MONOLITHICALLY-INTEGRATED, POLARIZATION-INDEPENDENT CIRCULATOR
20210405294 · 2021-12-30
Inventors
- Majid Sodagar (Albuquerque, NM, US)
- Wenyi Wang (Albuquerque, NM, US)
- Changyi Li (Albuquerque, NM, US)
- Guoliang Li (Albuquerque, NM, US)
- Murtaza Askari (Albuquerque, NM, US)
- Yi Wang (Albuquerque, NM, US)
- John Dallesasse (Geneva, IL, US)
- Stephen B. Krasulick (Albuquerque, NM, US)
Cpc classification
G02F1/093
PHYSICS
G02B6/1228
PHYSICS
G02B6/2746
PHYSICS
International classification
Abstract
A polarization-independent, optical circulator is formed in silicon photonics. The polarization-independent, optical circulator uses an optical splitter having two couplers and two waveguides joining the two couplers. One of the two waveguides is thinner than the other to create a large effective index difference between TE and TM modes transmitted through the one waveguide. Polarization rotators, including reciprocal and/or non-reciprocal rotators, are further used to create the optical circulator.
Claims
1. (canceled)
2. An apparatus comprising: a laser configured to emit light; a first splitter comprising: a first coupler configured to receive light from the laser at a first port and split light received at the first port into a first waveguide and a second waveguide; a second coupler configured to: receive light from the first waveguide and from the second waveguide; and transmit light received from the first coupler by the first waveguide and the second waveguide to propagate along a first path and along a second path; the first waveguide; and the second waveguide; a second splitter configured to: receive light from the first path and from the second path; and combine light received from the first path and from the second path to exit a second port; a first non-reciprocal polarization rotator in the first path between the first splitter and the second splitter; a first reciprocal polarization rotator in the first path between the first splitter and the second splitter; a second non-reciprocal polarization rotator in the second path between the first splitter and the second splitter; a second reciprocal polarization rotator in the second path between the first splitter and the second splitter; and a semiconductor substrate, wherein the laser, the first coupler, the second coupler, the first waveguide, the second waveguide, the second splitter, the first non-reciprocal polarization rotator, the first reciprocal polarization rotator, the second non-reciprocal polarization rotator, and the second reciprocal polarization rotator are integrated on the semiconductor substrate.
3. The device of claim 2, further comprising a third port, wherein: the third port is part of the first coupler; and light entering the second port, during operation, is transmitted to the third port.
4. The device of claim 2, wherein: the first waveguide has a cross-sectional dimension that is less than a cross-sectional dimension of the second waveguide; and the cross-sectional dimension of the first waveguide and the cross-sectional dimension of the second waveguide are measured in a direction orthogonal to a direction of beam propagation.
5. The device of claim 4, wherein: the first waveguide and the second waveguide each have a core height between 1.3 and 3 microns; and the cross-sectional dimension of the first waveguide and the cross-sectional dimension of the second waveguide are widths.
6. The device of claim 2, wherein the first path comprises a crystalline semiconductor waveguide.
7. The device of claim 2, wherein the first coupler and the second coupler are multi-mode interference couplers.
8. The device of claim 2, wherein the second splitter comprises two couplers and two waveguides optically connecting the two couplers.
9. The device of claim 2, wherein the first coupler is a 1×2 coupler.
10. The device of claim 2, wherein the first non-reciprocal polarization rotator comprises garnet.
11. The device of claim 10, wherein the garnet is integrated on the semiconductor substrate by being in a pit of a silicon-on-insulator (SOI) wafer.
