BONDED BODY AND ACOUSTIC WAVE ELEMENT

Abstract

A bonded body includes a supporting substrate, piezoelectric material substrate and a multilayer film, between the supporting substrate and piezoelectric material substrate. The multilayer film includes a lamination structure having a first layer, second layer, third layer and fourth layer in the order. The first layer and third layer are composed of silicon oxides, and the second layer and fourth layer are composed of metal oxides. The refractive index of the second layer is higher than the refractive index of the first layer and refractive index of the third layer. The refractive index of the second layer is different from the refractive index of the fourth layer.

Claims

1. A bonded body comprising: a supporting substrate; a piezoelectric material substrate; and a multilayer film between said supporting substrate and said piezoelectric material substrate, wherein said multilayer film comprises a lamination structure comprising a first layer, a second layer, a third layer and a fourth layer in the order; wherein said first layer and said third layer comprise silicon oxides, respectively; wherein said second layer and said fourth layer comprise metal oxides, respectively; wherein a refractive index of said second layer is higher than a refractive index of said first layer and a refractive index of said third layer; and wherein said refractive index of said second layer is different from a refractive index of said fourth layer.

2. The bonded body of claim 1, wherein said multilayer film comprises a plurality of said lamination structures.

3. The bonded body of claim 1, wherein said metal oxides comprise hafnium oxide, tantalum oxide or zirconium oxide.

4. The bonded body of claim 1, wherein a difference of said refractive index of said second layer and said refractive index of said first layer is 0.3 to 0.8.

5. The bonded body of claim 1, wherein a difference of said refractive index of said second layer and said refractive index of said fourth layer is 0.02 or larger.

6. The bonded body of claim 1, wherein each of a thickness of said first layer, a thickness of said second layer, a thickness of said third layer and a thickness of said fourth layer is 20 nm or larger and 300 nm or smaller.

7. The bonded body of claim 1, further comprising a bonding layer having a composition of Si.sub.(1-v) O.sub.v(0.008≤v≤0.408) between said piezoelectric material substrate and said supporting substrate.

8. An acoustic wave device comprising: the bonded body of claim 1; and an electrode provided on said piezoelectric material substrate.

9. The acoustic wave device of claim 8 used for an acoustic wave of a frequency of 3.5 to 6 GHz.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0025] FIG. 1(a) shows the state that a multilayer film 22 is provided on a piezoelectric material substrate 1, FIG. 1(b) shows the state that a bonding layer 4 is provided on the multilayer film 22, and FIG. 1(c) shows the state that a surface of the bonding layer 4 is activated.

[0026] FIG. 2(a) shows the state that a surface of a supporting substrate 6 is activated, and FIG. 2(b) shows a bonded body 9 of the supporting substrate and piezoelectric material substrate.

[0027] FIG. 3(a) shows the state that a piezoelectric material substrate 1A of a bonded body 9A is thinned by the processing, and FIG. 3(b) shows the state that an electrode is provided on the bonded body 9A.

[0028] FIG. 4(a) shows a bonded body 9B obtained by directly bonding a bonding layer 4 provided on a multilayer film and a bonding layer 14 provided on the supporting substrate 6, and FIG. 4(b) shows an acoustic wave device 10B obtained by providing electrodes 11 on the piezoelectric material substrate 1A of the bonded body 9B.

[0029] FIG. 5(a) shows a bonded body 9C obtained by directly bonding the multilayer film 22 and supporting substrate 6, and FIG. 5(b) shows the state that electrodes are provided on the piezoelectric material substrate 1A of the bonded body 9C.

[0030] FIG. 6 is a chart showing the distribution of refractive index obtained by optical ellipsometry in the case that the refractive indices of second and fourth layers are different.

[0031] FIG. 7 is a chart showing the distribution of refractive index obtained by optical ellipsometry in the case that the refractive indices of the second and fourth layers are the same and relatively low.

