VAPOR CHAMBER ASSEMBLY

Abstract

The invention provides a vapor chamber assembly (1000) comprising two sections (1200) and one or more vapor chamber elements (100), wherein each section (1200) comprises at least part of the one or more vapor chamber elements (100), wherein each vapor chamber element (100) comprises a vapor chamber (200) at least partly defined by two parallel configured plate parts (211, 221), wherein the two sections (1200) define a bend (1100), wherein the bend (1100) has a bend angle ab, wherein 0°≤α.sub.b<180°.

Claims

1. A vapor chamber assembly comprising two sections and one or more vapor chamber elements, wherein each section comprises at least part of the one or more vapor chamber elements, wherein each vapor chamber element comprises a vapor chamber at least partly defined by two parallel configured plate parts, wherein the two sections define a bend, wherein the bend has a bend angle α.sub.b, wherein α.sub.b<180 º; wherein the two sections together define at least part of one of the one or more vapor chamber elements; and wherein each of the two sections comprises a vapor chamber element part, wherein the vapor chamber element parts taper towards the bend, and wherein the vapor chamber element parts define at least part of the one of the one or more vapor chamber elements, and wherein α.sub.b ≥ 45 º.

2. The vapor chamber assembly according to claim 1, wherein 45º ≤α.sub.b≤ 135º.

3. The vapor chamber assembly according to claim 1, wherein the vapor chamber is at least partly defined by two plates, wherein a first plate of the two plates consists of a single piece comprising two first plate parts, and wherein a second plate of the two plates comprises two second plate parts abutted at the bend, wherein each of the first plate parts is configured in parallel with one of the second plate parts.

4. The vapor chamber assembly according to claim 1, wherein the two parallel configured plates define a vapor chamber height, wherein the vapor chamber comprises bridging elements bridging at least part of the vapor chamber height.

5. The vapor chamber assembly according to claim 1, wherein the bend has a bending radius ≤ 2 mm.

6. A vapor chamber segment, wherein the vapor chamber segment comprises at least part of a vapor chamber element, wherein the vapor chamber segment has an average segment thickness d.sub.s perpendicular to an axis of elongation, wherein the vapor chamber segment comprises a thinned region having a thickness d.sub.T, wherein d.sub.T ≤ 0.3*d.sub.s, wherein: the thinned region is arranged at a first end of the vapor chamber segment with respect to the axis of elongation, wherein the vapor chamber segment tapers towards the first end; or the vapor chamber segment comprises a groove.

7. A vapor chamber assembly comprising one or more vapor chamber segments according to claim 6.

8. The vapor chamber assembly according to claim 7, wherein the vapor chamber assembly comprises two sections and one or more vapor chamber elements, wherein each section comprises at least part of the one or more vapor chamber elements, wherein each vapor chamber element comprises a vapor chamber at least partly defined by two parallel configured plate parts, wherein the two sections define a bend, wherein the bend has a bend angle α.sub.b, wherein 0 º≤ α.sub.b<180 º.

9. The vapor chamber assembly according to claim 8, wherein 5 º ≤α.sub.b≤ 135 º.

10. The vapor chamber assembly according to claim 6, wherein the bend has a bend radius ≤ 2 mm.

11. A device comprising the vapor chamber assembly of claim 1, wherein the device further comprises an electronic component thermally coupled to the vapor chamber assembly .

12. The device according to claim 11, wherein the device comprises a housing, wherein the housing internally has a rounded corner, wherein the bend of the vapor chamber assembly is arranged in physical contact with the rounded corner at a contact interface, wherein the bend and the rounded corner have the same radius at the contact interface.

13. The device according to claim 11, wherein the device comprises a light generating device.

14. The device according to claim 11, wherein the device comprises a driver unit comprising a driver, wherein the drive is thermally coupled with the vapor chamber assembly.

15. A lamp or a luminaire comprising the light generating device according to claim 13.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0080] Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:

[0081] FIGS. 1A-B schematically depict an embodiment of the vapor chamber assembly and an embodiment of the vapor chamber segment.

[0082] FIGS. 2A-C schematically depict a further embodiments of the vapor chamber assembly and the vapor chamber segment.

