Method for manufacturing a device for forming at least one focused beam in a near zone
11396474 · 2022-07-26
Assignee
Inventors
Cpc classification
B82Y20/00
PERFORMING OPERATIONS; TRANSPORTING
C03C17/001
CHEMISTRY; METALLURGY
International classification
C03C17/00
CHEMISTRY; METALLURGY
G02B6/32
PHYSICS
B82Y20/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The disclosure concerns a method for manufacturing a device for forming at least one focused beam in a near zone, from an electromagnetic wave incident on said device. The method includes depositing a dielectric material layer with a first refractive index on a substrate layer, creating at least one cavity by a microfabrication technique in the dielectric material layer, the device for forming at least one focused beam in a near zone of the substrate layer (110) and the dielectric material layer, filling the at least one cavity with a material having a second refractive index lower than the first refractive index, determining a deviation between a measured focused beam radiation angle obtained from the device for forming at least one focused beam in a near zone and an expected focused beam radiation angle and modifying locally at least one of the two refractive indexes according to the deviation.
Claims
1. A method for manufacturing a device that forms at least one focused beam in a near zone, from an electromagnetic wave incident on the device, the method comprising: depositing a dielectric material layer with a first refractive index on a substrate layer; forming at least one cavity by a microfabrication technique in the dielectric material layer deposited on the substrate layer; filling the at least one cavity with a material having a second refractive index lower than the first refractive index, wherein the device comprises the substrate layer and the dielectric material layer having the at least one cavity filled with the material; determining a deviation between a measured radiation angle of a near-zone focused beam obtained from the device and an expected focused beam radiation angle; and modifying locally at least one of the first refractive index and the second refractive index to adjust a radiation angle of the near-zone focused beam to reduce the determined deviation.
2. The method for manufacturing according to claim 1, wherein the microfabrication technique is selected from the group consisting of optical lithography and e-beam lithography.
3. The method for manufacturing according to claim 1, further comprising depositing a superstrate layer on the dielectric material layer.
4. The method for manufacturing according to claim 1, wherein the at least one cavity is a through-hole in the dielectric material layer.
5. The method for manufacturing according to claim 1, wherein the at least one cavity surrounds an element within the dielectric material layer.
6. The method for manufacturing according to claim 1, wherein the at least one cavity is targeted to be cylindrical or cone-shaped.
7. The method of claim 1, wherein when the measured radiation angle of the near-zone focused beam is to be decreased, locally doping the dielectric material layer to increase the value of a first dielectric index of the dielectric material layer.
8. The method of claim 1, wherein when the measured radiation angle of the near-zone focused beam is to be increased, locally doping the material filling the at least one cavity to increase the value of a second dielectric index of the material.
9. The method of claim 1, wherein the at least one cavity is configured such that the near-zone focused beam is formed by the device in response to the incident electromagnetic wave.
10. The method of claim 1, wherein, when the determined deviation is positive, the modifying comprises locally doping the dielectric material layer to modify a value of the first refractive index of the dielectric material layer.
11. The method of claim 1, wherein, when the determined deviation is negative, the modifying comprises locally doping the material filling the at least one cavity to modify a value of the second refractive index of the material.
12. The method of claim 1, wherein the modifying comprises using at least one technique selected from the group consisting of neutron irradiation, chemical vapor deposition, and partial polymerization.
13. The method of claim 1, wherein the radiation angle of the near-zone focused beam is a direction at which the near-zone focused beam is directed.
14. The method of claim 1, wherein the radiation angle of the near-zone focused beam is an angle between the dielectric material layer and a direction of the near-zone focused beam.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The above and other aspects of the invention will become more apparent by the following detailed description of exemplary embodiments thereof with reference to the attached drawings in which:
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DETAILED DESCRIPTION
(46) In one embodiment of the disclosure, in order to overcome the limitations mentioned in the background section, a technique for the near-field focusing and beam forming based on the use of a hollow structure is proposed.
(47) Indeed, the inventors of the present disclosure have reached the conclusion that diffraction of a plane electromagnetic wave on a dielectric object having an abrupt change level of its surface, also called a step, can result in the formation of condensed optical beams (so-called nanojets), that occur in a vicinity to the step, and are oriented towards the medium with higher refractive index value. The number of beams and shape of each individual beam can be controlled by the variation of the step size and shape of the step edge line, whereas the beam radiation angle and the field intensity enhancement in each individual beam can be controlled by the variation of the refraction index ratio at the boundary of the object in the vicinity of the step and the step base angle.