[0032] FIG. 8 is a chart showing the distribution of refractive index obtained by optical ellipsometry in the case that the refractive indices of the second and fourth layers are the same and relatively high.

MODES FOR CARRYING OUT THE INVENTION

[0033] The present invention will be described in detail, appropriately referring to the drawings.

[0034] As shown in FIG. 1(a), a piezoelectric material substrate 1 has a pair of surfaces 1a and 1b. A multilayer film 22 is film-formed on one surface 1a. According to the present example, the multilayer film 22 is obtained by providing, for example, two lamination structures on the piezoelectric material substrate 1. Each of the laminated structures 2 has the structure of alternately providing a first layer 3A, second layer 7A, third layer 3B and fourth layer 7B from the side of the piezoelectric material substrate 1. Further, although the first layer, second layer, third layer and fourth layer are laminated in the order from the side of the piezoelectric material substrate according to the present example, the fourth layer, third layer, second layer and first layer may be laminated in the order from the side of the piezoelectric material substrate 1.

[0035] As shown in FIG. 1(b), a bonding layer 4 may be further provided on the surface 22a of the multilayer film 22. In this case, as shown in FIG. 1(c), neutralized beam is irradiated onto the surface of the bonding layer 4 as arrows A, so that the surface of the bonding layer 4 is activated to provide an activated surface 5.

[0036] Further, as shown in FIG. 2(a), neutralized beam is irradiated onto the surface of the supporting substrate 6 as arrows B, so that the surface of the supporting substrate 6 is activated to provide an activated surface 6a. Then, as shown in FIG. 2(b), the activated surface 5 of the bonding layer 4 and activated surface 6a of the supporting substrate 6 are directly contacted under pressure, to obtain a bonded body 9 shown in FIG. 2(b). An arrow C indicates a bonding interface.

[0037] According to a preferred embodiment, the surface 1b of the piezoelectric material substrate 1 of the bonded body 9 is further subjected to polishing process to reduce the thickness of a piezoelectric material substrate 1A to obtain a bonded body 9A, as shown in FIG. 3(a). 1c represents a polished surface. As shown in FIG. 3(b), predetermined electrodes 11 are formed on the polished surface 1c of the piezoelectric material substrate 1A to produce an acoustic wave device 10A.

[0038] According to a preferred embodiment, a bonding layer 14 is provided on the supporting substrate so that the bonding layer 14 is directly bonded with the bonding layer on the multilayer film. It is thus possible to obtain a bonded body 9B shown in FIG. 4(C). The bonding interface is indicated by an arrow C. As shown in FIG. 4(b), an acoustic wave device 10B can be obtained by providing the electrodes 11 on the piezoelectric material substrate 1A of the bonded body.

[0039] Further, according to a preferred embodiment, the supporting substrate and multilayer film are directly bonded. It is thereby provided a bonded body 9C shown in FIG. 5(a). The bonding interface is shown by an arrow C. As shown in FIG. 5(b), an acoustic wave device 10C can be obtained by providing the electrodes 11 on the piezoelectric material substrate 1A of the bonded body.

[0040] According to the present invention, the multilayer film provided between the supporting substrate and piezoelectric material substrate includes a first layer, second layer, third layer and fourth layer in the order, the first layer and third layer are composed of silicon oxides, second layer and fourth layer are composed of metal oxides, the refractive index of the second layer is higher than the refractive index of the first layer and refractive index of the third layer, and the refractive index of the second layer is made different from the refractive index of the fourth layer. The first layer, second layer, third layer and fourth layer may be arranged from the side of the supporting substrate to the side of the piezoelectric material substrate in the order, or alternatively may be arranged in the order from the side of the piezoelectric material substrate to the side of the supporting substrate.

[0041] The silicon oxides forming the first layer and third layer may preferably have a composition of SiOx (1.80≤x≤2.50).

