INTERCONNECTABLE ELECTRONIC EQUIPMENT RACK SYSTEM HAVING REDUCED RADIATED EMISSIONS AND SUSCEPTIBILITY
20220201908 · 2022-06-23
Inventors
Cpc classification
H05K9/0062
ELECTRICITY
H05K7/1492
ELECTRICITY
International classification
Abstract
An equipment rack, including an electronic equipment enclosure defined by RF-shielded walls. Openings in the RF-shielded walls are provided for being aligned with complimentary-sized and shaped openings in one or more like data center equipment racks and adapted for permitting a shielded electromagnetic connection between two or more racks. At least one access door in the enclosure is provided for facilitating access to the electronic equipment in the rack. Panels are provided for covering the respective openings in the RF-shielded walls when the openings are not being used to permit an electromagnetic interconnection between two or more racks. Feedthroughs of the invention communicate signals and power into and out of adjacent enclosures while allowing the enclosures to each form a Faraday cage, protecting electrical and electronic systems within the enclosure from electromagnetic threats such as EMP, HEMP, lightning and geomagnetic storms.
Claims
1. An equipment rack, comprising: an electronic equipment enclosure defined by RF-shielded walls; a plurality of openings in the RF-shielded walls adapted for being aligned with complimentary openings in one or more like data center equipment racks and adapted for permitting a shielded electromagnetic connection between two or more racks; at least one signal feedthrough capable of providing designed energy to a system to be protected, while preventing unwanted energy from being provided to the system to be protected, comprising; an electrically conductive panel disposed in at least one of the plurality of openings; wherein the at least one signal feedthrough is disposed in the electrically conductive panel such that an input end of said signal feedthrough is located within said electronic equipment enclosure, and an output end of said signal feedthrough is located within an interior volume of a second electronic equipment enclosure when the electronic equipment enclosure is attached to the second electronic equipment enclosure such that said plurality of openings are aligned with said complementary openings in said second electronic equipment enclosure; the signal feedthrough operable to communicate a signal applied on an input of the at least one electrical feedthrough to an output of the at least one electrical feedthrough, without requiring any opening in an electrical conductive layer between the input and the output of the feedthrough or in the electrically isolating panel, such that electrical signals are able to be communicated between the first and second electronic equipment enclosures without requiring an electrically conductive path between the first and second electronic equipment enclosures.
2. The equipment rack of claim 1, wherein said electrical feedthrough comprises: an input piezoelectric layer having a first surface and a second surface defining a first thickness of said input piezoelectric layer, said second surface of said input piezoelectric layer opposing said first surface of said input piezoelectric layer, said input piezoelectric layer having a first axis normal to said first and second surfaces; and an output piezoelectric layer having a third surface and a fourth surface defining a second thickness of said output piezoelectric layer, said fourth surface of said output piezoelectric layer opposing said third surface of said output piezoelectric layer, said output piezoelectric layer having a second axis normal to said third and fourth surfaces; wherein said first surface of said input piezoelectric layer is electroded, forming said input; said second surface of said input piezoelectric layer is in physical contact with an electrically conductive layer; said third surface is in physical contact with said electrically conductive layer; and said fourth surface of said output piezoelectric layer is electroded, forming said output; and wherein said input piezoelectric layer is mechanically coupled to said output piezoelectric layer through said electrically conductive layer such that an input time-varying electrical signal applied to said first surface is converted to vibrational energy by said input piezoelectric layer, and wherein said vibrational energy is transmitted through said electrically conductive layer to said output piezoelectric layer, wherein said vibrational energy is converted back into a time-varying electrical signal, resulting in a replica of the input time-varying electrical signal being present on said fourth surface of said output piezoelectric layer; and wherein there is no electrically conductive path between said electroded first surface on said input piezoelectric layer and said electroded fourth surface on said output piezoelectric layer, wherein said electrically conductive layer comprises a continuous, uninterrupted electrically conductive layer completely covering a cross section of the feedthrough, wherein said electrically conductive layer comprises a continuous peripheral surface external to the feedthrough that is in uninterrupted electrical contact with a conductive surface of said electrically conductive panel extending completely around the periphery of the feedthrough, forming a connection with said electrically conductive panel, such that radiated electromagnetic energy from outside the electrical enclosure does not pass into said enclosed interior volume through or around the signal feedthrough or said connection to the electrically conductive panel.
3. The equipment rack of claim 2, wherein said input piezoelectric layer is further defined as comprising a ceramic piezoelectric material, and wherein said output piezoelectric layer is further defined as comprising a ceramic piezoelectric material.
4. The equipment rack of claim 2, wherein said input piezoelectric layer is polarized in a direction parallel to said first axis, and said output piezoelectric layer is polarized in a direction parallel to said second axis.
