COMPACT VENTURI SCRUBBER AND METHOD TO TREAT GAS STREAMS UTILIZING THE COMPACT VENTURI SCRUBBER
20220134272 · 2022-05-05
Inventors
Cpc classification
Y02P70/10
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B01D2247/04
PERFORMING OPERATIONS; TRANSPORTING
B01D2247/107
PERFORMING OPERATIONS; TRANSPORTING
B01D2258/0291
PERFORMING OPERATIONS; TRANSPORTING
B01D47/12
PERFORMING OPERATIONS; TRANSPORTING
B01D2257/404
PERFORMING OPERATIONS; TRANSPORTING
International classification
Abstract
Disclosed is a compact venturi scrubber, used for removing undesirable materials from a gas stream, that includes a gas inlet section, a discharge section aligned with the gas inlet section, the discharge section having a base defined by the intersection of the gas inlet section and the discharge section, a diverging interior surface, and a diverging angle defined by the diverging interior surface, a nozzle, and a liquid inlet through which a liquid scrubbing medium is introduced to the nozzle, wherein the nozzle produces a full spray pattern directed towards the base of the discharge section with a sufficiently large discharge angle so that a cross-sectional area of the full spray pattern produced by the nozzle at the point it intersects with the base of the discharge section fully covers, and substantially matches the size and shape of, the cross-sectional area of the base of the discharge section.
Claims
1. A compact venturi scrubber comprising: a gas inlet section, a discharge section aligned with the gas inlet section, the discharge section having (i) a base defined by the intersection of the gas inlet section and the discharge section, (ii) a diverging interior surface, and (iii) a diverging angle defined by the diverging interior surface, a nozzle, and a liquid inlet through which a liquid scrubbing medium is introduced to the nozzle, wherein the nozzle produces a full spray pattern directed towards the base of the discharge section with a sufficiently large discharge angle so that the cross-sectional area of the full spray pattern produced by the nozzle at the point it intersects with the base of the discharge section fully covers, and substantially matches the size and shape of, the cross-sectional area of the base of the discharge section.
2. The compact venturi scrubber of claim 1, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle are substantially the same.
3. The compact venturi scrubber of claim 1, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle are substantially the same and are greater than 20 degrees.
4. The compact venturi scrubber of claim 1, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle are substantially the same and are between 20 and 45 degrees.
5. The compact venturi scrubber of claim 1, wherein the cross-sectional geometry of the full spray pattern, the cross-sectional geometry of the base of the discharge section, and the cross-sectional geometry of the discharge section are substantially the same.
6. The compact venturi scrubber of claim 5, wherein the cross-sectional geometries of the full spray pattern, the base of the discharge section, and the discharge section are substantially the same and are circular or rectangular.
7. The compact venturi scrubber of claim 5, further comprised of one or more additional nozzles.
8. The compact venturi scrubber of claim 1, wherein (i) the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle are substantially the same and are between 20 and 45 degrees and (ii) the cross-sectional geometry of the full spray pattern, the cross-sectional geometry of the base of the discharge section, and the cross-sectional geometry of the discharge section are substantially the same and are circular or rectangular.
9. A venturi scrubbing system comprising one or more scrubbing stages, each scrubbing stage having one or more compact venturi scrubbers, each compact venturi scrubber comprising: a gas inlet section, a discharge section aligned with the gas inlet section, the discharge section having (i) a base defined by the intersection of the gas inlet section and the discharge section, (ii) a diverging interior surface, and (iii) a diverging angle defined by the diverging interior surface, a nozzle, and a liquid inlet through which a liquid scrubbing medium is introduced to the nozzle, wherein the nozzle produces a full spray pattern directed towards the base of the discharge section with a sufficiently large discharge angle so that the cross-sectional area of the full spray pattern produced by the nozzle at the point it intersects with the base of the discharge section fully covers, and substantially matches the size and shape of, the cross-sectional area of the base of the discharge section.