[0042] Further, although the metal oxides forming the second layer and fourth layer are not particularly limited, the metal oxides may more preferably be hafnium oxide, tantalum oxide or zirconium oxide, on the viewpoint of improving Q value.

[0043] Here, the composition of the hafnium oxide may preferably be HfO.sub.z (1.80≤z≤2.50). The composition of the tantalum oxide may preferably be Ta.sub.2O.sub.y (4.60≤y≤5.50). Further, the composition of the zirconium oxide may preferably be ZrO.sub.z (1.80≤z≤2.50).

[0044] According to a preferred embodiment, the multilayer film includes a plurality of the lamination structures. The modulation of the refractive indices is thus made effective so that the Q-value can be improved effectively. The number of the lamination structures of the multilayer film may preferably 2 or larger. However, as the number of the lamination structures is too large, the effect of restricting the piezoelectric material substrate by the supporting substrate is reduced, so that the number of the lamination structures may preferably 5 or smaller and more preferably 3 or smaller.

[0045] On the viewpoint of the present invention, the difference of the refractive index of the second layer and refractive index of the first layer or the refractive index of the third layer may preferably be 0.2 or larger and more preferably be 0.3 or larger. Further, the difference of the refractive index of the second layer and the refractive index of the first layer or the refractive index of the third layer may preferably be 0.8 or smaller and more preferably be 0.6 or smaller.

[0046] On the viewpoint of the present invention, the difference of the refractive index of the fourth layer and the refractive index of the second layer may preferably be 0.02 or larger and more preferably be 0.03 or larger. Further, the difference may preferably be 0.10 or smaller.

[0047] The first layer and third layer are composed of silicon oxides, and the refractive indices are usually 1.40 to 1.58. It is preferred that the refractive index of the first layer and refractive index of the third layer are substantially the same, and on the viewpoint, the difference of the first layer and the refractive index of the third layer may preferably be 0.01 or smaller. Further, as the Q value can be further improved by providing a difference between the refractive index of the first layer and refractive index of the third layer, on the viewpoint, the difference of the refractive indices of the first layer and third layer may preferably be 0.02 or larger and more preferably be 0.03 or larger. However, the difference may preferably be 0.10 or smaller.

[0048] The refractive indices of the respective layers are to be measured under the following conditions.

[0049] The measurement is performed by a high-speed spectroscopic ellipsometer using the following system under the following measurement conditions.

“System”

[0050] “M-2000” (J. A. Woollam Corporation), Rotation compensation type

“Measurement conditions”

[0051] Incident angle: 65, 70, 75 degrees

[0052] Wavelength for measurement: 195 to 1680 nm

[0053] Beam size: 2 mm×8 mm

[0054] Thereafter, the following analysis is performed.

“Analytical Model”

[0055] Metal oxide/silicon oxide/metal oxide/silicon oxide/metal oxide/silicon oxide/metal oxide/silicon oxide/substrate

“Analysis Method”

[0056] The spectrum of the measured Δ (difference of phase) and φ (amplitude reflectance) is compared with (Δ, φ) calculated based on the analytical model described above, and the dialectic function and film thickness are changed to perform the fitting so as to approach the measured value (Δ, φ). As to the optical constants of the respective films, the value obtained by the reference during the formation of a single layer is made an initial value. The wavelength dispersion of the refractive index is obtained as the result where the measured value and theoretical value are best-fitted (average square error is converged at the minimum value).

[0057] The thickness of the first layer, thickness of the second layer, thickness of the third layer and thickness of the fourth layer may preferably be 20 nm or larger and more preferably be 100 nm or larger. Further, as the thickness of each layer is too large, the restriction of the piezoelectric material substrate by the supporting substrate is weak. On the viewpoint, the thickness of each layer may preferably be 300 nm or smaller.