5. The equipment rack of claim 2, wherein said input piezoelectric layer and said output piezoelectric layer are coaxially disposed with one another.
6. The equipment rack of claim 2, wherein said second thickness is greater than said first thickness.
7. The equipment rack of claim 2, further comprising a rigid end-mass attached to said electroded fourth surface on said output piezoelectric layer, said rigid end-mass having a mechanical quality factor greater than a mechanical quality factor of said output piezoelectric layer.
8. The equipment rack of claim 2, further comprising a rigid end-mass attached to said electroded first surface on said input piezoelectric layer, said rigid end-mass having a mechanical quality factor greater than a mechanical quality factor of said input piezoelectric layer.
9. The equipment rack of claim 1, wherein: said signal feedthrough comprises a piezoelectric ring attached to a drive disk, wherein said drive disk is flexible, and wherein a rod first end is attached to said drive disk; wherein said rod extends through the piezoelectric ring and through at least one flexible membrane that is in continuous electrical communication with and all along the peripheral edges of an opening in the electrically conductive panel; and wherein the rod passes through an opening in the electrically conductive panel, the opening having a peripheral edge, the rod forming an electrically conductive seal between the rod and the peripheral edge of the opening such that the rod is able to pass through the flexible membrane and into the interior volume of the enclosure without creating any voids or openings in enclosure that would allow electromagnetic energy to radiate into, or out of, an interior volume of enclosure; wherein, when a time varying signal is applied to said piezoelectric ring, the rod is translated back and forth, also translating a magnet disposed on a second end of the rod; wherein the magnet is in magnetic communication with a coil such that a time varying current is induced in said coil by a time-varying magnetic field generated by the movement of the magnet, said time varying current proportional to said time-varying signal.
10. The equipment rack of claim 9, wherein said magnet is further defined as a plurality of magnets.
11. An equipment rack system comprising a plurality of RF-shielded equipment racks, each rack of said plurality of RF-shielded equipment racks the racks comprising: an electronic equipment enclosure defined by RF-shielded walls; a plurality of openings in the RF-shielded walls adapted for being aligned with complimentary openings in one or more like data center equipment racks and adapted for permitting a shielded electromagnetic connection between two or more racks; at least one signal feedthrough capable of providing designed energy to a system to be protected, while preventing unwanted energy from being provided to the system to be protected, comprising; an electrically isolating panel disposed in at least one of the plurality of openings; wherein the at least one signal feedthrough is disposed in the electrically conductive panel such that an input end of said signal feedthrough is located within said electronic equipment enclosure, and an output end of said signal feedthrough is located within an interior volume of a second electronic equipment enclosure when the electronic equipment enclosure is attached to the second electronic equipment enclosure such that said plurality of openings are aligned with said complementary openings in said second electronic equipment enclosure; the signal feedthrough operable to communicate a signal applied on an input of the at least one electrical feedthrough to an output of the at least one electrical feedthrough, without requiring any opening in an electrical conductive layer between the input and the output of the feedthrough or in the electrically isolating panel, such that electrical signals are able to be communicated between the first and second electronic equipment enclosures without requiring an electrically conductive path between the first and second electronic equipment enclosures.
12. The equipment rack of claim 11, wherein said electrical feedthrough comprises: an input piezoelectric layer having a first surface and a second surface defining a first thickness of said input piezoelectric layer, said second surface of said input piezoelectric layer opposing said first surface of said input piezoelectric layer, said input piezoelectric layer having a first axis normal to said first and second surfaces; and an output piezoelectric layer having a third surface and a fourth surface defining a second thickness of said output piezoelectric layer, said fourth surface of said output piezoelectric layer opposing said third surface of said output piezoelectric layer, said output piezoelectric layer having a second axis normal to said third and fourth surfaces; wherein said first surface of said input piezoelectric layer is electroded, forming said input; said second surface of said input piezoelectric layer is in physical contact with an electrically conductive layer; said third surface is in physical contact with said electrically conductive layer; and said fourth surface of said output piezoelectric layer is electroded, forming said output; and wherein said input piezoelectric layer is mechanically coupled to said output piezoelectric layer through said electrically conductive layer such that an input time-varying electrical signal applied to said first surface is converted to vibrational energy by said input piezoelectric layer, and wherein said vibrational energy is transmitted through said electrically conductive layer to said output piezoelectric layer, wherein said vibrational energy is converted back into a time-varying electrical signal, resulting in a replica of the input time-varying electrical signal being present on said fourth surface of said output piezoelectric layer; and wherein there is no electrically conductive path between said electroded first surface on said input piezoelectric layer and said electroded fourth surface on said output piezoelectric layer, wherein said electrically conductive layer comprises a continuous, uninterrupted electrically conductive layer completely covering a cross section of the feedthrough, wherein said electrically conductive layer comprises a continuous peripheral surface external to the feedthrough that is in uninterrupted electrical contact with a conductive surface of said electrically conductive panel extending completely around the periphery of the feedthrough, forming a connection with said electrically conductive panel, such that radiated electromagnetic energy from outside the electrical enclosure does not pass into said enclosed interior volume through or around the signal feedthrough or said connection to the electrically conductive panel.
