MAGNETIC ALLOY MATERIAL
20210395865 · 2021-12-23
Assignee
Inventors
- Yuma IWASAKI (Tokyo, JP)
- Masahiko ISHIDA (Tokyo, JP)
- Akihiro KIRIHARA (Tokyo, JP)
- Koichi TERASHIMA (Tokyo, JP)
- Ryohto SAWADA (Tokyo, JP)
- Hiroko SOMEYA (Tokyo, JP)
- Yasutomo OMORI (Tokyo, JP)
Cpc classification
International classification
Abstract
A magnetic alloy material that includes iron and cobalt as main components and at least one element selected from the group containing of platinum, gold, and iridium.
Claims
1. A magnetic alloy material comprising iron and cobalt as main components and at least one element selected from the group consisting of platinum, gold, and iridium.
2. The magnetic alloy material according to claim 1, wherein an atomic composition ratio of cobalt is equal to or more than 10 atomic percent and equal to or less than 90 atomic percent.
3. The magnetic alloy material according to claim 1, wherein equal to or less than 6 atomic percent of platinum is added.
4. The magnetic alloy material according to claim 1, wherein equal to or less than 4.4 atomic percent of gold is added.
5. The magnetic alloy material according to claim 1, wherein equal to or less than 5.8 atomic percent of iridium is added.
6. The magnetic alloy material according to claim 1, wherein at least two kinds of elements selected from the group consisting of platinum, gold, and iridium are added, each of the elements being contained in amount of equal to or more than 0.1 atomic percent.
7. The magnetic alloy material according to claim 6, wherein equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of platinum and equal to or more than 0.1 atomic percent and equal to or less than 5 atomic percent of gold are added.
8. The magnetic alloy material according to claim 6, wherein equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of platinum and equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of iridium are added.
9. The magnetic alloy material according to claim 6, wherein equal to or more than 0.1 atomic percent and equal to or less than 5 atomic percent of gold and equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of iridium are added.
10. The magnetic alloy material according to claim 6, wherein equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of platinum, equal to or more than 0.1 atomic percent and equal to or less than 5 atomic percent of gold, and equal to or more than 0.1 atomic percent and equal to or less than 6 atomic percent of iridium are added.
Description
BRIEF DESCRIPTION OF DRAWINGS
[0022]
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[0024]
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[0029]
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[0031]
EXAMPLE EMBODIMENT
[0032] Hereinafter, an example embodiment of the present invention will be described with reference to the drawings. Although the following example embodiments are technically preferable for carrying out the present invention, the scope of the invention is not limited thereto. In all the drawings used for describing the following example embodiments, similar parts are denoted with the same reference numerals unless otherwise noted. Furthermore, in the following example embodiments, similar configurations and operations may not be described repeatedly.
[0033] In the following example embodiments, the Korringa Kohn Rostoker Coherent Potential Approximation (KKR-CPA), one of the first-principles calculation methods, is employed to calculate the spin moment of a magnetic alloy. The KKR-CPA is based on a Green function. Specifically, the following example embodiments show results of the spin moment of an alloy calculated with software called AkaiKKR. The software AkaiKKR calculates first-principles electronic states based on the local density approximation or the generalized gradient approximation of the density functional theory.
First Example Embodiment
[0034] First, a magnetic alloy material according to a first example embodiment will be described with reference to the drawings. The magnetic alloy material of the present example embodiment is an iron-cobalt-platinum alloy (hereinafter referred to as “FeCoPt alloy”).
[0035]
[0036]
[0037] As shown in
[0038] According to the graph of
[0039] The magnetic alloy material 10 of the present example embodiment can be produced by various methods. The magnetic alloy material 10 of bulk type can be produced by, for example, sintering or arc melting. Furthermore, the magnetic alloy material 10 of thin film type can be produced by, for example, sputtering, vapor deposition, and pulsed laser deposition.
[0040] As described above, in the magnetic alloy material of the present example embodiment, Pt is added to an FeCo alloy containing Fe and Co as main components. An FeCoPt alloy to which 6 at % or less of Pt is added has a spin moment larger than that of the FeCo alloy.
[0041] The addition of a small amount of Pt to the FeCo alloy enables the magnetic alloy material of the present example embodiment to have a larger spin moment than the FeCo alloy. Since Pt is added to the magnetic alloy material of the present example embodiment to such an extent not to affect the thermal properties of the FeCo alloy, the magnetic alloy material of the present example embodiment is practically produced and applied. In other words, according to the present example embodiment, there is provided a magnetic alloy material which contains a metallic element as a main component and has a larger spin moment than that of the FeCo alloy and is easy to produce.
