POWDER ATOMIC LAYER DEPOSITION APPARATUS FOR BLOWING POWDERS
20220136103 · 2022-05-05
Inventors
- JING-CHENG LIN (Hsinchu County, TW)
- JUNG-HUA CHANG (Hsinchu County, TW)
- CHIA-CHENG KU (Hsinchu County, TW)
Cpc classification
C23C16/4412
CHEMISTRY; METALLURGY
C23C16/4417
CHEMISTRY; METALLURGY
C23C16/54
CHEMISTRY; METALLURGY
International classification
C23C16/455
CHEMISTRY; METALLURGY
Abstract
A powder atomic layer deposition apparatus for blowing powders is disclosed. The powder atomic layer deposition apparatus includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit drives the vacuum chamber to rotate through the shaft sealing device. The shaft sealing device includes an outer tube and an inner tube, wherein the inner tube is arranged in an accommodating space of the outer tube. At least one air extraction line and at least one air intake line are located in the inner tube, wherein the air intake line extends from the inner tube into a reaction space within the vacuum chamber, and is used to transport the a non-reactive gas to the reaction space to blow the powders around in the reaction space.
Claims
1. A powder atomic layer deposition apparatus for blowing powders, comprising: a vacuum chamber, comprising a reaction space for accommodating a plurality of powders; a shaft sealing device, comprising an outer tube and an inner tube, the outer tube having an accommodating space for accommodating the inner tube; a driving unit, connected to the vacuum chamber via the shaft sealing device, wherein the driving unit drives the vacuum chamber to rotate through the shaft sealing device; at least one air extraction line, disposed in the inner tube and fluidly connected to the reaction space of the vacuum chamber, for extracting a gas from the reaction space; and at least one air intake line, extending from the inner tube into the reaction space toward a surface of the reaction space, for transporting a non-reactive gas to the reaction space, wherein the non-reactive gas blows the powders around in the reaction space.
2. The powder atomic layer deposition apparatus of claim 1, wherein the reaction space comprises two bottom sides and at least one abutment side connected to the two bottom sides, and the air intake line extends in a direction toward the abutment side or one of the bottom sides of the reaction space.
3. The powder atomic layer deposition apparatus of claim 2, wherein the air intake line comprises at least one non-reactive gas line extending from the inner tube into the reaction space and toward the abutment side or one of the bottom sides of the reaction space, for transporting the non-reactive gas to the reaction space to blow the powders around in the reaction space.
4. The powder atomic layer deposition apparatus of claim 3, wherein the non-reactive gas line comprises an extension line, the extension line is disposed in the reaction space and extends in a direction toward the abutment side or one of the bottom sides of the reaction space.
5. The powder atomic layer deposition apparatus of claim 4, wherein the extension line comprises an outlet facing toward the shaft sealing device, and the outlet outputs the non-reactive gas to blow the powders around in the reaction space.
6. The powder atomic layer deposition apparatus of claim 4, wherein the vacuum chamber comprises a cover lid and a chamber, the cover lid covers the chamber to form the reaction space between the cover lid and the chamber, and the extension line comprises an outlet facing toward the cover lid and outputs the non-reactive gas through the outlet to blow the powders around in the reaction space.
7. The powder atomic layer deposition apparatus of claim 1, wherein the air intake line transports a precursor to the reaction space.
8. The powder atomic layer deposition apparatus of claim 4, wherein the inner tube extends from the accommodating space of the outer tube into the reaction space of the vacuum chamber and forms a protruding tube part in the reaction space.
9. The powder atomic layer deposition apparatus of claim 8, wherein the extension line passes through the protruding tube part of the inner tube and extends in a direction toward the abutment side or one of the bottom sides of the reaction space.
10. The powder atomic layer deposition apparatus of claim 4, further comprising a filter unit disposed at one end of the inner tube connecting to the reaction space, wherein the air extraction line is fluidly connected to the reaction space via the filter unit, and the extension line passes through the filter unit and extends in a direction toward the abutment side or one of the bottom sides of the reaction space.
11. The powder atomic layer deposition apparatus of claim 10, wherein the extension line comprises a plurality of outlets disposed on a side wall of the extension line and facing an abutment side of the reaction space, and a non-reactive gas is transported by the extension line and flows toward the abutment side of the reaction space through the plurality of outlets to blow the powders around in the reaction space.
12. The powder atomic layer deposition apparatus of claim 11, wherein the plurality of outlets on the extension line face the abutment side at lower half of the reaction space.