(48) Unlike the well-known diffracted beams predicted by the Fresnel theory, the nanojet beams are low-dispersive (they show no or small wavelength dependence). Moreover, the nanojet focusing component (or device) according to the present disclosure can produce multiple independent beams (having identical or non-identical shape), which is not possible with Fresnel diffractive lenses. These unique features make the nanojet-based focusing component (or device) according to the present disclosure attractive for many today and future applications.
(49)
(50)
(51) As shown in
(52) Spots referenced 22 to 24 indicate the corresponding hot spots in the near-field distribution formed in the imaging plane 21. The specific field distribution with two hot spots 23, 24 observed in
(53) It should be noted that the boundary curvature of the cavity is a tool for changing the nanojet beam shape, position and field intensity enhancement level.
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(58) It must be understood that, in case of a cavity, the focusing function is to be associated not with the entire structure, but with an elementary segment of the step discontinuity. The other segments of the step discontinuity will contribute to the formation of other nanojet beams that may form all together (i) a wide uniform “blade like” nanojet beam as in case of an infinite step (
(59) For sake of simplicity, we therefore focus hereafter on the example of a cavity formed in the layer of dielectric material 112, like the one illustrated in
(60) As may be observed, such a cavity is cylindrical, with a cross-section of arbitrary shape. By cylindrical cavity, it is meant here, and throughout this document, a cavity which shape is a cylinder, i.e. a surface created by projecting a closed two-dimensional curve along an axis intersecting the plane of the curve. In other words, such a cylinder is not limited to a right circular cylinder but covers any type of cylinder, notably, but not exclusively, a cuboid or a prism for example.
(61) The cavity may also have the form of a cone. Its main axis may be orthogonal to the surface of the bottom of the cavity, or be tilted. Due to the fabrication tolerance, the cavities may also have imperfect shapes, and it must be understood, for example, that cavities targeted to be shaped as cylinders, may become cone-shaped cavities with S-shape cross-sections during the manufacturing process.
(62) More generally, such cavities are formed as cylinders or cones with an arbitrary cross-section, which can be adapted (optimized) in order to produce a desired near-field pattern, i.e. a desired field intensity distribution in the xy-plane (typically orthogonal to the incident wave propagation direction). This pattern may have one or multiple hot spots with identical (or different) field intensity level.
(63) Non-symmetric cavities are also possible. For example, a cavity which cross-section in the xy-plane is triangular will create three spots. One of them can be enhanced if the corresponding face is concave, as will be explained in greater detail in relation to the figures.
(64)
(65) For example, the cavity can have a form of a circular cylinder filled in with vacuum (n.sub.2=1) and embedded in a homogeneous non-dispersive dielectric medium with an example refractive index n.sub.1=1.49 and illuminated by a linearly-polarized unit-amplitude plane wave E.sub.y=1 (V/m) propagating in the positive z-axis direction (see
(66)
(67)
where E.sub.m is the amplitude of the E-field, η is the wave impedance in a host medium and n is the host medium refractive index. Note that according to equation (1), the power density value associated with a unit-amplitude plane wave propagating in a dielectric host medium with a refractive index n is equal
(68)
Hereafter, this value is considered as a reference for the definition of the relative field intensity enhancement (FIE) achieved using different types of nanojet lenses embedded in the corresponding host media:
FIE=P/P.sub.0[a.u.] (equation 2)
where P is the simulated power density characterized by the time average Poynting vector and P.sub.0 is the reference power density of the unit-amplitude plane wave propagating in the same host medium.
(69) As may be observed in
(70) These data extracted from near-field maps reveal that the variation of the nanojet beam radiation angle does not exceed 3° for the wavelength range from at least 450 to 750 nm. As it is seen in
(71) The origins of the nanojet beams can be explained by the combination of three electromagnetic phenomena, which occur in the vicinity of the base edge of the hollow cavity (or more generally in the vicinity of the abrupt change of level in the surface of the dielectric material), namely: diffraction from the index-step discontinuity associated with the base 120 of the cavity (or, more generally with the surface of lower level of a step formed in the host medium), refraction of the diffracted wave at the vertical edge 121 of the cavity (or more generally on the lateral surface of the step), and interference of the refracted wave and the incident plane wave outside the cavity (or more generally in the host medium).
