SUSCEPTOR ARRANGEMENT OF A CVD REACTOR

Abstract

A susceptor arrangement for use in a CVD reactor includes a circular or annular susceptor with a first susceptor broad side, on which a substrate holder and at least one coveting element are arranged. At least one of the covering elements consists of multiple covering plates, in which a lowermost covering plate is adjacent to the first broad side face of the susceptor, and an uppermost covering plate covers the lowermost covering plate at least in certain regions and forms a free broad side face of the susceptor arrangement. The covering plates are preferably produced from silicon carbide, and are connected to one another by positioning elements.

Claims

1. (canceled)

2. A susceptor arrangement, comprising: a substrate holder (4); at least one covering element (5, 15) comprising a lowermost covering plate (6, 16, 36) and an uppermost covering plate (7, 17); a circular or annular susceptor (2) with a first broad side surface (3), on which the substrate holder (4) and the at least one covering element (5, 15) are arranged, wherein the lowermost covering plate (6, 16, 36) adjoins the first broad side surface (3) of the susceptor (2), and the uppermost covering plate (7, 17) at least partially overlaps the lowermost covering plate (6, 16, 36) and forms a free broad side surface (14) of the susceptor arrangement; and one or more positioning elements (8, 18) inserted into respective openings (13, 19; 9, 12) of the lowermost and uppermost covering plates (6, 7, 16, 17, 36), with which the uppermost covering plate (7, 17) is secured to the lowermost covering plate (6, 16, 36) and/or the lowermost covering plate (6, 16, 36) and the uppermost covering plate (7, 17) resting thereupon are secured to the susceptor (2).

3. The susceptor arrangement of claim 2, wherein the uppermost and lowermost covering plates (6, 7, 16, 17, 36) consist of SiC, quartz, Al.sub.2O.sub.3, ZrO.sub.2 or SiC-coated graphite.

4-5. (canceled)

6. The susceptor arrangement of claim 2, wherein each of the one or more positioning elements (18) includes a shaft (18′) that is configured to be inserted into a respective insertion opening (24) of the first broad side surface (3) of the susceptor (2).

7. The susceptor arrangement of claim 6, wherein the shaft (18′) extends through an opening of a spacer element (20), with which the lowermost covering plate (6, 16, 36) is positioned at a gap distance to the first broad side surface (3) of the susceptor (2).

8. The susceptor arrangement of claim 6, wherein each of the one or more positioning elements (18) has a head (18″), which has an enlarged diameter in relation to the shaft (18′) and rests on the uppermost covering plate (17) or on the lowermost covering plate (16).

9. (canceled)

10. The susceptor arrangement of claim 2, wherein the one or more openings (9, 10) of the uppermost covering plate (7) are formed by blind holes.

11. The susceptor arrangement of claim 2, wherein the uppermost covering plate (7, 17) directly adjoins the lowermost covering plate (6, 16, 36).

12. A chemical vapor deposition (CVD) CVD reactor (1), comprising: a process chamber (28); a gas inlet organ (27) for introducing a process gas into the process chamber (28); the susceptor arrangement of claim 2; and a heating device (26) configured to heat a second broad side surface (3) of the susceptor (2) lying opposite the first broad side surface (3).

13. (canceled)

14. A chemical vapor deposition (CVD) reactor (1), comprising: a process chamber (28); a gas inlet organ (27) for introducing a process gas into the process chamber (28); the susceptor arrangement of claim 3; and a heating device (26) configured to heat a second broad side surface (3) of the susceptor (2) lying opposite the first broad side surface (3).

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0008] The invention will be explained in more detail below based upon exemplary embodiments. Shown on:

[0009] FIG. 1 is a schematic cross sectional view of a CVD reactor,

[0010] FIG. 2 is a perspective view of a susceptor arrangement, consisting of a susceptor 2 and several covering elements lying thereupon from various exemplary embodiments,

[0011] FIG. 3 is an exploded view of the susceptor arrangement shown on FIG. 2,

[0012] FIG. 4 is a top view of the susceptor arrangement,

[0013] FIG. 5 is the section according to line V-V on FIG. 4 to illustrate a first exemplary embodiment,

[0014] FIG. 6 is a magnified view of the VI cutout on FIG. 5,

[0015] FIG. 7 is a view according to FIG. 4,

[0016] FIG. 8 is the section according to line VIII-VIII on FIG. 7 to illustrate a second exemplary embodiment,

[0017] FIG. 9 is a magnified view of the IX cutout on FIG. 8,

[0018] FIG. 10 is a view according to FIG. 4,

[0019] FIG. 11 is the section according to the XI-XI line on FIG. 10 to illustrate a second exemplary embodiment,

[0020] FIG. 12 is a magnified view of the XII cutout on FIG. 11;

[0021] FIG. 13 is a magnified view of the XIII cutout on FIG. 11;

[0022] FIG. 14 is a view of an exemplary embodiment in which a lowermost covering plate 6 is adjacent to two substrate holders 4, and

[0023] FIG. 15 is an exemplary embodiment in which a lowermost covering plate 36 partially envelops a substrate holder 4.