12. The device of claim 2, wherein the semiconductor substrate is silicon.
13. A method for an optical isolator and/or circulator, the method comprising: receiving light at a first port from a laser, wherein the first port is part of a first coupler, wherein: the first coupler is part of a first splitter; and the first splitter comprises the first coupler, a second coupler, a first waveguide between the first coupler and the second coupler, and a second waveguide between the first coupler and the second coupler; splitting, using the first coupler, received light from the first port into the first waveguide and the second waveguide; receiving, at the second coupler, light from the first waveguide and the second waveguide; transmitting light, received by the second coupler, into a first path and a second path, wherein: a first non-reciprocal polarization rotator is in the first path between the first splitter and a second splitter; a first reciprocal polarization rotator is in the first path between the first splitter and the second splitter; a second non-reciprocal polarization rotator is in the second path between the first splitter and the second splitter; a second reciprocal polarization rotator is in the second path between the first splitter and the second splitter; receiving light from the first path and the second path, at the second splitter, wherein the laser, the first coupler, the second coupler, the first waveguide, the second waveguide, the second splitter, the first non-reciprocal polarization rotator, the first reciprocal polarization rotator, the second non-reciprocal polarization rotator, and the second reciprocal polarization rotator are integrated on a semiconductor substrate; and combining, at the second splitter, light received from the first path and from the second path to exit a second port.
14. The method of claim 13, wherein: the first waveguide has a cross-sectional dimension that is less than a cross-sectional dimension of the second waveguide; and the cross-sectional dimension of the first waveguide and the cross-sectional dimension of the second waveguide are measured in a direction orthogonal to a direction of beam propagation.
15. The method of claim 14, wherein: the first waveguide and the second waveguide each have a core height between 1.3 and 3 microns; and the cross-sectional dimension of the first waveguide and the cross-sectional dimension of the second waveguide are widths.
16. The method of claim 13, wherein: the first non-reciprocal polarization rotator comprises garnet; and the garnet is integrated on the semiconductor substrate in a pit of a silicon-on-insulator (SOI) wafer.
17. The method of claim 13, further comprising a third port, wherein: the third port is part of the first coupler; and the method further comprises transmitting light received at the second port to the third port.
18. A device for an optical isolator and/or circulator, the device comprising: a laser; a first splitter comprising: a first coupler configured to receive light from the laser at a first port and split light received at the first port into a first waveguide and a second waveguide; a second coupler configured to: receive light from the first waveguide and from the second waveguide; and transmit light received from the first coupler by the first waveguide and the second waveguide to propagate along a first path and along a second path; the first waveguide; and the second waveguide; a second splitter configured to: receive light from the first path and from the second path; and combine light received from the first path and from the second path to exit a second port.
19. The device of claim 18, wherein: the first waveguide has a cross-sectional dimension that is less than a cross-sectional dimension of the second waveguide; and the cross-sectional dimension of the first waveguide and the cross-sectional dimension of the second waveguide are widths.
20. The device of claim 18, wherein the laser, the first coupler, the second coupler, the first waveguide, the second waveguide, and the second splitter are integrated on a semiconductor substrate.
21. The device of claim 18, wherein the first waveguide is crystalline silicon and the second waveguide is crystalline silicon.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0012]
[0013]
[0014]
[0015]
[0016]
[0017]
[0018]
[0019]
[0020]
[0021]
[0022] In the appended figures, similar components and/or features may have the same reference label. Further, various components of the same type may be distinguished by following the reference label by a dash and a second label that distinguishes among the similar components. If only the first reference label is used in the specification, the description is applicable to any one of the similar components having the same first reference label irrespective of the second reference label.
DETAILED DESCRIPTION
[0023] The ensuing description provides preferred exemplary embodiment(s) only, and is not intended to limit the scope, applicability, or configuration of the disclosure. Rather, the ensuing description of the preferred exemplary embodiment(s) will provide those skilled in the art with an enabling description for implementing a preferred exemplary embodiment. It is understood that various changes may be made in the function and arrangement of elements without departing from the spirit and scope as set forth in the appended claims.
[0024]
[0025] Light from the first port 110-1 (port 1) is transmitted to the second port 110-2 (port 2). Light from the second port 110-2 is transmitted to the third port 110-3 (port 3). For an optical isolator, port 3 is not used. The optical circulator 100 is polarization insensitive, i.e., it works with all states of polarization. In some embodiments, the splitter 104 comprises one or more multi-mode interference (MMI) couplers.
