SEMICONDUCTOR DEVICES HAVING THROUGH ELECTRODES AND METHODS FOR FABRICATING THE SAME

Abstract

The semiconductor device includes a substrate including an integrated circuit and a contact that are electrically connected to each other, an insulation layer covering the substrate and including metal lines, and a through electrode electrically connected to the integrated circuit. The insulation layer includes an interlayer dielectric layer on the substrate and an intermetal dielectric layer on the interlayer dielectric layer. The metal lines include a first metal line in the interlayer dielectric layer and electrically connected to the contact, and a plurality of second metal lines in the intermetal dielectric layer and electrically connected to the first metal line and the through electrode. The through electrode includes a top surface higher than a top surface of the contact.

Claims

1. A semiconductor device comprising: a substrate including an integrated circuit and an electrical contact, the electrical contact electrically connected to the integrated circuit; an insulation layer covering the substrate, the insulation layer including a plurality of metal lines electrically connected to the integrated circuit; and a through electrode penetrating the substrate, the through electrode electrically connected to the integrated circuit, wherein the insulation layer includes: an interlayer dielectric layer on the substrate; and an intermetal dielectric layer on the interlayer dielectric layer, wherein the plurality of metal lines includes: a first metal line that is provided in the interlayer dielectric layer and electrically connected to the electrical contact; and a plurality of second metal lines that are provided in the intermetal dielectric layer and electrically connected to the first metal line and the through electrode, and wherein the through electrode includes a top surface higher in relation to the substrate than a top surface of the electrical contact.

2. The semiconductor device of claim 1, further comprising: a capping layer between the interlayer dielectric layer and the intermetal dielectric layer, wherein the through electrode penetrates the substrate and the interlayer dielectric layer such that the top surface of the through electrode reaches the capping layer.

3. The semiconductor device of claim 2, wherein the plurality of second metal lines comprise: a first interconnection line electrically connected to the first metal line; and a plurality of second interconnection lines on the top surface of the through electrodes, wherein the capping layer covers a portion of the top surface of the through electrode, the portion of the top surface of the through electrode being between the second interconnection lines.

4. The semiconductor device of claim 3, wherein, the top surface of the through electrode is flat, and the capping layer has a uniform thickness.

5. The semiconductor device of claim 4, wherein a top surface of the first metal line is coplanar with the top surface of the through electrode, and a bottom surface of the first metal line is in contact with the electrical contact.

6. The semiconductor device of claim 3, wherein the portion of the top surface of the through electrode protrudes between the second interconnection lines such that the portion of the top surface of the through electrode protrudes in a direction away from the substrate, a first portion of the capping layer has a first thickness, the first portion of the capping layer being on the portion of the top surface of the through electrode, and a second portion of the capping layer has a second thickness, the second portion of the capping layer being on the interlayer dielectric layer, the second thickness being greater than the first thickness.

7. The semiconductor device of claim 6, wherein a top surface of the first metal line is lower than the portion of the top surface of the through electrode, and a bottom surface of the first metal line is in contact with the electrical contact.

8. A method for fabricating a semiconductor device, the method comprising: forming an interlayer dielectric layer on a substrate, the interlayer dielectric layer including an integrated circuit and an electrical contact, the electrical contact electrically connected to the integrated circuit; forming a through electrode partially penetrating the substrate; forming a first metal line in the interlayer dielectric layer, the first metal line electrically connected to the electrical contact; sequentially forming a capping layer and an intermetal dielectric layer on the interlayer dielectric layer; and forming a plurality of second metal lines in the intermetal dielectric layer, the second metal lines being electrically connected to the first metal line and the through electrode.

9. The method of claim 8, wherein the forming the first metal line forms the first metal line such that a top surface of the electrical contact is in contact with the first metal line, the forming the plurality of second metal lines forms the plurality of second metal lines such that a top surface of the through electrode is in contact with one or more of the plurality of second metal lines, and the forming the through electrode forms the through electrode such that the top surface of the through electrode is higher than the top surface of the electrical contact.

10. The method of claim 9, wherein the sequentially forming forms the capping layer such that the capping layer covers a portion of the top surface of the through electrode, the portion of the through electrode being between the one or more of the plurality of second metal lines.

11. The method of claim 8, wherein the forming the interlayer dielectric layer comprises: forming a first insulation layer on the substrate to cover the integrated circuit; forming the electrical contact penetrating the first insulation layer, such that electrical contact is electrically connect to the integrated circuit; and forming the second insulation layer on the first insulation layer to cover the electrical contact.