[0058] Although the film-forming method of the first layer, second layer, third layer and fourth layer forming the multilayer film is not limited, sputtering method, chemical vapor deposition (CVD) method and vapor deposition may be listed. For example, in the case of sputtering, the refractive index of the second layer and refractive index of the fourth layer can be changed depending on the presence of absence of the bias voltage. That is, the refractive indices of the metal oxide layers can be made relatively high by applying the bias voltage, and the refractive indices of the metal oxide layers can be lowered by not applying the bias voltage. Further, in the case of ion assisted vapor deposition, the refractive index of each layer can be adjusted by adjusting the assist energy. That is, the refractive index of the metal oxide layer can be made relatively high by increasing the assist energy, and the refractive index of the metal oxide layer can be lowered by reducing the assist energy.

[0059] The specific production conditions of the respective layers forming the multilayer film are appropriately selected depending on the specification of a chamber. According to a preferred embodiment, the total pressure is made 0.28 to 0.34 Pa, the partial pressure of oxygen is made 1.2×10.sup.−3 to 5.7×10.sup.2 Pa, and the film-forming temperature is made ambient temperature.

[0060] According to a preferred embodiment, one or plural bonding layer(s) may be provided between the piezoelectric material substrate and supporting substrate. The material of such bonding layer may be as follows.

[0061] Si.sub.(1-v) O.sub.v, Ta.sub.2O.sub.5, Al.sub.2O.sub.3, Nb.sub.2O.sub.5, TiO.sub.2

[0062] According to a preferred embodiment, the bonding layer provided between the supporting substrate and piezoelectric material substrate has a composition of Si.sub.(1-v) O.sub.v (0.008≤v≤0.408).

[0063] The oxygen ratio of the composition is made considerably lower than the oxygen ratio of SiO.sub.2 (corresponding with v of 0.667). The insulating property of the bonding layer can be further improved by further interposing the bonding layer composed of the silicon oxide having such composition of Si.sub.(1-v) O.sub.v.

[0064] In the composition of Si.sub.(1-v) O.sub.v forming each layer, in the case that v is lower than 0.008, the electrical resistance of the bonding layer becomes low. Thus, v may preferably be 0.008 or higher, more preferably be 0.010 or higher, particularly preferably be 0.020 or higher, and most preferably be 0.024 or higher. Further, as the bonding strength is further improved by making v 0.408 or lower, v may preferably be 0.0408 or lower, and more preferably be 0.225 or lower.

[0065] Although the thickness of each bonding layer is not particularly limited, the thickness may preferably be 0.01 to 10 μm and more preferably be 0.01 to 0.5 μm, on the viewpoint of the production cost.

[0066] Although the film-forming method of the respective bonding layers is not limited, sputtering method, chemical vapor deposition method and vapor deposition may be listed. Here, particularly preferably, the content of oxygen gas flown in a chamber is adjusted during the reactive sputtering applying Si as a sputtering target, so that it is possible to control the oxygen ratio (v) of each bonding layer.

[0067] Although the specific production condition of each bonding layer is appropriately selected depending on the specification of the chamber, according to a preferred example, the total pressure is made 0.28 to 0.34 Pa, the partial pressure of oxygen is made 1.2×10.sup.−3 to 5.7×10.sup.−2 Pa, and the film-forming temperature is made ambient temperature. Further, B-doped Si may be listed as the Si target.

[0068] The oxygen concentration of the bonding layer is measured by means of EDS under the following conditions. Measuring system:

[0069] Elementary analysis is performed by means of an elementary analysis system “JEM-ARM200F” supplied by JEOL Ltd.

Measurement Conditions:

[0070] A sample of a thinned piece is observed by FIB (Focused Ion Beam method) at an accelerating voltage of 200 kV.

[0071] According to the present invention, the supporting substrate may be composed of a monocrystalline or polycrystalline material. The material of the supporting substrate may preferably be selected from the group consisting of silicon, sialon, sapphire, cordierite, mullite and alumina. The alumina may preferably be translucent alumina.

[0072] Silicon may be monocrystalline silicon, polycrystalline silicon or high-resistance silicon.