[0026] In some embodiments, a method for using the optical circulator 100 comprises transmitting light into the first port 110-1, splitting the light into TE and TM components using the first splitter 104-1, rotating both the TE and TM components (e.g., by 90 degrees), and combining the TE and TM components at the second splitter 104-2 to output through the second port 110-2. In some embodiments, a method for using the optical circulator 100 comprises transmitting light into the second port 110-2, splitting the light into TE and TM components, rotating the TE and TM components by 45 degrees and by −45 degrees (no net change in polarization), and combining the TE and TM components to output through the third port 110-3.
[0027] In some embodiments, the optical circulator 100 is monolithically integrated on a silicon photonics chip (e.g., on a silicon-on-insulator (SOI) substrate). In some embodiments, embedded latching garnet material is integrated on an SOI wafer (e.g., in a pit of the SOI wafer) using a fabrication process similar to a process disclosed in '914 application (e.g., by depositing a garnet chip in an SOI pit instead of a III-V chip). In some embodiments, the optical circulator 100 has all passive components (e.g., zero power consumption). The optical circulator 100 is polarization insensitive. In some embodiments, the non-reciprocal polarization rotators 112 are Faraday rotators.
[0028]
[0029] The non-reciprocal polarization rotator 112 comprises rotator material 212. In some embodiments, the rotator material 212 is garnet (e.g., latching garnet and/or MGL garnet). In some embodiments, the rotator material 212 is magneto-optical (MO) material. In some embodiments, a rotator waveguide 216 (e.g., a ridge) is formed in the rotator material 212 (e.g., by etching the rotator material 212). The rotator waveguide 216 is optically aligned with the platform waveguide 204. Polarization is rotated by +45° or −45° depending on a direction of beam propagation. The rotator waveguide 216 is optically coupled with the platform waveguide 204 using an optical bridge 220. Examples of forming the optical bridge 220 are disclosed in U.S. patent application Ser. No. 13/597,117, filed on Aug. 28, 2012; and U.S. patent application Ser. No. 15/426,366, filed on Feb. 7, 2017, the disclosures of which are incorporated by reference for all purposes. MGL garnet provides 93 degree/mm polarization rotation at 1550 nm wavelength. Thus, in some embodiments, for 45-degree rotation, the rotator material 212 is 480 μm long (in a direction along beam propagation). In some embodiments, the rotator material 212 is integrated onto an SOI wafer at many locations (e.g., 2 to 500), and then processed on wafer scale. Examples of wafer-scale bonding are given in U.S. Pat. No. 8,859,394, issued on Oct. 14, 2014, and U.S. patent application Ser. No. 14/862,435, filed on Sep. 23, 2015, the disclosures of which are incorporated by reference for all purposes.
[0030] In some embodiments, thick silicon is used. In some embodiments, waveguides in thick silicon are used to increase coupling between waveguides. In some embodiments, thick is a waveguide having a core height between 0.8 and 7 μm, between 1.0 and 5 μm, and/or between 1.3 to 3 μm. In some embodiments, garnet (poled permanently) is used so the circulator is passive (i.e., little or no power consumption), and/or is symmetrical.
[0031]
[0032] In a direction of forward beam propagation 320 (e.g., from the first splitter 104-1 to the second splitter 104-2) the shoulder 304 widens and the ridge 308 narrows. In some embodiments, the reciprocal polarization rotator 116 uses multi-stage tapers to rotate light polarization. In some embodiments, 90° rotation, with polarization extinction ratio (PER) ˜20 dB, is achieved with a length of ˜3 mm. Forty-five degree rotation can be achieved with shorter lengths (e.g., 1 to 1.5 mm). In some embodiments, a reciprocal polarization rotator 116 is used in other applications than in a circulator (e.g., the reciprocal polarization rotator 116 is used for 90° rotation).