12. The method of claim 8, wherein the forming the through electrode comprises: forming a polish stop layer on the interlayer dielectric layer; forming a via hole completely penetrating the polish stop layer and interlayer dielectric layer and partially penetrating the substrate; forming on the substrate a conductive layer such that the conductive layer covers the polish stop layer and fills the via hole; forming the through electrode from the conductive layer filling the via hole by polishing the conductive layer until the polish stop layer is exposed; and removing the polish stop layer.

13. The method of claim 8, wherein the forming the second metal lines includes patterning the intermetal dielectric layer and the capping layer to form a first interconnection line and a plurality of second interconnection lines in the intermetal dielectric layer, the first interconnection line electrically connected to the first metal line, and the plurality of second interconnection lines electrically connected to the through electrode, and the forming the capping layer forms the capping layer such that the capping layer covers a portion of a top surface of the through electrode.

14. The method of claim 13, wherein the capping layer has a uniform thickness.

15. The method of claim 13, wherein the forming the capping layer forms the capping layer such that the capping layer includes: a first portion of the capping layer has a first thickness, the first portion of the capping layer being on the portion of the top surface of the through electrode, and a second portion of the capping layer has a second thickness, the second portion of the capping layer being on the interlayer dielectric layer, the second thickness being greater than the first thickness.

16. A semiconductor device comprising: an insulation layer having an upper surface and a lower surface, the lower surface covering an upper surface of a substrate, the substrate having an integrated circuit (IC) and a contact thereon, the insulation layer including at least first metal lines and an interlayer dielectric layer adjacent thereto such that a first one of the first metal lines is electrically isolated from a second one of the first metal lines; and a through electrode extending from the upper surface of the insulation layer to at least a lower surface of the substrate such that the through electrode is electrically connected to the IC via the contact.

17. The semiconductor device of claim 16, wherein the upper surface of the substrate contacts a lower surface of the contact and a lower surface of the first one of the metal lines contacts a upper surface of the contact such that the contact is electrically connected the upper surface of the substrate and the lower surface of the first one of the first metal lines.

18. The semiconductor device of claim 17, wherein the interlayer dielectric layer includes a first insulation layer having the IC therein, and a second insulation layer on the first insulation layer, the first insulation layer and second insulation layer including a same material, and an upper surface of the through electrode is coplanar with an upper surface of the second insulation layer such that the upper surface of the through electrode is further from the upper surface of the substrate than the upper surface of the contact.

19. The semiconductor device of claim 18, wherein the insulation layer further includes an intermetal dielectric layer on an upper surface of the interlayer dielectric layer, and the semiconductor device further comprises: second metal lines in the intermetal dielectric layer, the second metal lines including first interconnection lines and second interconnection lines, one of the first interconnection lines configured to contact the upper surface of the first one of the first metal lines, and the second interconnection lines configured to contact the upper surface of the through electrode.

20. The semiconductor device of claim 19, further comprising: a capping layer between the intermetal dielectric layer and the interlayer dielectric layer, each of the second metal lines extending from the intermetal dielectric layer through the capping layer to one of the upper surface of the first metal lines and the upper surface of the through electrode such that the capping layer is between each of the second metal lines.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0009] The accompanying drawings are included to provide a further understanding of the example embodiments, and are incorporated in and constitute a part of this specification. The drawings illustrate example embodiments and, together with the description, serve to explain principles of the example embodiments. In the drawings:

[0010] FIGS. 1A to 1L are cross-sectional views illustrating a method for fabricating a semiconductor device according to example embodiments of the present inventive concepts;

[0011] FIG. 1M is an enlarged cross-sectional view illustrating a portion of FIG. 1L;

[0012] FIGS. 2A to 2C are cross-sectional views illustrating a method for fabricating a semiconductor device according to example embodiments of the present inventive concepts;

[0013] FIG. 2D is an enlarged cross-sectional view illustrating a portion of FIG. 2C;

[0014] FIG. 3A is a cross-sectional view illustrating a semiconductor package including a semiconductor device according to example embodiments of the present inventive concepts; and

[0015] FIG. 3B is a cross-sectional view illustrating a semiconductor module including a semiconductor device according to example embodiments of the present inventive concepts.

DETAILED DESCRIPTION

[0016] Hereinafter, it will be described about example embodiments in conjunction with the accompanying drawings.

