FeNi ordered alloy and method for manufacturing FeNi ordered alloy
11313004 · 2022-04-26
Assignee
Inventors
Cpc classification
B22F1/00
PERFORMING OPERATIONS; TRANSPORTING
B22F2999/00
PERFORMING OPERATIONS; TRANSPORTING
C22C30/00
CHEMISTRY; METALLURGY
B22F2998/10
PERFORMING OPERATIONS; TRANSPORTING
H01F1/068
ELECTRICITY
B22F2999/00
PERFORMING OPERATIONS; TRANSPORTING
B22F1/145
PERFORMING OPERATIONS; TRANSPORTING
C22C33/0285
CHEMISTRY; METALLURGY
International classification
C22C30/00
CHEMISTRY; METALLURGY
B22F1/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A method for manufacturing FeNi ordered alloy having a L1.sub.0 type order structure is provided. After a nitrification process for nitriding a powder sample of a FeNi disordered alloy arranged in a tube furnace is performed using a NH.sub.3 gas, a de-nitrification process for removing a nitrogen from the FeNi disordered alloy which is processed by the nitrification process is performed using a H.sub.2 gas. Thus, the L1.sub.0 type FeNi ordered alloy with a regularity defined by S equal to or higher than 0.5 is obtained.
Claims
1. An FeNi ordered alloy powder comprising: an L1.sub.0 order crystal structure; and a regularity defined by S, which is equal to or higher than 0.5, wherein: the regularity is defined by a X ray diffraction measurement.
2. The FeNi ordered alloy powder according to claim 1, wherein: the regularity S is obtained by an equation of:
3. The FeNi ordered alloy powder according to claim 1, wherein: a X ray diffraction pattern in the X ray diffraction measurement includes a diffraction peak from a (001)-plane as the super lattice diffraction and a diffraction peak from a (111)-plane as the fundamental diffraction; the diffraction peak from the (001)-plane has an integral intensity of a peak which is defined by ∫(001); the diffraction peak from the (111)-plane has an integral intensity of a peak which is defined by ∫(111); a diffraction strength ratio between the integral intensity of the peak defined by ∫(001) and the integral intensity of the peak defined by ∫(111) is obtained by an equation of:
∫(001)/∫(001)×100; and the diffraction strength ratio is equal to or larger than 0.4.
4. The FeNi ordered alloy powder according to claim 1, wherein: a composition range of Fe in the FeNi ordered alloy powder is disposed between 47 atomic % and 55 atomic %.
5. The FeNi ordered alloy powder according to claim 1, wherein: a volume average diameter of the FeNi ordered alloy powder is equal to or larger than 50 nanometers.
6. A magnetic material comprising: the FeNi ordered alloy powder according to claim 1.
7. An FeNi ordered alloy powder comprising: an L1.sub.0 order crystal structure; and a regularity defined by S, which is equal to or higher than 0.5, wherein: the regularity is defined by a X ray diffraction measurement; and a volume average diameter of the FeNi ordered alloy powder is equal to or larger than 30 nanometers.
8. The FeNi ordered alloy powder according to claim 7, wherein: the regularity S is obtained by an equation of:
9. The FeNi ordered alloy powder according to claim 7, wherein: a X ray diffraction pattern in the X ray diffraction measurement includes a diffraction peak from a (001)-plane as the super lattice diffraction and a diffraction peak from a (111)-plane as the fundamental diffraction; the diffraction peak from the (001)-plane has an integral intensity of a peak which is defined by ∫(001); the diffraction peak from the (111)-plane has an integral intensity of a peak which is defined by ∫(111); a diffraction strength ratio between the integral intensity of the peak defined by ∫(001) and the integral intensity of the peak defined by ∫(111) is obtained by an equation of:
∫(001)/∫(001)×100; and the diffraction strength ratio is equal to or larger than 0.4.
10. The FeNi ordered alloy powder according to claim 7, wherein: a composition range of Fe in the FeNi ordered alloy powder is disposed between 47 atomic % and 55 atomic %.
11. A magnetic material comprising: the FeNi ordered alloy powder according to claim 7.
Description
BRIEF DESCRIPTION OF DRAWINGS
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EMBODIMENTS
(17) Embodiments will be explained with reference to drawings. Here, the same or equivalent element according to each embodiment has the same reference numeral in the explanation.