[0073] Sialon is a ceramic material obtained by sintering mixture of silicon nitride and alumina and has the following composition.

Si.sub.6-wAl.sub.wO.sub.wN.sub.8-w

[0074] That is, sialon has the composition of mixed alumina with silicon nitride, and w indicates the ratio of mixed alumina. w may more preferably be 0.5 or more. Further, w may more preferably be 4.0 or less.

[0075] Sapphire is a single crystal having the composition of Al.sub.2O.sub.3, and alumina is a polycrystal having the composition of Al.sub.2O.sub.3. Cordierite is ceramics having the composition of 2MgO.2Al.sub.2O.sub.3.5SiO.sub.2. Mullite is ceramics having the composition in a range of 3Al.sub.2O.sub.3.2SiO.sub.2 to 2Al.sub.2O.sub.3.SiO.sub.2.

[0076] Although the material of the piezoelectric material substrate is not limited as far as it has necessary piezoelectricity, the material may preferably be a single crystal having the composition of LiAO.sub.3. Here, A represents one or more elements selected from the group consisting of niobium and tantalum. Thus, LiAO.sub.3 may be lithium niobate, lithium tantalate or lithium niobate-lithium tantalate solid solution.

[0077] Respective constituents of the present invention will be described further in detail below.

[0078] The application of the bonded body of the present invention is not particularly limited and, for example, it may preferably be applied as an acoustic wave device or optical device.

[0079] As the acoustic wave device, a surface acoustic wave device, Lamb wave-type device, thin film resonator (FBAR) or the like is known. For example, the surface acoustic wave device is produced by providing input side IDT (Interdigital transducer) electrodes (also referred to as comb electrodes or interdigitated electrodes) for oscillating surface acoustic wave and IDT electrodes on the output side for receiving the surface acoustic wave on the surface of the piezoelectric material substrate. By applying high frequency signal on the IDT electrodes on the input side, electric field is generated between the electrodes, so that the surface acoustic wave is oscillated and propagated on the piezoelectric material substrate. Then, the propagated surface acoustic wave is drawn as an electrical signal from the IDT electrodes on the output side provided in the direction of the propagation.

[0080] A metal film may be provided on a bottom surface of the piezoelectric material substrate. After the Lamb type device is produced as the acoustic wave device, the metal film plays a role of improving the electro-mechanical coupling factor near the bottom surface of the piezoelectric material substrate. In this case, the Lamb type device has the structure that interdigitated electrodes are formed on the surface of the piezoelectric material substrate and that the metal film on the piezoelectric material substrate is exposed through a cavity provided in the supporting body. Materials of such metal films include aluminum, an aluminum alloy, copper, gold or the like, for example. Further, in the case that the Lamb wave type device is produced, it may be used a composite substrate having the piezoelectric single crystal substrate without the metal film on the bottom surface.

[0081] Further, a metal film and an insulating film may be provided on the bottom surface of the piezoelectric material substrate. The metal film plays a role of electrodes in the case that the thin film resonator is produced as the acoustic wave device. In this case, the thin film resonator has the structure that electrodes are formed on the upper and bottom surfaces of the piezoelectric material substrate and the insulating film is made a cavity to expose the metal film on the piezoelectric material substrate. Materials of such metal films include molybdenum, ruthenium, tungsten, chromium, aluminum or the like, for example. Further, materials of the insulating films include silicon dioxide, phosphorus silicate glass, boron phosphorus silicate glass or the like.

[0082] Further, as the optical device, it may be listed an optical switching device, wavelength conversion device and optical modulating device. Further, a periodic domain inversion structure may be formed in the piezoelectric material substrate.

[0083] In the case that the object of the present invention is an acoustic wave device and that the piezoelectric material substrate is made of lithium tantalate, it is preferred to use the substrate rotated from Y-axis to Z-axis by 123 to 133° (for example 128°) around X-axis, which is a direction of propagation of a surface acoustic wave, because of a low propagation loss.