[0083] FIG. 3 schematically depicts a further embodiment of the vapor chamber assembly and a further embodiment of the vapor chamber segment.

[0084] FIG. 4 schematically depicts a further embodiment of the vapor chamber assembly.

[0085] FIGS. 5A-C schematically depict an embodiment of the device comprising a vapor chamber assembly.

[0086] FIG. 6 schematically depicts embodiments of a luminaire and a lamp comprising the device of the invention.

[0087] The schematic drawings are not necessarily on scale.

DETAILED DESCRIPTION OF THE EMBODIMENTS

[0088] FIG. 1A schematically depicts an embodiment of the vapor chamber assembly 1000 (bottom half of figure). In particular, the vapor chamber assembly 1000 comprises two sections 1200 and one or more vapor chamber elements 100. For visualization purposes, the two sections 1200 have been separated by a hyphened line. In particular, in the depicted embodiment, the vapor chamber assembly comprises a single vapor chamber element 100. Each section 1200 may comprise at least part of the one or more vapor chamber elements 100. Here, both sections 1200 comprise about half of the vapor chamber element 1000. Each vapor chamber element 100 may comprise a vapor chamber 200 at least partly defined by two parallel configured plate parts 211,221. In the depicted embodiment, the two sections 1200 define a bend 1100, wherein the bend 1100 has a bend angle α.sub.b, wherein 0°≤α.sub.b<180°, especially wherein 5° ≤α.sub.b≤ 135°.

[0089] Hence, in the depicted embodiment, the two sections 1200 together define at least part of (a single) one of the one or more vapor chamber elements 100. Hence, the vapor chamber element may be a shared vapor chamber element 101, i.e., the two sections 1200 together define at least part of a shared vapor chamber element 101 of the one or more vapor chamber elements 100.

[0090] The vapor chamber element 100 may comprise a vapor chamber 200 at least partly defined by two parallel configured plates 210,220, i.e., in embodiments, the vapor chamber element 100 may comprise a first plate 210 and a second plate 220, especially with a vapor chamber 200 in between. The first plate 210 and the second plate 220 may especially be arranged in parallel. Hence, in embodiments, the vapor chamber may be defined by at least a first plate 210 and a second plate 220 having an average plate distance equal to a first height H1, i.e., the first plate 210 and the second plate 220 may define the first height H1.

[0091] The bend angle α.sub.b may especially be defined as the angle between section planes of the two sections, wherein each section plane is essentially parallel to the respective section. In particular, the bend angle α.sub.b may be defined as the angle between the first plate parts 211,212 corresponding to the two sections 1200, or the angle between the second plate parts 221, 222 corresponding to the two sections 1200. In general, the angle between the first plate parts 211, 212 may be about the same angle as the angle between the second plate parts 221, 222.

[0092] Hence, in embodiments, the two sections may each comprise a first (or second) plate part, wherein the bend angle α.sub.b is the angle between the two first (or second) plate parts.

[0093] In the depicted embodiment, the two sections 1200 comprise a vapor chamber element part 150, wherein the vapor chamber element parts 150 taper towards the bend 1100.

[0094] In particular, the vapor chamber 200 is at least partly defined by two plates 210, 220, wherein a first plate 210 of the two plates 210, 220 consists of a single piece comprising two first plate parts 211, 212, and wherein a second plate 220 of the two plates 210, 220 comprises two second plate parts 221, 222 abutted at the bend 1100. Further, in the depicted embodiment, each of the first plate parts 211, 212 is configured in parallel with one of the second plate parts 221, 222, i.e., first plate part 211 is configured in parallel with second plate part 221, and first plate part 212 is configured in parallel with second plate part 222.

[0095] FIG. 1A further schematically depicts an embodiment of the vapor chamber segment 1500. In particular, the vapor chamber segment 1500 may comprise at least part of a vapor chamber element 100. The vapor chamber segment 1500 may have an average segment thickness d.sub.s perpendicular to an axis of elongation A. In embodiments, the vapor chamber segment 1500 may further comprise a thinned region 1550 having a thickness d.sub.T, wherein d.sub.T ≤ 0.5*d.sub.s.