13. A powder atomic layer deposition apparatus for blowing powders, comprising: a vacuum chamber, comprising a reaction space for accommodating a plurality of powders; a shaft sealing device, comprising an outer tube and an inner tube, the outer tube having an accommodating space for accommodating the inner tube, wherein the inner tube extends from the accommodating space of the outer tube to the reaction space of the vacuum chamber and forms a protruding tube part in the reaction space; a driving unit, connected to the vacuum chamber via the outer tube of the shaft sealing device, wherein the driving unit drives the vacuum chamber to rotate through the outer tube; at least one air extraction line, disposed in the inner tube and fluidly connected to the reaction space of the vacuum chamber, for extracting a gas from the reaction space; and at least one air intake line, passing through a tube wall of the protruding tube part and extending from the inner tube into the reaction space to form an extension line in the reaction space, wherein the extension line comprises a plurality of outlets disposed on a side wall of the extension line and face an abutment side of the reaction space, the extension line transports a non-reactive gas to flow toward the abutment side of the reaction space through the plurality of outlets, and the non-reactive gas blows the powders around in the reaction space.
14. The powder atomic layer deposition apparatus of claim 13, wherein the plurality of outlets on the extension line face the abutment side at lower half of the reaction space.
15. The powder atomic layer deposition apparatus of claim 14, wherein the reaction space has a columnar shape and comprises two bottom sides and the abutment side, the abutment side is connected to the two bottom sides, and the extension line extends in a direction toward the bottom sides and the abutment side of the reaction space.
16. The powder atomic layer deposition apparatus of claim 13, wherein the air intake line comprises at least one non-reactive gas line extending from the inner tube into the reaction space to form the extension line.
17. The powder atomic layer deposition apparatus of claim 13, further comprising a filter unit disposed at one end of the inner tube connecting to the reaction space.
18. A powder atomic layer deposition apparatus for blowing powders, comprising: a vacuum chamber, comprising a reaction space for accommodating a plurality of powders; a shaft sealing device, comprising an outer tube and an inner tube, the outer tube having an accommodating space for accommodating the inner tube, the inner tube extending from the accommodating space of the outer tube to the reaction space of the vacuum chamber and forming a protruding tube part in the reaction space, wherein the protruding tube part comprises a plurality of outlets that pass through a tube wall of the protruding tube part and face toward an abutment side of the reaction space; a driving unit, connected to the vacuum chamber via the outer tube of the shaft sealing device, wherein the driving unit drives the vacuum chamber to rotate through the outer tube; at least one air extraction line, disposed in the inner tube and fluidly connected to the reaction space of the vacuum chamber, for extracting a gas from the reaction space; and at least one air intake line, disposed in the inner tube and the protruding tube part and fluidly connected to the plurality of outlets, for transporting a non-reactive gas to the reaction space, wherein the gas flows toward the abutment side of the reaction space through the plurality of outlets and blows the powders around in the reaction space.
19. The powder atomic layer deposition apparatus of claim 18, wherein the plurality of outlets on the extension line face the abutment side at lower half of the reaction space.
20. The powder atomic layer deposition apparatus of claim 18, wherein the air intake line comprises at least one non-reactive gas line extending from the inner tube into the reaction space to form an extension line.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0026] The structure as well as preferred modes of use, further objects, and advantages of this present disclosure will be best understood by referring to the following detailed description of some illustrative embodiments in conjunction with the accompanying drawings, in which:
[0027]
[0028]
[0029]
[0030]
[0031]
[0032]
[0033]
[0034]
[0035]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0036] Referring to
[0037] The vacuum chamber 11 has a reaction space 12 for accommodating a plurality of powders 121 such as quantum dots. The quantum dots may be made of semiconductor material like ZnS, CdS, CdSe, etc in groups II˜VI, and a thin film formed on each of the quantum dots may be aluminum oxide (Al.sub.2O.sub.3). The vacuum chamber 11 includes a cover lid 111 and a chamber 113, wherein an inner surface 1111 of the cover lid 111 is used to cover the chamber 113 so as to form the reaction space 12 between the cover lid 111 and the chamber 113.
[0038] In one embodiment, a monitor wafer 115 is disposed on the inner surface 1111 of the cover lid 111, wherein the monitor wafer 115 is positioned inside the reaction space 12 when the cover lid 111 covers the chamber 113. During the ALD process in the reaction space 12, a thin film is formed on the surface of the monitor wafer 115. In practice, the thickness of the thin film formed on the surface of the monitor wafer 115 and the thickness of the thin film formed on the surface of the powder 121 can be measured to calculate a relation between the two thin films. Subsequently, the thickness of the thin film formed on the surface of the powder 121 can be obtained by measuring the thickness of the thin film formed on the surface of the monitor wafer 115 and converting the measured thickness based on the relation.
