Superconducting stress-engineered micro-fabricated springs
11201275 · 2021-12-14
Assignee
Inventors
Cpc classification
H01R13/03
ELECTRICITY
International classification
Abstract
A structure has a substrate, and a spring structure disposed on the substrate, the spring structure having an anchor portion disposed on the substrate, an elastic material having an intrinsic stress profile that biases a region of the elastic material to curl away from the substrate, and a superconductor film in electrical contact with a portion of the elastic material. A method of manufacturing superconductor structures includes depositing a release film on a substrate, forming a stack of films comprising an elastic material and a superconductor film, releasing a portion of the elastic material by selective removal of the release film so that portion lifts out of the substrate plane to form elastic springs. A method of manufacturing superconductor structures includes depositing a release film on a substrate, forming a stack of films comprising at least an elastic material, releasing a portion of the elastic material so that portion lifts out of a plane of the substrate to form elastic springs, and coating the elastic springs with a superconductor film.
Claims
1. A structure comprising: a substrate; and a spring structure disposed on the substrate, the spring structure comprising: an anchor portion disposed on the substrate; an elastic material having an intrinsic stress profile that biases a region of the elastic material to curl away from the substrate; and a superconductor film in electrical contact with a portion of the elastic material.
2. The structure as claimed in claim 1, wherein the elastic material comprises molybdenum chromium alloy.
3. The structure as claimed in claim 1, wherein the superconductor film comprises one of the group consisting of: niobium, niobium titanium, niobium nitride, tantalum, titanium nitride, yttrium barium copper oxide, or magnesium diboride.
4. The structure as claimed in claim 1, wherein the superconductor film lies above the elastic material.
5. The structure as claimed in claim 1, wherein the superconductor film lies below the elastic material.
6. The structure as claimed in claim 1, wherein the superconductor film lies within the elastic material.
7. The structure as claimed in claim 1, wherein the superconductor film envelopes the elastic material.
8. The structure as claimed in claim 1, wherein the superconductor film and the elastic material are the same film.
9. The structure as claimed in claim 1, further comprising a coating on the spring structure.
10. The structure as claimed in claim 9, wherein the coating comprises at least one of copper, nickel, or gold, or combinations thereof.
11. The structure as claimed in claim 1, wherein the superconductor film has a thickness sufficient to achieve a desired current density but thin enough to allow the elastic material to curl out of a plane of the substrate when released.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
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DETAILED DESCRIPTION OF THE EMBODIMENTS
(5) The embodiments here show stress-engineered, superconductor micro-springs for interconnecting cryogenic circuits such as quantum computing chips. Generally, these springs form from films deposited on a substrate, where at least one film has more compressive stress nearer the substrate than the surface of the film away from the substrate. The film also has higher tensile stress on the surface of the film than nearer the substrate.
(6) The term “spring” as used here refers to structures that curl out of the plane of the substrate. These structures are naturally mechanically compliant and can accommodate changes in package dimensions due to thermal expansion mismatch. Curling out of the plane may involve the tip of the spring curling away from the substrate, or the body of the spring curling away from the substrate as will be discussed in more detail further.
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(8) The process then forms a stack of films of a stress-engineered film and a superconducting film.
(9)
(10) The stress-engineered film may result from many different processes. As used here, a “stress-engineered” film means a film that has a stress gradient. In the embodiments here, the stress gradient in the film results in a film having higher compressive stress near the substrate than near the surface of the film. The film stress at the substrate may be compressive, neutral, or tensile, as long as it is more compressive than some overlaying film layers above. This discussion may refer to the stress-engineered film as an elastic material.
(11) In one embodiment, compressively-stressed films can be attained by depositing the film via physical vapor deposition (sputtering) in an ambient with relatively low pressure. The low ambient pressure leads to fewer collisions with atoms in the ambient gas and to consequently higher impact energies at the substrate, thereby leading to a more compact, compressively stressed film. The electrical power applied to the sputter target can be increased to further increase the impact energy and promote compressive stress. Tensile stress, on the other hand, can be attained by increasing the ambient pressure and decreasing the electrical power applied to the target to lower the impact energy.
(12) As mentioned above, the stress-engineered film and the superconducting film may be the same film. However, if they are different films, the stress-engineered film may comprise a molybdenum chromium (MoCr) film, resulting from using a MoCr target during sputtering. The two films may be deposited using the same machine in one sequential sputtering process or may be deposited in separate processes in different machines. For some films, the deposition could be done using laser pulsed deposition, as is common for YBCO (yttrium barium copper oxide) superconducting films.
(13) In one embodiment, a protective layer such as 18 shown in
(14) After manufacture of the stack of films, the process selectively removes the release layer 12, leaving only anchor portions such as 13 shown in
(15) Typically, the resulting spring may be as small as 4 micrometers (μm) wide on a 6 μm pitch to 200 μm wide. The springs may have lift heights ranging from just a few microns off the substrate to nearly 1 millimeter high. The film thickness could range from 5 nanometers to several microns, depending upon the current density needed for the application. In addition, the superconducting film, if separate from the stress-engineered film, should be thin enough so it does not produce excessive mechanical load that prevents the structure from properly curling away from the substrate, while providing the needed thickness for the designed current density.
(16) In another embodiment, the stack of films 20 could have the superconductor film deposited inside the middle of the elastic material. This may be accomplished after the first pressure part of the process but before the second pressure part of the process. The resulting structure may appear something similar to the structure shown in
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(18)
(19) The result has a substrate with a spring. The spring structure has an anchor portion disposed on the substrate. The spring structure has an elastic material having an intrinsic stress profile that biases a region of the elastic material to curl away from the substrate, and a superconductor film in electrical contact with a portion of the elastic material. The region may be the tip of the spring or a region of the elastic material between the anchor portion and the tip, such as that shown in
(20) It will be appreciated that variants of the above-disclosed and other features and functions, or alternatives thereof, may be combined into many other different systems or applications. Various presently unforeseen or unanticipated alternatives, modifications, variations, or improvements therein may be subsequently made by those skilled in the art which are also intended to be encompassed by the following claims.