STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

Abstract

A structure of a semiconductor device is provided, including a circuit substrate. A first metal bulk layer is disposed on the circuit substrate. A buffer layer is disposed on the first metal bulk layer. An absorbing layer is disposed on the buffer layer. A first electrode layer is disposed on the absorbing layer. A plurality of piezoelectric material units are disposed on the first electrode layer. A protection layer is conformally disposed on the piezoelectric material units. A second metal bulk layer is disposed over the piezoelectric material units, and including a first part and a second part. The first part penetrating through the protection layer is disposed on the piezoelectric material units, serving as a second electrode layer. The second part is at a same level of the first part, and at least electrically connecting to the first electrode layer.

Claims

1. A structure of a semiconductor device, comprising: a circuit substrate; a first metal bulk layer, disposed on the circuit substrate; a buffer layer, disposed on the first metal bulk layer; an absorbing layer, disposed on the buffer layer; a first electrode layer, disposed on the absorbing layer; a plurality of piezoelectric material units, disposed on the first electrode layer; a protection layer, conformally disposed on the plurality of piezoelectric material units; and a second metal bulk layer, disposed over the plurality of piezoelectric material units, comprising: a first part, disposed on the plurality of piezoelectric material units through the protection layer, serving as a second electrode layer; and a second part, at a same level of the first part, and at least electrically connecting to the first electrode layer.

2. The structure of the semiconductor device according to claim 1, further comprising an interlayer dielectric layer to support the second metal bulk layer, wherein the protection layer is harder than the interlayer dielectric layer.

3. The structure of the semiconductor device according to claim 1, wherein the absorbing layer is a laminated structure.

4. The structure of the semiconductor device according to claim 1, wherein the absorbing layer comprises a plurality of embedded air-gap regions corresponding to the plurality of piezoelectric material units.

5. The structure of the semiconductor device according to claim 1, wherein the first electrode layer has a connection part extending beyond the plurality of piezoelectric material units, and a via connects between the connection part and the second part of the second metal bulk layer.

6. The structure of the semiconductor device according to claim 1, wherein the second metal bulk layer further comprises a third part electrically connecting to the first metal bulk layer through a via structure.

7. The structure of the semiconductor device according to claim 6, wherein the first metal bulk layer also electrically connects to a circuit routing structure of the circuit substrate.

8. The structure of the semiconductor device according to claim 1, wherein the circuit substrate comprises a first device circuit layer and a second device circuit layer over the first device circuit layer.

9. The structure of the semiconductor device according to claim 8, wherein the first device circuit layer comprises a silicon device, and the second device circuit layer comprises a GaN device.

10. The structure of the semiconductor device according to claim 9, wherein the first device circuit layer of the circuit substrate comprises a thermal detecting device.

11. The structure of the semiconductor device according to claim 1, wherein the first electrode layer under the plurality of piezoelectric material units is surrounded by an interlayer dielectric layer on the absorbing layer.

12. A method for fabricating a semiconductor device, comprising: providing a circuit substrate; forming a first metal bulk layer on the circuit substrate; forming a buffer layer on the first metal bulk layer; forming an absorbing layer on the buffer layer; forming a first electrode layer on the absorbing layer; forming a plurality of piezoelectric material units on the first electrode layer; forming a protection layer, conformally disposed on the plurality of piezoelectric material units; and forming a second metal bulk layer over the plurality of piezoelectric material units, the second metal bulk layer comprising: a first part, disposed on the plurality of piezoelectric material units through the protection layer, serving as a second electrode layer; and a second part, at a same level of the first part, and at least electrically connecting to the first electrode layer.

13. The method for fabricating the semiconductor device according to claim 12, further comprising forming an interlayer dielectric layer to support the second metal bulk layer, wherein the protection layer is harder than the interlayer dielectric layer.

14. The method for fabricating the semiconductor device according to claim 12, wherein the step of forming the absorbing layer is to form a laminated structure by alternately stacking a plurality of layers of two different materials.

