ELECTRONIC BAKING CIGARETTE DEVICE AND HEATING APPARATUS THEREOF
20220192267 · 2022-06-23
Inventors
- Hongming ZHOU (Shenzhen, CN)
- Xingfu ZHANG (Shenzhen, CN)
- Zhenqian CHENG (Shenzhen, CN)
- Junjie XIAO (Shenzhen, CN)
Cpc classification
H05B2203/022
ELECTRICITY
H05B3/06
ELECTRICITY
International classification
H05B3/06
ELECTRICITY
Abstract
A heating apparatus for an electronic baking cigarette device includes a substrate and a heating element on the substrate. The substrate includes a root portion configured for fixing and an end portion for inserting a cigarette. The substrate includes a first region close to the root portion and a second region close to the end portion, the first region has a first thermal conductivity, the second region has a second thermal conductivity, and the first thermal conductivity is less than the second thermal conductivity. The heating element is located in the first region. The substrate adopts a gradient thermal conductivity layout, so that the heating apparatus can have advantages such as a higher energy utilization rate, a better temperature field, a large amount of vapor during vaping, and a better vaping taste.
Claims
1. A heating apparatus, applicable to an electronic baking cigarette device, the heating apparatus comprising: a substrate and a heating element on the substrate, the substrate comprising a root portion configured for fixing and an end portion for inserting a cigarette, and wherein the substrate comprises a first region close to the root portion and a second region close to the end portion, wherein the first region has a first thermal conductivity, the second region has a second thermal conductivity, and the first thermal conductivity is less than the second thermal conductivity, and wherein the heating element is located in the first region.
2. The heating apparatus according to claim 1, wherein the second thermal conductivity is 10 W/(m.Math.° C.) to 30 W/(m.Math.° C.), and the first thermal conductivity is 1 W/(m.Math.° C.) to 5 W/(m.Math.° C.).
3. The heating apparatus according to claim 2, wherein the heating apparatus further comprises two electrical conductors on the substrate; the two electrical conductors are located in the first region, and the heating element is located in the second region; and the two electrical conductors are electrically connected to two ends of the heating element respectively.
4. The heating apparatus according to claim 1, wherein the substrate further comprises a third region located between the first region and the second region, the third region has a third thermal conductivity, and the third thermal conductivity is less than the second thermal conductivity and greater than the thermal conductivity of the first region.
5. The heating apparatus according to claim 4, wherein the second thermal conductivity is 15 W/(m.Math.° C.) to 30 W/(m.Math.° C.), the third thermal conductivity is 5 W/(m.Math.° C.) to 15 W/(m.Math.° C.), and the first thermal conductivity is 1 W/(m.Math.° C.) to 5 W/(m.Math.° C.).
6. The heating apparatus according to claim 4, wherein the substrate is elongated, and the first region, the third region, and the second region are sequentially distributed in a length direction of the substrate.
7. The heating apparatus according to claim 1, wherein the substrate is elongated, and the first region and the second region are distributed in a length direction of the substrate.
8. The heating apparatus according to claim 1, wherein the substrate is made of a non-metal material, metal ceramic, or alloy.
9. The heating apparatus according to claim 1, wherein a thickness of the substrate is 0.2 mm to 0.5 mm.
10. The heating apparatus according to claim 9, wherein the heating apparatus further comprises an insulating layer, the insulating layer is located between the heating element and the substrate, and a thickness of the insulating layer is 0.2 μm to 0.5 μm.
11. The heating apparatus according to claim 10, wherein the heating element comprises a first transition layer on the insulating layer, and a thickness of the first transition layer is 10 nm to 200 nm.
12. The heating apparatus according to claim 11, wherein a thickness of the heating element is 1 μm to 3.5 μm.
13. The heating apparatus according to claim 12, wherein the heating apparatus further comprises two electrical conductors on the substrate, and a thickness of each of the two electrical conductors is 1 μm to 5 μm.
14. The heating apparatus according to claim 13, wherein the heating apparatus further comprises a protective layer on the heating element, and a thickness of the protective layer is 100 nm to 1000 nm.