[0096] In particular, in the depicted embodiment, the vapor chamber segment 1500 comprises a groove 10, especially a V-shaped groove 11.

[0097] Hence, in the depicted embodiment, the thickness d.sub.T of the thinned region may essentially be the thickness d.sub.1 of the first plate 210. In further embodiments, the thickness d.sub.T of the thinned region may be less than the thickness d.sub.1, for example 0.5 * d.sub.1, or may be more than the thickness d.sub.1. For example, the groove 10 may run till the wick 105 closest to the first plate 210, such as schematically depicted in FIG. 1B, especially such that the wick 105 is uninterrupted. In such embodiments, the wick 105 may especially comprise a mesh wick.

[0098] The vapor chamber assembly 1000 of FIG. 1A may especially be provided from the vapor chamber segment 1500 of FIG. 1A by bending the vapor chamber segment 1500 such that the groove 1500 is closed.

[0099] FIG. 2A schematically depicts a further embodiment of the vapor chamber assembly 1000. In the depicted embodiment, the vapor chamber assembly 1000 comprises a base plate 400. Further, the vapor chamber assembly 1000 comprises a plurality of vapor chamber elements 100 arranged on the base plate 400 along a base plate length L, wherein two neighboring vapor chambers elements 100 are separated by the bend 1100.

[0100] In embodiments, the two neighboring vapor chamber elements 100 may be separated by a bending region 410 of the base plate 400. The bending region 410 may have a bending length l.sub.b along the base plate length L, especially wherein l.sub.b is selected from the range of 0.1 - 40 mm. The bending length l.sub.b may especially be the (shortest) distance (before bending) between the two neighboring vapor chamber elements 100 that are separated by the bend 1100.

[0101] FIG. 2A further schematically depicts an embodiment of the vapor chamber segment 1500. In the depicted embodiment, the vapor chamber segment 1500 comprises a plurality of vapor chamber elements 100 sequentially arranged on a base plate 400 along the axis of elongation A. Hence, a plurality of vapor chamber elements 100 are arranged in series on a base plate 400 parallel to an axis of elongation A. In particular, two neighboring vapor chamber elements 100 may be separated by a bending region 410 of the base plate 400, wherein the bending region 410 has a bending length l.sub.b along the axis of elongation A, wherein l.sub.b is selected from the range of 0.1 - 40 mm, and especially wherein the bending region 410 comprises the thinned region 1550.

[0102] Hence, the vapor chamber assembly 1000 of FIG. 2A may be provided from the vapor chamber segment 1500 of FIG. 2A by bending the vapor chamber segment 1500 at the bending regions 410.

[0103] FIG. 2B schematically depicts a further embodiment of the vapor chamber segment 1500. In the depicted embodiment, the base plate 400 has a thickness d.sub.p, especially an average thickness d.sub.p, or especially a median thickness d.sub.p, wherein the bending region 410 comprises a thinned region 1550 having a thickness d.sub.T, wherein d.sub.p is selected from the range of 0.05 - 2 mm, and wherein 0.1 ≤ d.sub.T/d.sub.p ≤ 0.9. Hence, the base plate 400, especially the bending region 410, may comprise a groove 10 defining the thinned region 1550.

[0104] Further, in the depicted embodiment, the vapor chamber element 100 comprises a flange 160 for attaching of the vapor chamber element 100 to the base plate 400. Especially, each vapor chamber element 100 may comprise a flange 160 on either end of the vapor chamber element 100 with respect to the base plate length L. In particular, the flange 160 may be welded to the base plate 400. Hence, in such embodiments, the bending region 410 may especially be arranged between the flanges 160 of neighboring vapor chamber elements 100.

[0105] FIG. 2C schematically depicts a further embodiment of the vapor chamber assembly 1000. In the depicted embodiment, the vapor chamber elements 100 are arranged at different sides of the base plate 400. Hence, in embodiments, the vapor chamber elements 100 may be arranged at opposite sides of the base plate 400.

[0106] In further embodiments, the vapor chamber elements 100 may all be arranged at the same side of the base plate 400.

