Anti-reflection film and an optical component containing the anti-reflection film

Abstract

An antireflection film is arranged on a surface of a substrate layer. The antireflection film includes a multilayer film arranged on the surface of the substrate layer and a protective film arranged outside the multilayer film. The multilayer film is formed by stacking two or three low-reflection layers. Two protective films are successively arranged outside the multilayer film of the antireflection film. An optical component includes the antireflection film arranged on both sides or one side of an optical filter of the optical component. The high-performance antireflection film can be obtained with respect to a broadband wavelength ranging from 400 nm to 800 nm, and the antireflection film can reduce the occurrence of ghosts or flare when used in an optical system.

Claims

1. An antireflection film, comprising: a multilayer film, arranged on a surface of a substrate layer, and two protective films, arranged outside the multilayer film; wherein the multilayer film is formed by stacking two or three low-reflection layers; a refractive index of the substrate layer ranges from 1.43 to 1.70; when the multilayer film comprises two low-reflection layers, a first low-reflection layer of the two low-reflection layers has a first refractive index of 1.30 to 1.50 and a first optical film thickness of 60 nm to 180 nm, and a second low-reflection layer of the two low-reflection layers has a second refractive index of 1.15 to 1.23 and a second optical film thickness of 60 nm to 120 nm; when the multilayer film comprises three low-reflection layers, a first low-reflection layer of the three low-reflection layers has a third refractive index of 1.30 to 1.70 and a third optical film thickness of 30 nm to 170 nm, a second low-reflection layer of the three low-reflection layers has a fourth refractive index of 1.30 to 1.50 and a fourth optical film thickness of 80 nm to 120 nm, and a third low-reflection layer of the three low-reflection layers has a fifth refractive index of 1.15 to 1.23 and a fifth optical film thickness of 80 nm to 120 nm; the two protective films are successively arranged outside the multilayer film of the antireflection film; a first protective film of the two protective films has a sixth refractive index of 1.30 to 2.40 and a sixth optical film thickness of below 20 nm, and a second protective film of the two protective films has a seventh refractive index of 1.30 to 1.60 and a seventh optical film thickness of 10 nm to 30 nm; and wherein the refractive index of the substrate layer and a refractive index of the multilayer film are set and obtained under a d-line of a Helium (He) light source, and a wavelength of the d-line is 587.56 nm.

2. The antireflection film according to claim 1, wherein, a maximum reflectance of the antireflection film with respect to light at an incident angle of 0° does not exceed 0.2%, and a minimum reflectance of the antireflection film with respect to the light at the incident angle of 0° does not exceed 0.1%; and a wavelength of the light ranges from 450 nm to 600 nm.

3. The antireflection film according to claim 1, wherein, a maximum reflectance of the antireflection film with respect to light at an incident angle of 0° does not exceed 0.2%, and a wavelength of the light ranges from 380 nm to 780 nm.

4. The antireflection film according to claim 1, wherein, the multilayer film and the two protective films are made of two or three materials with different refractive indices; the first low-reflection layer of the multilayer film comprising three low-reflection layers is composed of a monomer of silicon (Si), magnesium (Mg), and aluminum (Al), or a mixture of Si, Mg, and Al; and the second low-reflection layer of the multilayer film comprising two low-reflection layers or the third low-reflection layer of the multilayer film comprising three low-reflection layers is composed of a monomer of an oxide of silicon or a mixture containing the monomer of the oxide of silicon.

5. The antireflection film according to claim 1, wherein, when the multilayer film comprises the two low-reflection layers, the second low-reflection layer of the two low-reflection layers is composed of hollow microparticles containing Si; when the multilayer film comprises the three low-reflection layers, the third low-reflection layer of the three low-reflection layers is composed of the hollow microparticles containing Si.

6. The antireflection film according to claim 1, wherein, when the multilayer film comprises the two low-reflection layers or the three low-reflection layers, the first low-reflection layer is composed of a monomer of SiO.sub.2, MgF.sub.2, and Al.sub.2O.sub.5 or a mixture of SiO.sub.2, MgF.sub.2, and Al.sub.2O.sub.5.