(72) A schematic drawing illustrating these three phenomena is given in
(73) The key elements of the complex electromagnetic phenomena illustrated in
(74) The nanojet beam creation is hence explained by phenomena that are non-dispersive in nature, namely (i) edge diffraction, (ii) refraction of the wave at the interface of two dielectric media, and (iii) interference. This explains why the shape of the beam and its radiation angle remain stable versus wavelength, as may be observed in
(75) Moreover, the nanojet beam radiation angle is defined by the Snell's law and, thus, is only a function of two parameters: ratio between the refraction indexes of the host media and cavity materials, and the base angle of the cavity. For sake of simplicity, in the foregoing, we only consider a cavity with the base angle equal 90° thus having a cylindrical shape with vertical edges.
(76) Last, the nanojet beam-forming phenomenon is associated with the edge (not a full aperture) of the cavity and occurs in the 2-D vertical plane orthogonal to the cavity cross-section (see
(77) As follows from
θ.sub.1≈θ.sub.TIR (equation 3)
where θ.sub.TIR=sin.sup.−1(n.sub.2/n.sub.1) is the critical angle for a diopter with indices n.sub.1 and n.sub.2.
(78) The nanojet beam 55 is finally created as a result of the interference between the refracted wave and the plane wave incident from below. Thus, the angle of radiation of the nanojet beam (θ.sub.B) is defined by a vector sum of the two waves as schematically shown in
(79)
(80) According to equation (4), in the case of a host medium with index n.sub.1=1.49 (θ.sub.TIR=41.8°), the nanojet beam radiation angle should be θ.sub.B˜24° that is slightly larger than observed in the full-wave simulations (see
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(82) The minimum height is needed to form the planar wave front 60 illustrated in
(83) As shown on
(84) Based on the 2-D ray-tracing analysis of
(85) In 2-D case (which may correspond to any vertical cross-section, e.g. in xz-plane), the local field intensity enhancement (FIE) achieved thanks to the nanojet beam formation is about a factor of 2 compared to the incident plane wave (see formula (2) for the definition). A larger FIE can be achieved by modifying the shape of the cavity cross-section and, in particular, the shape of the cavity edge line 5, as will be explained hereafter in greater details.
(86) The nanojet beam width at half power (BWHP) can vary from about ½λ.sub.1 (that is order of the diffraction limit) to several wavelengths and more depending on the shape of the cavity.
(87)
(88) The symmetry of the near-field patterns in the XY-plane (see
(89) Moreover, in case of an incline incidence, it may be observed in
(90)
(91) The understanding of the nanojet formation phenomena illustrated through
(92) As explained above in the present disclosure, the formation of the nanojet beams is associated with the lateral part of the step in the layer of dielectric material, or with the lateral edge of the cavity, but not its full aperture. By optimizing the shape of the cross-section of the cavity S, it is possible to control the shape of the nanojet beam(s) produced by this cavity.
(93)
(94) In particular,
(95)
(96) Finally,
(97) The boundary curvature of the cavity is hence a tool for changing the nanojet beam shape, position and field intensity enhancement.
(98) The same approach can be used to build more complex components with symmetrical or non-symmetrical cross-sections producing an arbitrary number of identical or different nanojet beams, as depicted in
(99) However, the nanojet focusing components (or devices) previously described in
(100) In one embodiment of the disclosure, it is proposed to transform the configuration of the cavity in such a way that all the nanojet beams, originating from different segments of the cavity cross-section boundary, recombine and contribute to the formation of a single high-intensity nanojet beam located on the axis of symmetry of the cavity and oriented along this axis, i.e. with no tilt compared to the incident plane wave.
(101) In order to achieve this, it is proposed to use a device comprising at least one layer of a dielectric material comprising at least partially a first element (for example having the shape of a cylinder or a cuboid as depicted in
(102) It should be noted that the intensity of the at least one focused beam is defined by the length of the two corresponding edge line segments of the at least a base surface.
(103) As schematically shown in
(104) A general topology of the ring-type nanojet lens is illustrated in
(105) For instance, the host media may have a refractive index similar to the one of glass or plastic in the optical range (e.g. n.sub.2=1.49) with a ring-type cavity filled in with vacuum or air, n.sub.1=1.