First Embodiment
(18) A first embodiment will be explained. A L1.sub.0 type FeNi ordered alloy, i.e., FeNi super lattice according to the present embodiment is applied to magnetic material such as magnet material or magnetic storage material. The regularity S is equal to or larger than 0.5, and therefore, the magnetic property is excellent.
(19) Here, the regularity S shows the degree of the order in the FeNi super lattice. As described above, the L1.sub.0 type ordered structure has a structure with a face-centered cubic lattice as a unit cell. The structure has the lattice structure shown in
(20) Accordingly, for example, when the metal A is Ni, the metal B is Fe, Ni is shown as a white circle, and Fe is shown as a black circle, the regularity S of the FeNi alloy between the FeNi disordered alloy with the regularity S of zero and the FeNi supper lattice with the regularity S of 1 is shown in
(21) Regarding the regularity S defined above, for example, when the site I is mainly occupied by the metal A, i.e., Ni, and the site II is mainly occupied by the metal B, i.e., Fe, and at least an average regularity S as a whole is equal to or larger than 0.5, an excellent magnetic property may be obtained. Here, regarding the regularity S, it is necessary to be high value in average as a whole of material. Thus, even if the value is locally high, the excellent magnetic property may not be obtained. Accordingly, even if the value is locally high, the material does not belong to a case where the average regularity S as a whole is equal to or larger than 0.5.
(22) The L1.sub.0 type FeNi ordered alloy is prepared by executing the de-nitrification process for removing nitrogen from the FeNi disordered alloy which is processed by the nitrification process after the nitrification process for nitriding the FeNi disordered alloy is performed. Here, the disordered alloy has no regularity of an atomic arrangement so that the arrangement is random.
(23) The manufacturing method of the L1.sub.0 type FeNi ordered alloy according to the present embodiment will be explained in detail with reference to embodiment examples S3, S4, S5, S6, S7, S8, S9, S12, S13 and S13 and the comparison examples S0, S1, S2, S10, S11, S15 and S16 shown in
(24) The above embodiment examples and comparison examples are prepared by executing the nitrification process and the de-nitrification process of powder samples of the FeNi disordered alloy, which is manufactured by a thermal plasma method, a frame spray method and a co-precipitation method, shown in
(25) Here, regarding the powdered samples of the FeNi disordered alloy in the embodiment examples and the comparison examples shown in
(26) The nitrification process and the de-nitrification process are performed using a manufacturing device shown in
(27) Further, as shown in
(28) The manufacturing method according to the present embodiment using the above manufacturing device is described as follows. First, the powdered sample 100 made of the FeNi disordered alloy is arranged in the tube furnace 10. In the nitrification process, the NH.sub.3 gas is introduced into the tube furnace 10, so that the inside of the tube furnace 10 is filled with the NH.sub.3 atmosphere. Then, the FeNi disordered alloy is heated at predetermined temperature for a predetermined interval so as to nitride the alloy.
(29) Then, in the de-nitrification process, the H.sub.2 gas is introduced into the heating furnace so that the inside of the tube furnace 10 is filled with the H.sub.2 atmosphere. Then, the FeNi disordered alloy, which is processed by the nitrification process, is heated at predetermined temperature for a predetermined interval so as to remove the nitrogen. Thus, the L1.sub.0 type FeNi ordered alloy having the average regularity S in a whole of material equal to or larger than 0.5 is obtained.
(30) Here, in the embodiment examples and the comparison examples shown in
(31) Further, the powder sample made of FeNi disordered alloy manufactured by the frame spray method is a product of Sigma-Aldrich Japan LLC having a model number of 677426-5G with a composition ratio of Fe:Ni=55:45, and a volume average diameter of 50 nanometers.
(32) Further, the powder sample made of FeNi disordered alloy manufactured by the co-precipitation method is prepared by hydrogen reduction of FeNi oxide, and has a composition ratio of Fe:Ni=47:53, and a volume average diameter of 200 nanometers.
(33) As shown in
(34) In the comparison example S1, the FeNi disordered alloy same as in the comparison example S0 is used, and then, the nitrification process is performed for 4 hours at 300° C. Then, the sample is evaluated by the X ray diffraction method without performing the de-nitrification process. In the comparison example S2, the FeNi disordered alloy same as in the comparison example S0 is used, and then, the de-nitrification process is performed for 4 hours at 300° C. without performing the nitrification process. Then, the sample is evaluated by the X ray diffraction method.