[0039] The shaft sealing device 13 includes an outer tube 131 and an inner tube 133, wherein the outer tube 131 has an accommodating space 132 and the inner tube 133 has a connection space 134. The outer tube 131 and the inner tube 133 may, for example, be hollow columnar objects. The accommodating space 132 of the outer tube 131 is used to accommodate the inner tube 133, and the outer tube 131 and the inner tube 133 are configured to be coaxial. The shaft sealing device 13 can be a common shaft seal or a magnetic fluid shaft seal that is mainly used for isolating the reaction space 12 of the vacuum chamber 11 from outer spaces to maintain vacuum in the reaction space 12.
[0040] The driving unit 15 is connected to one end of the shaft sealing device 13 and drives the vacuum chamber 11 to rotate through the shaft sealing device 13. The driving unit may, for example, be connected to the vacuum chamber 11 via the outer tube 131, and through the outer tube 131, drives the vacuum chamber 11 to rotate. The driving unit 15 is not connected to the inner tube 133, therefore when the driving unit 15 drives the outer tube 131 and the vacuum chamber 11 to rotate, the inner tube 133 does not rotate along therewith.
[0041] The driving unit 15 may drive the outer tube 131 and the vacuum chamber 11 to rotate continuously in one direction or in the same direction, like clockwise or counterclockwise. In different embodiments, the driving unit 15 may drive the outer tube 131 and the vacuum chamber 11 to rotate in the clockwise direction by a specific angle, and then in the counterclockwise direction by the specific angle; the angle is, for example, 360 degrees. As the vacuum chamber 11 rotates, the powders 121 in the reaction space 12 are stirred and agitated, which in turn facilitates the powders 121 to be heated evenly and to come in contact with a precursor gas or a non-reactive gas.
[0042] In one embodiment, the driving unit 15 is a motor, which is connected to the outer tube 131 via a gear 14, and through the gear 14, drives the outer tube 131 and the vacuum chamber 11 to rotate.
[0043] As shown in
[0044] The air extraction line 171 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to extract gas from the reaction space 12 to create vacuum in the reaction space 12 for subsequent ALD process. In particular, the air extraction line 171 can connect to a pump and use the pump to extract the gas in the reaction space 12.
[0045] The air intake line 173 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to transport a precursor or a non-reactive gas to the reaction space 12, wherein the non-reactive gas may be a noble gas like nitrogen or argon. The air intake line 173 can, for example, be connected to a precursor storage tank and a non-reactive gas storage tank via a valve set, and through the valve set, transport the precursor to the reaction space 12 for the precursor to be deposited on the surface of each powder 121. In practical application, the air intake line 173 may transport a carrier gas together with the precursor to the reaction space 12. Then, the air intake line 173 transports the non-reactive gas to the reaction space 12 through the valve set in addition to the air extraction line 171 extracting gas from the reaction space 12, to remove the precursor in the reaction space 12. In one embodiment, the air intake line 173 is connected to a plurality of branch lines and transports different precursors to the reaction space 12 sequentially through the respective branch lines.
[0046] The air intake line 173 is also capable of increasing a flow of non-reactive gas delivered to the reaction space 12, so as to blow the powders 121 around in the reaction space 12 by the non-reactive gas, such that the powders 121 are carried by the non-reactive gas and diffused to various areas and all regions of the reaction space 12.
[0047] In one embodiment, the air intake line 173 includes the at least one non-reactive gas line 175, wherein the non-reactive gas line 175 is fluidly connected to the reaction space 12 of the vacuum chamber 11 and is used to transport a non-reactive gas to the reaction space 12. The non-reactive gas line 175 can, for example, be connected to a nitrogen storage tank via a valve set, and through the valve set, transport nitrogen to the reaction space 12. The non-reactive gas is used to blow the powders 121 around in the reaction space 12, and in combination with the rotating of the vacuum chamber 11 driven by the driving unit 15, the powders 121 in the reaction space 12 are effectively and evenly stirred and agitated, thereby contributing in forming a thin film with a uniform thickness on the surface of each powder 121.
[0048] The air intake line 173 and the non-reactive gas line 175 of the powder atomic layer deposition apparatus 10 for blowing powders are both used to transport non-reactive gas to the reaction space 12. The flow of non-reactive gas transported by the air intake line 173 is smaller as the main purpose of which is for removing the precursor in the reaction space 12, whereas the flow of non-reactive gas transported by the non-reactive gas line 175 is larger and is mainly used to blow the powders 121 around in the reaction space 12.