(106) In principle, the cylinder cross-section boundaries S.sub.1 (core cylinder) and S.sub.2 (external cylinder) can have any shape (symmetrical or non-symmetrical). The impact the size and shape of each boundary is investigated later in the description. In one embodiment of the disclosure, the cylindrical structures could be oblique and/or truncated and/or comprise a rounded top surface.
(107) Hereafter, we consider cylindrical structures with vertical edges parallel to z-axis and top/bottom surface parallel to xy-plane. However, as mentioned previously, some conical and prismatic structures with arbitrary base angles can also be used. The variation of the base angles associated with different segments of the base edge line can be used to produce nanojet beams with different radiation angles. This option is not discussed here, but one skilled in the art could handle that question according to the teachings of the present disclosure.
(108) In one of its embodiments, the ring-type nanojet lens can be implemented in a form of a double-layer circular cylinder. In the following analysis, we assume that its core is filled in with a material same as the host medium (n.sub.2=n.sub.3=1.49 for instance) and the outer shell (the cavity) is filled in with vacuum or air (n.sub.1=1).
(109) Under the above assumption (i.e. double-layer circular cylindrical shape and pre-selected host medium material), configuration of a ring-type nanojet lens is controlled by three parameters, namely: its height along z-axis (L.sub.z) and radii of the two cylindrical layers (R.sub.1 and R.sub.2=R.sub.1+W, where W is the width of the ring).
(110) Focal Length
(111) In a first approximation, the focal length of the ring-type nanojet lens can be derived as a function of the core radius, R.sub.1 and nanojet beam radiation angle, θ.sub.B, defined by equation (3). Under assumption that the nanojet radiation angle remains constant for any combination of the ring-type lens height and radii, the focal length of the ring-type lens can be estimated as:
F=R.sub.1/tan(θ.sub.B), (equation 5)
where F is the distance from the lens bottom to the point with maximum field intensity (
(112) According to equation (5), in case of a hollow (n.sub.1=1) ring-type nanojet lens embedded in a host medium with a refractive index n.sub.2=1.49, (θ.sub.TIR≈42°), the focal length is estimated as
(113)
(114) As may be seen in
(115) The increase of the beam length observed in
(116) Angle of Incidence
(117) In case of an incline illumination, the nanojet beam angle tilts proportionally to the tilt of the incident wave propagation direction (see the
(118) Ring Width, W
(119) The width of the ring-type cavity can alter characteristics of the nanojet beam. In particular, it can affect the focal length and beam shape of the ring-type nanojet lens.
(120) Although the nanojet beam formation is associated with the base edge of the cavity, there exists a finite-size effective aperture responsible for its formation (see dashed lines in
(121) An oversized ring can also affect the nanojet beam formation because of two phenomena associated with the overall size of the ring-type cavity, namely: (i) internal reflections inside the ring-type cavity and (ii) Fresnel-type focusing effect associated with the diffracted waves originating from the top surface of the ring-type cavity. Empirical analysis suggests the upper limit of the width such as W≈3λ.sub.1. For larger rings, the contribution of the ring can become dominant, thus masking the nanojet phenomenon. However, if needed (e.g. for technological needs), the ring width can be enlarged rather arbitrarily without spoiling the nanojet phenomenon (
(122) Moreover, for each size (height and radius) of the core cylinder, the size of the ring-type cavity can be optimized in order to: increase the field intensity in the hot spot (
(123) Note that the effects related to the height and width of the ring-type are more narrowband than the nanojet beam phenomenon (
(124) Field Intensity Enhancement by Combining the Nanojet and Fresnel Focusing Effects
(125) The impact of the ring width on the maximum field intensity in the hot spot of the ring-type nanojet lens is illustrated in
(126) Length of the Nanojet Beam
(127) The impact of the ring width on the length of the nanojet beam is illustrated in
(128) Bandwidth of the Nanojet and Fresnel-Type Beam Forming Effects
(129) The difference in the physical mechanisms behind the nanojet and Fresnel-type focusing mechanisms results in a different bandwidth of these two phenomena.