(35) In the embodiment example S3, the FeNi disordered alloy same as in the comparison example S0 is used, and then, the nitrification process is performed for 4 hours at 300° C. Further, the de-nitrification process is performed for 4 hours at 300° C. Then, the sample is evaluated by the X ray diffraction method. In the embodiment example S4, the FeNi disordered alloy manufactured by the frame spray method is used, and then, the nitrification process and the de-nitrification process similar to the embodiment example S3 are performed. Then, the sample is evaluated by the X ray diffraction method. In the embodiment example S5, the FeNi disordered alloy manufactured by the co-precipitation method is used, and then, the nitrification process and the de-nitrification process similar to the embodiment example S3 are performed. Then, the sample is evaluated by the X ray diffraction method.
(36) The embodiment examples S6, S7, S8, and S9 are conducted similar to the embodiment example S3 other than a condition such that the process temperature of the nitrification process is changed to 325° C., 350° C., 400° C. and 500° C., respectively. Further, the comparison examples S10 and S11, the embodiment examples S12, S13 and S14, and the comparison examples S15 and S16 are conducted similar to the embodiment example S3 other than a condition such that the process temperature of the de-nitrification process is changed to 150° C., 200° C., 250° C., 350° C., 400° C., 450° C. and 500° C., respectively.
(37) The evaluation by the X ray diffraction method whether the L1.sub.0 type order structure is formed is performed by comparing with the X ray diffraction pattern of an ideal FeNi ordered alloy having the regularity S of 1 shown in
(38) On the other hand, as shown in
(39) Thus, in the above embodiment examples and the comparison examples, the X ray diffraction measurement is performed. When the super lattice diffraction P1 appears in the measured pattern, it is determined that the L1.sub.0 type order structure is formed. When the super lattice diffraction P1 does not appear in the measured pattern, it is determined that the L1.sub.0 type order structure is not formed. Here, the determination is performed whether the peaks at 28° and 40°, which is easily recognizable in the super lattice diffraction P2, clearly appear.
(40) Thus, in
(41) In the above embodiment examples and the comparison examples, the regularity S of a sample, in which the L1.sub.0 type order structure is formed, is estimated according to a method described in the above Patent Literature 1. The estimation of the regularity S is performed using an estimation equation of the regularity S in the L1.sub.0 type FeNi ordered alloy shown in the following equation 1.
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(43) Here, in the equation 1, “I.sub.sup” indicates an integral intensity of a peak in the super lattice diffraction P1. “I.sub.fund” indicates an integral intensity of a peak in the fundamental diffraction P2. “(I.sub.sup/I.sub.dunf).sup.obs” indicates a ratio between the integral intensity of the super lattice diffraction P1 and the integral intensity of the fundamental diffraction P2 in the X ray diffraction pattern measured in each embodiment and each comparison example. Further, “(I.sub.sup/I.sub.fund).sup.cal” indicates a ratio between the integral intensity of the super lattice diffraction P1 and the integral intensity of the fundamental diffraction P2 in the X ray diffraction pattern shown in
(44) As shown in the equation 1, the regularity S is obtained by calculating a square root of a division of two ratios. Here, in the comparison example S11, the formation of the L1.sub.0 type order structure is shown as “YES.” According to the estimation equation, the regularity S is about 0.25, which is comparatively low. Thus, since the regularity S in the present embodiment is equal to or higher than 0.5, the example S11 is defined as the comparison example.
(45) In each of the embodiment examples and the comparison examples, a part of a typical sample of the measured X ray diffraction pattern is shown in
(46) In
(47) In
(48) In
(49) Further, with reference to
(50) As shown in
(51) Here, as described in the above embodiment examples and the above comparison examples, after the FeNi disordered alloy is processed by the nitrification process, the de-nitrification process for removing the nitrogen is performed, so that the L1.sub.0 type FeNi ordered alloy having the regularity S equal to or higher than 0.5 is obtained.
(52) The above method is a simple method with regard to a manufacturing apparatus and steps, compared with a conventional stacking method using a molecular beam epitaxy and a conventional thermal processing method with a neutron beam irradiation. Thus, in the present embodiment, the L1.sub.0 type FeNi ordered alloy having the high regularity S equal to or higher than 0.5 is easily synthesized.
(53) The L1.sub.0 type FeNi ordered alloy having the high regularity S equal to or higher than 0.5 has the high regularity S which is not conventional. The magnetic material made of this alloy has excellent magnetic properties which are not obtained by a conventional magnetic material made of a conventional L1.sub.0 type FeNi ordered alloy.