[0033] Thick silicon (e.g., equal to or greater than 1.0, 1.2, or 1.5 μm and/or equal to or less than 1.5, 1.7, 2.0, or 3 μm) is often more difficult to create polarization rotators in because thick silicon polarization rotator lengths are sometimes longer (e.g., more loss) than thin silicon polarization rotators. In some embodiments, to reduce a length of the reciprocal polarization rotator 116, the reciprocal polarization rotator 116 (wherein length of the reciprocal polarization rotator 116 is measured from the entrance 312 to the exit 316, along the direction of forward beam propagation 320) comprises a first stage 321, a second stage 322, and a third stage 323. The second stage 322 is between the first stage 321 and the third stage 323. The first stage 321 and the third stage 323 have tapers with greater slopes than the second stage 322. Polarization rotation occurs primarily in the second stage 322. The first stage 321 and the third stage 323 have tapers with higher slopes than the second stage 322 to shorten the length of the reciprocal polarization rotator 116 as compared to a rotator with a single, linear taper. In some embodiments, instead of, or in addition to, having multiple taper stages, tapers based on function shapes are used (e.g., a function having a steeper slope at ends than in the middle, such as a cosine taper or a parabolic taper).
[0034] The entrance 312 has a first height H1 and a first width W1. Height and width are measured orthogonal to the direction of forward beam propagation 320. The exit 316 has a second height H2 and a second width W2. In
[0035] The ridge 308 is etched to a depth D to form the shoulder 304. The first stage 321 is defined by a first length L1, the second stage 322 is defined by a second length L2, and the third stage is defined by a third length L3. Table I below provides ranges and example values of dimensions of an embodiment of the reciprocal polarization rotator 116.
TABLE-US-00001 TABLE I Dimensions of an embodiment of a reciprocal polarization rotator 116 Example Dimension Range (μm) Values (μm) D 0.3-0.8 0.45, 0.5 0.45-0.65 0.55, 0.6 W1 0.6-2.0 0.8, 0.85 0.8-1.1 0.90, 0.95 1.0, 1.05 W2 1.0-2.5 1.4, 1.5 1.3-1.7 1.6 H1 1.0-2.5 1.4, 1.5 1.3-1.7 1.6 H2 (H1 − D) ≤ H2 ≤ H1 0.95, 1.0 0.5-2.5 1.4, 1.5 1.3-1.7 1.6 L1 0-1000 400, 500, 600 L2 500-5000 1500, 2000 1500-2500 2500 L3 0-1000 400, 500, 600
[0036]
TABLE-US-00002 TABLE II Sample configurations of a reciprocal polarization rotator 116 Configuration D W1 W2 C1 0.5 0.95 1.5 C2 0.55 0.95 1.5 C3 0.6 0.95 1.5 C4 0.55 0.85 1.5 C5 0.55 1.05 1.5 C6 0.55 0.95 1.4 C7 0.55 0.95 1.6
[0037]
[0038] An optical beam is transmitted from the input 504 to the first coupler 512-1. The optical beam is separated into a first portion and a second portion at the first coupler 512-1. The first portion of the optical beam is transmitted through the first waveguide 516-1 to the second coupler 512-2. The second portion of the optical beam is transmitted through the second waveguide 516-2 to the second coupler 512-2. The geometry of the first waveguide 516-1 is different from the geometry of the second waveguide 516-2. The first portion of the optical beam experiences a different effective refractive index than the second portion of the optical beam. In some embodiments, the first geometry is different from the second geometry to create a refractive index difference between TE and TM modes in a waveguide 516 (e.g., between 0.05 and 0.2, 0.08 and 0.15, and/or 0.1±5%, 10% and/or 20%). In some embodiments, the polarization splitter is less than 500 μm long; insertion loss is less than 0.5 dB; and/or PER >30 dB. In the second coupler 512-2 the first portion of the optical beam interferes with the second portion of the optical beam such that a TE component of the optical beam is separated from a TM component of the optical beam. The TE component of the optical beam is transmitted to the first output 508-1 and the TM component of the optical beam is transmitted to the second output 508-2
[0039] In some embodiments, the first geometry is different from the second geometry by the first waveguide 516-1 having a cross-sectional width that is narrower than a cross-sectional width of the second waveguide 516-2. For example, the cross-sectional width of the first waveguide 516-1 has a minimum width between 0.5 and 1.5 μm, not including a ridge portion of the first waveguide 516-1; and the cross-sectional width of the second waveguide 516-2 has a minimum width between 1.0 and 2.5 μm, not including a ridge portion of the second waveguide 516-2.