DESCRIPTION OF THE EMBODIMENTS

[0024] FIG. 1 schematically depicts a CVD reactor 1 according to the invention with a housing, in which are located a gas inlet organ 27 for letting in process gases, a susceptor 2 for supporting substrates to be coated, and a heating device 29 for heating the susceptor 2. The susceptor 2 rests on a carrier 32, with which the susceptor 2 can be rotary driven around an axis.

[0025] Covering elements 5, 15 are located on the susceptor 2. In the drawings, the susceptor arrangement has varyingly designed covering elements 5, 15 for illustrating different variants of the invention. In reality, a susceptor arrangement preferably has exclusively covering elements 5, 15 that are designed identically to each other.

[0026] In the first exemplary embodiment shown on FIGS. 5 and 6, a covering element 5 consists of two flat bodies designed identically to each other, which consist of massive silicon carbide. The lowermost covering plate 16 has an underside that lies directly opposite a broad side 3 of the susceptor 2 consisting of graphite. A gap 11 is formed between the downwardly facing broad side surface of the lowermost covering plate 16 and the upwardly facing broad side 3 by a socket 21 or a spacer element 20.

[0027] The uppermost covering plate 17 is congruent to the lowermost covering plate 16. Both covering plates 16, 17 form peripheral edges that run on a circular arc line, which border a storage place of a substrate holder 4. As a result, the substrate holder 4 is inserted in a bag 22 having a bag floor into which undepicted gas lines empty, through which a purging gas can be fed, lifting the substrate holder 4 and rotationally driving it, suspended on a gas cushion. A centering pin can be inserted in the center of the floor of the bag 22, which engages into a centering opening on the underside of the substrate holder 4, so as to in this way form a rotational axis around which the substrate holder 4 can rotate when the purging gas is fed into the gap between the floor of the bag 22 and the underside of the substrate holder 4.

[0028] The two covering plates 16, 17 lying one over the other have openings 13, 19 that align with each other, which in turn align with insertion openings 24 in the broad side 3 of the susceptor 2. In the exemplary embodiment, a spacer element 20 lies between the lowermost covering plate 16 and broad side 3 or socket 21, and has an opening through which a shaft 18′ of a positioning element 18 reaches. The shaft 18′ of the positioning element 18 reaches through the two openings 13, 19 of the two covering plates 16, 17 lying one over the other. A head 18″ having a larger diameter than the shaft 18′ lies on the upwardly facing upper side of the uppermost covering plate 7. It forms a free surface that faces toward the process chamber 28. The positioning element 18 can be fabricated out of silicon carbide.

[0029] In the exemplary embodiment shown on FIGS. 8 and 9, a positioning element 18 with a shaft 18′ and a head 18″ only reaches through an opening 23 of a lowermost covering plate 6, so as to connect this lowermost covering plate 6 with the susceptor 2, while forming a gap 11 between the susceptor broad side 3 and the lowermost covering plate 6. For this purpose, the susceptor 2 has an insertion opening 24, into which the lower end of the shaft 18′ is inserted.

[0030] FIGS. 11 to 13 along with FIGS. 8 to 9 show an exemplary embodiment in which the uppermost covering plate 7 has a smaller surface extension than the lowermost covering plate 6. Here as well, it is provided that the stack comprised of two covering plates 6, 7 be connected with the susceptor with only two positioning elements 18. The opening 23 through which the shaft 18′ of the positioning element 18 reaches can have a somewhat larger diameter than the shaft 18′ of the positioning element 18, so that the constituents of the susceptor arrangement can move in relation to each other while heating up the susceptor 2.

