METHODS FOR OBTAINING AN N-TYPE DOPED METAL CHALCOGENIDE QUANTUM DOT SOLID-STATE ELEMENT WITH OPTICAL GAIN AND A LIGHT EMITTER INCLUDING THE ELEMENT, AND THE OBTAINED ELEMENT AND LIGHT EMITTER
20220235263 · 2022-07-28
Assignee
- FUNDACIÓ INSTITUT DE CIÈNCIES FOTÒNIQUES (Castelldefels, ES)
- INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS (Barcelona, ES)
Inventors
Cpc classification
H01S5/12
ELECTRICITY
B82Y20/00
PERFORMING OPERATIONS; TRANSPORTING
B82Y40/00
PERFORMING OPERATIONS; TRANSPORTING
H01S5/1075
ELECTRICITY
H01S5/1078
ELECTRICITY
C01P2006/60
CHEMISTRY; METALLURGY
H01S3/169
ELECTRICITY
H01S3/1691
ELECTRICITY
C09K11/025
CHEMISTRY; METALLURGY
International classification
H01S5/10
ELECTRICITY
H01S5/12
ELECTRICITY
H01S5/183
ELECTRICITY
Abstract
The present invention relates to a method for obtaining an n-type doped metal chalcogenide quantum dot solid-state element with optical gain for low-threshold, band-edge amplified spontaneous emission (ASE), comprising: —forming a metal chalcogenide quantum dot solid-state element, and —carrying out an n-doping process on its metal chalcogenide quantum dots to at least partially bleach its band-edge absorption, which comprises: —a partial substitution of chalcogen atoms by halogen atoms, in the metal chalcogenide quantum dots, and/or —a partial aliovalent-cation substitution of bivalent metal cations by trivalent cations, in the metal chalcogenide quantum dots; and —providing a substance on the metal chalcogenide quantum dots, to avoid oxygen p-doping. The present invention also relates to the obtained n-type doped metal chalcogenide quantum dot solid-state element, a method for obtaining a light emitter with that n-type doped metal chalcogenide quantum dot solid-state element, and the obtained light emitter.
Claims
1. A method for obtaining an n-type doped metal chalcogenide quantum dot solid-state element with optical gain for low-threshold, band-edge amplified spontaneous emission (ASE), comprising: forming a metal chalcogenide quantum dot solid-state element, and carrying out an n-doping process on at least a plurality of the metal chalcogenide quantum dots of said metal chalcogenide quantum dot solid-state element, to at least partially bleach its band-edge absorption, wherein said n-doping process comprises: a partial substitution of chalcogen atoms by halogen atoms, in at least said plurality of metal chalcogenide quantum dots, and/or a partial aliovalent-cation substitution of bivalent metal cations by trivalent cations, in at least said plurality of metal chalcogenide quantum dots; and providing a substance on at least said plurality of metal chalcogenide quantum dots, wherein said substance is an oxide-type substance made and arranged to avoid oxygen p-doping of the plurality of metal chalcogenide quantum dots.
2. The method according to claim 1, wherein said metal chalcogenide is at least one of Pb-, Cd-, and Hg-chalcogenide, wherein said chalcogen atoms are at least one of sulphur, selenium, and tellurium atoms, and wherein said halogen atoms are at least one of iodine, bromine, and chlorine atoms.
3. The method according to claim 1, wherein said metal chalcogenide is at least one of Pb-, Cd-, and Hg-chalcogenide, wherein said bivalent metal cations are at least one of Pb, Cd, and Hg, in the +2 oxidation state, and wherein said trivalent cations are at least one of In, Bi, Sb, and Ga, in the +3 oxidation state.
4. The method according to claim 1, comprising providing said substance to: coat said metal chalcogenide quantum dot solid-state element to isolate the same from ambient oxygen; and/or infiltrate within the metal chalcogenide quantum dot solid-state element to react with oxygen present therein for suppressing their p-doping effect.