(130) The well-known Fresnel type focusing is based on the interference of the diffracted waves originating from the top surface of the ring cavity. Interference of the waves produced by different segments of the ring top surface can lead to the formation of multiple hot spots and beams corresponding to different diffraction orders. Thus, the radiation direction of these beams, as well as positions of the hot spots, strongly depend on the wavelength of the incident wave. On the opposite, the nanojet beams are created independently at each segment of the cavity base edge line. Because of these, the position and shape of the nanojet beam created on the optical axis of the ring-type lens as a result of recombination of nanojet beams produced by different segments of the cavity base edge line, is less sensitive to the incident wave wavelength.
(131) The difference in the dispersive behavior of both types of the focusing mechanisms is illustrated in
(132) External Ring Shape, S.sub.2
(133) The external shape of the ring can be selected rather arbitrarily.
(134) As we can see in
(135) A larger impact can be expected for certain configurations of ring-type lenses, when its performance is defined by an interplay of the Fresnel-type and nanojet phenomena (not shown).
(136) Core Size, R.sub.1
(137) The core size is a key parameter of the ring-type nanojet lens. This parameter determines the hot spot position along z-axis and peak field intensity in the nanojet beam region.
(138) The radius of the core cylinder defines the length and curvature of the edge line and thus the total effective aperture of the nanojet lens. The longer the edge, the more power is trapped and guided towards the nanojet beam, thus increasing the field intensity in the focal spot. In case when the core, substrate, and superstrate are of the same material (n.sub.2=n.sub.3=n.sub.4, see
(139) Optimal Combination of the Lens Height and Radius & Impact of the Host Media Material
(140) The optimal ratio between the core height and radius as well as the estimated FIE due to the nanojet focusing effect, is a function of the index ratio between the lens core and cavity materials. The full wave analysis of the ring-type nanojet lens with a hollow ring (n.sub.1=1) embedded in an unbounded host medium with refractive index n.sub.2=1.49 revealed that maximum field intensity is achieved for L.sub.z/R.sub.1=2 (
(141) Core Shape, S.sub.1
(142) The shape of the core cylinder can be selected rather arbitrarily and optimized in order to provide a desired shape and size of the nanojet beam (
(143) Modification of the core shape of the ring-type nanojet lens enables one to modify the partial contributions of the nanojet beams associated with different segments of the core base edge line. A few exemplary embodiments of the ring-type nanojet lens with cores of a different shape are illustrated in
(144)
(145) In such embodiment, the emitting element referenced 280 can be any source of the electromagnetic radiation (e.g. visible light) positioned in the near or far zone. The electromagnetic waves, generated by the emitting element 280, can reach the nanojet focusing element referenced 281 (being part of a device for forming at least one focused beam in a near zone or being such device for forming at least one focused beam in a near zone) via free space propagation or through a wave guiding elements, e.g. optical fiber or a glass plate acting as a 2D light guiding structure. Indeed, in one embodiment of the disclosure, it is possible to put, at the position where the nanojet beam is focused, another first and second elements.
(146) A receiving element referenced 282 must be located within a certain distance D≤R.sub.max from the nanojet focusing element 281. The optimal distance depends on the focal length and the nanojet beam shape. It can vary from 0 to a few wavelengths. The value of R.sub.max is to be defined depending on the specifications for the systems functionality that can be formulated, for instance, in terms of an acceptable field intensity enhancement. A typical value of R.sub.max is estimated as 3 to 10 wavelengths.
(147) In one embodiment of the disclosure, the receiving element 282 can be one of the following element: a detector, e.g. a photodiode (for example to be used in optical sensors in photo cameras); another focusing, beam-forming or light-guiding element, e.g. lens, grating, optical fiber, etc. (AR/VR glasses, light communication, etc.), a target, e.g. quantum dots, nanoparticles or molecules inside a water or blood solution (spectroscopy, microscopy or lab-on-chip device).
(148) It should be noted that, in one embodiment of the disclosure, the nanojet focusing element 281 comprises a multi-layer structure with “cavity(ies)” on one or both surfaces of the sealed substrates. In some configurations, these structures can be directly attached to either the receiving and/or emitting elements.
(149) In one embodiment of the disclosure, the emitting element 280 can handle: ambient light coming from a source located far away via free space propagation or through a light guiding system, light produced by a local source directly attached to the nanojet component (e.g. photodiode or optical fiber), optical beam produced by another focusing element.