[0017] FIGS. 1A to 1L are cross-sectional views illustrating a method for fabricating a semiconductor device according to example embodiments of the present inventive concepts. FIG. 1M is an enlarged cross-sectional view illustrating a portion of FIG. 1L.

[0018] Referring to FIG. 1A, a substrate 100 may be provided to include a top surface 100a and a bottom surface 100b opposite the top surface 100a. The substrate 100 may include a semiconductor substrate such as a silicon wafer. A first insulation layer 111 including an integrated circuit 102 therein may be formed on the top surface 100a of the substrate 100. The integrated circuit 102 may include a memory circuit, a logic circuit, or a combination thereof. The first insulation layer 111 may include a silicon oxide layer, a silicon nitride layer, or a TEOS (tetraethyl orthosilicate) oxide layer formed by, for example, a chemical vapor deposition. One or more electrical contacts 104 may be formed to vertically penetrate the first insulation layer 111 by patterning the first insulation layer 111 and depositing a conductive material. The electrical contacts 104 may be in contact with the substrate 100 and electrically connected to the substrate 100 and/or the integrated circuit 102. The electrical contacts 104 may include a metal such as copper, tungsten, aluminum, or any combination thereof.

[0019] Referring to FIG. 1B, a second insulation layer 112 may be formed on the first insulation layer 111 and then a polish stop layer 121 may be formed on the second insulation layer 112. Substantially identical or similar to the formation of the first insulation layer 111, the second insulation layer 112 may include a TEOS (tetraethyl orthosilicate) oxide layer formed by, for example, a chemical vapor deposition. The first and second insulation layers 111 and 112 may constitute an interlayer dielectric layer 110 that encapsulates the integrated circuit 102 and the electrical contacts 104. The polish stop layer 121 may include a material different from that of the second insulation layer 112. For example, the polish stop layer 121 may include a silicon nitride layer formed by, for example, a chemical vapor deposition.

[0020] Referring to FIG. 1C, a photolithography process and an etch process may be performed to form a via hole 101 that vertically penetrates the polish stop layer 121, the interlayer dielectric layer 110, and the substrate 100. The via hole 101 may completely penetrate the polish stop layer 121 and the interlayer dielectric layer 110. The via hole 101 may partially penetrate the substrate 100 and may not reach the bottom surface 100b of the substrate 100.

[0021] Referring to FIG. 1D, an insulation layer 130a may be formed to cover an inner wall of the via hole 101 and a top surface of the polish stop layer 121. And then, a conductive layer 140a may be formed on the substrate 100 such that the via hole 101 may be filled with the conductive layer 140a. The insulation layer 130a may be formed by depositing HARP (high aspect ratio process) oxide using an SACVD (sub-atmospheric chemical vapor deposition). The conductive layer 140a may be formed by depositing or plating polysilicon, copper, tungsten, aluminum, etc.

[0022] When the conductive layer 140a is formed of copper or copper-containing conductive material, a metal layer 135a may be further formed on the insulation layer 130a to prevent copper from being diffused. The metal layer 135a may be formed to have a shape that conforms to the insulation layer 130a by depositing a metal including titanium (Ti), titanium nitride (TiN), chromium (Cr), tantalum (Ta), tantalum nitride (TaN), nickel (Ni), tungsten (W), tungsten nitride (WN), or any combination thereof.

[0023] Referring to FIG. 1E, the conductive layer 140a may be planarized using, for example, a chemical mechanical polishing (CMP) process. The CMP process may be performed until the polish stop layer 121 is exposed. The insulation layer 130a and the metal layer 135a may be polished together with the conductive layer 140a during the planarization process. The planarization process may change the conductive layer 140a into a pillar-shaped through electrode 140 that fills the via hole 101, and the insulation layer 130a into a cup-shaped via insulation layer 130 that surrounds side and bottom surfaces of the through electrode 140. When the metal layer 135a is further formed, the planarization process may also change the metal layer 135a into a barrier layer 135 that reduces (or, alternatively, prevents) a constituent (e.g., copper) of the through electrode 140 from being diffused into the substrate 100 and/or the integrated circuit 102.

[0024] Referring to FIG. 1F, the polish stop layer 121 may be selectively removed. For example, the polish stop layer 121 may be removed from the substrate 100 by an etch process using an etchant capable of selectively removing the polish stop layer 121. The removal of the polish stop layer 121 may expose the through electrode 140 and a top surface 110s of the interlayer dielectric layer 110. The through electrode 140 may protrude from the top surface 110s of the interlayer dielectric layer 110.