5. The method according to claim 1, wherein said substance is at least one of alumina, titania, ZnO, and hafnia.
6. The method according to claim 1, wherein said step of forming said metal chalcogenide quantum dot solid-state element comprises forming a blend with a host matrix of first metal chalcogenide quantum dots and, embedded therein, said plurality of metal chalcogenide quantum dots, which are second metal chalcogenide quantum dots having a smaller or equal bandgap, wherein said second metal chalcogenide quantum dots are larger than said first metal chalcogenide quantum dots, and wherein the method comprises applying said n-doping process at least on the second metal chalcogenide quantum dots so that they are heavily n-doped.
7. The method according to claim 1, comprising selecting the size of said plurality of metal chalcogenide quantum dots to obtain, after said n-doping process has been carried out thereon, an initial electron occupancy doping <N>.sub.D ranging from 1.4 to 5.4.
8. The method according to claim 7, wherein said step of selecting the size of said plurality of metal chalcogenide quantum dots comprises selecting quantum dot diameters ranging from 5.0 nm to 6.2 nm for PbS colloidal quantum dots.
9. The method according to claim 1, wherein at least part of said plurality of metal chalcogenide quantum dots are of a core-shell type, each including a core and at least one shell, wherein said core comprises a metal chalcogenide and said shell a distinct metal chalcogenide or an alloy of the metal chalcogenide of the core, and wherein the n-doping process is applied to either the core, the at least one shell, or both.
10. An n-type doped metal chalcogenide quantum dot solid-state element with optical gain for low-threshold, band-edge amplified spontaneous emission (ASE), comprising a plurality of metal chalcogenide quantum dots with its band-edge absorption at least partially bleached, wherein said plurality of metal chalcogenide quantum dots comprises: some chalcogen atoms substituted by halogen atoms, and/or some bivalent metal cations aliovalent-cation substituted by trivalent cations; and wherein a substance is provided on at least said plurality of metal chalcogenide quantum dots, wherein said substance is an oxide-type substance made and arranged to avoid oxygen p-doping of the plurality of metal chalcogenide quantum dots.
11. The n-type doped metal chalcogenide quantum dot solid-state element of claim 10, wherein said substance is at least one of alumina, titania, ZnO, and hafnia.
12. (canceled)
13. A method for obtaining a light emitter, comprising: providing a gain medium comprising at least one n-type doped metal chalcogenide quantum dot solid-state element obtained according to the method of claim 1; and providing an optical or electrical pump configured and arranged to excite said at least one n-type doped metal chalcogenide quantum dot solid-state element so that a population inversion is produced therein that generates an amplified spontaneous emission (ASE).
14. A light emitter, comprising: a gain medium comprising at least one n-type doped metal chalcogenide quantum dot solid-state element obtained according to the method of claim 1; and an optical or electrical pump configured and arranged to excite said at least one n-type doped metal chalcogenide quantum dot solid-state element so that a population inversion is produced therein that generates an amplified spontaneous emission (ASE).
15. A light emitter according to claim 14, wherein the light emitter is a superluminescence light emitter.
16. A light emitter according to claim 14, wherein the light emitter is a laser device further comprising a laser optical cavity and, optically coupled thereto, said gain medium, which is a laser gain medium, wherein said laser optical cavity is configured and arranged to provide optical feedback to said amplified spontaneous emission (ASE).
17. A light emitter according to claim 16, wherein said laser device comprises at least one of a vertical-cavity surface-emitting laser structure (VCSEL), a distributed feedback laser structure (DFB), and a whispering gallery mode laser structure (WGM).
18. A light emitter according to claim 17, wherein: said VCSEL structure comprises said laser gain medium with a thickness ranging from 200 nm to 1 μm, sandwiched between two Bragg reflectors forming a photonic bandgap ranging from 1000 nm to 2000 nm; said DFB structure comprises a waveguide resonator formed by: a corrugated substrate with corrugations implemented by periodically arranged structured elements forming a grating with a grating height ranging from 20 nm to 500 nm, and a periodicity ranging from 700 nm to 1400 nm, and said laser gain medium, with a thickness ranging from 20 nm to 1500 nm, arranged on top of said corrugated substrate over said corrugations; and said WGM structure comprises said laser gain medium with a thickness ranging from 10 nm to 2000 nm, optically coupled to one or more WGM resonators for single or multi laser mode, wherein the diameter of each resonator ranges from 50 μm to 1000 μm.