Second Example Embodiment
[0042] Next, a magnetic alloy material according to a second example embodiment will be described with reference to the drawings. The magnetic alloy material of the present example embodiment is an iron-cobalt-gold alloy (hereinafter referred to as “FeCoAu alloy”). The magnetic alloy material of the present example embodiment is different from the magnetic alloy material of the first example embodiment in that gold (Au) is used instead of platinum (Pt).
[0043]
[0044]
[0045] As shown in
[0046] According to the graph of
[0047] The magnetic alloy material 20 of the present example embodiment can be produced by various methods. The magnetic alloy material 20 of bulk type can be produced by, for example, sintering or arc melting. Furthermore, the magnetic alloy material 20 of thin film type can be produced by, for example, sputtering, vapor deposition, and pulsed laser deposition.
[0048] As described above, in the magnetic alloy material of the present example embodiment, Au is added to an FeCo alloy containing Fe and Co as main components. An FeCoAu alloy to which 4.4 at % or less of Au is added has a spin moment larger than that of the FeCo alloy.
[0049] The addition of a small amount of Au to the FeCo alloy enables the magnetic alloy material of the present example embodiment to have a larger spin moment than the FeCo alloy. Since Au is added to the magnetic alloy material of the present example embodiment to such an extent not to affect the thermal properties of the FeCo alloy, the magnetic alloy material of the present example embodiment is practically produced and applied. In other words, according to the present example embodiment, there is provided a magnetic alloy material which contains a metallic element as a main component and has a larger spin moment than that of the FeCo alloy and is easy to produce.
Third Example Embodiment
[0050] Next, a magnetic alloy material according to a third example embodiment will be described with reference to the drawings. The magnetic alloy material of the present example embodiment is an iron-cobalt-iridium alloy (hereinafter referred to as “FeCoIr alloy”). The magnetic alloy material of the present example embodiment is different from the magnetic alloy materials of the first and second example embodiments in that iridium (Ir) is used instead of platinum (Pt) or gold (Au).
[0051]
[0052]
[0053] As shown in
[0054] According to the graph of
[0055] The magnetic alloy material 30 of the present example embodiment can be produced by various methods. The magnetic alloy material 30 of bulk type can be produced by, for example, sintering or arc melting. Furthermore, the magnetic alloy material 30 of thin film type can be produced by, for example, sputtering, vapor deposition, and pulsed laser deposition.
[0056] As described above, in the magnetic alloy material of the present example embodiment, Ir is added to an FeCo alloy containing Fe and Co as main components. An FeCoIr alloy to which 5.8 at % or less of Ir is added has a spin moment larger than that of the FeCo alloy.
[0057] The addition of a small amount of Ir to the FeCo alloy enables the magnetic alloy material of the present example embodiment to have a larger spin moment than the FeCo alloy. Since Ir is added to the magnetic alloy material of the present example embodiment to such an extent not to affect the thermal properties of the FeCo alloy, the magnetic alloy material of the present example embodiment is practically produced and applied. In other words, according to the present example embodiment, there is provided a magnetic alloy material which contains a metallic element as a main component and has a larger spin moment than that of the FeCo alloy and is easy to produce.
Fourth Example Embodiment
[0058] Next, a magnetic alloy material according to a fourth example embodiment will be described with reference to the drawings. In the magnetic alloy material of the present example embodiment, at least two kinds of elements selected from the group consisting of platinum (Pt), gold (Au), and iridium (Ir) are added to an iron-cobalt alloy (hereinafter referred to as “FeCo alloy”). The magnetic alloy material 40 contains at least two kinds of elements selected from the group consisting of platinum (Pt), gold (Au), and iridium (Ir). Each of the elements is contained in amount of equal to or more than 0.1 at %.
[0059]
[0060]
[0061] As shown in
[0062] The magnetic alloy material 40 of the present example embodiment can be produced by various methods. The magnetic alloy material 40 of bulk type can be produced by, for example, sintering or arc melting. Furthermore, the magnetic alloy material 40 of thin film type can be produced by, for example, sputtering, vapor deposition, and pulsed laser deposition.