15. The method for fabricating the semiconductor device according to claim 12, wherein the step of forming the absorbing layer comprises: forming a dielectric layer containing a sacrificial material layer embedded in the dielectric layer; and removing the sacrificial material layer after forming the protection layer on the plurality of piezoelectric material units to form a plurality of air-gap regions, wherein the plurality of air-gap regions corresponds to the plurality of piezoelectric material units.

16. The method for fabricating the semiconductor device according to claim 12, wherein the first electrode layer has a connection part extending beyond the plurality of piezoelectric material units, and a via is connecting between the connection part and the second part of the second metal bulk layer.

17. The method for fabricating the semiconductor device according to claim 12, wherein the second metal bulk layer as formed further comprises a third part electrically connecting to the first metal bulk layer through a via structure.

18. The method for fabricating the semiconductor device according to claim 17, wherein the first metal bulk layer also electrically connects to a circuit routing structure of the circuit substrate.

19. The method for fabricating the semiconductor device according to claim 12, wherein the circuit substrate as provided comprises a first device circuit layer and a second device circuit layer over the first device circuit layer.

20. The method for fabricating the semiconductor device according to claim 19, wherein the first device circuit layer comprises a silicon device, and the second device circuit layer comprises a GaN device.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The accompanying drawings are included to provide a further understanding of the disclosure, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the disclosure and, together with the description, serve to explain the principles of the disclosure.

[0029] FIG. 1 is a schematic diagram of a cross-sectional structure of a semiconductor device integrated with a BAW filter according to an embodiment;

[0030] FIG. 2 to FIG. 5 are schematic cross-sectional diagrams of a fabrication procedure for fabricating a semiconductor device including a BAW filter according to an embodiment; and

[0031] FIG. 6 to FIG. 8 are schematic cross-sectional diagrams of a fabrication procedure for fabricating a semiconductor device including a BAW filter according to an embodiment.

DESCRIPTION OF THE EMBODIMENTS

[0032] Reference will now be made in detail to the exemplary embodiments of the disclosure, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.

[0033] The disclosure relates to a structure of a semiconductor device including a bulk acoustic wave (BAW) filter and a method for fabricating the same. The acoustic wave filter is, for example, a BAW filter, which can be fabricated on a circuit substrate according to the semiconductor fabricating technology and obtain sufficient protection.

[0034] A number of embodiments are provided below to illustrate the disclosure, but the disclosure is not limited to the cited embodiments, and the embodiments might be combined with each other as appropriate.

[0035] FIG. 1 is a schematic diagram of a cross-sectional structure of a semiconductor device integrated with a BAW filter according to an embodiment. Referring to FIG. 1, in semiconductor fabricating technology, an integrated circuit of an electronic device includes a variety of operating circuits, the operating circuits complete fabricating a circuit substrate 50 according to the semiconductor fabricating technology, and the circuit substrate 50 includes a silicon device 106 and a GaN device 112 suitable for high-frequency operation. The circuit of the circuit substrate 50 is, for example, a basic circuit of a cellular phone, and for example, to meet the needs of wireless communication, a BAW acoustic wave filter circuit 60 continues to be formed on the circuit substrate 50 to achieve the overall circuit.

[0036] The basic structure of the circuit substrate 50 includes a buffer layer 102 and a buffer layer 110 in the middle, a circuit including the silicon device 106 and a circuit including the GaN device 112 formed on both sides. There may also be a shielding metal layer 100 between the buffer layer 102 and the buffer layer 110 to shield the two circuits. The silicon device 106 is, for example, a device fabricated based on a silicon layer 104, such as a silicon transistor. The GaN device 112 is, for example, a GaN transistor suitable for high frequency operation, and for example, can be used in a wireless communication circuit. In addition, an interconnection structure 108 and an interconnection structure 114 on both sides provide a required interconnection routing. In a general manner, the interconnection structure 108 and the interconnection structure 114 include a horizontally extending metal layer and a vertically connected via structure to achieve the required interconnection routing. In addition, based on the semiconductor fabricating process, an interlayer dielectric layer is involved, so as to achieve the fabrication and support of the metal device structure.