15. An electronic baking cigarette device including a heating apparatus comprising: a substrate and a heating element on the substrate, the substrate comprising a root portion configured for fixing and an end portion for inserting a cigarette, and wherein the substrate comprises a first region close to the root portion and a second region close to the end portion, wherein the first region has a first thermal conductivity, the second region has a second thermal conductivity, and the first thermal conductivity is less than the second thermal conductivity, and wherein the heating element is located in the first region.
16. The electronic baking cigarette device according to claim 15, wherein the second thermal conductivity is 10 W/(m.Math.° C.) to 30 W/(m.Math.° C.), and the first thermal conductivity is 1 W/(m.Math.° C.) to 5 W/(m.Math.° C.).
17. The electronic baking cigarette device according to claim 16, wherein the heating apparatus further comprises two electrical conductors on the substrate; the two electrical conductors are located in the first region, and the heating element is located in the second region; and the two electrical conductors are electrically connected to two ends of the heating element respectively.
18. The electronic baking cigarette device according to claim 15, wherein the substrate further comprises a third region located between the first region and the second region, the third region has a third thermal conductivity, and the third thermal conductivity is less than the second thermal conductivity and greater than the thermal conductivity of the first region.
19. The electronic baking cigarette device according to claim 18, wherein the second thermal conductivity is 15 W/(m.Math.° C.) to 30 W/(m.Math.° C.), the third thermal conductivity is 5 W/(m.Math.° C.) to 15 W/(m.Math.° C.), and the first thermal conductivity is 1 W/(m.Math.° C.) to 5 W/(m.Math.° C.).
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0023]
[0024]
[0025]
[0026]
[0027]
[0028]
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[0030]
[0031]
[0032]
DETAILED DESCRIPTION
[0033] The following further describes the present disclosure with reference to the accompanying drawings.
[0034] It should be understood that, the terms “front”, “rear”, “left”, “right”, “upper”, “lower”, “first”, and “second” are merely used for ease of description of the technical solutions of the present disclosure rather than indicating that a mentioned apparatus or element needs to have a special difference. Therefore, such terms should not be construed as limiting of the present disclosure. It should be noted that, when an element is considered to be “connected to” another element, the element may be directly connected to the other element, or an intervening element may also be present. Unless otherwise defined, meanings of all technical and scientific terms used in this specification are the same as that usually understood by a person skilled in the technical field to which the present disclosure belongs. The benefits described in this specification are not intended to limit to the scope of the appended claims.
[0035]
[0036] As shown in
[0037] As shown in
[0038] In some embodiments, the heating apparatus 20 may further include an insulating layer 25, the insulating layer 25 is disposed between the heating element 22 and electrical conductors 23 and the substrate 21 and is configured to prevent the substrate 21 from forming a short circuit with the heating element 22 and the electrical conductors 23. Preferably, the insulating layer is an insulating material that can be stably bonded with the substrate 21, such as SiO.sub.2, ZrO.sub.2, or Si.sub.3N.sub.4. The protective layer 24 needs to cover at least the heating element 22, to isolate the heating element 22 from the tobacco, thereby preventing corrosion of the heating element 22 caused by the tobacco.
[0039] In some embodiments, the substrate 21 may have different thermal conductivities in different positions and the thermal conductivities exhibit a gradient change (that is, there are two or more thermal conductivity gradients from top (a position of the end portion) to bottom (a position of the root portion) in the length direction of the substrate), and values of the thermal conductivities are distributed in ascending order. By plating the pattern of the heating element 22 on the substrate 21, and the thermal conductivity of the substrate 21 and the pattern of the heating element 22 are optimized, allowing the heating apparatus 20 to have advantages such as a higher energy utilization rate, a better temperature field, a large amount of vapor during vaping, and a better vaping taste. In some embodiments, the substrate 21 may be made of a non-metal material, a metal ceramic, or an alloy having a thermal conductivity gradient.
[0040] As shown in
[0041] As shown in
[0042] As shown in
[0043] As shown in
[0044] S1. Preparation of the Substrate 21:
[0045] (A) A substrate having a thermal conductivity gradient is prepared by using a powder metallurgy method.
[0046] (B) Treatment before coating:
[0047] The substrate is wiped and cleaned with ethanol and then placed in the chamber of a coating machine, followed by evacuation and preheating. The surface of the substrate is ion cleaned.