[0063] As described above, in the magnetic alloy material of the present example embodiment, at least two kinds of elements selected from the group consisting of Pt, Au, and Ir are added to an FeCo alloy containing Fe and Co as main components. Each of the elements is contained in amount in amount of equal to or more than 0.1 at %.
[0064] The adding of at least two kinds of elements selected from the group consisting of Pt, Au, and Ir to the FeCo alloy in small amounts enables the magnetic alloy material of the present example embodiment to have a larger spin moment than the FeCo alloy. Since at least two kinds of elements selected from the group consisting of Pt, Au, and Ir are added to the magnetic alloy material of the present example embodiment to such an extent not to affect the thermal properties of the FeCo alloy, the magnetic alloy material of the present example embodiment is practically produced and applied. In other words, according to the present example embodiment, there is provided a magnetic alloy material which contains a metallic element as a main component and has a larger spin moment than that of the iron-cobalt alloy and is easy to produce.
[0065] The magnetic alloy materials according to the first to fourth example embodiments have been described above. The magnetic material according to each example embodiment contains iron and cobalt as main components and equal to or more than 0.1 at % of at least one element selected from the group consisting of platinum, gold, and iridium. Platinum, gold, and iridium are Groups 9 to 11 Period 6 transition metals (atomic number: 77 to 79) in the periodic table. For example, the magnetic alloy materials according to the first to fourth example embodiments contain cobalt having an atomic composition ratio of equal to or more than 10 at % and equal to or less than 90 at %. For example, the magnetic alloy materials according to the first to fourth example embodiments preferably have an atomic composition ratio of iron to cobalt of 75:25.
[0066] (Related Art)
[0067] Next, a magnetic alloy material according to the related art will be described with reference to the drawings. Examples of the magnetic alloy material in the related art include an iron-cobalt alloy (hereinafter referred to as “FeCo alloy”) and an iron-cobalt-palladium alloy (hereinafter referred to as “FeCoPd alloy”).
[0068]
[0069]
[0070] As shown in
[0071] PTL 2 (JP 2005-347688 A) contains information that the addition of Pd to an FeCo alloy increases saturation magnetization. PTL 2 says that an increase in saturation magnetization is caused by an increase in spin moment based on a change in electronic state which is caused when Pd displaces a lattice point of an FeCo crystal or penetrates between lattices to expand the FeCo crystal lattice structure. However, the result in
[0072] On the other hand, in each of the magnetic alloy materials of the first to fourth example embodiments, the spin moment increases when at least one element selected from the group consisting of platinum (Pt), gold (Au), and iridium (Ir) is added to an FeCo alloy. It is inferred that each of the magnetic alloy materials of the first to fourth example embodiments increases in spin moment because of a change in electronic state caused by adding at least one element selected from the group consisting of Pt, Au, and Ir to an FeCo alloy.
[0073] Next, methods for producing the magnetic alloy materials according to the first to fourth example embodiments will be described with reference to several Examples. The following methods for producing the magnetic alloy materials are shown schematically, and preparation of materials and usage of production devices are not shown in a precise sense.
Example 1
[0074] Example 1 relates to the first example embodiment. In Example 1, an FeCoPt alloy of bulk type was produced by sintering.
[0075] First, metal powders of iron (Fe), cobalt (Co), and platinum (Pt) were blended with an atomic composition ratio of Fe:Co:Pt=0.746:0.246:0.008 and were uniformly mixed with a mortar to prepare a mixed powder.
[0076] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0077] Then, the sintered body was diced to a desired size, whereby producing an FeCoPt alloy having the desired size.
[0078] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoPt alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Pt.
Example 2
[0079] Example 2 relates to the first example embodiment. In Example 2, an FeCoPt alloy of thin film type was produced by sputtering.
[0080] First, sputtering targets, that is, iron (Fe), cobalt (Co), and platinum (Pt) were prepared. Fe, Co, and Pt were sputtered simultaneously (or “co-sputtered”) under an argon gas atmosphere to form an FeCoPt alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Pt=0.746:0.246:0.008.
[0081] Then, the silicon substrate formed with the FeCoPt alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoPt alloy.
[0082] At the time of co-sputtering Fe, Co, and Pt, for example, it is possible to change a coercive force of the FeCoPt alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Pt.
Example 3
[0083] Example 3 relates to the second example embodiment. In Example 3, an FeCoAu alloy of bulk type was produced by sintering.
