Method for marking a sapphire watch crystal
11320790 · 2022-05-03
Assignee
Inventors
Cpc classification
G04B45/0084
PHYSICS
B41M5/262
PERFORMING OPERATIONS; TRANSPORTING
International classification
G04B39/00
PHYSICS
Abstract
A method for marking a sapphire watch crystal, through the interaction between a laser beam and the sapphire. The beam is focused on a point inside the crystal and the interaction is such that it produces a rectilinear opaque area, which is parallel to the upper surface of the crystal or perpendicular to the surface. The orientation of the opaque area depends on the mode of operation applied. According to the hatching mode of operation, the beam is scanned along one or more linear paths, producing opaque lines inside the crystal, which are parallel to the upper surface. The perforation mode of operation produces distinct opaque areas, obtained by discontinuous operation of the beam on a number of juxtaposed points. According to this latter mode of operation, the opaque areas extend in the direction perpendicular to the upper surface of the crystal.
Claims
1. A method for marking a sapphire watch crystal, the crystal having a plane upper surface and a lower surface, the method comprising: using a laser beam directed perpendicularly to the upper surface; focusing the laser beam at a point inside the material of the crystal, wherein an interaction between the laser and the sapphire at the focal point produces a rectilinear opaque area which extends along a path in a direction parallel to the upper surface or in a direction perpendicular to said upper surface; forming a plurality of parallel rectilinear opaque paths with the laser beam which extend in the direction parallel to the upper surface or in the direction perpendicular to said upper surface, in order to mark a first portion of the crystal in a first hatching step, wherein the laser beam is scanned at a scanning speed between 2 m/s and 3 m/s, and wherein a distance between each of the plurality of parallel rectilinear opaque paths is 10 μm to 20 μm.
2. The method according to claim 1, wherein the laser beam is scanned along a linear path while remaining focused on a point at a fixed distance with respect to the upper surface of the crystal, and wherein said plurality of parallel rectilinear opaque paths are essentially parallel to the upper surface of the crystal.
3. The method according to claim 1, wherein a second hatching step is performed in a transverse direction with respect to the first step, the second step being performed on a second portion of the crystal, which at least partially covers the first portion, the second hatching step being performed at the same distance respect to the upper surface as the first hatching step.
4. The method according to claim 1, wherein several hatching operations, comprising one or two steps, are performed at successive levels in the material, in order to obtain a three-dimensional marking, and wherein the rectilinear opaque areas formed at two adjacent levels are separate from each other.
5. The method according to claim 2, wherein parameters of the laser beam are as follows: TABLE-US-00005 Type of laser Pulse laser Pulse length 200 fs-10 ps.sup. Wavelength 500 nm-1200 nm Pulse frequency 200 kHz-1.5 MHz Laser energy 1 μJ-20 μJ.
6. The method according to claim 2, wherein geometric parameters are defined as follows: TABLE-US-00006 Depth of the laser focal point 0.5 mm-1 mm.
7. The method according to claim 1, wherein the laser beam is focused consecutively on a plurality of juxtaposed points located at the same distance from the upper surface, and wherein the rectilinear opaque paths are produced at each of the points, said areas extending in the direction perpendicular to the upper surface.
8. The method according to claim 7, wherein several marking steps are performed at successive levels in the material, in order to obtain a three-dimensional marking, and wherein the rectilinear opaque areas formed on two adjacent levels are separate from each other.
9. The method according to claim 7, wherein values of laser parameters are as follows: TABLE-US-00007 Type of laser Pulse laser Pulse length 200 fs-10 ps.sup. Wavelength 500 nm-1200 nm Pulse frequency 200 kHz-1.5 MHz Laser energy 1 μJ-20 μJ Laser on time 0.01 ms-0.1 ms.
10. The method according to claim 7, wherein values of geometric parameters are defined as follows: TABLE-US-00008 Distance between two adjacent 0.01 mm-0.03 mm points Depth of the laser focal point 0.5 mm-1 mm.