[0084] Further, in the case that the piezoelectric material substrate is made of lithium niobate, it is preferred to use the substrate rotated from Y-axis to Z-axis by 86 to 94° (for example 90°) around X-axis, which is the direction of propagation of the surface acoustic wave, because of a lower propagation loss. Further, although the size of the piezoelectric material substrate is not particularly limited, for example, the diameter may be 50 to 150 mm and thickness may be 0.2 to 60 μm.

[0085] The following method is preferred to obtain the inventive bonded body.

[0086] First, the respective surfaces to be bonded (the surface of the multilayer film, surface of the bonding layer, surface of the piezoelectric material substrate and surface of the supporting substrate) are flattened to obtain flat surfaces. Here, the method of flattening the respective surfaces includes lapping, chemical mechanical polishing (CMP) and the like. Further, the flat surfaces may preferably have Ra of 1 nm or lower and more preferably be 0.3 nm or lower.

[0087] Then, for removing the residue of a polishing agent and processing denatured layer, the respective surfaces of the respective bonding layers are cleaned. The method of cleaning the surfaces includes wet cleaning, dry cleaning, scrub cleaning or the like, and the scrub cleaning is preferred on the viewpoint of obtaining cleaned surface easily and effectively. At this time, it is particularly preferred to use “Sun Wash LH540” as the cleaning agent and then to perform the cleaning by means of a scrub cleaning machine by mixed solution of acetone and IPA.

[0088] Then, neutralized beam is irradiated onto the respective surfaces to activate the respective surfaces.

[0089] When the activation of the surfaces is performed by the neutralized beam, it is preferred to use a system described in Patent Document 2 to generate the neutralized beam, which is irradiated. That is, it is used a high-speed atomic beam source of saddle field type as the beam source. Then, inert gas is introduced into the chamber and a high voltage is applied onto electrodes from a direct current electric source. By this, electric field of saddle field type generated between the electrode (positive electrode) and a housing (negative electrode) causes motion of electrons, e, so that atomic and ion beams derived from the inert gas are generated. Among the beams reached at a grid, the ion beam is neutralized at the grid, and the beam of neutral atoms is emitted from the high-speed atomic beam source. The atomic specie providing the beam may preferably be an inert gas (argon, nitrogen or the like).

[0090] In the activation step by beam irradiation, the voltage may preferably be made 0.5 to 2.0 kV, and the current may preferably be made 50 to 200 mA.

[0091] Then, the activated bonding surfaces are contacted and bonded with each other under vacuum atmosphere. The temperature at this time is ambient temperature, may specifically and preferably be 40° C. or lower and more preferably 30° C. or lower. Further, the temperature during the bonding may more preferably be 20° C. or higher and 25° C. or lower. The pressure at the bonding is preferably 100 to 20000N.

EXAMPLES

Preliminary Experiment

[0092] First, a silicon oxide layer or hafnium oxide layer was film-formed on a piezoelectric material substrate to record the film-forming conditions that the respective layers described below were obtained. However, the bias voltages were adjusted as follows, for adjusting the refractive index of the hafnium oxide layer.

[0093] Silicon oxide layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.52

[0094] Hafnium oxide layer (HfO.sub.2): bias voltage; 100V, thickness; 150 nm, refractive index; 2.07

[0095] Hafnium oxide layer (HfO.sub.2): bias voltage; 200V: thickness; 150 nm, refractive index; 2.12

[0096] Hafnium oxide layer (HfO.sub.2): bias voltage; 400V: thickness; 150 nm, refractive index 2.15

Inventive Example A1

[0097] Then, a surface acoustic wave device was produced according to the method described referring to FIGS. 1 to 3.