[0031] FIGS. 11 to 13 show the attachment of a roughly triangular uppermost covering plate 7 to a lowermost covering plate 6. The uppermost covering plate 7 lies flatly on the lowermost covering plate. The uppermost covering plate 7 has two blind holes 9, 10. These are located on the underside of the uppermost covering plate 7. A first blind hole 10 is form fitted to an upper section 8″ of a positioning element that has the shape of a cylinder pin, and whose lower section 8′ is inserted into a form fitting opening 13 of the lowermost covering plate 6. The second blind hole 9 in the underside of the uppermost covering plate 7 is designed as an oblong hole, so that the two covering plates 6, 7 can move in relation to each other given a thermal expansion. The lowermost covering plate 6 and the uppermost covering plate 7 are connected with each other with precisely two positioning elements 8, wherein the positioning elements 8 are arranged one after the other in about a radial direction-relative to the center of rotation of the susceptor 2. However, it is also possible to arrange the positioning elements 8 one next to the other. For example, they can lie next to each other in an azimuthal direction.

[0032] One end face of the lower section 8′ of the positioning element 8 can support itself on the broad side 3 of the susceptor 2. The uppermost covering plate 7 should not be supported on the end face of the upper section 8″ of the positioning element 8, even if this might also be possible in variants that are not preferred. In this unpreferred variant, the respective floor of the second blind holes 9, 10 would support itself on this end face. This would not only make it possible to space the uppermost covering plate 7 apart from the lowermost covering plate 6 by means of a gap. The two pin-shaped positioning elements 8 could then also be completely covered by the uppermost covering plate 7. However, the uppermost covering plate 7 preferably lies on the lowermost covering plate 6. As a consequence, there is a distance between the end face of the upper section 8″ and the floor of the blind hole 9, 10.

[0033] Here as well, it can be provided that the positioning element 8 consist of silicon carbide. However, the positioning element 8 preferably consists of sapphire, unless it is exposed to the process chamber.

[0034] The two positioning elements 18 with which the lowermost covering plate 6 is fastened to the susceptor 2 define a line, which runs through the two openings 23 of the lowermost covering plate 6. The two positioning elements 8 with which the uppermost covering plate 7 is fastened to the lowermost covering plate 6 likewise define a line. The two lines are perpendicular to each other.

[0035] The lowermost covering plate 6 can have an outline contour identical to the lowermost covering plate 16. The lowermost covering plate 6 has two sections, in which the peripheral edge runs on a circular arc line, so that the lowermost covering plate 6 partially envelops two bags 22.

[0036] The uppermost covering plate 7 lying on the lowermost covering plate 6 has two edges 30 that meet at an acute angle, which run along a straight line. The edges 30 each flank channels 31, into which fork arms of a fork of a gripping arm can engage, with which a substrate holder 4 can be lifted out of the bag 22 that stores it.

[0037] FIGS. 2 and 3 further show additional covering plates 25, 26, which likewise have rounded edges that flank a bag 22.

[0038] FIG. 14 shows a susceptor 2 with five substrate holders 4 arranged thereupon, which each are inserted into a storage bag. The lowermost covering plate 6 is designed in such a way as to have two arced peripheral edges, with which two substrate holders 4 or storage bags are partially enveloped. In this exemplary embodiment, a storage bag or a substrate holder 4 arranged therein is partially enveloped by a total of four covering plates, specifically the two radially outer covering plates 6 and two radially inner covering plates 25. A gap forms 33, at which the two radially outer covering plates 6 adjoin each other.

[0039] FIG. 15 shows an exemplary embodiment for a susceptor 2 in which a substrate holder 4 or the storage bag that accommodates the substrate holder 4 adjoins three covering plates 36, 25. A radially outer covering plate 36 has an arc-shaped opening that partially envelops the substrate holder 4. In this exemplary embodiment, the substrate holder 4 is partially enveloped by precisely one radially outer covering plate 36.

[0040] The covering plate 36 is a lower covering plate, on which upper covering plates or precisely one upper covering plate can lie. Provided between two adjacent covering plates 36 is an additional, roughly triangular covering plate 34, which adjoins the two covering plates 36 with the formation of a gap 35. In this exemplary embodiment, the covering plate 34 does not adjoin a substrate holder 4.

[0041] The above statements serve to explain the inventions covered by the application as a whole, which each also independently advance the prior art at least by the following feature combinations, wherein two, several or all of these feature combinations can also be combined, specifically:

[0042] A susceptor arrangement, characterized in that the at least one covering element 5, 15 comprises a lowermost covering plate 6, 16, 36, which adjoins the first broad side surface 3 of the susceptor 2, and an uppermost covering plate 7, 17, which at least regionally overlaps the lowermost covering plate 6, 16, 36 and forms a free broad side surface 14 of the susceptor arrangement.