[0107] FIG. 3 schematically depicts a further embodiment of the vapor chamber assembly 1000. In the depicted embodiment, each of the (at least) two sections 1200 comprises a vapor chamber element part 150, wherein the vapor chamber element parts 150 taper towards the bend 1100, and wherein the vapor chamber element parts 150 define at least part of the one of the one or more vapor chamber elements 100. In the depicted embodiment, α.sub.b ≥ 45°. In particular, α.sub.b is about 90°. Further, in the depicted embodiment, the vapor chamber 200 is at least partly defined by two plates 210,220, wherein a first plate 210 of the two plates 210,220 comprises two first plate parts 211, 212 abutted at the bend 1100, and wherein a second plate 220 of the two plates 210,220 comprises two second plate parts 221,222 abutted at the bend 1100. Further, in the depicted embodiment, each of the first plate parts 211,212 is configured in parallel with one of the second plate parts 221,222, i.e., first plate part 211 is configured in parallel with second plate part 221, and first plate part 212 is configured in parallel with second plate part 222.

[0108] In the depicted embodiment, the vapor chamber element 100 is defined by three sections 1200 of the vapor chamber assembly 1000.

[0109] In embodiments, the two parallel configured plates 210,220 define a vapor chamber height H1, wherein the vapor chamber 200 comprises bridging elements 230 bridging at least part of the vapor chamber height H1. In the depicted embodiment, the bridging elements 230 may especially have a spherical shape.

[0110] FIG. 3 further schematically depicts two embodiments of the vapor chamber segment 1500. In the depicted embodiments, the thinned region 1550 is arranged at a first end 110 of the vapor chamber segment 1500 with respect to the axis of elongation A, wherein the vapor chamber segment 1500 tapers towards the first end 110. The tapering may especially provide a triangular shape at the end of the vapor chamber segment 1500. In particular, the vapor chamber segment 1500 may taper at a taper angle α.sub.t, wherein the taper angle α.sub.t is especially the angle of the tip of the triangular shape at the first end 110. In embodiments, the taper angle α.sub.t may be selected from the range of 5°-85°, especially from the range of 15°-75°, such as from the range of 30°-60°. In the depicted embodiment, the taper angle α.sub.t may be about 45°.

[0111] In particular, in the embodiment depicted on the left, the vapor chamber segment 1500 comprises two thinned regions 1550, wherein a first thinned region 1500 is arranged at a first end 110 of the vapor chamber segment 1500 with respect to the axis of elongation, and wherein a second thinned region 1500 is arranged at a second end 120 of the vapor chamber segment 1500 with respect to the axis of elongation.

[0112] Hence, the vapor chamber assembly 1000 of FIG. 3 may be obtained from the vapor chamber segments 1500 of FIG. 3 (using both depicted embodiments twice) by connecting the vapor chamber segments 1500. In particular, the vapor chamber segments 1500 may be welded together. In particular, the vapor chamber assembly 1000 of FIG. 3 provides a vapor chamber element 100 wherein the two sections 1200 define a bend 1100, wherein the bend 1100 has a bend angle α.sub.b, wherein 0°≤α.sub.b<180°, especially wherein 5° ≤α.sub.b≤ 135°. However, the bend 1100 is provided by assembling the vapor chamber element parts 150 rather than by bending a vapor chamber element (part). Hence, in the depicted embodiment, the bend 1100 may be considered to have a bending radius (see below) of 0.

[0113] In the depicted embodiment, the first plate 210 and the second plate 220 may (respectively) have a first thickness (d.sub.1) and a second thickness (d.sub.2) independently selected from the range of 50-5000 .Math.m, such as 100-2000 .Math.m, like especially 300-2000 .Math.m. The thicknesses of the first plate 210 and the second plate 220 and the space between the plates 210,220, especially the vapor chamber 200, may also essentially define the thickness of the vapor chamber element 100. Hence, in embodiments, the vapor chamber element 100 may have an element thickness d.sub.e, wherein d.sub.e = d.sub.1+d.sub.2+H1. In particular, the element thickness d.sub.e may be essentially the same as the segment thickness d.sub.s (see below).