[0098] Specifically, it was applied a lithium tantalate substrate (LT substrate) having an OF part, a diameter of 4 inches and a thickness of 250 μm, as the piezoelectric material substrate 1. As the LT substrate, it was applied a 128° Y-cut X-propagation LT substrate whose propagating direction of the acoustic surface wave (SAW) was made X and the cutting angle was made the rotated Y-cut substrate. The surface 1a of the piezoelectric material substrate 1 was subjected to mirror polishing so that the arithmetic average surface roughness Ra reached 0.3 nm. Further, Ra was measured by means of an atomic force microscope (AFM) in a visual field of 10 μm×10 μm.

[0099] Then, two laminated structures were formed sequentially on the piezoelectric material substrate 1 by sputtering method to obtain the multilayer film 22. Further, The first layer composed of silicon oxide was film-formed on the piezoelectric material substrate first, and the second layer, third layer and fourth layer were formed in the order. The thickness and refractive index of each layer were adjusted as follows based on the preliminary experiment.

[0100] First layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0101] Second layer (HfO.sub.2): thickness 150 nm, refractive index; 2.12

[0102] Third layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0103] Fourth layer (HfO.sub.2): thickness; 150 nm, refractive index 2.07

[0104] The bonding layer 4 was film-formed on the multilayer film 2. Specifically, direct current sputtering method was applied and boron-doped Si was applied as the target. Further, oxygen gas was introduced as the oxygen source. At this time, the amount of the introduced oxygen gas was adjusted to control the total pressure of atmosphere and partial pressure of oxygen in a chamber. The thickness of the bonding layer 4 was 50 nm. The arithmetic average roughness Ra of the surface of the bonding layer 4 was 0.2 to 0.6 nm. Then, the bonding layer 4 was subjected to chemical mechanical polishing (CMP) until the film thickness was made 80 to 190 nm and Ra was made 0.08 to 0.4 nm.

[0105] Further, it was prepared the supporting substrate 6 having an orientation flat (OF) part, a diameter of 4 inches, a thickness of 500 μm and composed of silicon. The surface of the supporting substrate 6 was finished by chemical mechanical polishing (CMP) so that the arithmetic average roughness Ra was 0.2 nm.

[0106] Then, neutralized beam was irradiated onto the surface of the bonding layer 4 and onto the Si substrate as the supporting substrate 6 to activate the surfaces, which were directly bonded.

[0107] Specifically, the surface of the bonding layer 4 and surface of the supporting substrate 6 were cleaned to remove the contamination, followed by introduction into a vacuum chamber. After it was evacuated to the order of 10.sup.−6 Pa, high-speed atomic beam (acceleration voltage of 1 kV and Ar flow rate of 27 sccm) was irradiated onto the surfaces over 120 sec. Then, after the beam-irradiated surface (activated surface) of the bonding layer 4 and activated surface of the supporting substrate 6 were contacted with each other, the substrates were bonded by pressurizing at 10000N for 2 minutes. Then, the thus obtained bonded bodies of the respective examples were heated at 100° C. for 20 hours. The thus obtained bonded bodies were subjected to measurement by means of an optical ellipsometry to obtain a chart of refractive index shown in FIG. 6.

[0108] Then, the surface of the piezoelectric material substrate 1 was subjected to grinding and polishing from the initial 250 μm to 1 μm. Then, electrode patterns for measurement were formed to obtain acoustic surface wave devices. Then, the Q value was measured at a frequency of 5.5 GHz and shown in table 1.

[0109] Further, the Q value was measured as follows.

[0110] A surface acoustic wave resonator was produced on a wafer and the frequency characteristic was measured by means of a network analyzer. The resonance frequency f.sub.r and its half value width Δf.sub.r were calculated based on the thus obtained frequency characteristics, and f.sub.r/Δf.sub.r was obtained to provide the Q value.

Inventive Example A2

[0111] The bonded body and surface acoustic wave device were obtained according to the same procedure as that of the inventive example A1. However, the respective layers forming the multilayer film were adjusted as follow. The Q value of the thus obtained device at a frequency of 5.5 GHz was measured and shown in table 1.