13. The equipment rack of claim 12, wherein said input piezoelectric layer is further defined as comprising a ceramic piezoelectric material, and wherein said output piezoelectric layer is further defined as comprising a ceramic piezoelectric material.
14. The equipment rack of claim 12, wherein said input piezoelectric layer is polarized in a direction parallel to said first axis, and said output piezoelectric layer is polarized in a direction parallel to said second axis.
15. The equipment rack of claim 12, wherein said input piezoelectric layer and said output piezoelectric layer are coaxially disposed with one another.
16. The equipment rack of claim 12, wherein said second thickness is greater than said first thickness.
17. The equipment rack of claim 12, further comprising a rigid end-mass attached to said electroded fourth surface on said output piezoelectric layer, said rigid end-mass having a mechanical quality factor greater than a mechanical quality factor of said output piezoelectric layer.
18. The equipment rack of claim 12, further comprising a rigid end-mass attached to said electroded first surface on said input piezoelectric layer, said rigid end-mass having a mechanical quality factor greater than a mechanical quality factor of said input piezoelectric layer.
19. The equipment rack of claim 11, wherein: said signal feedthrough comprises a piezoelectric ring attached to a drive disk, wherein said drive disk is flexible, and wherein a rod first end is attached to said drive disk; wherein said rod extends through the piezoelectric ring and through at least one flexible membrane that is in continuous electrical communication with and all along the peripheral edges of an opening in the electrically conductive panel; and wherein the rod passes through an opening in the electrically conductive panel, the opening having a peripheral edge, the rod forming an electrically conductive seal between the rod and the peripheral edge of the opening such that the rod is able to pass through the flexible membrane and into the interior volume of the enclosure without creating any voids or openings in enclosure that would allow electromagnetic energy to radiate into, or out of, an interior volume of enclosure; wherein, when a time varying signal is applied to said piezoelectric ring, the rod is translated back and forth, also translating a magnet disposed on a second end of the rod; wherein the magnet is in magnetic communication with a coil such that a time varying current is induced in said coil by a time-varying magnetic field generated by the movement of the magnet, said time varying current proportional to said time-varying signal.
20. The equipment rack of claim 19, wherein said magnet is further defined as a plurality of magnets.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0061] The accompanying drawings, which are incorporated into and form a part of the specification, illustrate one or more embodiments of the present invention and, together with the description, serve to explain the principles of the invention. The drawings are only for the purpose of illustrating embodiments of the invention and are not to be construed as limiting the invention. In the figures, like item designators refer to like elements. The figures are not necessarily to scale, and elements in the figures are depicted without regard to their relative physical size or shape, so that the figures are not limiting as to the sizes of the depicted features in relation to one another.
[0062] In the drawings:
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DETAILED DESCRIPTION OF THE INVENTION
[0093] The following documentation provides a detailed description of exemplary, non-limiting embodiments of the invention.
[0094] Although a detailed description as provided in the attachments contains many specifics for the purposes of illustration, anyone of ordinary skill in the art will appreciate that many variations and alterations to the following details are within the scope of the invention. Accordingly, the following preferred embodiments of the invention are set forth without any loss of generality to, and without imposing limitations upon, the claimed invention. Thus, the scope of the invention should be determined by the appended claims and their legal equivalents, and not merely by the preferred examples or embodiments given.