19. A light emitter according to claim 14, configured to emit light with a wavelength ranging from 800 nm to 2400 nm.
Description
BRIEF DESCRIPTION OF THE FIGURES
[0069] In the following some preferred embodiments of the invention will be described with reference to the enclosed figures. They are provided only for illustration purposes without however limiting the scope of the invention.
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DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0085] In the present section, by means of several experiments detailed below, the present inventors demonstrate the feasibility and good results offered by the present invention, specifically for embodiments for which the metal chalcogenide quantum dot solid-state elements are PbS quantum dot solid-state elements, and sulphur atoms are partially substituted by iodine atoms.
[0086] Here the present inventors demonstrate infrared stimulated emission tuneable across the optical communication band based on PbS CQDs. The present inventors have employed robust heavily doped PbS CQD solid-state conductive elements that reach gain threshold at the single exciton regime, representing a four-fold reduction from the theoretical limit of an eight-fold degenerate system. They also exhibit room temperature stimulated emission near the single exciton regime, at a threshold two orders of magnitude lower than prior reports [11,12], and a net modal gain in excess of 110 cm.sup.−1, the highest reported to date in the infrared.
[0087] The present inventors posited that a CQD element, such as a film, robustly doped in the heavy doping regime, can address this challenge by utilizing the doping electrons present in the first excited state of the CQDs (conduction band) to reach the population inversion condition at reduced pumping fluence. To test the here proposed hypothesis, the present inventors employed a method to dope PbS CQDs in the heavy doping regime. The doping mechanism takes place by iodine substitution of surface sulphur sites on (001) exposed surface facets (
Transition Absorption PbS CQD Films:
[0088] To verify the hypothesis of reaching single exciton gain threshold in doped PbS CQD films, the present inventors performed transient absorption (TA) studies in undoped PbS CQD films as well as a series of doped PbS CQD films with variable initial electron occupancy doping <N>.sub.D, determined by their size (
[0089] The corresponding transient absorption of the undoped and doped films (
[0090] Particularly, the diagrams of
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[0092] The fitting parameters of the transient absorption measurements are summarized at the table below:
TABLE-US-00001 A.sub.1 τ.sub.1 (ps) A.sub.2 τ.sub.2 (ps) Undoped <N> = 1 0.029 613 — — Undoped <N> = 9 0.049 490 0.073 38 Doped <N> = 1 0.0214 614 — — Doped <N> = 9 0.08 217 0.118 22
[0093] Table 1 Furthermore, extracting the gain lifetime from the transient absorption data at the probing wavelength of the highest gain value (
Photoconductivity Measurement:
[0094] To shed further insights, having conductive films, the present inventors have performed transient photoconductivity measurements [22] that, as will be shown below, yield a very low value for the Auger coefficient of 10.sup.−31 cm.sup.6s.sup.−1, lower than prior reports for PbS CQDs [23]. This is likely due to the conductive nature of those films [22].
