Optical Waveguide Chip
20220236482 ยท 2022-07-28
Inventors
- Satomi KATAYOSE (Musashino-shi, Tokyo, JP)
- Nobutatsu Koshobu (Musashino-shi, Tokyo, JP)
- Katsuhiko Hirabayashi (Musashino-shi, Tokyo, JP)
- Ryoichi Kasahara (Musashino-shi, Tokyo, JP)
- Mikitaka Ito (Musashino-shi, Tokyo, JP)
Cpc classification
G02B6/12014
PHYSICS
International classification
Abstract
There is provided an optical waveguide chip. In the optical waveguide chip, an optical waveguide circuit includes a substrate, a lower clad layer laminated on the substrate, a core layer that is laminated on the lower clad layer and corresponds to a propagation path of an optical signal, and an upper clad layer laminated on the core layer; the upper and lower clad layers in a region that does not correspond to the propagation path of the optical signal are removed across to an edge of the chip; the region from which the upper and lower clad layers have been removed is filled with a light absorbing material; and a height of the filled light absorbing material is higher than a height of an uppermost surface of the upper clad layer.
Claims
1. An optical waveguide chip comprising: an optical waveguide circuit, wherein the optical waveguide circuit includes a substrate, a lower clad layer laminated on the substrate, a core layer that is laminated on the lower clad layer and corresponds to a propagation path of an optical signal, and an upper clad layer laminated on the core layer, the upper clad layer and the lower clad layer in a region that does not correspond to the propagation path of the optical signal are removed across to an edge of the optical waveguide chip, the region from which the upper clad layer and the lower clad layer have been removed is filled with a light absorbing material, and a height of the filled light absorbing material is higher than a height of an uppermost surface of the upper clad layer.
2. The optical waveguide chip according to claim 1, wherein the height of the light absorbing material is not less than 0.1 mm and not greater than 1.5 mm from the uppermost surface of the upper clad layer.
3. The optical waveguide chip according to claim 1, wherein a fixture plate is provided on a top surface of an input waveguide of the optical waveguide chip.
4. The optical waveguide chip according to claim 1, wherein an optical fiber is provided on an input end of the optical waveguide circuit.
5. The optical waveguide chip according to claim 1, wherein a laser is provided on an input end of the optical waveguide chip.
6. The optical waveguide chip according to claim 1, further comprising: a 3-dB branch optical waveguide configured to split input light having propagated through the input waveguide into two beams of light; and a first output waveguide and a second output waveguide, each of which is configured to propagate one of the two beams of split input light, wherein the light absorbing material is filled covering the first output waveguide and the second output waveguide.
7. The optical waveguide chip according to claim 1, further comprising: a 3-dB branch optical waveguide configured to split input light having propagated through the input waveguide into two beams of light; and a first output waveguide and a second output waveguide, each of which is configured to propagate one of the two beams of split input light, wherein the light absorbing material is filled without covering top surfaces of the first output waveguide and the second output waveguide.
8. A manufacturing method for an optical waveguide chip, comprising: arranging sets of the optical waveguide chips according to claim 1 on a plurality of wafers; and performing cut and separation by cutting along a cutting line common to each of the sets of the optical waveguide chips after forming an optical waveguide and a light blocking structure by common optical waveguide formation processing and light blocking structure formation processing for each of the plurality of wafers.
Description
BRIEF DESCRIPTION OF DRAWINGS
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DESCRIPTION OF EMBODIMENTS
[0051] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
First Embodiment
[0052] An optical waveguide chip according to a first embodiment of the present invention will be described with reference to
[0053] In
[0054] In
[0055] In the optical waveguide chip 100 of the first embodiment, a light blocking structure is formed in which a light blocking material (light absorbing material) 21 is formed covering the first output waveguide 7a and the second output waveguide 7b.
[0056] In the present embodiment, the light blocking material 21 is filled across to an edge of the chip as illustrated in
[0057] As a result, stray light that may propagate through the clad layer and may be superimpose on the light receiving element, stray light generated in the joining portion between the optical fiber and the input waveguide, and the like may be effectively absorbed and suppressed/eliminated. The light blocking material 21 is formed covering the top surfaces of the first output waveguide 7a and the second output waveguide 7b, as illustrated in the substrate cross-sectional view perpendicular to the optical axis of the output waveguide in
[0058] In the optical waveguide chip 100 according to the first embodiment, the optical waveguide is a so-called planar optical integrated circuit. For example, a lower clad layer formed of quartz-based glass is provided on a surface of a silicon substrate, a core portion formed of quartz-based glass and corresponding to a propagation path of an optical signal is provided on a top surface of the clad layer, and an upper clad layer formed of quartz-based glass is provided on a top surface of the core portion. In a region on the outgoing end side of the optical waveguide chip that does not correspond to the propagation path of the optical signal, there is provided a region where the upper and lower clad layers are removed across to an edge of the chip, and this region is filled with the light blocking material 21. The height of the light blocking material is higher than the uppermost surface of the upper clad layer by at least 0.1 mm.