(150) It should be noted, that in one exemplary embodiment, the ring-type nanojet lens previously mentioned can be fabricated in a form of a multi-layer structure comprising three layers, namely: (i) glass plate, (ii) thin film with perforated apertures made of an optically transparent photoresist or phase change material, and (iii) another glass plate. Such a structure can be fabricated via photolithography. In another embodiment, the lens can comprise only two layers. For instance, it can be fabricated in an optically transparent plastic and comprising one plate with hollow cavities engraved on its surface attached to another plate using a glue or molecular adhesion. Such a structure can be fabricated, for instance, via a direct laser beam writing method, replication, or molding. This embodiment is potentially more suitable for mass production. The manufacturing processes are given as mere examples, in order to highlight the fabrication feasibility of the device according to the present disclosure, using established microfabrication methods. However, some other manufacturing methods may also exist, or be better suited for a mass production.
(151) Although the top layer (superstrate) is not absolutely required for the generation of the nanojet beams, it provides a twofold potential advantage for the nanojet-based focusing devices.
(152) First, it enables integration of the lens with other components of the optical system (e.g. optical sensors in photo cameras or other light-guiding and beam-forming components inside a dielectric wave guiding system, like in case of AR glasses). Direct integration can help avoid the problems related to the alignment between different components of the focusing system.
(153) Second, the superstrate prevents excitation of the internal reflections inside the core cylinder of the ring-type lens that can, otherwise, spoil the nanojet beam forming phenomenon However, if needed (e.g. for technological needs or design constrains) the superstrate can be removed, subject for a possible degradation of the lens performance due to the internal reflections
(154)
(155) These views present at least three parameters associated with said second element that can control the shape and the orientation of the focused beam: the length and the curvature of the edge line segment associated with the base surface, and also the values of the base angles associated with opposite edge line segments.
(156)
(157)
(158)
(159) It should be noted that the nanojet beams generated thanks to the interference of the two parts of the wave fronts of the incident wave propagating through the base of the first and second elements recombine all together inside the second element giving rise to a focused nanojet beam. In case of a normal incidence of the plane wave, for a lens having symmetrical cross-section and equal values of the previously mentioned base angles associated with opposite base edge line segments, a symmetrical nanojet beam is created on the optical axis of the lens with an orientation along this axis. It should be noted that, in case of an oblique incidence of the plane wave, the beam is tilted proportionally.
(160) One skilled in the art, by varying the shape and size of the first and second elements and, in particularly, by varying the shape of the base edge line and associated base angles, could control the shape, position, and radiation angle of the nanojet beam(s). Hence, it is possible to control the focusing and beam forming characteristics of the nanojet focusing device according to selected parameters.
(161)
(162) The
(163)
(164) The component of
(165) A nanojet beam is generated on the axis of the 2×2 array of hollow (n.sub.2=1) cuboids 140 embedded in a homogeneous dielectric medium 112 with a refractive index n.sub.1=1.49 that is a typical value for glass and plastics in the optical range. Analysis shows that, by optimizing the size, shape and relative positions of the cuboids with respect to the host medium refractive index and wavelength of the incident plane wave, a nanojet beam can be generated with the beam full width at half power (FWHP) of ˜λ/2n.sub.1 and FIE of at least a factor of 5.
(166)
(167)
(168) As in
(169)
(170) It should be noted that in the case the plane wave is incident from left, the at least one base surface of the second element previously mentioned correspond to the lateral surface of a cylinder in the common sense with the at least two edge line segments being parts of the cylinder top and bottom edge lines However, one skilled in the art would understand this change of common sense.
(171) It should be noted that due to the manufacturing process, some issues related to the creation of the previous mentioned shapes can occur. Indeed, at the nanoscale, it can be difficult to create an expected shape (such as a cylinder, a double-ring structure, etc.) without inaccuracies/deformations. These distortions introduced by the manufacturing process clearly affect (more or less depending on the type of distortions) the generated beams/nanojets originating from the device according to one embodiment of the disclosure. Especially, the nanojet beam radiation angle can be affected by these deformations.
(172) Hence, in one embodiment of the disclosure, it is proposed to correct, at the nanoscale, the deficiencies (in term of orientation of the created nanojet) introduced by the manufacturing process. Such correction technique can be done via a doping process that modifies locally the refractive index value of the materials. Hence, it is proposed to obtain, via such doping process, a non-uniform (or non-istropic) material instead of a homogeneous material (in term of refractive index value). Modifying locally the refractive index means that for a 3D structure (that can have a wide range of shapes, i.e. it can be a three-dimensional space enclosed by a closed surface), having a volume from 1λ.sub.1.sup.3 to 20λ.sub.1.sup.3, the refractive index value is modified. Hence, within such 3D structure, the value of the refractive index is different from outside of this 3D structure.