[0084] First, metal powders of iron (Fe), cobalt (Co), and gold (Au) were blended with an atomic composition ratio of Fe:Co:Au=0.746:0.246:0.008 and were uniformly mixed with a mortar to prepare a mixed powder.
[0085] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0086] Then, the sintered body was diced to a desired size, whereby producing an FeCoAu alloy having the desired size.
[0087] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoAu alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Au.
Example 4
[0088] Example 4 relates to the second example embodiment. In Example 4, an FeCoAu alloy of thin film type was produced by sputtering.
[0089] First, sputtering targets, that is, iron (Fe), cobalt (Co), and gold (Au) were prepared. Fe, Co, and Au were co-sputtered under an argon gas atmosphere to form an FeCoAu alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Au=0.746:0.246:0.008.
[0090] Then, the silicon substrate formed with the FeCoAu alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoAu alloy.
[0091] At the time of co-sputtering Fe, Co, and Au, for example, it is possible to change a coercive force of the FeCoAu alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Au.
Example 5
[0092] Example 5 relates to the third example embodiment. In Example 5, an FeCoIr alloy of bulk type was produced by sintering.
[0093] First, metal powders of iron (Fe), cobalt (Co), and iridium (Ir) were blended with an atomic composition ratio of Fe:Co:Ir=0.729:0.229:0.042 and were uniformly mixed with a mortar to prepare a mixed powder.
[0094] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0095] Then, the sintered body was diced to a desired size, whereby producing an FeCoIr alloy having the desired size.
[0096] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Ir.
Example 6
[0097] Example 6 relates to the third example embodiment. In Example 6, an FeCoIr alloy of thin film type was produced by sputtering.
[0098] First, sputtering targets, that is, iron (Fe), cobalt (Co), and iridium (Ir) were prepared. Fe, Co, and Ir were co-sputtered under an argon gas atmosphere to form an FeCoIr alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Ir=0.729:0.229:0.042.
[0099] Then, the silicon substrate formed with the FeCoIr alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoIr alloy.
[0100] At the time of co-sputtering Fe, Co, and Ir, for example, it is possible to change a coercive force of the FeCoIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, and Ir.
Example 7
[0101] Example 7 relates to the fourth example embodiment. In Example 7, an FeCoPtAu alloy of bulk type was produced by sintering.
[0102] First, metal powders of iron (Fe), cobalt (Co), platinum (Pt), and gold (Au) were blended with an atomic composition ratio of Fe:Co:Pt:Au=0.75:0.25:0.02:0.04 and were uniformly mixed with a mortar to prepare a mixed powder.
[0103] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0104] Then, the sintered body was diced to a desired size, whereby producing an FeCoPtAu alloy having the desired size.
[0105] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoPtAu alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, and Au.
Example 8
[0106] Example 8 relates to the fourth example embodiment. In Example 8, an FeCoPtAu alloy of thin film type was produced by sputtering.
[0107] First, sputtering targets, that is, iron (Fe), cobalt (Co), platinum (Pt), and gold (Au) were prepared. Fe, Co, Pt, and Au were co-sputtered under an argon gas atmosphere to form an FeCoPtAu alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Pt:Au=0.75:0.25:0.02:0.02.
[0108] Then, the silicon substrate formed with the FeCoPtAu alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoPtAu alloy.
[0109] At the time of co-sputtering Fe, Co, Pt, and Au, for example, it is possible to change a coercive force of the FeCoPtAu alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, and Au.
Example 9
[0110] Example 9 relates to the fourth example embodiment. In Example 9, an FeCoPtIr alloy of bulk type was produced by sintering.
[0111] First, metal powders of iron (Fe), cobalt (Co), platinum (Pt), and iridium (Ir) were blended with an atomic composition ratio of Fe:Co:Pt:Ir=0.75:0.25:0.02:0.04 and were uniformly mixed with a mortar to prepare a mixed powder.
[0112] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0113] Then, the sintered body was diced to a desired size, whereby producing an FeCoPtIr alloy having the desired size.
[0114] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoPtIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, and Ir.
Example 10
[0115] Example 10 relates to the fourth example embodiment. In Example 10, an FeCoPtIr alloy of thin film type was produced by sputtering.
[0116] First, sputtering targets, that is, iron (Fe), cobalt (Co), platinum (Pt), and iridium (Ir) were prepared. Fe, Co, Pt, and Ir were co-sputtered under an argon gas atmosphere to form an FeCoPtIr alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Pt:Ir=0.75:0.25:0.02:0.04.