[0048] (C) Formation of the insulating layer:
[0049] Argon is introduced into the chamber to reach a working gas pressure of 2×10.sup.−1 Pa. Coating is performed at a ZrO.sub.2 target power density of 2 W/cm.sup.2 to 6 W/cm.sup.2 at room temperature for 60 min to 150 min. The ZrO.sub.2 target power supply is then turned off
[0050] S2. Formation of the Heating Element 22:
[0051] Argon is introduced into the chamber to reach a working gas pressure of 5×10.sup.−1 Pa. Coating is performed at a ZrNi target power density of 6 W/cm.sup.2 to 8 W/cm.sup.2 at room temperature for 5 min to 15 min to form the first transition layer 221. The ZrNi target power supply is then turned off. A Pt target power supply is turned on. Coating is performed at a power density of 6 W/cm.sup.2 to 8 W/cm.sup.2 at room temperature for 60 min to 120 min, to form the heating layer 222 having a thickness of 1 μm to 3 μm.
[0052] S3. Formation of the Electrical Conductor 23:
[0053] Argon is introduced into the chamber to reach a working gas pressure of 5×10.sup.−1 Pa. A titanium target power supply is turned on. Coating is performed at a power density of 6 W/cm.sup.2 to 8 W/cm.sup.2 at room temperature for 5 min to 10 min to form the base layer 231. A nickel target power supply is then turned on. Coating is performed at a power density of 6 W/cm.sup.2 to 8 W/cm.sup.2 at room temperature for 10 min to 30 min to form the second transition layer 232. A silver target power supply is turned on. Coating is performed at a power density of 4 W/cm.sup.2 to 8 W/cm.sup.2 at room temperature for 30 min to 120 min to form the conductive layer 233. Finally, lead wires are soldered on the conductive layer 233 to form conductive electrodes.
[0054] S4. Formation of the Protective Layer 24:
[0055] Argon and oxygen with a ratio of 1:1 are introduced to reach a working gas pressure of 0.2 Pa. Sputtering is performed at a sputtering power intensity of a ZrO.sub.2 target direct current power supply at a temperature from normal temperature to 500° C., to form the protective layer 24 having a thickness of 100 nm to 1000 nm.
[0056] In addition, step S2 may further include a step of forming the pattern of the heating element 22.
[0057] To ensure the consistency of the temperature field of the heating region, the heating element 22 needs to be formed into a suitable pattern. The pattern of the heating element 22 may be prepared by using a masking method or an ion etching method. In the masking method, the non-pattern part is masked on the substrate 21, and the pattern of the heating element 22 is formed on the substrate 21 upon the sputtering of the heating element 22. In the ion etching method, first, the heating element 22 is coated on an entire surface, followed by photoresist application and exposure for curing. The exposed photoresist and the region of the heating element 22 are ion etched, and then the unexposed photoresist is removed, to form the required pattern of the heating element 22.
[0058] Compared with related technologies, the foregoing heating apparatus 20 has at least the following beneficial effects:
[0059] (1) Design and preparation processes of the pattern of the heating element 22 are simplified, and product research and development and manufacturing difficulties are reduced.
[0060] (2) The substrate 21 and the pattern of the heating element 22 are optimized together to form an optimal temperature field, to improve the vaping taste.
[0061] (3) The part of the substrate 21 on which the electrical conductor 23 is plated has a low thermal conductivity, and is low in temperature when the heating apparatus 20 generates heat, thereby achieving a higher energy utilization rate. Lead wires may be soldered to the electrical conductor 23, thereby improving the product preparation efficiency.
[0062] (4) By plating the thin-film heating element 22 on the substrate 21 having a thermal conductivity gradient by magnetron sputtering, the consistency of the resistance of the pattern of the heating element 22 can be improved and the variation range of the temperature coefficient of resistance (TCR) can be reduced, thereby achieving precise control of the heating field.
[0063]
[0064] It may be understood that, the foregoing embodiments only describe exemplary implementations of the present disclosure specifically and in detail, but cannot be construed as a limitation to the patent scope of the present disclosure. It should be noted that a person of ordinary skill in the art may further freely combine the foregoing technical features or make several variations and improvements without departing from the concept of the present disclosure, and these variations and improvements all fall within the protection scope of the present disclosure. Therefore, any equivalent change or modification made within the scope of the claims of the present disclosure shall fall within the scope covered by the claims of the present disclosure.