11. The method according to claim 1, wherein the upper surface of the crystal is provided with an anti-reflective layer.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
DETAILED DESCRIPTION OF EMBODIMENTS OF THE INVENTION
(5) In both modes of operation of the invention, respectively illustrated in
(6) In the non-limiting examples represented, crystal 1 has an upper surface 2 and a lower surface 3, which are essentially plane and parallel with respect to one another. According to the first mode of operation (
(7) According to a preferred embodiment, these dimensions can be controlled as a function of the power of the laser and the design to be etched. The order of magnitude of height H ranges from one micrometre to several hundreds of micrometres, for example up to 200 micrometres. Without being bound by theory, it is estimated that each opaque area is formed of a plurality of microfissures which extend in the direction of the scanning path.
(8) The main parameter that makes it possible to obtain rectilinear areas 6 parallel to upper surface 2 of the crystal is the scanning speed. This speed is considerably higher than the speeds used for material removal etching of a sapphire crystal.
(9) Preferably, the scanning speed according to the invention is between 2 m/s and 3 m/s, for example 2.5 m/s. Further, it is necessary for the laser to operate at a speed suitable for etching a watch crystal. Table 1a gives the preferred values for the laser operating parameters used in the first operating mode:
(10) TABLE-US-00001 TABLE 1a Type of laser Pulse laser Pulse length 200 fs-10 ps Wavelength 500 nm-1200 nm Pulse frequency 200 kHz-1.5 MHz Laser energy 1 μJ-20 μJ
(11) Table 1a gives preferred values for a number of geometric parameters used in the first operating mode:
(12) TABLE-US-00002 TABLE 1b Distance between two adjacent 10 μm-20 μm opaque areas 6 (measured between the central lines of areas 6) Depth of laser focal point 5 0.5 mm-1 mm (distance ‘a’ in FIG. 1).
(13) According to a specific embodiment of the first operating mode, a second hatching step is performed in a transverse direction to the direction of the first step.
(14) The hatching operating mode can be used to create a three-dimensional shape, by performing the hatching at several levels in the material. This method starts with a first hatching step (single or crossed), focusing the laser at a distance a.sub.1 from upper surface 2, followed by one or more consecutive steps, at distances a.sub.2, a.sub.3, . . . which are progressively less than initial distance a.sub.1. In this manner, a 3D shape which has several layers is obtained. The distance between two layers is selected to avoid partial superposition of two adjacent layers.
(15) According to a second operating mode, illustrated in
(16) According to the method of the invention, the interaction between the laser and the sapphire produces a rectilinear opaque area 10, which extends in the direction of the beam, i.e. perpendicularly to upper surface 2 of crystal 1. As represented in the detail of
(17) Table 2a sets out the laser parameters that can preferably be used to achieve a marking according to this second mode of operation.
(18) TABLE-US-00003 TABLE 2a Type of laser Pulse laser Pulse length 200 fs-10 ps Wavelength 500 nm-1200 nm Pulse frequency 200 kHz-1.5 MHz Laser energy 1 μJ-20 μJ Laser on time 0.01 ms-0.1 ms
(19) Table 2b gives preferred values for a number of geometric parameters used in the second mode of operation:
(20) TABLE-US-00004 TABLE 2b Distance between two adjacent 0.01 mm-0.03 mm areas 10 (measured between the centres of two areas) Depth of laser focal point 0.5 mm-1 mm (distance ‘a’ in FIG. 3).
(21) In a similar manner to the first mode of operation, a three-dimensional marking can be obtained by perforation marking at several levels in the thickness of crystal 1. This method starts with a first perforation step, focusing the laser at a distance a.sub.1 from upper surface 2, followed by one or more consecutive steps, at distances a.sub.2, a.sub.3, . . . which are progressively less than initial distance a.sub.1. In this manner, a 3D shape which is formed of several layers is obtained. The distance between two layers is selected to avoid partial superposition of two adjacent layers.
(22) The method according to the invention also functions when an anti-reflective layer, for example, a layer of MgF.sub.2 or SiO.sub.2 is present on upper surface 2 of the crystal.
(23) The invention also concerns a sapphire watch crystal marked by any of the methods described above, and a watch provided with said crystal.