CURRENT DETECTION CIRCUIT APPLIED TO SIC FIELD EFFECT TRANSISTOR
20210364555 · 2021-11-25
Inventors
- Laili Wang (Xi'an, CN)
- Chengzi YANG (Xi'an, CN)
- Huaqing LI (Xi'an, CN)
- Xingshuo LIU (Xi'an, CN)
- Longyang YU (Xi'an, CN)
- Yunqing PEI (Xi'an, CN)
- Yongmei GAN (Xi'an, CN)
- Xu YANG (Xi'an, CN)
Cpc classification
Y02B70/10
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
Abstract
The present invention provides a current detection circuit applied to a SiC field effect transistor. The current detection circuit includes a current detection loop and an acquisition loop on the current detection loop. The current detection loop includes a voltage source, a capacitor, a first SiC field effect transistor, a second SiC field effect transistor, and a sampling resistor. The first SiC field effect transistor is connected to a power signal. The second SiC field effect transistor is connected to a pulse signal. The acquisition loop includes a compensating resistor and a compensating inductor. The compensating resistor and the compensating inductor are connected in series and then connected in parallel at two ends of the sampling resistor to counteract the influence of total parasitic inductance in the current detection loop.
Claims
1. A current detection circuit applied to a SiC field effect transistor, the current detection circuit comprising: a current detection loop and an acquisition loop on the current detection loop; wherein the current detection loop comprises a voltage source, a capacitor, a first SiC field effect transistor, a second SiC field effect transistor, and a sampling resistor; a positive electrode of the voltage source is electrically connected to a D pole of the first SiC field effect transistor, an S pole of the first SiC field effect transistor is electrically connected to a D pole of the second SiC field effect transistor, the D pole of the second SiC field effect transistor is electrically connected to a negative electrode of the voltage source through the sampling resistor, and the capacitor is connected in parallel to two ends of the voltage source, wherein a power signal is connected between a G pole and the S pole of the first SiC field effect transistor, and a pulse signal is connected between a G pole and an S pole of the second SiC field effect transistor; the acquisition loop comprises a compensating resistor and a compensating inductor; a sum of currents of the compensating resistor and the sampling resistor is acquired through a current acquisition device, and a voltage at two ends of the compensating resistor is acquired through the current acquisition device, wherein the compensating resistor and the compensating inductor are connected in series and then connected in parallel at two ends of the sampling resistor to counteract the influence of total parasitic inductance in the current detection loop; the total parasitic inductance comprises: internal parasitic inductance and external parasitic inductance of the sampling resistor, wherein a value of the total parasitic inductance is a sum of the internal parasitic inductance and the external parasitic inductance; and parameter design of the current detection circuit meets a constraint condition of L.sub.C>>L.sub.S, R.sub.C>>R.sub.S and
2. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein a transfer function model of a current id on the acquisition loop to the voltage Vsc at the two ends of the compensating resistor is:
G.sub.sc0(s)=R.sub.S.
3. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein the inductance value L.sub.C of the compensating inductor is in a range of 470 nH<L.sub.C≤4.7 μH.
4. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein a self-resonant frequency of the compensating inductor is higher than 50 MHz.
5. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein a transfer function model of the current id on the acquisition loop to the voltage Vsc at the two ends of the compensating resistor is:
6. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein a transfer function model of the current id on the acquisition loop to the voltage Vsc at the two ends of the compensating resistor is:
7. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein a transfer function model of the current id on the acquisition loop to the voltage Vsc at the two ends of the compensating resistor is:
G.sub.sc3(s)=(sL.sub.S+R.sub.S)R.sub.C/(s(L.sub.S+L.sub.C)+R.sub.S)(sR.sub.CC.sub.L+1)+R.sub.C, when L.sub.C>>L.sub.S and R.sub.C>>R.sub.S, G.sub.sc2(s) is simplified into:
8. The current detection circuit applied to a SiC field effect transistor according to claim 1, wherein the total parasitic inductance is obtained by double pulse measurement, and a generation model thereof is:
Description
BRIEF DESCRIPTION OF DRAWINGS
[0031]
[0032]
[0033]
[0034]
[0035]
[0036]
[0037]
[0038]
[0039]
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
[0040] To make the objectives, technical solutions, and advantages of implementations of the present invention clearer, the technical solutions in the implementations of the present invention are clearly and completely described below with reference to the drawings in the implementations of the present invention. The following detailed description of the implementations of the present invention provided in the drawings is not intended to limit the scope of the present invention for which protection is sought, but merely to indicate selected implementations of the present invention.
[0041] Specific embodiments of the present invention are described in detail below with reference to the drawings.
[0042] Referring to
[0043] a current detection loop and an acquisition loop on the current detection loop.
[0044] The current detection loop includes a voltage source Vin, a capacitor Cin, a first SiC field effect transistor Q1, a second SiC field effect transistor Q2, and a sampling resistor Rs; a positive electrode of the voltage source Vin is electrically connected to a D pole of the first SiC field effect transistor Q1, an S pole of the first SiC field effect transistor Q1 is electrically connected to a D pole of the second SiC field effect transistor Q2, the D pole of the second SiC field effect transistor Q2 is electrically connected to a negative electrode of the voltage source Vin through the sampling resistor Rs, and the capacitor Cin is connected in parallel to two ends of the voltage source Vin, wherein a power signal is connected between a G pole and the S pole of the first SiC field effect transistor Q1, and a pulse signal is connected between a G pole and an S pole of the second SiC field effect transistor Q2.