[0095] As used herein, “piezoelectric material”, or PZT, includes within its meaning any material that experiences a mechanical change when subjected to an applied electric charge, or which develops an electric charge when subjected to a mechanical stress or mechanical deformity, or both. A non-limiting, exemplary list of piezoelectric materials includes: ceramics including but not limited to barium titanate (BaTiO3), lead zirconate titanate Pb[ZrxTix]03, potassium niobate (KNbO3), sodium tungstate (Na2WO3), Ba2NaNb5O5, Pb2KNb5O15, zinc oxide, sodium potassium niobate (K0.5Na0.5NbO3), bismuth ferrite (BiFeO3), sodium niobate (NaNbO3), barium titanate (BaTiO3 and Bi4Ti3O12) and Sodium bismuth titanate NaBi(TiO3)2; crystalline materials such as langasite (La3Ga5SiO14), gallium orthophosphate (GaPO4), lithium niobate (LiNbO3), lithium tantalate (LiTaO3), quartz, berlinite (AlPO4), rochelle salt, topaz, tourmaline-group minerals, and lead titanate (PbTiO3); semiconductors such as, for example and not by way of limitation, III-V and II-VI semiconductors including zincblende and wurtzite crystal structures such as GaN, InN, AlN and ZnO, and any bulk or nanostructured semiconductor crystal having non-central symmetry; polymers, including amorphous and semi-crystalline polymers, including but not limited to polyvinylidene fluoride (PVDF) and its copolymers, polyamides, paralyne, polyimide polyvinylidene chloride (PVDC), voided charged polymers, polymer composites integrating piezoelectric ceramic particles into a polymer film; and any other material that experiences a mechanical change when subjected to an applied electric charge, or which develops an electric charge when subjected to a mechanical stress or mechanical deformity, or both. Such piezoelectric materials may, or may not be, polarized, in any direction.
[0096] As used herein, “electronics enclosure”, “rack” or “housing” includes within its meaning any structure that has a substantially closed interior volume in which a system to be protected may be disposed, or housed. An electronics enclosure may comprise electrically conductive sheet materials that have been shaped to form the interior volume. The sheet materials may be a solid sheet material, or the sheet materials may comprise openings that are sized and disposed so as to significantly attenuate undesired radiated electromagnetic energy to which the enclosure may be subjected. Further, the sheet materials may comprise mu-metals. Electronics enclosures may have feedthroughs for allowing electrical power and communication signals to enter and exit the electronics enclosure, as well as other feedthroughs that may allow, for example, cooling air or liquids to enter or exit the enclosure.
[0097] As used herein, “undesired conducted energy” includes within its meaning electric currents that, when a system to be protected is subjected to such electric currents, experiences undesired results that render the system to be protected such that its operation is degraded or it is inoperable, temporarily or permanently. In some cases, the effect of the undesired conducted energy may be temporary such that the system returns to normal operation when the undesired radiated energy is removed. In other cases, the effect of the undesired conducted energy may be permanent such that the system does not return to normal operation when the undesired conducted energy is removed.
[0098] As used herein, “undesired radiated energy” includes within its meaning electric and/or magnetic fields and radiating electromagnetic energy such as EMP, HEMP and HEMP-level energy that, when a system to be protected (such as an electrical system) is subjected to such energy, the system experiences undesired results that render the electrical system to be protected such that its operation is degraded, or the electrical system is inoperable, temporarily or permanently. In some cases, the effect of the undesired radiated energy may be temporary such that the system returns to normal operation when the undesired radiated energy is removed. In other cases, the effect of the undesired radiated energy may be permanent such that the system does not return to normal operation when the undesired radiated energy is removed. Within the context of “undesired radiated energy” is EMP (including HEMP-level) radiated energy. HEMP radiated energy includes within its meaning electric fields of up to 114 J/m2, which may extend up to and beyond 100 MHz; and, electric field components of HEMP may range up to 10.sup.1 V/m at 0.01 Hz, 10-1 V/m at 100 Hz, and 0.001 V/m at 10,000,000 Hz (as stated at 5.6.3.1 and in Fig. A.1 in IEC TR 6100-5-5-3 (1999), Installation and mitigation guidelines—HEMP protection concepts, filed herewith in an Appendix to the patent application, and incorporated by reference herein in its entirety). “Undesired radiated energy” also includes EMP and HEMP pulse levels and durations as set out in Electromagnetic Pulse (EMP) Protection and Resilience Guidelines for Critical Infrastructure and Equipment, developed by the National Coordinating Center for Communications (NCC), National Cybersecurity and Communications Integration Center, Arlington, Va., (Feb. 5, 2019), filed herewith in an Appendix to the patent application, and incorporated by reference herein in its entirety. “Undesired radiated energy” also includes HEMP-level radiated energy. “Undesired radiated energy” also includes within its meaning radiated energy that causes EMI in the system to be protected. “Undesired radiated energy” also includes within its meaning the effect electric fields induced in the earth by variations in the geomagnetic field caused by natural phenomena such as, for example, geomagnetic storms. Such fields may range up to 15 V/km or more. See Geomagnetic Storms and Their Impacts on the U.S. Power Grid, John Kappenman (Metatch Corporation) (2010), as prepared for the Oak Ridge National Laboratory, 1 Bethel Valley Rd., P.O. Box 2008, Oak Ridge, Tenn. 37831, U.S. govt. contract no. 6400009137, contemporaneously filed herewith as an Appendix in the application, which is incorporated by reference herein in its entirety. “HEMP” means the EMP resulting from a high-altitude nuclear explosion. “HEMP-level” means any electromagnetic energy at the same level as HEMP radiated energy. HEMP and HEMP-level radiated energy includes within its meaning radiated energy as depicted in any of
[0099] As used herein, “system to be protected” and “system” includes within their meaning any system, element, structure or device which may be susceptible to damage, degraded operation, or any undesirable effect resulting from being subjected to undesired radiated electromagnetic energy or conducted electrical energy. Such systems may comprise, by way of example and not by limitation, any electrical or electronic circuit; any system in communication with electrical conductors for transmission of electrical power or information; circuits comprising discrete logic components, analog electrical components, digital circuit components, semiconductor-based circuit elements including but not limited to microprocessors, memory devices, communication circuits, logic arrays, programmable logic, field programmable gates, and other digital circuit elements; electric power supplies; and any system comprising conductors or semiconductors. Such systems may include computers, radios, power supplies, guidance and control systems, motor controllers, and virtually any system comprising an electric or electronic circuit or device.