(54) Further, when the composition of Fe is around 50 atomic %, the L1.sub.0 type FeNi is easily formed. In the present embodiment, as described in the above embodiment examples and the above comparison examples, the high regularity with the regularity S equal to or higher than 0.5 is obtained when the alloy has the composition range of Fe between 55 atomic % and 47 atomic %.
(55) Further, it is preferable to prepare a powdered sample of the FeNi disordered alloy as described above in order to shorten the nitrification process and the de-nitrification process although the configuration of the sample is not specified. Specifically, it is preferable to prepare a nano-particle sample of the FeNi disordered alloy in order to perform these processes rapidly.
(56) Further, in the present embodiment, as described above, the regularity is confirmed even when the manufacturing methods of the powder of the FeNi disordered alloy are different. Furthermore, the manufacturing methods of the disordered alloy are not limited to the above described thermal plasma method, the frame spray method and the co-precipitation method.
(57) Further, when the L1.sub.0 type FeNi ordered alloy is formed, the nitrogen concentration in the nitride which is processed by the nitrification process is preferably in a range between 20 atomic % and 33 atomic % as an atomic weight ratio with respect to a total amount of Fe, Ni and nitrogen.
(58) Although not limited to the nitrification process and the de-nitrification process, in the present embodiment, as described above, the L1.sub.0 type FeNi ordered alloy is obtained by performing nitrification using ammonia gas and performing de-nitrification using hydrogen gas without contaminating an impurity.
(59) Further, as described in the above embodiment examples and the above comparison examples, when the nitrification process is performed using the ammonia gas, the process temperature is preferably equal to or higher than 300° C. and equal to or lower than 500° C. In each example shown in
(60) Further, as described above in
Second Embodiment
(61) A second embodiment will be explained. In the present embodiment, the regularity S is increased compared with the first embodiment. In the present embodiment, fundamental manufacturing steps are similar to the first embodiment. Thus, different features from the first embodiment will be explained.
(62) In the present embodiment, when the L1.sub.0 type FeNi ordered alloy is formed from the FeNi disordered alloy, the regularity S is further increased by producing an intermediate product. In the first embodiment, the nitrification process and the de-nitrification are performed. In the present embodiment, after terminating the nitrification process, FeNiN is produced as the intermediate product. At this time, a process for removing an oxide film, which is formed on a surface of the FeNi disordered alloy, is performed before the nitrification process in order to produce the intermediate product appropriately in the nitrification process. When the de-nitrification process is performed based on FeNiN as the intermediate product, the L1.sub.0 type FeNi ordered alloy is formed.
(63) Specifically, as shown in
(64) First, the FeNi disordered alloy is prepared. Then, since the oxide film is formed on the surface of the FeNi disordered alloy, the removal process for removing the oxide film on the surface of the FeNi disordered alloy is performed prior to the nitrification process. Then, the nitrification process is performed successively from the removal process.
(65) In the removal process, the thermal process is performed at, for example, temperature in a range between 300° C. and 450° C. in an etching atmosphere of the oxide film. Thus, the oxide film on the surface of the FeNi disordered alloy is removed, so that, under the surface condition, the sample is easily nitrided. In the nitrification process, the thermal process is performed at, for example, temperature in a range between 200° C. and 400° C. in atmosphere including nitrogen. Thus, the FeNi disordered alloy, which is easily nitrided by removing the oxide film, is easily nitrided appropriately, so that FeNiN as the intermediate product is formed.
(66) Next, the de-nitrification process is performed in FeNiN as the intermediate product. In the de-nitrification process, the thermal process is performed at, for example, temperature in a range between 200° C. and 400° C. in de-nitrification atmosphere. Thus, the nitrogen is removed from the intermediate product so that the L1.sub.0 type FeNi ordered alloy is formed. Thus, after FeNiN as the intermediate product is formed, the L1.sub.0 type FeNi ordered alloy is formed so that the higher regularity S is obtained.
(67) A concrete example will be explained such that, actually, the above described removal process, the nitrification process and the de-nitrification process are performed, and the L1.sub.0 type FeNi ordered alloy is formed.