[0045] The acquisition loop includes a compensating resistor and a compensating inductor; a sum of currents of the compensating resistor and the sampling resistor is acquired through a current acquisition device, and a voltage at two ends of the compensating resistor is acquired through the current acquisition device, wherein the compensating resistor Rc and the compensating inductor Lc are connected in series and then connected in parallel at two ends of the sampling resistor Rs to counteract the influence of total parasitic inductance Lsi in the current detection loop.
[0046] In this embodiment, the total parasitic inductance Lsi includes: internal parasitic inductance and external parasitic inductance of the sampling resistor Rs, wherein a value of the total parasitic inductance Lsi is a sum of the internal parasitic inductance and the external parasitic inductance.
[0047] It needs to be noted that L.sub.Pe denotes the external parasitic inductance, mainly caused by PCB layout, which can be minimized by advanced layout, and L.sub.Si denotes the internal parasitic inductance of the current sampling resistor RsCSR. L.sub.Si is determined by materials and a manufacturing process. L.sub.Si varies greatly among different current sampling resistors RsCSR. A sum of L.sub.Pe and L.sub.Si is equal to the total parasitic inductance Lsi of the current sampling resistor RsCSR.
[0048] In this embodiment, a transfer function model of a current id on the acquisition loop to the voltage Vsc at the two ends of the compensating resistor Rc is:
[0049] wherein L.sub.S denotes an inductance value of the total parasitic inductance Lsi, R.sub.C denotes a resistance value of the compensating resistor Rc, R.sub.S denotes a resistance value of the sampling resistor Rs, and L.sub.C denotes an inductance value of the compensating inductor Lc;
[0050] when L.sub.C>>L.sub.S, R.sub.C>>R.sub.S and
Gsc0(s) is simplified into:
G.sub.sc0(s)=R.sub.S.
[0051] In this embodiment, the inductance value of the compensating inductor Lc is in a range of 470 nH<L.sub.C≤4.7 μH.
[0052] In this embodiment, a self-resonant frequency of the compensating inductor Lc may be higher than 50 MHz.
[0053] Referring to
[0054] wherein Z.sub.S=sL.sub.S+R.sub.S, and
therefore:
[0055] when L.sub.C>>L.sub.S, and R.sub.C>>R.sub.S; G.sub.sc1(s) is simplified into:
[0056] It needs to be noted that, in consideration of the influence of CC, frequency-domain characteristics of the current sensing circuit proposed can be calculated, as shown in
[0057] In this embodiment, as shown in
[0058] wherein Z.sub.S=sL.sub.S+R.sub.S and Z.sub.C=s(L.sub.C+L.sub.RC)+R.sub.C; therefore:
[0059] when L.sub.C>>L.sub.S and R.sub.C>>R.sub.S, Gsc2(s) is simplified into:
[0060] It needs to be noted that, in consideration of the influence of LRC, frequency-domain characteristics of the current sensing circuit proposed can be calculated, as shown in
[0061] In this embodiment, as shown in
[0062] wherein Z.sub.S=sL.sub.S+R.sub.S and
therefore:
[0063] when L.sub.C>>L.sub.S and R.sub.C>>R.sub.S, Gsc2(s) is simplified into:
[0064] It needs to be noted that, in consideration of the influence of CL, frequency-domain characteristics of the current sensing circuit proposed can be calculated, as shown in
[0065] In this embodiment, the total parasitic inductance Lsi is obtained by double pulse measurement, and a generation model thereof is:
[0066] As shown in
[0067] T.sub.ring denotes a ringing period of a drain-source voltage of the second SiC field effect transistor Q2, and C.sub.oss@Vin denotes an output capacitance of the second SiC field effect transistor Q2 when an input voltage is Vin, wherein ΔV.sub.DS and ΔV.sub.S denote peak-to-peak values of V.sub.DS and V.sub.S respectively.
[0068] Based on the current detection circuit applied to a SiC field effect transistor, during a specific detection operation, the compensating resistor Rc and the compensating inductor Lc form a compensating branch. A branch consisting of the current sampling resistor Rs and the total parasitic inductance Lsi is connected in parallel with the compensating branch, through which the total parasitic inductance Lsi is compensated. The circuit is smaller, which can effectively avoid the influence of parasitic inductance on the detection performance of the current sampling resistor Rs.
[0069] In the present invention, the terms “first,” “second,” and “third” are merely for the purpose of description, but cannot be understood as indicating or implying relative importance. The term “multiple” means two or more unless otherwise explicitly defined. The terms “mount,” “connect with,” “connect,” “fix,” and the like shall be understood in a broad sense. For example, “connect” may mean being fixedly connected, detachably connected, or integrally connected; and “connect with” may mean being directly connected or indirectly connected through an intermediary. For those of ordinary skill in the art, specific meanings of the above terms in the present invention can be understood according to specific situations.
[0070] The above are merely preferred implementations of the present invention. The protection scope of the present invention is not merely limited to the above embodiments. Any technical solution under the idea of the present invention falls within the protection scope of the present invention.