10. The venturi scrubbing system of claim 9, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle of one or more of the compact venturi scrubbers are substantially the same.
11. The venturi scrubbing system of claim 9, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle of one or more of the compact venturi scrubbers are substantially the same and are greater than 20 degrees.
12. The venturi scrubbing system of claim 9, wherein the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle of one or more of the compact venturi scrubbers are substantially the same and are between 20 and 45 degrees.
13. The venturi scrubbing system of claim 9, wherein the cross-sectional geometry of the full spray pattern, the cross-sectional geometry of the base of the discharge section, and the cross-sectional geometry of the discharge section of one or more of the compact venturi scrubbers are substantially the same.
14. The venturi scrubbing system of claim 13, wherein the cross-sectional geometries of the full spray pattern, the base of the discharge section, and the discharge section of one or more of the compact venturi scrubbers are substantially the same and are circular or rectangular.
15. The venturi scrubbing system of claim 14, wherein one or more of the compact venturi scrubbers is further comprised of one or more additional nozzles.
16. The venturi scrubbing system of claim 9, wherein the nozzle and liquid inlet of one or more of the compact venturi scrubbers are removeable and are situated within an isolation assembly, the isolation assembly being accessible from the exterior of the venturi scrubbing system and having a means for preventing the leakage of gas from within the venturi scrubbing system when the nozzle or liquid inlet is removed.
17. The venturi scrubbing system of claim 9 wherein the installation of one or more of the compact venturi scrubbers enables the orientation of the compact venturi scrubber to be changed.
18. The venturi scrubbing system of claim 9, wherein (i) the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle of one or more of the compact venturi scrubbers are substantially the same and are between 20 and 45 degrees, (ii) the cross-sectional geometry of the full spray pattern, the cross-sectional geometry of the base of the discharge section, and the cross-sectional geometry of the discharge section of one or more of the compact venturi scrubbers are substantially the same and are circular or rectangular, and (iii) the nozzle and the liquid inlet of one or more of the compact venturi scrubbers are removeable and are situated within an isolation assembly, the isolation assembly being accessible from the exterior of the venturi scrubbing system and having a means for preventing the leakage of gas from within the venturi scrubbing system when the nozzle or liquid inlet is removed.
19. A method for the removal of materials from a gas stream utilizing a compact venturi scrubber that comprises (a) a gas inlet section, (b) a discharge section aligned with the gas inlet section, the discharge section having (i) a base defined by the intersection of the gas inlet section and the discharge section, (ii) a diverging interior surface, and (iii) a diverging angle defined by the diverging interior surface, (c) a nozzle, and (d) a liquid inlet through which a liquid scrubbing medium is introduced to the nozzle, the method comprising: producing, by the nozzle, a full spray pattern directed towards the base of the discharge section with a sufficiently large discharge angle so that the cross-sectional area of the full spray pattern produced by the nozzle at the point it intersects with the base of the discharge section fully covers, and substantially matches the size and shape of, the cross-sectional area of the base of the discharge section, and passing the gas stream through the gas inlet section and discharge section of the compact venturi scrubber as it mixes with the liquid scrubbing medium.