[0100] As used herein, “mu-metal” includes within its meaning any ferromagnetic alloy exhibiting a permeability greater than ordinary steel, for example greater than 10,000, and up to, and greater than, 100,000. An exemplary common range for the permeability of mu metal is 80,000 to 100,000. Exemplary, non-limiting compositions of mu-metal include approximately 77% nickel, 16% iron, 5% copper, and 2% chromium or molybdenum. Mu-metal may also be considered to be ASTM A753 Alloy 4 and may be composed of approximately 80% nickel, 5% molybdenum, small amounts of various other elements such as silicon, and the remaining 12% to 15% iron. A number of different proprietary formulations of the alloy are sold under trade names such as MuMETAL®, Mumetall®, and Mumetal2®. Mu-metal may be a “soft” ferromagnetic material such that it has low magnetic anisotropy and magnetostriction, giving it a low coercivity so that it saturates at low magnetic fields. Other high-permeability nickel-iron alloys such as permalloy have similar magnetic properties; mu-metal's advantage is that it is more ductile, malleable and workable, allowing it to be easily formed into the thin sheets needed for magnetic shields such as electronics enclosures. Mu-metal objects, including electronics enclosures, may require heat treatment after they are in final form—annealing in a magnetic field in hydrogen atmosphere, which may increase the magnetic permeability of the mu-metal about 40 times. Such annealing alters the material's crystal structure, aligning the grains and removing some impurities, especially carbon, which obstruct the free motion of the magnetic domain boundaries. Bending or mechanical shock after annealing may disrupt the mu-metal's grain alignment, leading to a drop in the permeability of the affected areas, which can be restored by repeating the hydrogen annealing step.
[0101] As used herein, “Electromagnetic Pulse”, or “EMP”, includes within its meaning any transient electromagnetic disturbance or short burst of electromagnetic energy. Such a burst's origin may be a natural occurrence, or may be manmade, and may occur as a radiated, electric, or magnetic field or a conducted electric current, depending on the source and circumstance of the occurrence. An EMP may result in the generation of undesired conducted electric currents, undesired radiated electric fields and undesired magnetic fields. EMP also includes within its meaning HEMP and HEMP-level electromagnetic energy.
[0102] As used herein, “electroded” means the creation of a conductive surface on an object through any means known in the art such as plating, depositing, sputtering or any form of metal deposition, or through any other means of creating, applying or attaching a conductive surface on an object or adjacent to an object. An electroded object has at least one surface that has received a conductive coating or is adjacent to and in electrical contact with a conductive surface.
[0103] As used herein, “signal” includes within its meaning desired energy provided from a source to a load. “Signal” includes within its meaning electrically conducted or mechanically transmitted energy that contains power or information. A non-limiting, exemplary list of signals includes: alternating electrical current (AC); non-time varying electrical voltages or currents (sometimes known as “discretes”); time varying electrical voltages or currents such as those used to transmit information; and mechanical stress or vibration, including time-varying stress and vibration.
[0104] As used herein, a “replica” of a signal means a resulting signal that has the same information content as an original, or input, signal. Thus, it may be, but is not necessarily, an exact replica of the input signal. The replica signal is not necessarily the same amplitude, polarity, level or spectral content of the input signal. Thus, as a non-limiting exemplary case, an output signal may be a replica of an input signal even if the output signal is level-shifted, scaled, or inverted or any combination of these; or even if it contains spectral components not present in the input signal, such as may be the case when the output signal has picked up noise as it is passed from input to output. A replica signal may be, for example, a scaled version of the replicated signal.