[0095] Indeed, the dependence of the photocurrent density on the excitation intensity was investigated to understand the mechanism of photo-carrier generation in the chemically treated elements following a previously reported procedure [33]. The photocurrent was collected at a voltage bias of 20 V. In
[0096] The standard EDT (1,2-ethanedithiol) treated and the according to the present invention ZnI.sub.2/MPA treated films showed different behaviour with high photon flux as the higher degree of photocurrent saturation observed in case of EDT treated film [33]. For doped ZnI.sub.2/MPA treated film, the photocurrent increased nearly 3 orders of magnitude due to the improvement in the mobility. The photon flux dependence of the photo-current showed a similar trend of the ZnI.sub.2/MPA treated undoped materials. To quantify the recombination dynamics involving more than one charge carrier taking place in the QD solids, the following equations have been considered,
[0097] Where G is the generation rate, an is the carrier trapping rate, bn.sup.2 is the radiative recombination rate and cn.sup.3 is the Auger recombination rate. Photocurrent I is proportional to the charge carriers n. The plots are fit in
TABLE-US-00002 TABLE 2 DEVICE b/a.sup.2 (s cm.sup.3) c/a.sup.3 (s.sup.2cm.sup.6) PbS_EDT treat 3.4 × 10.sup.−14 3 × 10.sup.−27 Undoped PbS_ZnI.sub.2/MPA 1.2 × 10.sup.−14 1.2 × 10.sup.−31 Doped PbS_ZnI.sub.2/MPA 9 × 10.sup.−15 1 × 10.sup.−31
[0098] The radiative (bi-molecular) rate parameters showed nearly similar values for all the cases whereas there is a distinct difference between EDT treated and ZnI.sub.2/MPA treated films in case of Auger coefficient. ZnI.sub.2/MPA treated doped and undoped both PbS QD solids showed a much lower Auger coefficient compared to the standard EDT treated solids. This confirms fast dissipation of charges in QD solids based with ZnI.sub.2/MPA treatment (both doped and undoped).
Power Dependence ASE Measurements:
[0099] Optical gain is a prerequisite for stimulated emission. Having achieved this, next the present inventors performed amplified spontaneous emission (ASE) measurements of thin films obtained according to the method of the first aspect of the present invention. In line with the TA measurements the present inventors observed stimulating emission from both doped and undoped samples (see
[0100] A figure of merit of paramount importance for applications in optical amplification and lasing is the net modal gain of the material. The present inventors have experimentally measured the net modal gain g.sub.modal using the variable stripe length (VSL) technique, from the measured data shown in
[0101] The variable strength dependence data have been collected at the pump fluence in the saturation regime of the ASE signal. In order to extract the net modal gain values the data have been fitted with the following function:
[0102] Where:
[0103] G: net modal gain coefficient
[0104] I: photoluminescence Intensity
[0105] L: stripe length
[0106] A: spontaneous emission growth parameter
[0107] The present inventors report an average g.sub.modal of 30 cm.sup.−1 nearly constant for all the undoped samples (
Calculating the Occupancy Per Dot:
[0108] In order to calculate the number of the occupancy per dot the present inventors carefully measured the thickness of each CQD film, H.sub.film using profilometry. Therefore, the number of QDs within the excitation area A.sub.exc is determined:
Where V.sub.CQD is the volume of the quantum dots.
[0109] Next the energy required to generate one N=1 carrier per NC was calculated. For this reason, both the transmission (T) and the reflection (R) spectra of the film at 800 nm were measured.
[0110] The photon energy at the excitation wavelength (800 nm) is given by:
[0111] Where h is the Planck's constant, c is the speed of light, and λ the wavelength of the radiation.
[0112] So the incident energy required for N=1:
Methods:
PbS CQDs Synthesis:
[0113] PbS QDs synthesis was adapted from a previously reported multi-injection procedure. Briefly, 0.446 g lead(II) oxide (PbO, 99.999% Pb, Strem Chemicals), 50 mL 1-Octadecene (ODE, 90%, Alfa Aesar) and 3.8 mL oleic acid (OA, 90%, Sigma Aldrich) were introduced in 3-neck, round bottom flask and degassed overnight, under vacuum at 90° C. Then the reaction temperature was increased at 95-100° C. under Argon and 60 μL of Hexamethyldisilathiane ((TMS).sub.2S, Sigma Aldrich) diluted in 3 ml of ODE was swiftly injected. After 6 minutes, a second solution of 75 μL (TMS).sub.2S in 9 ml ODE was injected dropwise in a rate of 0.75 mL/min. The reaction was constantly monitored with aliquots and is was stop when at the desirable QD size. At that point both the heating and the injection was stopped and the solution was let cool down slowly at room temperature. QDs were purified three times by precipitation with anhydrous acetone and ethanol and re-dispersed in anhydrous toluene. Finally, the concentration was adjusted to 30 mg/mL and the solution was bubbled with N.sub.2 in order to minimize to oxidation of the QDs.