(173) The refractive index is a measurement of optical density of a material. The refractive index of the material depends on the relative permittivity of the material and also depends on optical frequency or wavelength.
(174) Therefore, in one embodiment of the disclosure, it is proposed to use a femtosecond laser that can generate a femtosecond pulse being focused into an identified region of the dielectric layer. A gas of electronics in the conduction band of the glass is generated. The change in the optical properties (the complex refractive index) associated with this electron gas can be measured by a probe pulse as explained in the Phd thesis entitled “Nonlinear femtosecond near infrared laser structuring in oxide glasses” by Arnaud Royon, published in 2009.
(175) In another embodiment of the disclosure, in order to measure a nanojet beam radiation angle, it is proposed to perform in a 3D coordinate system (such as a Cartesian coordinate system) x-y-z intensity measurements, by using for example a confocal microscopy technique (or confocal laser scanning microscopy technique) which characterizes the volumetric luminous intensity. The precision depends on the wavelength used to produce the nanojet beam and generally, a confocal microscope is known for measuring below the diffraction limit. The precision with which the maximum of radiation can be measured in each x-y plane is around λ.sub.1/(2*n), where n is the index of the material where the nanojet beam occurs. In depth, the precision is around λ.sub.1/(4n).
(176) From the description of the
(177)
(178) Therefore, by derivating such equation according to either variable n.sub.1 or n.sub.2, we can obtain the two following equations:
(179)
(180) Therefore, in the case that n.sub.1 is increasing, it has for effect to decrease/reduce the value of the angle θ.sub.B.
(181) In the case that n.sub.2 varies, it has for effect to increase the value of the angle θ.sub.B due to the fact that
(182)
Indeed, whatever the variation of the variable n.sub.2, it increases the value of the angle θ.sub.B.
(183) Hence, given a set of parameters (n.sub.1, n.sub.2), and knowing that values of n.sub.1 and n.sub.2 can only grow by applying a doping method, then if we have to correct the value of the angle θ.sub.B, two cases can happen: if the value of the angle θ.sub.B has to be decreased (i.e. a lower value has to be used), then the doping technique should be applied in order to increase the value of n.sub.1; if the value of the angle θ.sub.B has to be increased, therefore a doping technique should be applied in such way that the value of n.sub.2 is increased.
(184) The same principles can be applied to the context of a double ring structure (see
(185) Indeed, in another embodiment of the disclosure, it is proposed to modify the index refraction of the second element in order to correct a deviation of the angle θ.sub.B.
(186) The previous description only relates to explanations on how the proposed technique enables light guiding at near field scale (i.e. at a distance less than a few wavelengths). However, applications, at the far field level (i.e. at few mm, cm or a larger distance) can be developed based on the device according to one embodiment of the disclosure.
(187) For example, the PSF (point spread function) of a classical optics converging lens may be taken as the desired electro-magnetic field repartition for a given focal distance.
(188) Therefore, in one embodiment of the disclosure, instead of correcting a nanojet element structure (shape) deficiencies by performing local measurements and local doping (i.e. by measuring the angle difference between the generated nanojets, and the expected nanojets), it is proposed to perform index refractive modifications from measurement at the far field level (based on the PSF value). Therefore, such correction can address a device that comprises a set of a nanojet elements. In such variant, it is proposed to use mean for correcting the far-field pattern of a device comprising nanojets generating elements, that can be used either during the manufacturing process or after it.
(189) In order to correct the altered far-field pattern (due to the local deficiencies induced by malformations of the cavities for example), one way is to slightly perturb the distribution of the index of refraction of the host media aposteriori. This can be achieved by modifying locally the index of refraction via one of the several known methods in the state of the art. One skilled in the art, knowing the deviation can perform some simulations in order to identify a region (or 3D structure) where the index refraction modification will have a significant effect for correcting the deviation.