[0025] Referring to FIG. 1G, a plurality of first metal lines 151 may be formed to be electrically connected to the electrical contacts 104. The first metal lines 151 may include a metal such as copper, tungsten, aluminum, or any combination thereof. In an embodiment, the first metal lines 151 may include copper formed by, for example, a damascene process. A protruding portion of the through electrode 140 from the top surface 110s of the interlayer dielectric layer 110 may be removed when the first metal lines 151 are formed. Accordingly, the through electrode 140 may have a top surface 140s coplanar with the top surface 110s of the interlayer dielectric layer 110 and/or top surfaces 151s of the first metal lines 151.

[0026] Referring to FIG. 1H, a first capping layer 123 may be formed to cover the interlayer dielectric layer 110 and then a first intermetal dielectric layer 161 may be formed on the first capping layer 123. The first capping layer 123 may cover the through electrode 140 and the first metal lines 151. For example, substantially identical or similar to the formation of the polish stop layer 121, the first capping layer 123 may include a silicon nitride layer formed by, for example, a chemical vapor deposition. Alternatively, the first capping layer 123 may include a low-k insulating material (e.g., SiCN) capable of preventing metal constituents of the first metal lines 151. Substantially identical or similar to the formation of the interlayer dielectric layer 110, the first intermetal dielectric layer 161 may include a TEOS (tetraethyl orthosilicate) oxide layer formed by, for example, a chemical vapor deposition.

[0027] Referring to FIG. 1I, a plurality of second metal lines 153 and 154 may be formed to be connected to the first metal lines 151 and the through electrode 140. The second metal lines 153 and 154 may penetrate the first intermetal dielectric layer 161 and the first capping layer 123 to be in contact with the first metal lines 151 and the through electrode 140. Substantially identical or similar to the formation of the first metal lines 151, the second metal lines 153 and 154 may include copper formed by, for example, a damascene process.

[0028] The second metal lines 153 and 154 may include a one or more (or, alternatively, a plurality of) first interconnection lines 153 electrically connected to the first metal lines 151 and a plurality of second interconnection lines 154 electrically connected to the through electrode 140. In an example embodiment, at least two second interconnection lines 154 may be electrically connected to the through electrode 140. For example, the first interconnection lines 153 may be formed by a dual damascene process and the second interconnection lines 154 may be formed by a single damascene process. Alternatively, one of the single and dual damascene processes may be performed to form the second metal lines 153 and 154 whose shapes are identical or similar to each other.

[0029] Referring to FIG. 1J, a second capping layer 125, a second intermetal dielectric layer 163, a plurality of third metal lines 155, and a third capping layer 127 may be sequentially formed on the first intermetal dielectric layer 161. At least one of the second and third capping layers 125 and 127 may include a material substantially the same as that of the first capping layer 123. Substantially identical or similar to the formation of the second metal lines 153 and 154, the third metal lines 155 may include a metal such as copper, tungsten, aluminum, or any combination thereof. The third metal lines 155 may be electrically connected to the second metal lines 153 and 154. For example, the third metal lines 155 may include copper formed by, for example, a dual damascene process.

[0030] An upper protection layer 165 may be formed on the third capping layer 127, and an upper line 158 may be formed to be electrically connected to at least one of the third metal lines 155.

[0031] An upper terminal 170, such as a solder ball, may be formed on the upper protection layer 165 to be electrically connected to the upper line 158. The upper line 158 may include, for example, copper. The upper terminal 170 may include, for example, a lead-free solder. The upper protection layer 165 may be formed by, for example, depositing an insulating material such as silicon oxide, silicon nitride, or polymer.

[0032] Referring to FIG. 1K, the substrate 100 may be recessed to protrude the through electrode 140. For example, the bottom surface 100b of the substrate 100 may be recessed by at least one of an etching process, a chemical mechanical polishing process, a grinding process, or any combination thereof which uses an etchant or slurry capable of selectively removing a constituent (e.g., silicon) of the substrate 100. The recess process may be performed until a third bottom surface 100d is revealed. The third bottom surface 100d may be closer to the top surface 100a than the bottom surface 100b, and the through electrode 140 may protrude from the third bottom surface 100d.

[0033] For example, the bottom surface 100b of the substrate 100 may be, for example, chemically mechanically polished to reveal a second bottom surface 100c through which the through electrode 140 is not exposed, and the second surface 100c may be then be, for example, dry-etched to reveal the third bottom surface 100d through which the through electrode 140 is exposed. The top surface 100a may be hereinafter referred to as an active surface, and the third bottom surface 100d may be hereinafter referred to as an inactive surface.