7. An optical component including the antireflection film according to claim 1, wherein the antireflection film is arranged on both sides or one side of an optical filter of the optical component.

8. The optical component according to claim 7, wherein, a maximum reflectance of the antireflection film with respect to light at an incident angle of 0° does not exceed 0.2%, and a minimum reflectance of the antireflection film with respect to the light at the incident angle of 0° does not exceed 0.1%; and a wavelength of the light ranges from 450 nm to 600 nm.

9. The optical component according to claim 7, wherein, a maximum reflectance of the antireflection film with respect to light at an incident angle of 0° does not exceed 0.2%, and a wavelength of the light ranges from 380 nm to 780 nm.

10. The optical component according to claim 7, wherein, the low-reflection layers and the two protective films are made of two or three materials with different refractive indices; a first film layer of the multilayer film and the two protective films is composed of a monomer of silicon (Si), magnesium (Mg), and aluminum (Al), or a mixture of Si, Mg, and Al.

11. The optical component according to claim 7, wherein, when the multilayer film comprises the two low-reflection layers, the second low-reflection layer of the two low-reflection layers is composed of hollow microparticles containing Si; when the multilayer film comprises the three low-reflection layers, the third low-reflection layer of the three low-reflection layers is composed of the hollow microparticles containing Si.

12. The optical component according to claim 7, wherein, when the multilayer film comprises the two low-reflection layers or the three low-reflection layers, the first low-reflection layer is composed of a monomer of SiO.sub.2, MgF.sub.2, and Al.sub.2O.sub.5 or a mixture of SiO.sub.2, MgF.sub.2, and Al.sub.2O.sub.5.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a structural schematic diagram of the present disclosure.

(2) FIG. 2 is a structural schematic diagram of the optical component of the present disclosure.

(3) FIG. 3 is a first schematic diagram showing the reflectance characteristic of the antireflection film of the present disclosure.

(4) FIG. 4 is a second schematic diagram showing the reflectance characteristic of the antireflection film of the present disclosure.

(5) FIG. 5 is a third schematic diagram showing the reflectance characteristic of the antireflection film of the present disclosure.

(6) FIG. 6 is a fourth schematic diagram showing the reflectance characteristic of the antireflection film of the present disclosure.

(7) In the drawings: 1, substrate layer; 2, antireflection film; 3, first low-reflection layer;

(8) 4, second low-reflection layer; 5, third low-reflection layer; 6, first protective film; and

(9) 7, second protective film.

DETAILED DESCRIPTION OF THE EMBODIMENTS

(10) The present disclosure will be further described hereinafter with reference to the drawings.

(11) An antireflection film, wherein the antireflection film is arranged on a surface of a substrate layer. The antireflection film includes a multilayer film arranged on the surface of the substrate layer and a protective film arranged outside the multilayer film. The multilayer film is formed by stacking two or three low-reflection layers. The refractive index of the substrate layer ranges from 1.43 to 1.70. When the multilayer film includes two low-reflection layers, a first low-reflection layer of the two low-reflection layers has a refractive index of 1.30 to 1.50 and an optical film thickness of 60 nm to 180 nm, and a second low-reflection layer of the two low-reflection layers has a refractive index of 1.15 to 1.23 and an optical film thickness of 60 nm to 120 nm.

(12) When the multilayer film includes three low-reflection layers, the first low-reflection layer of the three low-reflection layers has a refractive index of 1.30 to 1.70 and an optical film thickness of 30 nm to 170 nm. The second low-reflection layer has a refractive index of 1.30 to 1.50 and an optical film thickness of 80 nm to 120 nm. The third low-reflection layer of the three low-reflection layers has a refractive index of 1.15 to 1.23 and an optical film thickness of 80 nm to 120 nm.

(13) Two protective films are successively arranged outside the multilayer film of the antireflection film. A first protective film of the two protective films has a refractive index of 1.30 to 2.40 and an optical film thickness of below 20 nm, and a second protective film of the two protective films has a refractive index of 1.30 to 1.60 and an optical film thickness of 10 nm to 30 nm.