[0114] FIG. 4 schematically depicts a further embodiment of the vapor chamber assembly 1000. In the depicted embodiment, a rectangular central segment 1200, 1201 may provide (respective) bends with four other segments 1200. Similarly, the four other segments 1200 may again provide bends with one or more other segments 1200.

[0115] Similarly, a vapor chamber assembly 1000 may be functionally coupled to other elements, such as other cooling elements, especially at edges of the vapor chamber assembly 1000.

[0116] FIGS. 5A-C schematically depict embodiments of the device 500 comprising a vapor chamber assembly 1000. In particular, FIGS. 5A-C depict a device 500 comprising a (bent) vapor chamber assembly 1000, wherein the device 500 further comprises an electronic component 510 thermally coupled, especially directly physically coupled, to the vapor chamber assembly 1000.

[0117] FIG. 5A schematically depicts an embodiment of the device 500 wherein the device 500 comprises a plurality of vapor chamber assemblies 1000, especially two vapor chamber assemblies 1000. In particular, each of the depicted vapor chamber assemblies comprises n bends 1100, wherein n=2. In the depicted embodiment, the bend 1100 is bent at a bending radius r.sub.b, wherein the bending radius r.sub.b ≤ 2 mm. In particular, the bending radius r.sub.b corresponds to the radius of a circle matching the circle section defined by the bending section (after bending). For explanatory purposes, a matching circle is depicted in FIG. 5A. Hence, the vapor chamber assembly 1000, especially the two sections 1200, may define a bend 1100, wherein the bend 1100 has a bending radius r.sub.b, especially wherein r.sub.b ≤ 2 mm. In particular, in the depicted embodiment, the bending angle α.sub.b may be about 90°.

[0118] FIG. 5B schematically depicts an embodiment of a device 500 comprising two single vapor chamber assemblies 1000, wherein each vapor chamber assembly 1000 comprises n bends 1100, wherein n=2.

[0119] In the depicted embodiment, the device 500 comprises a housing 520. The housing may comprise the vapor chamber assembly 1000 and the electronic component 510. In particular, in the depicted embodiment, the housing 520 internally has a rounded corner 521 (or: “has a rounded internal corner 521”), wherein the bend 1100 of the vapor chamber assembly 1000 is arranged in physical contact with the rounded corner 521 at a contact interface. In the depicted embodiment the bend and the rounded corner have (essentially) the same radius of curvature at the contact interface, i.e., there is (essentially) no empty space between the housing 520 and the vapor chamber assembly 1000 at the rounded corner 521. In particular, the rounded corner 521 is configured for hosting the bend 1100 of the vapor chamber assembly 1000, especially a vapor chamber assembly 1000 comprising a base plate 400.

[0120] Similarly, in further embodiments, the housing may internally have a sharp corner, especially wherein the sharp corner is configured for hosting the (bend of) the vapor chamber assembly 1000. In particular, the vapor chamber assembly 1000 and the sharp corner may have (essentially) the same shape at the contact interface. Thereby, the vapor chamber assembly 1000 and the housing may efficiently exchange heat, also at the corner of the housing. Otherwise, air may be trapped between the housing and the vapor chamber assembly 1000, which may inhibit efficient heat exchange at the corner. Further, the sharp corner may provide increased stability to the device 500, as the vapor chamber assembly is spatially constrained in such embodiments. In particular, the sharp corner may be configured for hosting the bend 1100 of the vapor chamber assembly 1000, especially a vapor chamber assembly 1000 wherein two sections 1200 together define at least part of one of the one or more vapor chamber elements 100.

[0121] FIG. 5C also schematically depicts an embodiment of the device 500 wherein the device 500 comprises a plurality of vapor chamber assemblies 1000, especially two vapor chamber assemblies 1000. In particular, in this embodiment, the vapor chamber assemblies 1000 may specifically be arranged at those areas of the device 500 where heat-generating elements are located.

[0122] FIG. 6 schematically depicts an embodiment of a luminaire 2 comprising a light generating device 550 comprising the device 500 described above. Reference 300 indicates a control system 300, especially a control system comprising a user interface. The control system 300 may especially be functionally coupled with the light generating device 550. FIG. 6 also schematically depicts an embodiment of a lamp 1 comprising the light generating device 550.