(68) First, the removal process and the nitrification process are performed according to a profile shown in
(69) Specifically, a heating furnace such as the above described tube furnace 10 or a muffle furnace is prepared. The nano-particle sample made of the FeNi disordered alloy having the average diameter of 30 nanometers is arranged in the heating furnace. Then, the temperature of the heating furnace is increased from room temperature to the temperature in the removal process for removing the oxide film, 400° C. in this case. At this moment, an inert gas is introduced into the furnace in order to restrict the nano-particle sample from being oxidized by oxygen disposed in the heating furnace. In this case, N.sub.2 (nitrogen) is introduced, and temperature rising step is performed.
(70) Here, N.sub.2 is used as the inert gas since N.sub.2 is also utilized in the nitrification process. Alternatively, other inert gas other than N.sub.2 such as Ar (argon) and He (helium) may be used.
(71) After the temperature of the heating furnace is increased to the temperature of the removal process, the introduction of N.sub.2 is stopped, and the etching gas of the oxide film is introduced so that the etching atmosphere is created. Then, the temperature of the heating furnace is maintained for a predetermined period to be temperature which is necessary to remove the oxide film. In this experiment, the etching gas is H.sub.2 (hydrogen). H.sub.2 is introduced into the heating furnace at a rate of 1 L/min, and the heating furnace is maintained at 400° C. for one hour. Thus, the oxide film on the surface of the nano-particle sample is removed.
(72) The process time necessary to remove the oxide film may be any. For example, when the process is performed for 10 minutes or longer, it is confirmed that the oxide film is removed to some extent. Further, temperature for removing the oxide film may be at least in a range between 300° C. and 450° C.
(73) The lower limit of the temperature for removing the oxide film is set to be 300° C. since it is confirmed that the oxide film is removed at temperature of at least 300° C. or higher. Here, even when the temperature is lower than 300° C., it is considered that the oxide film may be removed as long as it takes much time. The upper limit of the temperature for removing the oxide film is determined so as to perform the nitrification of the FeNi disordered alloy easily after that. Specifically, when the temperature for removing the oxide film is increased to be higher than 450° C., the surface of the FeNi disordered alloy on which the oxide film is removed is sintered so that the nitrification is difficult. Accordingly, in order to restrict the surface of the FeNi disordered alloy from being sintered, the temperature is set to be equal to or lower than 450° C. Further, the introducing rate of the etching gas into the heating furnace may be any. For example, when H.sub.2 is used, the oxide film is removed in at least a range between 0.3 L/min and 5 L/min.
(74) Thus, after completing the removal process of the oxide film, the nitrification process is successively performed in the same heating furnace. Specifically, the introducing gas into the heating furnace is switched from the etching gas to the nitrification gas so that the inside of the heating furnace is in atmosphere including nitrogen. Then, the temperature necessary to nitrification is maintained. In the present experiment, NH.sub.3 (ammonia) is used as the nitrification gas. NH.sub.3 is introduced into the heating furnace at an introducing rate of 5 L/min. The heating furnace is maintained at 300° C. for 50 hours. Thus, the nano-particle sample is nitrided, and FeNiN is produced as the intermediate product.
(75) The time necessary for the nitrification process may be any. For example, when the process is performed for 10 hours, it is confirmed that FeNiN is produced as the intermediate product. Further, the temperature of the nitrification process may be in a range between 200° C. and 400° C. The introducing rate of the nitrification gas into the heating furnace in order to generate the atmosphere including nitrogen may be any. For example, when NH.sub.3 is used, the nano-particle sample is nitrided in at least a range between 0.1 L/min and 10 L/min.
(76) Thus, the nitrification process is performed successively after the removal process of the oxide film. In this case, the oxide film is restricted from being formed on the surface of the FeNi disordered alloy again, on which the oxide film is removed. Further, the temperature increasing step is not necessary again. Thus, the thermal process is simplified, and the process time is shortened.
(77) Then, the de-nitrification process is performed. The de-nitrification process is executed according to a profile shown in
(78) First, a heating furnace such as the above described tube furnace 10 or a muffle furnace is prepared. FeNiN is arranged in the heating furnace as the intermediate product produced according to the profile shown in
(79) After the temperature of the heating furnace is increased to the temperature of the de-nitrification process, the introduction of N.sub.2 is stopped, and the atmosphere for performing the de-nitrification process is created. The temperature of the heating furnace is maintained for a predetermined period to be temperature which is necessary for the de-nitrification. In the present experiment, H.sub.2 (hydrogen) is used for producing the atmosphere for performing the de-nitrification. H.sub.2 is introduced into the heating furnace at a rate of 1 L/min. Then, the heating furnace is maintained at 300° C. for 4 hours. Thus, FeNiN as the intermediate product is de-nitrided.