(190) For example, one skilled in the art could use one of these known techniques for modifying index refraction: neutron irradiation (see for example the article “Correction of Optical Aberrations by Neutron Irradiation,” Appl. Opt. 10, 99-104 (1971) by P. Sinai) in which boron-rich glass is bombarded with neutrons to cause a change in the boron concentration, and thus the refractive index of the lens; chemical vapour deposition (see document U.S. Pat. No. 3,904,268) involving the deposition of different glass with varying refractive indexes, onto a surface to produce a cumulative refractive change; Partial polymerisation (see document U.S. Pat. No. 3,718,383): an organic monomer is partially polymerized using ultraviolet light at varying intensities to give a refractive gradient; ion exchange (see document U.S. Pat. No. 3,873,408): Glass is immersed into a liquid melt with lithium ions. As a result of diffusion, sodium ions in the glass are partially exchanged with lithium ones, with a larger amount of exchange occurring at the edge. Thus the sample obtains a gradient material structure and a corresponding gradient of the refractive index; ion Stuffing (in “Digest of Topical Meeting on Gradient-index Optical Imaging Systems” (Optical Society of America, Washington), D C (1979), paper WAL, by Mohr R K, Wilder J A, Macedo P B, and Gupta P K): Phase separation of a specific glass causes pores to form, which can later be filled using a variety of salts or concentration of salts to give a varying gradient.
(191) Some of the above methods might be less efficient for our purpose, but since we want to implement an index gradient to correct for the global shape of the far-field, it is not necessarily mandatory to modify the index of refraction in the very near vicinity of the nano-elements.
(192) In
(193) In order to correct for the far-field spot quality, one of the above method could be employed in order to modify the index of refraction of the right-hand side host media of the component. By optimizing the global variation of the index of refraction, we could achieve the performance shown on
(194) In order to compensate for the initial bad far-field pattern, the added modulation in the index of refraction of the host media can be modeled as n(r)=n′.sub.0+n′.sub.2r.sup.2+n′.sub.4r.sup.4 with n′.sub.0=1.6, n′.sub.2=−2.15×10.sup.−3 and n′.sub.4=2.476×10.sup.−5, where r=√{square root over (x.sup.2+y.sup.2)}. But in general, n as also a longitudinal component, so could also be a function of z, n(r,z).
(195) In another embodiment of the disclosure, it is proposed to use another polynomial function for defining a model for n(r). Hence, we have n(r)=P(r), where P is a polynomial function of degree n.
(196) In another embodiment, other function can be used for modeling the function n(r).
(197) As we can see from the
(198) In this example case and for the purpose to give an example, the correcting index function is an even function of r but this might not be the case in general since the fabrication process can end up in some asymmetrical or even random variation of the phase ϕ of the light emerging from the optical component.
(199) In the most general case, in order to achieve a target far-field pattern, the optical element needs to have the nanoelements fabricated and embedded in host material and the device has then an optical phase in the vicinity of the output surface described as a function ϕ.sub.target(x,y) which is not necessarily continuous.
(200) Once the component is fabricated, it will exhibit a phase function which is different due to some fabrication perturbations ϕ.sub.measured(x,y).
(201) In order to correct that sample, we need to modify the measured phase value by doping the host media or adding a thin component in its vicinity in such a way to get back to the design phase ϕ.sub.target. As the phase is defined modulo 2π, we can always state that to compensate the optical component in order to achieve the thrived far-field pattern, we need the following statement to hold true:
ϕ.sub.target(x,y)=ϕ.sub.measured(x,y)+Δϕ(x,y)mod 2π
and the value Δϕ(x,y) to add will be a summation of the varying index of refraction over the optical path length:
(202)
(203) One way to have a control over the production of specific nano-beams is to vary the index of refraction of the host media for hollow type nano-structures. Large scale (over few microns) variations of the nano-elements are necessary in order to achieve some far-field optical function. Those variations can exhibit different types of deviations from the specified ones, and with the means described in this invention disclosure, we can compensate the variations to get to a better far-field pattern.
(204) The fabrication of the hollow nano-structures is a complicated process and the performances of the optical components realized by such means greatly depend on various parameters of the nano-elements, such as their edge straightness, roughness, shape, their geometry, tolerances on the size. So it is much easier to enhance the quality of the optical element by providing it with an after fabrication index gradient than by tightening the fabrication process precision, the latter is not always possible.
(205) In another embodiment of the disclosure, one skilled in the art can use Schlieren photography in order to determine changes or nonuniformities in refractive index of materials used in the present document.