[0112] First layer (SIO.sub.2): thickness; 150 nm, refractive index; 1.53

[0113] Second layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.15

[0114] Third layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0115] Fourth layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.05

Comparative Example A1

[0116] The bonded body and surface acoustic wave device were obtained according to the same procedure as that of the inventive example A1. Further, the respective layers forming the multilayer film were adjusted as follows. The thus obtained bonded body was measured by means of optical ellipsometry to obtain a chart of refractive index shown in FIG. 7. Further, the Q value of the thus obtained device at a frequency of 5.5 GHz was measured and shown in table 1.

[0117] First layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0118] Second layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.07

[0119] Third layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0120] Fourth layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.07

Comparative Example A2

[0121] The bonded body and surface acoustic wave device were obtained according to the same procedure as that of the inventive example A1. However, the respective layers forming the multilayer film were adjusted as follows. The thus obtained bonded body was measured by means of optical ellipsometry to obtain a chart of refractive index shown in FIG. 8. Further, the Q value of the thus obtained device at a frequency of 5.5 GHz was measured and shown in table 1.

[0122] First layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0123] Second layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.12

[0124] Third layer (SiO.sub.2): thickness; 150 nm, refractive index; 1.53

[0125] Fourth layer (HfO.sub.2): thickness; 150 nm, refractive index; 2.12

TABLE-US-00001 TABLE 1 Refractive index of hafnium Refractive index of hafnium oxide layer 7A (lamination oxide layer 7B (lamination Result of structure on the lower structure on the lower evaluation side)/(lamination structure side)/(lamination structure of Q on the upper side) on the upper side) value Comparative 2.07/2.07 2.07/2.07 Standard Example A1 (±0%) Comparative 2.12/2.12 2.12/2.12 ±0% Example A2 Inventive 2.12/2.12 2.07/2.07 +20%  Example A1 Inventive 2.15/2.15 2.05/2.05 +8% Example A2

[0126] As shown in table 1, according the comparative example A1, as the refractive indices of the second layer and fourth layer were adjusted at lower values, the refractive indices of the second layer and fourth layers were on the same order as those obtained in the preliminary experiment as shown in FIG. 7.

[0127] According to the comparative example A2, as the refractive indices of the second layer and fourth layer were adjusted at higher values, the refractive indices of the second layer and fourth layer were on the same order of the refractive indices obtained in the preliminary experiment as shown in FIG. 8. Further, the Q value was same as that in the comparative example A1, and the effect by the increase of the refractive indices was not observed.

[0128] According to the inventive example A1, the distribution of refractive index shown in FIG. 6 was obtained.

[0129] Further, as shown in table 1, it was proved that the Q value was improved by as large as 20% with respect to the standard value.

[0130] According to the inventive example A2, as the refractive index of the second layer and refractive index of the fourth layer were changed, it was observed the modulation of the refractive index viewed in the direction of thickness similar to that of FIG. 6.

[0131] Further, as shown in table 1, it was proved that the Q value was considerably improved with respect to the standard value.

Inventive Examples B1, B2 and Comparative Examples B1 and B2

[0132] In the inventive examples A1 and A2 and comparative examples A1 and A2, the material of the second layer was changed from HfO.sub.2 to Ta.sub.2O.sub.5. Then, as the Q value of the thus obtained devices were measured, results similar to those of the inventive examples A1 and A2 and comparative examples A1 and A2 were obtained.

Inventive Examples C1 and C2 and Comparative Examples C1 and C2

[0133] In the inventive examples A1 and A2 and comparative examples A1 and A2, the material of the second layer was changed from HfO.sub.2 to ZrO.sub.2. Then, as the Q value of the thus obtained device was measured, the results similar to those of the inventive examples A1 and A2 and comparative examples A1 and A2 were obtained.