[0034] Referring to FIG. 1L, a lower protection layer 167 may be formed to cover the inactive surface 100d of the substrate 100, and a lower terminal 172 may be formed on the lower protection layer 167 to be electrically connected to the through electrode 140. The lower terminal 172 may have a pad shape or a solder ball shape.

[0035] The processing described above with reference to FIGS. 1A to 1L may fabricate a semiconductor device 1 including the through electrode 140.

[0036] Referring to FIG. 1M, the interlayer dielectric layer 110 may fill spaces between adjacent ones of the first metal lines 151. For example, as discussed with reference to FIGS. 1A and 1B, the interlayer dielectric layer 110 may include the first and second insulation layers 111 and 112 that are formed of the same material. Thereafter, as discussed in FIG. 1G, a damascene process may be performed to form the first metal lines 151 in the interlayer dielectric layer 110 to be electrically connected to the electrical contacts 104. Accordingly, a region A between adjacent first metal lines 151 may include the same material (e.g., TEOS oxide). In other words, the region A may have no interface, horizontally extending along the active surface 100a of the substrate 100, which will be formed between different materials in contact with each other. Therefore, there may be a reduced probability of electrical failure in the semiconductor device 1, such as, an electrical short occurred when constituents (e.g., copper) of the first metal lines 151 migrate along an interface in the space A between the adjacent first metal lines 151.

[0037] In example embodiments, after the formation of the through electrode 140 that penetrates the interlayer dielectric layer 110, the first metal lines 151 may be formed in the interlayer dielectric layer 110 to be electrically connected to the electrical contacts 104 using, for example, a damascene process. Thus, the first metal lines 151 may have the top surfaces 151s coplanar with the top surface 140s of the through electrode 140. At least one of the first metal lines 151 may have a bottom surface in contact with a top surface 104s of the electrical contact 104. The top surface 140s of the through electrode 140 may be higher than the top surface 104s of the electrical contact 104.

[0038] According to an example embodiment, the formation of the first capping layer 123 may be followed by the formation of the second metal lines 153 and 154. The plurality of second metal lines 153, 154 may include at least two second interconnection lines 154 on the through electrode 140. Accordingly, the first capping layer 123 may remain between adjacent second interconnection lines 154 on the through electrode 140.

[0039] The first capping layer 123 may have a substantially uniform thickness. For example, the first capping layer 123 may have a first thickness T1 at between the second interconnection lines 154 on the through electrode 140 and a second thickness T2, substantially the same as the first thickness T1, at other portions thereof. As the first capping layer 123 has the uniform thickness, the top surface 140s of the through electrode may be flat.

[0040] FIGS. 2A to 2C are cross-sectional views illustrating a method for fabricating a semiconductor device according to example embodiments of the present inventive concepts. FIG. 2D is an enlarged cross-sectional view illustrating a portion of FIG. 2C.

[0041] In the example embodiments that follows, the description of features that are the same as those the foregoing example embodiments will be omitted or roughly mentioned and different features will be discussed in detail.

[0042] Referring to FIG. 2A, using processes identical or similar to those discussed with reference to FIGS. 1A to 1G, the through electrode 140 may be formed and then the first metal lines 151 may be formed to be electrically connected to the electrical contacts 104.

[0043] For example, when a damascene process is performed to form the first metal lines 151, it may be possible to leave the protruding portion of the through electrode 140 remaining on the top surface 110s of the interlayer dielectric layer 110. Accordingly, the through electrode 140 may have the top surface 140s higher than the top surface 110s of the interlayer dielectric layer 110 and/or the top surfaces 151s of the first metal lines 151. In other example embodiments, the protruding portion of the through electrode 140 from the top surface 110s of the interlayer dielectric layer 110 is removed while the top surface 140s of the through electrode 140 remains higher than the top surface 110s of the interlayer dielectric layer 110 and/or the top surfaces 151s of the first metal lines 151.

[0044] Referring to FIG. 2B, the first capping layer 123 may be formed to cover the interlayer dielectric layer 110 and then the first intermetal dielectric layer 161 may be formed on the first capping layer 123. In example embodiments, the first capping layer 123 may have a non-uniform thickness. For example, the first capping layer 123 may have a relatively smaller thickness on the through electrode 140.