Doped PbS CQD Films:
[0114] The ad-hoc PbS CQDs (30 mg/ml) were spin-cast onto soda-lime glass substrates (1 cm×1 cm) at the speed rate of 2500 rpm for 20 s. The film was treated with ZnI.sub.2/MPA (7 mg/ml of ZnI.sub.2 dissolved in 0.01% of MPA in Methanol) solution for 5 s and the spin-coater was started again to dry the film, while 300 μL was MeOH were drop-casted to wash away the remain ligands. This procedure was repeated till the film thickness of ˜110 nm (4-5 layers). The film thickness was measured with profilometer. The PbS CQD films were doped after the capping with Al.sub.2O.sub.3 with atomic layer deposition (ALD).
Atomic Layer Deposition:
[0115] Al.sub.2O.sub.3 deposition was performed in a GEMStar XT Thermal ALD system. High-purity trimethylaluminium (TMA), purchased from STREM Chemicals Inc., was used as Al precursor. Pure H.sub.2O was used as 0 precursor. The deposition was carried out at 80° C. Before the process, the reaction chamber was pumped down and subsequently filled with pure nitrogen up to a pressure of approximately 0.56 mbar. The TMA and H.sub.2O manifolds were maintained at 150° C. during gas supply. Each layer of Al.sub.2O.sub.3 was formed by applying a 15-ms pulse of H.sub.2O at a partial pressure of 0.02 mbar, followed by a 50-ms pulse of TMA, at a partial pressure of 0.18 mbar. The waiting time between pulses was 15 s and 20 s, respectively.
Transmission and Absorption Measurements:
[0116] Room-temperature absorption measurements were taken under ambient atmosphere, using a Cary 5000 UV-Vis-NIR spectrometer.
Measurements of Doping Level by Optical Measurements:
[0117] Since, the 1S.sub.e states of PbS are eight-fold degenerated (including spin), the number of electrons in the CB per dot, n.sub.QD, can be calculated in a straightforward manner from the bleach of the first exciton transition. If I.sub.1 and I.sub.2 are defined as the integrated absorption strength of the excitonic transition of the undoped and doped samples, respectively, then n.sub.QD=8(1−I.sub.2/I.sub.1). Note that by saying undoped sample, the present inventors are assuming that the doping (whether p-type or n-type) of the samples without alumina is low enough to consider full valence band and empty conduction band.
Reflection Measurements of CQD Films:
[0118] Reflection measurements were obtained using a PerkinElmer Lambda 950 UV/Vis/NIR spectrophotometer equipped with a Universal Reflectance Accessory module.
Transient Absorption Measurements:
[0119] Transient absorption measurements were carried out using a titanium sapphire based ultrafast amplifier centred at 800 nm and generating 45 fs pulses at a repetition rate of 1 kHz. The optical setup utilized was a typical pump-probe non-collinear configuration. The main part of the fundamental energy from the amplifier was directed into a half wave plate and a thin film polarizer system to control the energy of the excitation pulse incident of the sample. The optical path of the pump beam included an optical chopper allowing the use of phase-sensitive detection thereby improving the signal-to-noise ratio. An optical parametric amplifier pumped with approximately 1 mJ of the fundamental 800 nm energy was used to generate the probe beam with wavelengths ranging from 1200 nm to 1700 nm. The probe beam optical path included a precise motorized translation stage to control the optical delay between the pump the probe beam. The probe beam was directed on the sample within the excitation area of the pump beam where changes in transmission and reflection were recorded simultaneously using lock-in amplifiers.