[0049] More specifically, the timings at which the air intake line 173 and the non-reactive gas line 175 transport the non-reactive gas to the reaction space 12 are different. Hence, the non-reactive gas line 175 may be omitted in practical application, and instead, the flow of non-reactive gas transported by the air intake line 173 at different timings is adjusted. When removing the precursor from the reaction space 12, the flow of non-reactive gas being transported to the reaction space 12 by the air intake line 173 is lowered, and when blowing the powders 121 around in the reaction space 12, the flow of non-reactive gas being transported to the reactions space 12 by the air intake line 173 is enlarged.
[0050] When the driving unit 15 drives the outer tube 131 and the vacuum chamber 11 to rotate, the inner tube 133 and the air extraction line 171, the air intake line 173 and/or the non-reactive gas line 175 disposed in the inner tube 133 do not rotate along therewith, which in turn keeps a stable supply of non-reactive gas and/or precursor to the reaction space 12 by the air intake line 173 and/or the non-reactive gas line 175.
[0051] The heater 177 is used to heat the connection space 134 and the inner tube 133. By heating the air extraction line 171, the air intake line 173 and/or the non-reactive gas line 175 in the inner tube 133 with the heater 177, temperatures of the gases in the air extraction line 171, the air intake line 173 and/or the non-reactive gas line 175 are raised. For example, the temperature of non-reactive gas and/or precursor transported by the air intake line 173 to the reaction space 12 may be raised, and the temperature of non-reactive gas transported by the non-reactive gas line 175 to the reaction space 12 may be raised. As such, when the non-reactive gas and/or the precursor enter the reaction space 12, the temperature of the reaction space 12 would not drop or change drastically. Moreover, the temperature sensing unit 179 is used to measure the temperature of the heater 177 or the connection space 134 to monitor an operation status of the heater 177. Additional heating device 15 is also often disposed inside of, outside of, or as shown in
[0052] In one embodiment, the air intake line 173 and/or the non-reactive gas line 175 extend from the inner tube 133 of the shaft sealing device 13 into the reaction space 12 of the vacuum chamber 11 in a direction toward a surface of the reaction space 12. The air intake line 173 and/or the non-reactive gas line 175 extend, for example, from the connection space 134 of the inner tube 133 into the reaction space 12 of the vacuum chamber, and the part of the air intake line 173 and/or the non-reactive gas line 175 that extends into the reaction space 12 is defined as an extension line 172.
[0053] In one embodiment, the reaction space 12 has a columnar shape and includes two bottom sides 122 and at least one abutment side 124, wherein the abutment side 124 is connected to the two bottom sides 122. The air intake line 173, the non-reactive gas line 175 and/or the extension line 172 in the reaction space 12 extend toward the abutment side 124 of the reaction space 12, such as extending toward the abutment side 124 at the lower half of the reaction space 12.
[0054] The extension line 172 includes an outlet 1721 that faces the shaft sealing device 13, and the non-reactive gas is blown or output through the outlet 1721 by the extension line 172 toward a direction of the shaft sealing device 13 to blow the powders 121 around. As shown in
[0055] In different embodiments, the turning angle between the second section and the third section may be greater than 90 degrees, such that there is an included angle between a line of extension of the outlet 1721 and the abutment side 124 of the reaction space 12. Thus, the outlet 1721 outputs the non-reactive gas downwardly in a slanted manner to blow powders 121 around in the reaction space 12 as shown in
[0056] In one embodiment, the extension line 172 may be straight. For example, the extension line 172 may only has one section that extends in a direction from the shaft sealing device 13 toward the cover lid 111, so as to shorten a distance between the outlet 1721 of the extension line 172 and the cover lid 111. Or, the extension line 172 may be curved, and the turning angle is rounded. In other embodiments, the extension line 172 includes four sections and three turning angles as shown in
[0057] In general, a filter unit 139 is disposed at one end of the inner tube 133 that is connected to the reaction space 12. The air extraction line 171, the air intake line 173 and/or the non-reactive gas line 17 in the inner tube 133 are fluidly connected to the reaction space 12 of the vacuum chamber 11 via the filter unit 139.
[0058] With the placement of the filter unit 139, the powders 121 in the reaction space 12 are prevented from being extracted out of the reaction space 12 when gas is being extracted from the reaction space 12 by the air extraction line 171 and leaving the reaction space 12 through the air intake line 173 and/or the non-reactive gas line 175, and thus a loss of powders is saved.