(14) The refractive index of the substrate layer and the multilayer film is set and obtained under the d-line of the Helium (He) light source, and the wavelength of the d-line is 587.56 nm.

(15) The maximum reflectance of the antireflection film with respect to light at an incident angle of 0° does not exceed 0.2%, and the minimum reflectance does not exceed 0.1%. The wavelength of the light ranges from 450 nm to 600 nm.

(16) The maximum reflectance of the antireflection film with respect to the light at the incident angle of 0° does not exceed 0.2%, wherein the wavelength of the light ranges from 380 nm to 780 nm.

(17) The multilayer film and the protective film are made of two or three materials with different refractive indices. The film layer with the refractive index of 1.30 to 1.70 is composed of a monomer of silicon (Si), magnesium (Mg), and aluminum (Al), or a mixture of Si, Mg, and Al; and the film layer with the refractive index of 1.15 to 1.23 is composed of a monomer of an oxide of silicon or a mixture containing the monomer of the oxide of silicon.

(18) When the multilayer film includes two low-reflection layers, the second low-reflection layer of the two low-reflection layers is composed of hollow microparticles containing Si. When the multilayer film includes three low-reflection layers, the third low-reflection layer of the three low-reflection layers is composed of hollow microparticles containing Si.

(19) When the multilayer film includes two low-reflection layers or three low-reflection layers, the first low-reflection layer is composed of a monomer of SiO.sub.2, MgF.sub.2, and Al.sub.2O.sub.5 or a mixture thereof.

(20) An optical component including the antireflection film, wherein the antireflection film is arranged on both sides or one side of an optical filter of the optical component including the antireflection film.

(21) In the first embodiment, as shown in FIG. 1, the antireflection film 2 provided on the substrate layer 1 includes a five-layer structure, i.e., the first low-reflection layer 3, the second low-reflection layer 4, and the third low-reflection layer 5 belonging to the multilayer film, and the first protective film 6 and the second protective film 7 belonging to the protective film.

(22) In the second embodiment, FIG. 1 and FIG. 2 show the structure of the optical component 8 using the substrate layer 1 and the antireflection film 2 of the present invention. One end of the optical component 8 is in contact with the air layer 9, and the substrate layer 1 is provided at both ends of the optical component 8. The optical component 8 includes the antireflection film 2 provided on at least one of the light incident surface and the light emitting surface of the substrate layer 1 in addition to a lens, an optical filter, and the like. The antireflection film 2 is formed by the first low-reflection layer 3, the second low-reflection layer 4, the third low-reflection layer 5, the first protective film 6 and the second protective film 7 which are successively stacked on the substrate layer 1 from a side of the substrate layer 1 to a side of the air layer 9.

(23) The implementation process is specifically as follows, in the present embodiment, the first low-reflection layer 3 or the first low-reflection layer 3 to the second low-reflection layer 4 are formed into a film by a vacuum coating method or spin coating. The refractive index of the first low-reflection layer 3 or the first low-reflection layer 3 to the second low-reflection layer 4 is 1.35 to 1.45, and the first low-reflection layer or the first low-reflection layer 3 to the second low-reflection layer 4 are composed of one or two materials. In addition, the second low-reflection layer 4 or the third low-reflection layer 5 is formed by spin-coating and firing a mixed adjustment solution containing hollow SiO.sub.2 for 1 h, wherein the refractive index of the mixed adjustment solution is adjusted to 1.16. In addition, the first protective film 6 and the second protective film 7 are formed by sputtering. The two protective films have a refractive index of 1.30 to 1.48 and are composed of two materials, and a fluoride film is arranged on the outermost layer.

(24) FIG. 3, FIG. 4, FIG. 5, and FIG. 6 show the reflectance characteristics of the first embodiment at the incident angle of 0° within the wavelength range of 380 nm to 780 nm, and the characteristic that the refractive index of the substrate layer is 1.43, 1.52, 1.61, 1.70. Within the wavelength range of 380 nm to 780 nm, the antireflection film of the first embodiment has a wavelength width of 130 nm to 400 nm when the reflectance is 0.2% or less and has a wavelength width of 60 nm to 350 nm when the reflectance is 0.1% or less.