20. The method of claim 19, wherein (i) the diverging angle of the discharge section and the discharge angle of the full spray pattern produced by the nozzle of the compact venturi scrubber are substantially the same and are between 20 and 45 degrees and (ii) the cross-sectional geometry of the full spray pattern, the cross-sectional geometry of the base of the discharge section, and the cross-sectional geometry of the discharge section of the compact venturi scrubber are substantially the same and are circular or rectangular.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0024] The description of illustrative embodiments according to principles of the present invention is intended to be read in connection with the accompanying drawings, which are to be considered part of the entire written description. In the description of embodiments of the invention disclosed herein, any reference to direction or orientation is merely intended for convenience of description and is not intended in any way to limit the scope of the present invention. Relative terms such as “lower,” “upper,” “horizontal,” “vertical,” “above,” “below,” “up,” “down,” “top” and “bottom” as well as derivative thereof (e.g., “horizontally,” “downwardly,” “upwardly,” etc.) should be construed to refer to the orientation as then described or as shown in the drawing under discussion. These relative terms are for convenience of description only and do not require that the apparatus be constructed or operated in a particular orientation unless explicitly indicated as such. Terms such as “attached,” “affixed,” “connected,” “coupled,” “interconnected,” and similar refer to a relationship wherein structures are secured or attached to one another either directly or indirectly through intervening structures, as well as both movable or rigid attachments or relationships, unless expressly described otherwise. Moreover, the features and benefits of the invention are illustrated by reference to the exemplified embodiments. Accordingly, the invention expressly should not be limited to such exemplary embodiments illustrating some possible non-limiting combination of features that may exist alone or in other combinations of features; the scope of the invention being defined by the claims appended hereto.
[0025] This disclosure describes the best mode or modes of practicing the invention as presently contemplated. This description is not intended to be understood in a limiting sense, but provides an example of the invention presented solely for illustrative purposes by reference to the accompanying drawings to advise one of ordinary skill in the art of the advantages and construction of the invention. In the various views of the drawings, like reference characters designate like or similar parts.
[0026]
[0027] The nozzle (4) is designed to atomize scrubbing liquid into first sheets and then into small droplets which provide surface area for absorption of gaseous species and interception of small particulate material and fumes, while simultaneously providing fast moving targets for the collection of larger solid particulate and fumes via inertial impaction. The nozzle (4) may be designed to provide droplets of varying sizes, velocities, and dispersion patterns necessary to accomplish removal of undesirable materials from the gas stream. The scrubbing liquid partially mixes with the gas flowing co-currently through the gas inlet section (1) to the discharge section (2) where both inlet gas and scrubbing liquid are intimately mixed/dispersed. The angle formed by the interior surface of the gas inlet section (1) is sufficiently large so as not to block any portion of the scrubbing liquid spray from reaching the point where the gas inlet section (1) attaches to the discharge section (2). Dependent on design requirements, the angle formed by the interior surface of the gas inlet section (1) may be as large as 180 degrees.
[0028] As depicted in
[0029] The combined gas and liquid stream enters the discharge section (2) uniformly mixed. At the base of the discharge section (2) there is differential velocity between the scrubbing liquid stream (sheets and droplets) and gas. This differential velocity is critical to scrubber performance and also provides energy to the gas stream to offset some or all of the venturi gas side pressure losses. To maximize differential velocity between the liquid stream and the gas, and to maximize the availability of scrubbing liquid for treatment of the gas, the discharge section (2) is designed with the same diverging angle (5A) as the spray discharge angle (5) from the nozzle (4). Thus, as the gas passes through the discharge section (2) its velocity decreases as the cross-sectional area of the discharge section (2) increases. The higher momentum liquid stream continues to disperse with minimal impact on the interior surface of the discharge section (2). Sheets and ligaments of scrubbing liquid continue to disintegrate through the entire length (10) of the compact venturi scrubber, maximizing droplet formation and enhancing gas treatment capability. The velocity difference between the gas and the liquid stream gradually increases in the discharge section (2) further enhancing gas treatment capability.
[0030] As depicted in
[0031] The compact nature of an embodiment of the present invention allows installation of the compact venturi scrubber(s) inside a gas enclosure while providing access to the liquid inlet (3) and nozzle (4) from outside the gas enclosure. An isolation assembly, such as shown in FIG. 2, can be used to prevent leakage of gas when the liquid inlet 3 and the nozzle 4 are removed. The isolation assembly may be comprised of a mounting nozzle (14), an isolation valve (18) and a packing gland (15). The incorporation of an isolation assembly enables the liquid inlet (3) and the nozzle (4) to be maintained or replaced with the scrubbing system in service, thereby maximizing overall unit reliability and runlength. In addition, this feature allows nozzles of differing design to be installed to change the performance characteristics of the scrubber without taking the scrubber out of service.