(80) The time necessary for the de-nitrification process may be any. For example, when performing for one hour or longer, it is confirmed that the L1.sub.0 type FeNi ordered alloy is produced. It is confirmed that the temperature of the de-nitrification process may be in a range between 200° C. and 400° C. Further, the introducing rate of the gas into the heating furnace in order to produce the atmosphere for performing the de-nitrification process may be any. For example, when H.sub.2 is used, the de-nitrification process is executed in at least a range between 0.1 L/min and 5 L/min.
(81) Thus, by performing the de-nitrification process, the L1.sub.0 type FeNi ordered alloy is produced. Then, the average regularity S of a whole material of the L1.sub.0 type FeNi ordered alloy manufactured is obtained. Specifically, using the powder X ray diffraction pattern, the regularity S is obtained.
(82) For example, when the regularity S is 1, the powder X ray diffraction pattern of the L1.sub.0 type FeNi ordered alloy is shown in
(83) Specifically, in the present embodiment, FeNiN is produced as the intermediate product by performing the nitrification process after the removal process of the oxide film from the FeNi disordered alloy is performed. Then, the de-nitrification process is performed, so that the L1.sub.0 type FeNi ordered alloy is formed. Then, the X ray diffraction pattern is obtained.
(84) As shown in
(85) Thus, the L1 type FeNi ordered alloy having the high regularity S and manufactured by the manufacturing method according to the present embodiment is obtained. Further, the magnetic property evaluation of the L1.sub.0 type FeNi ordered alloy is performed, so that the anisotropic magnetic field is 981 kA/m, which is comparatively high value.
(86) As described above, in the present embodiment, FeNiN as the intermediate product is produced by performing the nitrification process of the FeNi disordered alloy. Further, the de-nitrification process is performed, so that the L1.sub.0 type FeNi ordered alloy is produced. According to the manufacturing method, the L1.sub.0 type FeNi ordered alloy having the high regularity S equal to or higher than 0.7 is easily manufactured.
(87) Specifically, when the nitrification process is performed after the removal process for removing the oxide film formed on the surface of the FeNi disordered alloy is performed, the intermediate product is produced appropriately. Accordingly, by performing the removal process, the L1n type FeNi ordered alloy having the much higher regularity S is obtained.
OTHER EMBODIMENTS
(88) The present disclosure is not limited to the above described embodiments.
(89) For example, an example of conditions for the nitrification process and the de-nitrification process is explained in the first embodiment. However, that explanation is merely one example of each condition. As long as the L1.sub.0 type FeNi ordered alloy having the regularity S equal to or higher than 0.5 is obtained by performing the nitrification process and the de-nitrification process, the process temperature of each process and the process time of each process may not be limited to the above example. Similarly, in the second embodiment, an example of conditions for the removal process of the oxide film, the nitrification process and the de-nitrification process is explained. However, that explanation is merely one example of each condition. As long as the L1.sub.0 type FeNi ordered alloy having the regularity S equal to or higher than 0.7 is obtained, the process temperature of each process and the process time of each process may not be limited to the above example.
(90) In the first embodiment and the second embodiment, the L1.sub.0 type FeNi ordered alloy is obtained by performing the nitrification process and the de-nitrification process. Alternatively, the L1.sub.0 type FeNi ordered alloy may be obtained by performing a process other than the nitrification process and the de-nitrification process. For example, after a process for synthesizing a compound in which Fe and Ni are aligned with the same lattice structure as the L1.sub.0 type FeNi order structure is performed, the Li.sub.0 type FeNi ordered alloy may be obtained by performing a process for removing an element, which is an unnecessary element other than Fe and Ni, from the compound.
(91) Further, the L1.sub.0 type FeNi ordered alloy according to the above embodiments may be applied to the magnetic material such as the magnet material, the magnetic storage material or the like. The aspect of the FeNi ordered alloy is not limited to the magnetic material.
(92) The present disclosure is not limited to the above described embodiments. The contents of the description in the above embodiments are not totally unrelated to each other, but they appropriately combine with each other except for a case where they cannot clearly combine with each other. Furthermore, the above embodiments are not limited to the above embodiment examples.