[0105] As used herein, “desired signal” includes within its meaning any signal that is intended for use by the system to be protected, or by any system in communication with the system to be protected. A desired signal may have a bandwidth BWd having a lower frequency f.sub.L and an upper f.sub.U, within which the desired signal is contained.
[0106] As used herein, “mechanical transmission” of energy includes within its meaning any form of mechanical energy that is capable of transmitting a signal. The piezoelectric transmission of a signal from an input piezoelectric layer to an output piezoelectric layer as described herein is a non-limiting example of mechanical transmission of a signal.
[0107] As used herein, “electrically conductive enclosure” includes within its meaning any form or shape of enclosed volume, in which an enclosing structure forms an interior volume, and wherein the enclosing structure is electrically conductive. The enclosing structure may be a continuously electrically conductive sheet comprised of one or more conductive surfaces, such as when it is formed of a solid sheet of electrically conductive material; or it may comprise openings of a dimension small enough to prevent an undesired level of radiated electromagnetic energy to penetrate or radiate from or into the enclosed interior volume of the enclosure. The allowable dimension of any such opening may be determined by the susceptibility of the system to be protected to undesired radiated electromagnetic energy. Some systems, which may be highly susceptible to smaller levels of higher frequency radiated electromagnetic energy, may allow only small openings in the enclosing structure; other systems, which are less susceptible, may allow openings of larger dimensions in the enclosing structure. “Electrically conductive enclosure” also includes within its meaning electrically conductive enclosures in which the enclosing structure comprises mu-metal. The enclosing structure may comprise only electrically conductive materials, such an embodiment in which the enclosing structure is fabricated from a metal such as stainless steel, or it may comprise a combination of electrically non-conductive and electrically conductive materials such as an embodiment that comprises plastic or other non-conductive materials that have been plated or coated with a conductive surface. In such embodiments, the conductive surface may form a continuous conductive sheet surrounding the enclosed interior volume or may form a continuous conductive sheet comprising openings, as described above, that surrounds the enclosed interior volume. Such enclosures are known as EMI enclosures in the art. “Electrically conductive enclosure” includes within its meaning Faraday cages structures.
[0108] As used herein, “feedthrough” does not imply or mean that an opening or hole is created or required in the continuous electrically conductive surface or enclosure that forms the enclosed interior volume. “Feedthrough” includes within its meaning structures that receive a signal on a first end and either communicate that signal, or provide a replica signal, at a second end.
[0109] As used herein, “input side” includes within its meaning the side of a feedthrough that receives energy, such as electrical energy, from a source, and converts the received energy to mechanical vibrational energy for transmitting to the output side of the feedthrough.
[0110] As used herein, “output side” includes within its meaning the side of a feedthrough that receives energy, such as mechanical vibrational energy, from an input side of the feedthrough and converts the received energy to electrical energy for providing to a load.
[0111] While reference may be made herein to “data centers”, it is to be understood that this is by way of example only. The inventive scalable, EMI/EMP hardened electronic enclosure rack system may be used generally, in an application or situation in which it is desired to protect an electrical or electronic system from the effects of EMI or EMP radiated energy, or conducted electrical energy, or to reduce electromagnetic or conducted radiated emissions, without regard to the type of electrical system to be protected. Thus, the use of the inventive interconnectable, EMI/EMP/HEMP and HEMP-level hardened electronic enclosure rack system in data centers is just one of many applications of the invention.
[0112] It is well known that certain undesired radiated and conducted energy may have undesired effects on systems to be protected. In some cases in which the undesired radiated and conducted energy result in undesired voltages and currents in the system to be protected that are of a magnitude low enough that there is no permanent harm to the system to be protected, the undesired effect produced by the undesired radiated and conducted energy on the system may be limited to the generation of noise. Such noise may render the system to be temporarily non-operable, but the system may return to normal operation when the undesired radiated and conducted energy have ceased. However, in other cases, the undesired radiated and conducted energy may be of such magnitude that the system experiences voltages and or electric current exceeding breakdown levels such that the system suffers permanent damage in the form of burned out semiconductor junctions, semiconductor metal layers, cables, connectors, and the like. In such circumstances the result can be catastrophic, system-wide destruction of the ability to operate. In such circumstances, when the undesired radiated and conducted energy cease, the system may not return to normal operation.
[0113] In some circumstances, undesired radiated and conducted energy may be the result of natural phenomena such as lightning, electrostatic discharge (ESD), meteoric EMP, coronal mass ejection (i.e., a burst of plasma and accompanying magnetic field, ejected from the solar corona and released into the solar wind) or geomagnetic storms. In other circumstances, undesired radiated and conducted energy may be manmade such as, for example, the switching action of electrical circuitry, whether isolated or repetitive (as a pulse train); the closing and opening of electrical contacts in electric motors, clock and data signals in electronic systems, gasoline engine ignition systems, power line surges; EMP and HEMP weapons including nuclear weapons, and continuously operated radiated emission weapons and jamming systems, as in electronic warfare (EW) systems.