[0043] A susceptor arrangement, characterized in that the two covering plates 6, 16, 36, 7, 17 consist of SiC, quartz, Al.sub.2O.sub.3, ZrO.sub.2 or SiC-coated graphite or some other suitable ceramic, crystalline or amorphous material.

[0044] A susceptor arrangement, characterized in that the lowermost covering plate 6 has a larger surface extension than the uppermost covering plate 7, and the latter lies flatly on the former.

[0045] A susceptor arrangement, characterized by storage bags 22 arranged on the first susceptor broad side 3 for storing the substrate holder 4, wherein at least one of the lowermost covering plates 6 partially envelops two different storage bags 22 or one or precisely one storage bag 22.

[0046] A susceptor arrangement, characterized in that a lowermost covering plate 16 that partially envelops at least two storage bags 22 and an uppermost covering plate 17 carried by the latter have the same layout.

[0047] A susceptor arrangement, characterized by one or several positioning elements 8, 18 for tying an uppermost covering plate 7, 17 to a lowermost covering plate 6, 16, 36 and/or for tying at least one lowermost covering plate 6, 16 and an uppermost covering plate 7, 17 lying thereupon to the susceptor 2.

[0048] A susceptor arrangement, characterized in that the positioning element 18 forms a shaft 18′ that can be inserted into an insertion opening 24 of the first susceptor broad side 3, with it being provided in particular that the shaft 18′ reach through an opening of a spacer element 20, with which the lowermost covering plate 6, 16, 36 is positioned at a gap distance to the first susceptor broad side 3 and/or that the positioning element 18 has a head 18″, which has an enlarged diameter in relation to the shaft 18′ and lies on the uppermost covering plate 17 or on the lowermost covering plate 16.

[0049] A susceptor arrangement, characterized in that the lowermost covering plate 6, 16, 36 has two openings 12, 13 spaced apart from each other, into which respectively form fitting lower sections 8′ of a positioning element 8 engage, whose end face lies on the first susceptor broad side 3, and that the uppermost covering plate 7 has openings corresponding thereto, of which a first opening 10 is form fitting to an upper section 8″ of the positioning element, and a second opening 9 is designed as an oblong hole, with it being provided in particular that the two openings 9, 10 of the uppermost covering plate 7 be formed by blind holes.

[0050] A susceptor arrangement, characterized in that the uppermost covering plate 7, 17 directly adjoins the lowermost covering plate 6, 16, 36.

[0051] A CVD reactor, characterized in that the at least one covering element 5, 15 has a lowermost covering plate 6, 16, 36 that directly adjoins the first broad side 3 of the susceptor 2, and an uppermost covering plate 7, 17 that covers the lowermost covering plate 6, 16, 36 and forms a free broad side surface of the susceptor arrangement, in particular according to one of the preceding claims 1 to 9.

[0052] All disclosed features (whether taken separately or in combination with each other) are essential to the invention. The disclosure of the application hereby also incorporates the disclosure content of the accompanying/attached priority documents (copy of the prior application) in its entirety, also for the purpose of including features of these documents in claims of the present application. Even without the features of a referenced claim, the subclaims characterize standalone inventive further developments of prior art with their features, in particular so as to submit partial applications based upon these claims. The invention indicated in each claim can additionally have one or several of the features indicated in the above description, in particular those provided with reference numbers and/or indicated on the reference list. The invention also relates to design forms in which individual features specified in the above description are not realized, in particular if they are recognizably superfluous with regard to the respective intended use, or can be replaced by other technically equivalent means.

REFERENCE LIST

[0053]

TABLE-US-00001 1 CVD reactor 2 Susceptor 3 First broad side 4 Substrate holder 5 Covering element 6 Lowermost covering plate 7 Uppermost covering plate 8 Positioning element 8′ Lower section 8″ Upper section 9 Oblong hole, blind hole 10 Form-fit blind hole 11 Gap 12 Opening 13 Opening 14 Free broad side surface 15 Covering element 16 Lowermost covering plate 17 Uppermost covering plate 18 Positioning element 19 Opening 20 Spacer element 21 Socket 22 Bag 23 Opening 24 Insertion opening 25 Covering plate 26 Covering plate 27 Gas inlet organ 28 Process chamber 29 Heating device 30 Edge 31 Channel 32 Carrier 33 Gap 34 Covering plate 35 Gap 36 Lower covering plate