[0037] The structure of the circuit substrate 50 of FIG. 1 is only an embodiment, and the disclosure is not limited to the cited embodiment. The actual integrated circuit of the circuit substrate 50 is determined according to actual needs and not limited to a specific structure. The structure of the circuit substrate 50 is not limited to the cited embodiment.

[0038] After the fabrication of the circuit substrate 50 is completed, the acoustic wave filter circuit 60 can continue to be fabricated into a complete integrated circuit. The acoustic wave filter circuit 60 includes, for example, a BAW filter layer 120 and a required metal layer 122 electrically connecting to the circuit substrate 50 through a via 124. The thickness of the metal layer 122 is relatively large, for example, the metal layer 122 can simultaneously serve as the functions of signal receiving, shielding, thermal dissipating and the like. The acoustic wave filter circuit 60 is, for example, a passive device, which is beneficial to subsequent applications of other functional circuits.

[0039] The disclosure provides a fabricating process of the acoustic wave filter circuit 60 based on the circuit substrate 50. FIG. 2 to FIG. 5 are schematic cross-sectional diagrams of a fabrication procedure for fabricating a semiconductor device including a BAW filter unit according to an embodiment.

[0040] Referring to FIG. 2, for example, a metal layer 200 is formed on the circuit substrate 50 first, and then the metal layer 200 and the circuit substrate 50, for example, electrically connects to the interconnection structure 114 of the circuit substrate 50 through a via. The thickness of the metal layer 200 is relatively large, and the metal layer 200 can also provide electrical shielding and thermal dissipating functions at the same time in addition to providing the circuit routing required for electrical connection. The metal layer 200 also provides mechanical support strength, which is beneficial to the subsequent formation of the acoustic wave filter. Next, a buffer layer 202 is, for example, an oxide layer formed on the metal layer 200, which serves as a structural base to be formed later and also provides a flat processing plane.

[0041] An absorbing layer 204 is formed on the buffer layer 202. Due to the BAW filter unit having the effect of pressure, the absorbing layer 204 can absorb mechanical stress. In an embodiment, the absorbing layer 204 is a laminated structure 204a formed by alternately stacking a plurality of layers of two different materials. In an embodiment, the absorbing layer 204 may also be a plurality of air-gap structures 204b corresponding to the filter units to be formed later. The laminated structure 204a or the air-gap structures 204b of FIG. 2 is an embodiment to illustrate the detailed structure of the absorbing layer 204.

[0042] Referring to FIG. 3, an electrode layer 206 which is intended to be the lower electrode of the filter units is formed on the absorbing layer 204. The electrode layer 206 is formed by cooperating with a patterning process to form an interlayer dielectric layer 208, thereafter, for example, through a deposition and grinding process, a metal material is filled into the pattern of the interlayer dielectric layer 208, and the electrode layer 206 is completed.

[0043] A piezoelectric material layer 210 is formed on the electrode layer 206 and the interlayer dielectric layer 208. The piezoelectric material layer 210 is an initial material layer for the BAW filter units to be formed later. The piezoelectric material layer 210 has a predetermined thickness to achieve a BAW filtering effect. Since the piezoelectric material layer 210 needs to be patterned to obtain a plurality of filter units, the patterning process involves an etching process. A protection layer 212 may also be formed on the piezoelectric material layer 210 and provides protection in the subsequent etching process.