[0040] In some embodiments, the first geometry is different from the second geometry by the first waveguide 516-1 having a cross-sectional height that is shorter than a cross-sectional height of the second waveguide 516-2. In some embodiments, the waveguide 516 has similar dimensions as D, H1, H2, W1, and/or W2. Heights and widths are measured orthogonal to a direction of beam propagation. In some embodiments, the first waveguide 516-1 and/or the second waveguide 516-2 has a thickness, measured in a vertical direction where a substrate defines a horizontal plane, between 1.0 and 2.5 μm. In some embodiments, the input 504, the first output 508-1, the second output 508-2, the first coupler 512-1, the second coupler 512-2, the first waveguide 516-1, and the second waveguide 516-2 are integrated on a silicon substrate (e.g., formed in a device layer of an SOI wafer). In some embodiments, the input 504, the first output 508-1, the second output 508-2, the first coupler 512-1, the second coupler 512-2, the first waveguide 516-1, and/or the second waveguide 516-2 are formed of crystalline silicon.
[0041] The input 504 is optically coupled with the first port 110-1. The first output 508-1 is optically coupled with the first path 108-1. The second output 508-2 is optically coupled with the second path 108-2. In some embodiments, the first coupler 512-1 is optically coupled with a third output 508-3. For example, the third output 508-3 is optically coupled with port 3 and used to output an optical beam propagating in a direction reverse of the forward beam propagation 320.
[0042]
[0043] An optical beam is transmitted from the input 604 to the first coupler 612-1. The optical beam is separated into a first portion and a second portion at the first coupler 612-1. The first portion of the optical beam is transmitted through the first waveguide 616-1 to the second coupler 612-2. The second portion of the optical beam is transmitted through the second waveguide 616-2 to the second coupler 612-2. Since the first geometry of the first waveguide 616-1 is different from the second geometry of the second waveguide 616-2, the first portion of the optical beam experiences a different effective refractive index than the second portion of the optical beam. In some embodiments, the first geometry is different from the second geometry to create a refractive index difference between TE and TM modes in one waveguide that is different than a refractive index difference between TE and TM modes in another waveguide (e.g., a high refractive index difference in the first waveguide 616-1 between 0.05 and 0.2, 0.08 and 0.15, and/or 0.1±5%, 10% and/or 20%; and/or a low refractive index difference in the second waveguide 616-2 between 0 and 0.01). In some embodiments, the polarization splitter is less than 500 μm long and/or longer than 100 μm long; insertion loss is less than 0.5 dB; and/or PER greater than 30 dB and/or less than 50 dB or 100 dB. In the second coupler 612-2, the first portion of the optical beam interferes with the second portion of the optical beam such that a TE component of the optical beam is separated from a TM component of the optical beam. The TE component of the optical beam is transmitted to the first output 608-1 and the TM component of the optical beam is transmitted to the second output 608-2
[0044] In some embodiments, the first geometry is different from the second geometry by the first waveguide 616-1 having a cross-sectional width that is narrower than a cross-sectional width of the second waveguide 616-2. For example, the cross-sectional width of the first waveguide 616-1 has a minimum width between 0.5 and 1.5 μm, not including a ridge portion of the first waveguide 616-1; and the cross-sectional width of the second waveguide 616-2 has a minimum width between 1.0 and 2.5 μm, not including a ridge portion of the second waveguide 616-2.