[0032] An embodiment of the present invention enables the economic employment of multiple stage scrubbing systems.
[0033] The lower portion of the first treated gas chamber (17) may be designed to provide a sump for collection and storage of first stage scrubbing liquid inventory (20). First stage scrubbing liquid from the sump (20) is supplied to one or more first stage circulation pump(s) (42) via liquid outlet nozzle (21) and pump suction line (101). The circulation pumps (42) provide the required scrubbing liquid flow and pressure to the first stage compact venturi scrubber(s) through a main supply line (102) and branch lines (103) to each liquid inlet (3). The liquid sump (20) volume is set based on design criteria for sump level control and to provide sufficient inventory to allow continued scrubber operation during high inlet gas contaminant loading.
[0034] Treated gas in the first stage treated gas chamber (17) is saturated with the scrubbing liquid and carries a small amount of liquid droplets to the de-entrainment device (22). This device can be any one of a number of commercially available de-entrainment devices for liquid/vapor separation. The selection of the particular de-entrainment device is dependent on the allowable amount of first stage scrubbing liquid which can be added to the second stage scrubbing liquid without compromising second stage performance or reliability. The collected droplets coalesce into larger droplets and liquid films which fall back into the liquid sump (20) under the influence of gravity. Depending on specific design requirements, a full draw tray (34), as depicted partially in
[0035] After reducing the amount of entrained liquid to an acceptable level, the treated gas flows into a region (25) defined by an outer wall (16 or 8B) and an inner wall (8A), the inner wall (8A) being comprised of the side wall (23) of the second stage liquid sump (28) and the wall (24) separating region (25) and the second stage treated gas chamber (29). One or more compact venturi scrubber(s) are installed penetrating the inner wall (8A) providing a passage for gas to flow from region (25) to the second stage treated gas chamber (29). As gas flows through the second stage compact venturi scrubber(s) it is again contacted with a scrubbing liquid stream for additional treatment. The design specifications for the compact venturi scrubbers used in stage one and stage two do not need to be the same.
[0036] In the second scrubbing stage, treated gas and liquid discharged from discharge section outlet(s) (7) can be directed to impact liquid separation devices (11) or the side walls (23) of the second stage liquid sump (28), can be directed downward towards the surface of the second stage liquid sump (28), or provided another means for initial droplet removal. Various compact venturi scrubber discharge orientations are depicted in
[0037] Scrubbing liquid is directed or flows by gravity into the second stage sump (28) where it is collected and stored for use in the second scrubbing stage. Second stage scrubbing liquid is fed to one or more second stage circulation pump(s) (44) via liquid outlet nozzle (27) and pump suction line (114). The circulation pump(s) (44) provide the required scrubbing liquid flow and pressure to the second stage liquid inlet(s) (3) through a main supply line (109) and branch lines (110) to each liquid inlet (3). The liquid sump (20) volume is set based on design criteria for sump level control and to provide sufficient inventory to allow continued scrubber operation during high inlet gas contaminant loading.
[0038] Treated gas from the second stage venturis carries a small amount of liquid droplets to the de-entrainment device (26). This device can be any one of a number of commercially available de-entrainment devices for liquid/vapor separation. The selection of the particular de-entrainment device is dependent on the allowable amount of undesirable materials which can be contained in exhaust gases passing out of the scrubber exit (40). The collected droplets coalesce into larger droplets and liquid films which fall back into the second stage liquid sump (28) under the influence of gravity. Depending on specific design requirements, a full draw tray (34), as depicted partially in
[0039] When needed, make-up liquid is added to the second stage liquid sump (28) from an external source via a make-up liquid line (105). When required, a scrubbing reagent (alkalis such as ammonium, sodium and calcium hydroxides, etc., acids such as HCl, HBr, H.sub.2SO.sub.4, etc., reaction termination reagents such as alcohols absorbents such as amines, ionic liquids etc.) is added to the second scrubbing stage to react with undesirable materials in the treated gas from the first scrubbing stage which are absorbed into the scrubbing liquid which in turn allows additional undesirable materials to be absorbed into the scrubbing liquid. Reagent is added to the second stage liquid sump (28) from an external source via a reagent line (106). Both make-up liquid and reagent can also be added to the suction of the second stage circulation pump (44).