[0117] Then, the silicon substrate formed with the FeCoPtIr alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoPtIr alloy.
[0118] At the time of co-sputtering Fe, Co, Pt, and Ir, for example, it is possible to change a coercive force of the FeCoPtIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, and Ir.
Example 11
[0119] Example 11 relates to the fourth example embodiment. In Example 11, an FeCoAuIr alloy of bulk type was produced by sintering.
[0120] First, metal powders of iron (Fe), cobalt (Co), gold (Au), and iridium (Ir) were blended with an atomic composition ratio of Fe:Co:Au:Ir=0.75:0.25:0.02:0.04 and were uniformly mixed with a mortar to prepare a mixed powder.
[0121] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0122] Then, the sintered body was diced to a desired size, whereby producing an FeCoAuIr alloy having the desired size.
[0123] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoAuIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Au, and Ir.
Example 12
[0124] Example 12 relates to the fourth example embodiment. In Example 12, an FeCoAuIr alloy of thin film type was produced by sputtering.
[0125] First, sputter targets, that is, iron (Fe), cobalt (Co), gold (Au), and iridium (Ir) were prepared. Fe, Co, Au, and Ir were co-sputtered under an argon gas atmosphere to form an FeCoAuIr alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Au:Ir=0.75:0.25:0.02:0.04.
[0126] Then, the silicon substrate formed with the FeCoAuIr alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoAuIr alloy.
[0127] At the time of co-sputtering Fe, Co, Au, and Ir, for example, it is possible to change a coercive force of the FeCoAuIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Au, and Ir.
Example 13
[0128] Example 13 relates to the fourth example embodiment. In Example 13, an FeCoPtAuIr alloy of bulk type was produced by sintering
[0129] First, metal powders of iron (Fe), cobalt (Co), platinum (Pt), gold (Au), and iridium (Ir) were blended with an atomic composition ratio of Fe:Co:Pt:Au:Ir=0.75:0.25:0.02:0.02:0.04. The blended metal powders were uniformly mixed with a mortar to prepare a mixed powder.
[0130] Next, in a sintering device where argon gas was introduced after vacuum drawing, the prepared mixed powder was subjected to press molding at a pressure of 100 MPa and then sintered at 600° C. to form a sintered body.
[0131] Then, the sintered body was diced to a desired size, whereby producing an FeCoPtAuIr alloy having the desired size.
[0132] At the time of preparing the mixed powder, for example, it is possible to change a coercive force of the FeCoPtAuIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, Au, and Ir.
Example 14
[0133] Example 14 relates to the fourth example embodiment. In Example 14, an FeCoPtAuIr alloy of thin film type was produced by sputtering.
[0134] First, sputter targets, that is, iron (Fe), cobalt (Co), platinum (Pt), gold (Au), and iridium (Ir) were prepared. Fe, Co, Pt, Au, and Ir were co-sputtered under an argon gas atmosphere to form an FeCoAuIr alloy film on a silicon substrate. At this time, the sputtering power was adjusted to set an atomic composition ratio to Fe:Co:Pt:Au:Ir=0.75:0.25:0.02:0.02:0.04.
[0135] Then, the silicon substrate formed with the FeCoPtAuIr alloy film was annealed at 600° C. in vacuum, whereby preparing a thin film of the FeCoPtAuIr alloy.
[0136] At the time of co-sputtering Fe, Co, Pt, Au, and Ir, for example, it is possible to change a coercive force of the FeCoPtAuIr alloy and to enhance the strength (stability of a device) by adding a small amount of an impurity element other than Fe, Co, Pt, Au, and Ir.
[0137] The aforementioned Examples 1 to 14 are methods for producing the magnetic alloy materials according to the first to fourth example embodiments. Although specific parameters such as composition ratios, sintering temperatures, and annealing temperatures are described in Examples 1 to 14, those are shown for purposes of illustration but not limitation of parameters for producing the magnetic alloy materials according to the first to fourth example embodiments.
[0138] While the present invention has been particularly shown and described with reference to the example embodiments thereof, the invention is not limited to these embodiments. It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the claims.
[0139] This application is based upon and claims the benefit of priority from Japanese patent application No. 2018-224571, filed on Nov. 30, 2018, the disclosure of which is incorporated herein in its entirety by reference.
REFERENCE SIGNS LIST
[0140] 10, 20, 30, 40 magnetic alloy material