[0045] In some embodiments, the first geometry is different from the second geometry by the first waveguide 616-1 having a cross-sectional height that is shorter than a cross-sectional height of the second waveguide 616-2. In some embodiments, the waveguide 616 has similar dimensions as D, H1, H2, W1, and/or W2. Heights and widths are measured orthogonal to a direction of beam propagation. In some embodiments, the first waveguide 616-1 and/or the second waveguide 616-2 has a height, measured in a vertical direction where a substrate defines a horizontal plane, between 1.0 and 2.5 μm. In some embodiments, the input 604, the first output 608-1, the second output 608-2, the first coupler 612-1, the second coupler 612-2, the first waveguide 616-1, and the second waveguide 616-2 are integrated on a silicon substrate (e.g., formed in a device layer of an SOI wafer). In some embodiments, the input 604, the first output 608-1, the second output 608-2, the first coupler 612-1, the second coupler 612-2, the first waveguide 616-1, and/or the second waveguide 616-2 formed of crystalline silicon.
[0046] Though
[0047]
[0048]
[0049]
[0050] The more narrow a width of the first waveguide 516-1 and/or 616-1, the larger the index difference between modes. However, there is a tradeoff between creating a larger index difference and fabrication tolerances. The larger the refractive index difference, the shorter S1 or S2 can be. In some embodiments, a width of the second waveguide 616-2 is 2 μm; and/or a width of the first waveguide 616-1 is between 0.3 and 1.5 μm (e.g., 0.5, 1.0 μm) as a good tradeoff between polarization splitter length and ease of fabrication.
[0051]
[0052] The specific details of particular embodiments may be combined in any suitable manner without departing from the spirit and scope of embodiments. However, other embodiments may be directed to specific embodiments relating to each individual aspect, or specific combinations of these individual aspects.
[0053] The above description of exemplary embodiments has been presented for the purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form described, and many modifications and variations are possible in light of the teaching above. For example terms such as “first,” “second,” and so on are used to differentiate similar components and/or features, not necessarily to enumerate how many components and/or features there are. The first coupler 612-1 of the second splitter 104-2 could be referred to as a third splitter and the second coupler 612-2 of the second splitter 104-2 could be referred to as a fourth splitter. In some embodiments, the input is directly coupled to the first coupler; the first waveguide is directly coupled to the first coupler and/or to the second coupler; the second waveguide is directly coupled to the first coupler and/or the second coupler; and/or the first output and/or the second output are directly coupled to the second coupler. The optical circulator 100, and/or portions of the optical circulator 100, can be integrated with components and/or features in the '914 Application. For example, the optical circulator 100 can be integrated on a substrate with a laser and/or an optical receiver. In some embodiments, the rotator material 212 can be processed similarly as a III-V chip in the '914 Application. For example, the rotator material 212 can be bonded to a floor of a recess, similarly as a III-V chip is bonded to a floor of a recess in the '914 Application. In some embodiments, rotator material 212 is bonded to a semiconductor platform concurrently with bonding III-V chips to the semiconductor platform; and/or etching the rotator material 212 is performed concurrently with etching a III-V chip after bonding. The embodiments were chosen and described in order to explain the principles of the invention and its practical applications to thereby enable others skilled in the art to utilize the invention in various embodiments and with various modifications as are suited to the particular use contemplated.
[0054] Also, it is noted that the embodiments may be described as a process which is depicted as a flowchart, a flow diagram, a data flow diagram, a structure diagram, or a block diagram. Although a flowchart may describe the operations as a sequential process, many of the operations can be performed in parallel or concurrently. In addition, the order of the operations may be re-arranged. A process is terminated when its operations are completed, but could have additional steps not included in the figure. A process may correspond to a method, a function, a procedure, a subroutine, a subprogram, etc.
[0055] A recitation of “a”, “an”, or “the” is intended to mean “one or more” unless specifically indicated to the contrary.
[0056] All patents, patent applications, publications, and descriptions mentioned here are incorporated by reference in their entirety for all purposes. None is admitted to be prior art.