[0040] A continuous overflow from the second stage liquid sump (28) via overflow line (41) maintains a predetermined, fixed level in the second stage liquid sump (28). The overflow stream (107) contains second stage scrubbing liquid (which is comprised of water or other fluid, depending on the application), trace quantities of collected particulate, and absorbed and reacted gaseous contaminants which comingles with the first stage scrubbing liquid in the first stage liquid sump (20). The first scrubbing stage treats the inlet gas stream which contains the highest level of contaminants. Therefore, the first stage scrubbing liquid will have higher levels of particulate matter and absorbed and reacted gaseous contaminants than the second stage scrubbing liquid. To accommodate the higher contaminants, scrubbing reagent, when required, may be added to the first stage liquid sump (20) via a reagent feed line (108) which can introduce reagent directly to the first stage liquid sump (20) or alternatively to the suction line (101) feeding the first stage circulation pump(s) (42). Reagent addition to the first scrubbing stage is typically much greater than the amount of reagent added to the second scrubbing stage. The segregation of the circulating liquid in each of the scrubbing stages allows low reactant concentrations to be used in the second scrubbing stage which reduces the thermodynamic equilibrium concentration of contaminants in the treated gas maximizing scrubbing performance. In contrast, the higher concentration of reactants in the first stage results in higher treated gas contaminant concentrations, which are passed to the second stage scrubber where their removal can be accomplished. As an example, a gas containing 2,000 vppm (volume parts per million) SO.sub.2 (an acid gas contaminant) is treated in the first stage of a two-stage scrubber with caustic (NaOH). The scrubbing liquid is operating at a pH of 7.0 and contains 7.5 wt % sodium salts (Na.sub.2SO.sub.4, Na.sub.2SO.sub.3 and NaHSO.sub.3). During contact between the inlet gas and the scrubbing liquid in the first stage compact venturi scrubbers, the liquid droplets absorb SO.sub.2, converting some of the Na.sub.2SO.sub.3 to NaHSO.sub.3 resulting in a decrease in the scrubbing liquid pH. The new liquid composition has an SO.sub.2 equilibrium vapor pressure of 0.0007 psia, equivalent to an SO.sub.2 concentration of 50 vppm in the treated gas. Contacting in the first stage compact venturi scrubbers is not complete and contact time is limited so the system can only achieve an 80% approach to equilibrium resulting in a treated gas SO.sub.2 concentration of 62.5 vppm. The second stage scrubbing liquid chemistry is controlled independently of the first stage by controlled make-up liquid and reagent addition. In the example case the second stage liquid is controlled to a pH of 7.3 and 2.5 wt % sodium salts. During contact between the inlet gas and the scrubbing liquid in the second stage compact venturi scrubbers, the liquid droplets absorb SO.sub.2, converting some of the Na.sub.2SO.sub.3 to NaHSO.sub.3 resulting in a decrease in the scrubbing liquid pH. Since the amount of SO.sub.2 in the gas is much lower than the gas entering the first stage (96.9% of the inlet SO.sub.2 has been removed in the first stage) much less Na.sub.2SO.sub.3 is converted to NaHSO.sub.3 and the pH drop is proportionately lower than in the first stage. The scrubbing liquid composition exiting the second stage compact venturi scrubbers has an SO.sub.2 equilibrium vapor pressure of 0.00007 psia, equivalent to an SO.sub.2 concentration of 5 vppm in the treated gas. Gas—liquid contacting in the second stage compact venturi scrubbers is not complete and contact time is limited so, like the first stage, the second stage compact venturi scrubbers can only achieve an 80% approach to equilibrium resulting in a final treated gas SO.sub.2 concentration of 6.25 vppm.