Manufacturing Method for Optical Waveguide Chip
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[0062] The optical waveguide formation processing is as follows. First, a glass layer to serve as a lower clad is formed on a silicon substrate (the silicon wafer 300) using a flame hydrolysis deposition technique or the like. Then, on the glass layer, a glass material layer to serve as a core having a refractive index higher than that of the clad is formed by photolithography and etching techniques to form an optical waveguide pattern. Thereafter, a glass layer to serve as an upper clad is deposited again, so as to form a core built-in type optical waveguide.
[0063] Next, as for the light blocking structure formation processing, similarly to the time of forming the optical waveguide, after a region where the clad layers are removed is formed in a predetermined position in the wafer by the photolithography and etching techniques, the above region is filled with the light blocking material 21 and then the light blocking material 21 is cured.
[0064] The region to be filled with the light blocking material 21 is not necessary to be formed by removing all of the clad layers, and it is sufficient that the region is etched by at least 0.1 mm. The etching depth may be adjusted to make the light blocking material have a predetermined height (thickness), a surface with which the light blocking material makes contact may be physically or chemically modified, or the surface tension, wettability (contact angle) and the like of the light blocking material may be adjusted. In the present embodiment, the surface tension and the wettability (contact angle) of the light blocking material are adjusted to cause a cross section of the light blocking material to rise upward.
[0065] The light blocking material 21 in the present embodiment is formed by mixing a silicone resin as a base material and carbon black typically used as a light blocking material. Light that enters the light blocking material is attenuated in optical power primarily by absorption in the carbon black. The surface tension, the wettability, and the like may be adjusted by the selection of the base material. A thermosetting resin, a light curing resin, or the like may be used as the base material of the light blocking material.
[0066] The filling of the light blocking material needs to be carried out before cutting out a portion filled with the light blocking material, and is carried out in the wafer state in the present embodiment. The light blocking material is patterned in a predetermined position on the wafer by a dispenser, an ink jet printer, or screen printing. Thereafter, the light blocking material is cured by heat treatment when a thermosetting resin is used as the light blocking material, or by light irradiation when a light curing resin is used. After the light blocking structure is formed, the wafer is cut into individual chips by dicing.
[0067] The patterns of the regions for the optical waveguides and the filling of the light blocking material are constituted in such a manner that a second optical waveguide chip having the same pattern as that of a first optical waveguide chip is disposed to be line-symmetrical with respect to an outgoing surface of the first optical waveguide chip, and the pattern of the first optical waveguide chip and the pattern of the second optical waveguide chip are continued. This makes it possible to use the wafer area with zero waste.
[0068] In the present embodiment, the first optical waveguide chip 100 and the second optical waveguide chip 200 have the same pattern, but may have different patterns. Only the first optical waveguide chip 100 may be patterned, and in this case, as illustrated in
[0069] In the present embodiment, a case of the glass-based waveguide is described, but an InP waveguide, a GaAs waveguide, a LiNbO.sub.3 waveguide, a polymer waveguide, or the like may also be used.
[0070] In the present embodiment, an example is described in which light leaking from the joining portion between the optical fiber and the input waveguide, and light leaking from the 3-dB branch optical waveguide are eliminated by the light blocking material, and in a case where there exists a portion where light leaks in the waveguide circuits having other shapes, it is possible to eliminate/suppress the stray light by forming a region to be filled with the light blocking material in the vicinity of the light leaking portion. For example, as a portion where light leaks, a bend portion (in particular, when the radius of curvature is small) or a portion where multiplexing or demultiplexing is performed may be cited.
Second Embodiment
[0071] An optical waveguide chip according to a second embodiment will be described with reference to
[0072] The configuration of the optical waveguides of the second embodiment is the same as that of the first embodiment. A point different from the first embodiment is an application region of a light blocking material 22. As illustrated in the substrate cross-sectional view in
Third Embodiment
[0073] An optical waveguide chip according to a third embodiment will be described with reference to
INDUSTRIAL APPLICABILITY
[0074] As described thus far, according to the present invention, it is possible to suppress stray light while suppressing an increase in size of the optical waveguide chip. Additionally, since it is unnecessary to form a light blocking structure on the chip end surface, it is possible to suppress stray light without increasing the number of steps in the manufacturing process, and reduce the manufacturing cost.