Amplified Spontaneous Emission Measurements:
[0120] For the ASE measurements the ultrafast laser pulse at 800 nm was directed through a cylindrical lens (focus length 15 cm) onto the sample at normal incidence. The stripe width was 700 μm while the stripe length was measured for every measurement in order to calculate the occupancy values (average value of 0.35 cm±0.05). The thickness the PbS CQD elements was ˜110 nm in order to avoid over-estimation of the occupancy per dot. The emission was collected perpendicular to the incident beam using 6 cm focusing lens (5 cm diameter) and coupled into an Andor spectrometer (Shamrock SR-303) equipped with an InGaAs camera (iDus).
Photocurrent Measurements:
[0121] The QD thin films were prepared on the top of the Si/SiO.sub.2 substrate with patterned Au electrode following the standard EDT (0.2%) and ZnI.sub.2/MPA ligand treatments. The distance between two Au electrodes was fixed at 10 μm. 637 nm wavelength continuous laser (Vrotran stradus 637) was used to excite the QD films. All the measurements were performed in ambient conditions using an Agilent B1500A semiconducting device analyser.
Computational Details:
[0122] Density functional calculations of PbS have been performed by periodic plane-wave code Vienna ab initio simulation package VASP [26]. All structures have been optimized using the Perdew-Burke-Ernzerhof (PBE) [27] exchange-correlation functional, one of the most widely employed functionals of the generalized gradient approximation (GGA) family. It is important to mention that pure GGA functionals tend to underestimate electronic properties of materials such as band gaps. In order to account for the best possible and detailed description of the electronic structure of PbS, single-point calculations using the Heyd-Scuseria-Ernzerhof (HSE06) [28] hybrid exchange-correlation functional containing a fraction of nonlocal Fock exchange has been applied on the preoptimized PBE geometries. A plane-wave basis set with a 315 eV cutoff for the kinetic energy and a projector-augmented wave description of core-valence electron interactions were employed [29]. The one-electron Kohn-Sham states were smeared by 0.1 eV using Gaussian smearing. Finally, converged energies were extrapolated to zero smearing. All calculations were performed using a k-point Monkhorst-Pack [30] mesh of 3×3×1 in the reciprocal space for the unit cell of PbS. Relaxation of all atoms in the calculated models was carried out during the geometry optimization until forces acting on each atom became less than 0.01 eV/Å. In addition, the electron density was converged using a threshold of 10-6 eV for the total energy. No corrections for the zero-point energies were applied.
[0123] Two slab models consisting on 2×2×1 supercells were chosen to study PbS, one for the (100) surface and another for the (111) surface. The model of the stoichiometric (100) surface contains 32 atoms arranged in 4 layers, each layer formed by combination of Pb and S atoms, resulting in a nonpolar surface. Meanwhile, the (111) surface has been modelled using 28 atoms arranged in 3 Pb—S bilayers and an extra layer of Pb atoms, giving rise to two Pb terminations. The present inventors considered the PBE optimized lattice parameter to model all slabs (6.004 Å) [31], which is slightly larger than the reported experimental one of 5.929 Å [32].
[0124] The interaction of iodine with PbS surfaces has been modelled in two different ways, doping and adsorption of I atoms, respectively. Doping of PbS by iodine was modelled by substituting one of the S atoms located on the outmost layer of the (100) surface by an iodine. In turn, adsorption of iodine on the (111) surface has been modelled by covering the two Pb termination with I atoms, leading to a 100% coverage situation. Only the hexagonal-close-pack site has been considered in the present study. In order to account for the possible electron transfers emerging due to these two different processes, all calculations were spin-polarized.