[0045] Referring to FIG. 2C, a semiconductor device 2 may be fabricated through processes identical or similar to those discussed with reference to FIGS. 1I to 1L but with the aforementioned modifications of FIGS. 2A and 2B.

[0046] As shown in FIG. 2D, the region A between adjacent first metal lines 151 may have no interface that can cause an electrical failure of the semiconductor device 2. The through electrode 140 may have the top surface 140s higher than the top surface 104s of electrical the contact 104.

[0047] According to example embodiments, as discussed in FIG. 2B, the first capping layer 123 may have a non-uniform thickness. For example, the first capping layer 123 may have a first thickness T1 between the second interconnection lines 154 on the through electrode 140 and a second thickness T2, greater than the first thickness TI, at other portions thereof. As the first capping layer 123 has the non-uniform thickness, the top surface 140s of the through electrode may be non-flat. For example, the top surface 140s of the through electrode 140 may have a portion that protrudes from the top surface 151s of the first metal line 151 along a direction away from the active surface 100a of the substrate 100.

[0048] FIG. 3A is a cross-sectional view illustrating a semiconductor package including a semiconductor device according to example embodiments of the present inventive concepts. FIG. 3B is a cross-sectional view illustrating a semiconductor module including a semiconductor device according to example embodiments of the present inventive concepts.

[0049] Referring to FIG. 3A, a semiconductor package 10 may include a package substrate 210 (e.g., a printed circuit board) having outer terminals 212 attached thereto, an application processor 230 mounted on the package substrate 210, a memory chip 250 stacked on the application processor 230, and a mold layer 260 covering the application processor 230 and the memory chip 250. The semiconductor package 10 may be used a part of mobile products such as a cellular phone or a tablet computer.

[0050] The application processor 230 may be electrically connected to the package substrate 210 through a solder ball 220 disposed on the package substrate 210. The memory chip 250 may be electrically connected to the application processor 230 through a solder ball 240 disposed on the application processor 230. The application processor 230 may be mounted on the package substrate 210 in such a way that an active surface thereof faces the package substrate 210 or the memory chip 250. The memory chip 250 may be stacked on the application processor 230 in such a way that an active surface thereof faces the application processor 230. The application processor 230 may include a through electrode 235. For example, the application processor 230 may be configured to have a structure substantially identical or similar to that of the semiconductor device 1 of FIG. 1L or the semiconductor device 2 of FIG. 2C. The description of the semiconductor device 1 of FIG. 1L or the semiconductor device 2 of FIG. 2C may also be applicable to the application processor 230.

[0051] Referring to FIG. 3B, a semiconductor module 20 may be a memory module including a package substrate 310 (e.g., a printed circuit board) having outer terminals 312 attached thereto, a chip stack 360 and a graphic processing unit (GPU) 350 mounted on the package substrate 310, and a mold layer 370 covering the chip stack 360 and the graphic processing unit 350. The semiconductor module 20 may further include an interposer 330 provided on the package substrate 310.

[0052] The graphic processing unit 350 and the chip stack 360 may be electrically connected to the interposer 330 through solder balls 340. The interposer 330 may include a through electrode 335 and be electrically connected to the package substrate 310 through a solder ball 320 disposed on the package substrate 310.

[0053] The chip stack 360 may include a plurality of high-band memory chips 361, 362, 363 and 364 that are sequentially stacked. The memory chips 361-364 may be electrically connected to each other through solder balls 367. At least one of the memory chips 361-364 may include one or more through electrodes 365. For example, each of the first, second, and third memory chips 361-363 may include at least one through electrode 365. The through electrode may not be provided in the fourth memory chip 364. Alternatively, the fourth memory chip 364 may include the through electrode 365. At least the first to third ones 361-363 of the memory chips 361-364 may be configured to respectively have structures substantially identical or similar to that of the first semiconductor device 1 of FIG. 1L or the semiconductor device 2 of FIG. 2C. The description of the semiconductor device 1 of FIG. 1L or the semiconductor device 2 of FIG. 2C may also be applicable to the first to third memory chips 361-363.

[0054] According to example embodiments of the present inventive concepts, as the metal lines are configured to have no interface therebetween along which constituents of the metal lines are moved, an electrical short may be prevented between the metal lines. It therefore may be possible for the semiconductor device to obtain improved electrical characteristics.

[0055] Although some example embodiments have been described and illustrated in the accompanying drawings, example embodiments are not limited thereto. It will be apparent to those skilled in the art that various substitution, modifications and changes may be thereto without departing from the scope and spirit of the example embodiments.