristics. The described embodiments are to be considered in all respects only as illustrative and not restrictive. The scope of the invention is, therefore indicated by the appended claims rather than by the foregoing description. All changes, which come within the meaning and range of equivalency of the claims, are to be embraced within their scope.