[0059] In one embodiment, the extension line 172 passes through the filter unit 139 and extends to the reaction space 12, wherein the outlet 1721 of the extension line 172 faces the shaft sealing device 13, as shown in
[0060] In one embodiment, the inner tube 133 of the shaft sealing device 13 extends from the accommodating space 132 of the outer tube 131 to the reaction space 12 of the vacuum chamber 11 and the inner tube 133 forms a protruding tube part 130 in the reaction space 12. The extension line 172 passes through the protruding tube part 130 of the inner tube 133 and extends in a direction toward the abutment side 124 of the reaction space 12, wherein the outlet 1721 of the extension line 172 faces the shaft sealing device 13 or the cover lid 111, as shown in
[0061] In practical application, the height of the outlet 1721 of the extension line 172 may be adjusted or the amount of powder 121 in the reaction space 121 may be controlled, to ensure that the powders 121 in the reaction space 12 does not cover the outlet 1721 of the extension line 172 when the vacuum chamber 11 is stationary and not in motion, so a loss of powders 121 can be reduced. In addition, another filter unit can be disposed at the outlet 1721 of the extension line 172 to further reduce the loss of powders 121.
[0062] In other embodiments, the extension line 172 transports the non-reactive gas to the reaction space 12 continuously and adjusts a flow of non-reactive gas. More specifically, the extension line 172 outputs the non-reactive gas in different modes which include a stirring mode and a normal mode. In the stirring mode, the flow of non-reactive gas output by the extension line 172 is greater and the output non-reactive gas stirs and agitates the powders 121 in the reaction space 12. In the normal mode, the flow of non-reactive gas output by the extension line 172 is smaller. Although the output non-reactive gas in the normal mode may not be able to stir the powders in the reaction space 12, it forms a positive pressure at the outlet 1721 of the extension line 172, which in turn prevents the powders 121 from entering the extension line 172 through the outlet 1721.
[0063] In another embodiment as shown in
[0064] In one embodiment, the powder atomic layer deposition apparatus 10 for blowing powders further includes a support base 191 and at least one mount bracket 193, wherein the support base 191 is a board body for placing the driving unit 15, the vacuum chamber 11, and the shaft sealing device 13 thereon. The support base 191 is connected to the driving unit 15, and is connected to the shaft sealing device 13 and the vacuum chamber 11 via the driving unit 15. The shaft sealing device 13 and/or the vacuum chamber 11 can also be connected to the support base 191 via at least one support member so as to enhance the stability of connection.
[0065] The support base 191 is connected to the mount bracket 193 via at least one connecting shaft 195, wherein the number of mount brackets 193 is two and the two mount brackets 193 are respectively disposed at two sides of the support base 191. The support base 191 is rotatable relative to the mount brackets 193 with the connecting shaft 195 as axis, so as to change an inclination angle of the driving unit 15, the shaft sealing device 13, and the vacuum chamber 11, and in turn assist in the formation of a thin film with a uniform thickness on the surface of each powder 121.
[0066] In another embodiment as shown in
[0067] The air extraction line 171, the air intake line 173, the non-reactive gas line 175, the heater 177 and/or the temperature sensing unit 179 extend into the protruding tube part 130, wherein the air intake line 173 and/or the non-reactive gas line 175 are fluidly connected to the outlets 1331 on the tube wall of the inner tube 133 or the protruding tube part 130. In specific, the outlets 1331 disposed on the tube wall of the protruding tube part 130 or the inner tube 133 face the abutment side 124 at the lower half of the reaction space 12, so that the air intake line 173 or the non-reactive gas line 175 can transport and direct the non-reactive gas to flow through the outlets 1331 and toward the abutment side 124 at the lower half of the reaction space 12 and to blow the powders 121 around in the reaction space 12. In one embodiment, the air intake line 173 or the non-reactive gas line 175 are integrated to the inner surface of the inner tube 133 and connected to the outlets 1331 disposed on the inner tube 133.
[0068] In another embodiment shown in
[0069] In different embodiments, the outlets 1721 of the extension line 172 face the cover lid 111 and/or the monitor wafer 115 on the cover lid 111. Through the outlets 1721 of the extension line 172, the non-reactive gas is blown toward the bottom side 122 of the reaction space 12 and/or the monitor wafer 115.
[0070] Furthermore, the extension line 172 and the non-reactive gas line 175 can be two separate lines, and the extension line 172 can be fixed to the non-reactive gas line 175 by screw and is detachable from the non-reactive gas line 715.
[0071] The above disclosure is only the preferred embodiment of the present disclosure, and not used for limiting the scope of the present disclosure. All equivalent variations and modifications on the basis of shapes, structures, features and spirits described in claims of the present disclosure should be included in the claims of the present disclosure.