[0044] Referring to FIG. 4, a patterning process is applied on the piezoelectric material layer 210 to form a plurality of piezoelectric material units 210′. The functions of the piezoelectric material units 210′ constitute a BAW filter. A protection layer 214 is conformally formed on the plurality of piezoelectric material units 210′ formed by the piezoelectric material layer 210. The protection layer 214 is a relatively hard material and at least protects the sidewall of the piezoelectric material units 210′. The protection layer 212 pre-formed on the top surface of the piezoelectric material unit 210′ can be removed first, or retained to be combined with the protection layer 214. In addition, the electrode layer 206 has an extension area 206a extending beyond the piezoelectric material units formed by the piezoelectric material layer 210. The extension area 206a as described later, for example, vertically upward connects to other back-end application circuits from the electrode layer 206 by passing through a conductive via.

[0045] Referring to FIG. 5, a plurality of vias 218 are formed using the patterned interlayer dielectric layer 220 structure. The vias 218 contacts and connects to their corresponding different members, for example, contacting and connecting to the electrode layer 206 or the metal layer 200 to provide electrical connection in a vertical direction. Next, a metal bulk layer 216 is formed over the plurality of piezoelectric material units 210′, and includes, for example, a part 216a penetrating through the protection layer 214 and disposed on the plurality of piezoelectric material units 210′ of the piezoelectric material layer 210 and serve as the second electrode layer. The metal bulk layer 216 also includes another part 216b at the same level of the part 216a mentioned above and at least electrically connecting to the electrode layer 206. The metal bulk layer 216 may also include a part 216c contacting and connecting to the metal layer 200 through the via 218.

[0046] For the temperature control of the piezoelectric material units 210′, according to actual needs, the circuit substrate 50 can also be provided with a thermal detecting device and a thermal compensation device which also detect and compensate for the piezoelectric material units 210′ through a path 222. Here, the path 222 is just schematically drawn, and the actually formed path 222 can be a serpentine path, the disclosure is not limited thereto.

[0047] The absorbing layer 204 described in FIG. 2 is, for example, formed as the laminated structure 204a. In an embodiment, the absorbing layer 204 can also be a structure including the plurality of air-gap structures 204b.

[0048] FIG. 6 to FIG. 8 are schematic cross-sectional diagrams of a fabrication procedure for fabricating a semiconductor device including a BAW filter according to an embodiment. Referring to FIG. 6, if the absorbing layer 204 is to form the air-gap structures 204b, it forms a dielectric layer 250, for example. An embedded sacrificial layer 252 is also formed in a predetermined region in the dielectric layer 250. The materials of the dielectric layer 250 and the sacrificial layer 252 are different, so that the sacrificial layer 252 can be removed by using the etching process in a later phase of the fabrication procedure to form the air-gap structures.

[0049] Referring to FIG. 7, as the fabrication in FIG. 3 and FIG. 4, the protection layer 214 is formed on the piezoelectric material unit 210′. Here, the position of the piezoelectric material unit 210′ corresponds to the position of the sacrificial layer 252, thereby absorbing the pressure on the piezoelectric material unit 210′. After the protection layer 214 is formed on the piezoelectric material unit 210′, a small opening may be formed on the side of the piezoelectric material unit 210′, so that the sacrificial layer 252 can be removed through the etching process, for example, and an air-gap 254 is obtained.

[0050] Referring to FIG. 8, according to the fabricating process of FIG. 5, after the subsequent formation of the metal bulk layer 216 is completed, the interlayer dielectric layer 220 seals the air-gap 254. In this way, the absorbing layer 250 is a structure including the air-gap 254.

[0051] The fabrication procedure of the disclosure integrates the BAW filter on the circuit substrate 50 by, for example, directly forming the flat plane provided by the buffer layer 202 on the circuit substrate 50. The BAW filter can be fabricated on the circuit substrate 50 by cooperating with the large-thickness metal layer and the protection layer for the filter unit.

[0052] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the disclosure and are not intended to limit it. Although the disclosure has been described in detail with reference to the above embodiments, persons of ordinary skill in the art should understand that they may still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents, and that such modifications or replacements of corresponding technical solutions do not substantially deviate from the scope of the technical solutions of the embodiments of the disclosure.