[0114] The development of the rack system as described in this application is directed towards the purpose of providing an electromagnetically secure environment within which any item, including IT equipment, communications equipment, control equipment, protective relay equipment, or any other electronic or non-electronic item may be placed. As described below, the described racks and rack system are interconnectable—above, below, beside, or through a protected umbilical structure.
[0115] Various views of a rack 10 according to an embodiment of the invention are shown in
[0116] As shown collectively in
[0117] With the covers 24, 26 and 28 removed, interconnection ports 24A, 26A and 28A are exposed for use. The size and location of the interconnection ports 24A, 26A and 28A can be of any size and location, as long as the ports 24A, 26A and 28A match up to ports in adjacent racks 10.
[0118] Penetrations may be integrated onto the interconnection ports 24A, 26A and 28A as required to connect and maintain the electromagnetic shielding environment inside the rack 10. Penetrations can be integrated into the cover 24, 26 and/or 28 of an otherwise unused interconnection port 24A, 26A and/or 28A. This is important to accommodate specific applications inside the rack 10. Sizes and types of penetrations can vary. The penetrations can include an umbilical attachment to cooling/power for “TIER IV+” data center protection.
[0119] Referring collectively to
[0120] The air intake/exhausts 40, 42, 44 can be any size and in any location to accommodate specific needs of the user. As evident by its description, the air intake/exhausts 40, 42, 44 may either take cooling air into the rack 10 or exhaust warm air from the rack 10 depending on the direction of fan rotation. See by way of example, fan 46 of air intake/exhaust 44.
[0121] The rack 10 includes air waveguides, provisions for filters and other items. Because the racks 10 are interconnectable, each individual rack 10 does not need to have a filter, rather it can be connected to power in another rack 10 through the interconnection ports 24A, 26A and/or 28A.
[0122] Similarly, air flow, data cables, or any other required connection can be routed between racks 10 as needed. Also, a hose 17 may be provided to route compressed gas from a connector 15 to provide further cooling.
[0123] The racks 10 may be combined into multi-rack assemblies to form a rack system 70 shown in
[0124] The rack system 70 can support a “power bus” architecture, whereby a single bus supplies power to a full row of racks 10, without each rack 10 having its own power supply. A common “rectifier cabinet” can provide power to all of the racks 10 in a row, and still maintain electromagnetic protections.
[0125] The racks 10 can have as many interconnection ports as required. Also, the interconnection ports facilitate the integration of special penetrations, as needed, by allowing for electromagnetically sealed penetrations for waveguides, air, liquid, fiber optic ports, or penetrations for any other purpose to be integrated into any available rack interconnection port.
[0126] The depictions shown in this application are one possible version of many possible rack designs. The racks can be taller, wider, or be sized to support any standard or non-standard rack unit mounting of equipment. The interconnections shown are just one way to assure interconnection between racks. These can include versions with more, fewer, larger or smaller interconnection ports using any shape interconnection port cover.
[0127] The interconnection ports exclude electromagnetic energy from entering the inside of the rack system, and the means of accomplishing this can be the use of any suitable form of gasketing, fingerstock, conductive pastes, or any other method that can support electromagnetic shielding and facilitate the removal of the interconnection port cover to support any configuration or change in configuration of racks over the life-cycle of the systems protected by the rack system. As best shown in
[0128] The cooling pedestal 74 is interconnected through an electromagnetically sealed umbilical to electromagnetically protected cooling modules (not shown) that can be located inside, outside or any other convenient location to provide dedicated cooling capacity to the rack system 70. The rack system 70 can also use cooling as provided by any typical data center environment.
[0129] The electromagnetically protected umbilical can also support the supply of power to the rack system and can be connected to an electromagnetically sealed generator dedicated to the support of the rack system and any associated mechanical systems.
[0130] The rack system 70 may support “built in test” through the use of electromagnetic emitters inside the protected environment of the rack system 70. These emitters can be used to assess the electromagnetic shielding environment and detect if there are any shielding leaks, or to perform periodic “verification testing” of the shielded environment. The built-in test may not impact any operational aspect of the equipment operating inside the rack system.
[0131] Another embodiment may include the use of an integrated filter as part of the rack assembly and will provide isolation from RF energy that may be present at harmful levels outside the new rack assembly. The rack system 70 can be mobile—the system may or may not have integrated wheels for mobility, and may or may not have handles allowing for the system to be transported.