[0125] In this document, in a previous section, embodiments for which the n-doped metal chalcogenide quantum dots are of a core-shell type were described. One of those embodiments is illustrated by
[0126] Specifically,
[0127] Particularly, diagram of
[0128] Similarly, diagram of
[0129] Finally, different structures for implementing a laser device according to corresponding embodiments of the light device of the fourth aspect of the present invention are shown in
Vertical-Cavity Surface-Emitting Laser Structure (VCSEL):
[0130] Specifically,
[0131] The thickness L of the gain material is determined with the following function L=λ/2n, where n corresponds to the effective reflective index of the gain material A (e.g. PbS QD and Al.sub.2O.sub.3, PbS QD and Al.sub.2O.sub.3 and air). Taking under consideration that the refractive index of the QD medium, i.e. of the gain material A, ranges from 1.5 to 3, the thickness of the gain material for the telecom wavelengths spans from 200 nm to 1 μm.
[0132] The DBR mirror consist of two or more pairs of materials (e.g. SiO.sub.2, TiO.sub.2) forming a photonic band gap at the optical fibre optics communication wavelengths ranges from 1000 nm-2000 nm. The DBRs M1, M2 may have reflectivities within their photonic bandgap from 50% up to 99.999%. Preferably, the DBR through which laser emission is radiated has a lower reflectivity than the other DBR.
[0133] The optical excitation of the gain medium takes place through one of the DBRs, M1 or M2, outside their photonic bandgap (i.e. with light wavelength shorter that the low wavelength value of the DBR). Alternatively, optical excitation of the gain medium can take place from the side through a waveguiding mode within the gain medium. This waveguide can be implemented with the gain medium A, i.e. with the n-doped chalcogen quantum dots film, being integrated in a waveguide structure, for example embedded in a waveguide trench in a silicon substrate.
Distributed FeedBack Laser Structures (DFB):
[0134] As shown in
[0137] The waveguide resonator performs both functions, that of a waveguide and that of a resonator, as indeed light is wave-guided in the interface between the gain medium A and the substrate S, and in the presence of the corrugations this structure becomes resonant providing feedback (as a cavity).
[0138] The substrate S of the DFB laser structures is made of any of various materials including oxides, fluorides and/or doped oxides (e.g. SiO.sub.2, TiO.sub.2, MgF.sub.2, CaF.sub.2, ITO, FTO), Si, GaAs, and other organic polymeric materials like polyimide, PMMA (Polymethyl methacrylate), etc. The grating height can vary from 20 nm to 500 nm, while the periodicity (Λ) spans from 700-1400 nm. The DFB laser structures can operate as first-order (
[0139] The operating lasing wavelengths based on the aforementioned characteristics range from 1500 nm to 1800 nm. Moreover, the DFB structure with the use of conductive materials (e.g. ITO) can operate as electrically pumped laser. The DFB laser can be excited from one of the sides (up or down) or through a waveguide integration of the DFB structure in which light excitation is provided by coupling the light from the waveguide to the gain medium A, i.e. to the n-doped metal chalcogenide quantum dot solid-state element.
Whispering Gallery Mode Laser Structures (WGM):
[0140] For this kind of structure, the gain medium A comprising the heavily n-doped metal chalcogenide quantum dot solid-state element is coupled with Whispering Gallery mode (WGM) resonators Rs for single or multi laser mode at telecom wavelengths.
[0141] The structure of said WGM resonators Rs includes dielectric cylinders, disks, rings and fibre resonators, while the material from which they are made are oxides, fluorides and/or doped oxides (e.g. SiO.sub.2, TiO.sub.2, MgF.sub.2, CaF.sub.2, ITO, FTO).
[0142] The preferred operating lasing wavelengths are 1300 nm-1800 nm. The resonator diameter can vary from 50-1000 μm for the pertinent lasing wavelengths with Q-factors high as 105-106. The gain material A can be deposited on the ring, disk or sphere resonators Rs, or within or at the outer surface of the fibre and dielectric cylinders Rs.
[0143] Moreover, as shown in
[0144] The inner space can be fully filled with the gain medium A, as shown in
[0145] Alternatively, as shown in
[0146] At least for the embodiment of
[0147] A person skilled in the art could introduce changes and modifications in the embodiments described without departing from the scope of the invention as it is defined in the attached claims, such as providing any desired shape to the n-doped metal chalcogenide solid-state element (either in the form of a film or not) in order fit the requested application.
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