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[0042] Interstage gas treatment with a secondary gaseous stream can be implemented using simple gas dispersion nozzles generally without the need for the facilities described in the previous paragraph for circulating liquid interstage systems.
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[0049] An embodiment of the present invention can be comprised of one or more scrubbing stages utilizing the compact venturi scrubber(s) described herein with or without any number of inter-stage gas treatment sections.
[0050] An embodiment of the present invention can be comprised of one or more scrubbing stages utilizing the compact venturi scrubber(s) described herein situated downstream of a conventional spray or tray tower contacting section.
[0051] An embodiment of the present invention can be used to retrofit existing scrubbing systems based on low energy contacting such as spray or tray towers, packed bed columns, and similar contacting methods. An embodiment of the present invention may entail placing one or more scrubbing stage(s) utilizing the compact venturi scrubber(s) described herein downstream of the existing scrubber and situated inside the existing scrubber enclosure, which enclosure might be a tower, column, duct, or similar structures.
[0052] An embodiment of the present invention can be used to replace existing low collection efficiency contacting stages of existing scrubbing systems to improve scrubbing performance, increase scrubber gas capacity, or to decrease scrubber energy demand. An embodiment of the present invention is well suited for acid gas, acid fume, and particulate removal from contaminated gas streams.
[0053] An embodiment of the present invention is well suited for gas phase reactor outlet combined quenching and contaminant removal applications. As an example, quenching, killing, or stopping the polymerization reaction catalyzed by ammonia in the outlet stream from an acrylonitrile reactor, cooling the resulting treated gas stream, and condensing some of the water contained in the inlet gas stream may be accomplished using an embodiment of the present invention. In this application sulfuric acid, added to an aqueous circulating liquid stream, reacts with absorbed ammonia forming soluble ammonium sulfate salt which is discharged from the system dissolved in the aqueous purge stream.
[0054] An embodiment of the present invention is well suited for adding the capability for removing carbon dioxide (CO2) from flue gases emanating from the combustion of hydrocarbon fuels (natural gas, produced gas, well head gas, liquid oil fuels, coke, carbon coal, wood, and biomass) and from process and vent gas streams emanating from a myriad of chemical, petrochemical, polymer, pharmaceutical, and metal manufacturing processes which may or may not already have treatment facilities. The small footprint of gas treatment systems utilizing the novel compact venturi scrubber can significantly reduce installation costs and the low pressure drop of such systems will in many cases eliminate the need for modifications to or replacement of existing upstream equipment, common when other types of scrubbing systems are employed.
[0055] An embodiment of the present invention is well suited for controlling the emissions of CO2 from cement, lime, limestone and other mineral processing and manufacturing operations. The low back pressure of a scrubbing system based on the novel compact venturi scrubber will in many cases eliminate the need for modifications to or replacement of existing upstream equipment, common when other types of wet scrubbing systems are employed. For new grass roots manufacturing and processing facilities, multi component control can be achieved in scrubbers based on the novel compact venturi, eliminating the need for separate emissions control systems saving capital cost, operating cost and plant plot space.
[0056] While the present invention has been described at some length and with some particularity with respect to the several described embodiments, it is not intended that it should be limited to any such particulars or embodiments or any particular embodiment, but it is to be construed with references to the appended claims so as to provide the broadest possible interpretation of such claims in view of the prior art and, therefore, to effectively encompass the intended scope of the invention. Furthermore, the foregoing describes the invention in terms of embodiments foreseen by the inventor for which an enabling description was available, notwithstanding that insubstantial modifications of the invention, not presently foreseen, may nonetheless represent equivalents thereto.