[0132] The rack system may have RF ports built in to allow for the automatic testing of the rack system for Shielding Effectiveness per the MIL-STD. The rack system may have “Shielded Enclosure Leak Detection System” ports to allow for the injection of RF energy into loops or studs.
[0133] As shown in
[0134] Referring now to
[0135] Still referring to
[0136] Still referring to
[0137] Still referring to
[0138] Still referring to
[0139] In embodiments, the piezoelectric layers 101 and 103, and the optional end masses 105 and 106, may be of similar exterior shape. In embodiments, the piezoelectric layers 101 and 103, and optional end masses 105 and 106, may be coaxially located.
[0140] Referring now to
[0141] Referring now to
[0142] Referring now to
[0143] Still referring to
[0144] Still referring to
[0145] In embodiments, the piezoelectric layers 301 and 303, and the optional end masses 305 and 306, may be of similar exterior shape. In embodiments, the piezoelectric layers 301 and 303, and optional end masses 305 and 306, may be coaxially located.
[0146] As with other embodiments of the invention, in the embodiment depicted in
[0147] Referring now to
[0148] Referring now to
[0149]
[0150] Referring now to
[0151] Referring now to
[0152] Still referring to
[0153] Still referring to
[0154] The structure shown in
[0155] Referring still to
[0156] Herein, “signal” and “energy” are used interchangeably to describe the energy passing through the feedthrough. It is to be understood that the signal, or energy, passing through the feed through may be any signal of any characteristic that is able to be converted from electrical energy to mechanical vibrational energy and from mechanical vibrational energy to electrical energy using piezoelectric materials and techniques.
[0157] In any of the embodiments, the electrically conductive layer 109, 309 and the continuously electrically conductive sheet or enclosure forming the enclosed interior volume of enclosure 202 may optionally be, but is not required to be, connected to an electrical ground. In the figures, electrically conductive layer 109, 309 and enclosure 202 may be depicted as optionally connected to an electrical ground at a point 600. Such depiction is for convenience, and only depicts an exemplary, non-limiting embodiment. Such ground connection 600 is simply an optional embodiment of the invention. It is not necessary for each embodiment of the invention that any of these features be connected to an electrical ground, and, in fact, in some embodiments, it may be desired that electrically conductive layer 109, 309 and the electrically conductive walls of enclosure 202 not be connected to an electrical ground.
[0158] In the embodiments of the invention, wherever an electrical signal is applied to a piezoelectric element or material, it is understood that the surface of the piezoelectric element or material that is in electrical contact with an electrical conductor has been electroded.
[0159] Referring now to
[0160] Still referring to
[0161] Still referring to
[0162] Still referring to
[0163] In any of the embodiments of the invention, the feedthrough may operate bi-directionally, without regard to whether one end of the feedthrough is labeled as being an “input” or an “output”. In other words, the feedthroughs of the invention may be used to communicate a signal (including power) from either end of the feedthrough to the other end of the feedthrough. The use of “input” and “output” are thus to provide reference to certain features for ease of explanation, and not to create a limitation.
[0164] In the various embodiments of the invention, the various features described herein may be present in any combination, and in any quantity. The scope of the claimed invention includes not only all the various embodiments and features described herein, but all legal equivalents thereof.
[0165] The various elements of the embodiments of the invention as described herein and depicted in the figures may be present in any embodiment, and in any combination or quantity.
INDUSTRIAL APLICABILITY
[0166] A system and method for protecting electronic systems from failure or damage when such systems are subjected to undesired conducted or radiated energy such as electromagnetic pulse energy or electromagnetic interference, including EMP, HEMP and HEMP-level electromagnetic energy. The invention also reduces the amount of conducted or radiated emanations from a system. A novel, non-conductive signal feedthrough allows a desired signal to be communicated with electrical connectivity. An incoming desired electrical signal is converted to vibrational energy by a piezoelectric transducer, which is communicated into an enclosed interior volume of a conductive electrical enclosure housing a system to be protected, where it is converted back to electrical energy for processing by the system to be protected by a second piezoelectric transducer. The signal feedthrough allows a continuously conductive enclosure to be employed, in embodiments forming a Faraday cage surrounding the electrical system to be protected, providing protection from undesired radiated energy such as EMP and HEMP. The signal feedthrough allows communication without requiring electrical conduction through the feedthrough, thus protecting against undesired conducted energy.
[0167] An EMP and HEMP-hardened electrical electronic equipment rack, enclosure, and rack system according to the invention has been described and claimed with reference to specific embodiments and examples. Various details of the invention may be changed without departing from the scope of the invention. Furthermore, the foregoing description of the preferred embodiments of the invention and best mode for practicing the invention are provided for the purpose of illustration only and not for the purpose of limitation, the invention being defined by the claims.