[0123] In embodiments, the device 500 may comprise a light generating device 550.

[0124] In further embodiments, the device 500 may comprises a driver unit 530 comprising a driver 531, wherein the driver 531 is thermally coupled with the vapor chamber assembly 1000, especially with the one or more vapor chamber elements 100.

[0125] The term “plurality” refers to two or more. Furthermore, the terms “a plurality of” and “a number of” may be used interchangeably.

[0126] The terms “substantially” or “essentially” herein, and similar terms, will be understood by the person skilled in the art. The terms “substantially” or “essentially” may also include embodiments with “entirely”, “completely”, “all”, etc. Hence, in embodiments the adjective substantially or essentially may also be removed. Where applicable, the term “substantially” or the term “essentially” may also relate to 90% or higher, such as 95% or higher, especially 99% or higher, even more especially 99.5% or higher, including 100%. Moreover, the terms “about” and “approximately” may also relate to 90% or higher, such as 95% or higher, especially 99% or higher, even more especially 99.5% or higher, including 100%. For numerical values it is to be understood that the terms “substantially”, “essentially”, “about”, and “approximately” may also relate to the range of 90% - 110%, such as 95%-105%, especially 99%-101% of the values(s) it refers to.

[0127] The term “comprise” also includes embodiments wherein the term “comprises” means “consists of”.

[0128] The term “and/or” especially relates to one or more of the items mentioned before and after “and/or”. For instance, a phrase “item 1 and/or item 2” and similar phrases may relate to one or more of item 1 and item 2. The term “comprising” may in an embodiment refer to “consisting of” but may in another embodiment also refer to “containing at least the defined species and optionally one or more other species”.

[0129] Furthermore, the terms first, second, third and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances and that the embodiments of the invention described herein are capable of operation in other sequences than described or illustrated herein.

[0130] The devices, apparatus, or systems may herein amongst others be described during operation. As will be clear to the person skilled in the art, the invention is not limited to methods of operation, or devices, apparatus, or systems in operation.

[0131] The term “further embodiment” and similar terms may refer to an embodiment comprising the features of the previously discussed embodiment, but may also refer to an alternative embodiment.

[0132] It should be noted that the above-mentioned embodiments illustrate rather than limit the invention, and that those skilled in the art will be able to design many alternative embodiments without departing from the scope of the appended claims.

[0133] In the claims, any reference signs placed between parentheses shall not be construed as limiting the claim.

[0134] Use of the verb “to comprise” and its conjugations does not exclude the presence of elements or steps other than those stated in a claim. Unless the context clearly requires otherwise, throughout the description and the claims, the words “comprise”, “comprising”, “include”, “including”, “contain”, “containing” and the like are to be construed in an inclusive sense as opposed to an exclusive or exhaustive sense; that is to say, in the sense of “including, but not limited to”.

[0135] The article “a” or “an” preceding an element does not exclude the presence of a plurality of such elements.

[0136] The invention may be implemented by means of hardware comprising several distinct elements, and by means of a suitably programmed computer. In a device claim, or an apparatus claim, or a system claim, enumerating several means, several of these means may be embodied by one and the same item of hardware. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage.

[0137] The invention also provides a control system that may control the device, apparatus, or system, or that may execute the herein described method or process. Yet further, the invention also provides a computer program product, when running on a computer which is functionally coupled to or comprised by the device, apparatus, or system, controls one or more controllable elements of such device, apparatus, or system.

[0138] The invention further applies to a device, apparatus, or system comprising one or more of the characterizing features described in the description and/or shown in the attached drawings. The invention further pertains to a method or process comprising one or more of the characterizing features described in the description and/or shown in the attached drawings. Moreover, if a method or an embodiment of the method is described being executed in a device, apparatus, or system, it will be understood that the device, apparatus, or system is suitable for or configured for (executing) the method or the embodiment of the method, respectively.

[0139] The various aspects discussed in this patent can be combined in order to provide additional advantages. Further, the person skilled in the art will understand that embodiments can be combined, and that also more than two embodiments can be combined. Furthermore, some of the features can form the basis for one or more divisional applications.