MULTIPLE CHAMBER VACUUM EXHAUST SYSTEM

Abstract

A vacuum exhaust system includes a plurality of low pressure vacuum pumps that operate in a molecular flow region and evacuate a plurality of vacuum chambers. A plurality of chamber valves are positioned between the low pressure vacuum pumps and the plurality of vacuum chambers. A plurality of branch channels are each connected to a corresponding exhaust of the plurality of low pressure vacuum pumps and a main channel is formed from a confluence of the branch channels. An intermediate vacuum pump is connected to the main channel and operates in a viscous flow region. A higher pressure vacuum pump operates in a higher pressure viscous flow region and is connected to an exhaust of the intermediate pressure vacuum pump. A plurality of bypass channels, each having a valve, provide a fluid communication path between at least some of the plurality of vacuum chambers and a higher pressure vacuum pump.

Claims

1. A vacuum exhaust system for evacuating a plurality of vacuum chambers, said vacuum exhaust system comprising: a plurality of low pressure vacuum pumps configured to operate in the molecular flow region of the gas and configured for evacuating said plurality of vacuum chambers; a plurality of chamber valves for isolating or connecting said plurality of low pressure vacuum pumps with said plurality of vacuum chambers; a plurality of branch channels each connected to a corresponding exhaust of said plurality of low pressure vacuum pumps; a main channel formed from a confluence of said branch channels and configured to provide a fluid communication path between said plurality of branch channels and an intermediate pressure vacuum pump, said intermediate pressure vacuum pump being configured to evacuate said main channel and to operate in a viscous flow region of said gas; and a higher pressure vacuum pump configured to operate in a higher pressure viscous flow region of said gas than said intermediate pressure vacuum pump, said higher pressure vacuum pump being connected to an exhaust of said intermediate pressure vacuum pump; a plurality of bypass channels for providing a fluid communication path between at least some of said plurality of vacuum chambers and a higher pressure vacuum pump; wherein said plurality of bypass channels each comprise a valve configured to open or close said bypass channel.

2. The vacuum exhaust system according to claim 1, wherein said higher pressure vacuum pump connected to said exhaust of said intermediate pressure vacuum pump and said higher pressure vacuum pump in fluid communication with said plurality of bypass channels is a same higher pressure vacuum pump.

3. The vacuum exhaust system according to claim 1, wherein said higher pressure vacuum pump connected to said exhaust of said intermediate pressure vacuum pump and said higher pressure vacuum pump in fluid communication with said plurality of bypass channels are different higher pressure vacuum pumps.

4. The vacuum exhaust system according to claim 1, comprising a main bypass channel formed from a confluence of said plurality of bypass channels, said main bypass channel and said plurality of bypass channels providing said fluid communication path between said plurality of vacuum chambers and said higher pressure pump.

5. The vacuum exhaust system according to claim 1, wherein said bypass channels have a smaller diameter than said branch channels.

6. The vacuum exhaust system according to claim 1, wherein said branch channels and main channel comprise heating circuitry for heating said channels to reduce condensation of substances being pumped.

7. The vacuum exhaust system according to claim 1, comprising a further plurality of channels for providing a fluid communication path between said plurality of bypass channels and said plurality of branch channels, said further plurality of channels each comprising a valve for opening or closing said further plurality of channels.

8. The vacuum exhaust system according to claim 1, wherein at least some of said plurality of branch channels comprise a controllable inlet for admitting a gas.

9. The vacuum exhaust system according to claim 8, comprising inlet control circuitry configured to control said controllable inlet to admit a controlled amount of gas in dependence upon a gas flow in said branch channel, such that variations in said gas flow output by said branch channel are reduced.

10. The vacuum exhaust system according to claim 9, wherein said control circuitry is configured to monitor a power consumption of said low pressure pump evacuating said vacuum chamber and to control said controllable inlet in dependence upon said power consumption.

11. The vacuum exhaust system according to claim 9, wherein said control circuitry is configured to receive signals from said vacuum chamber indicative of a current process in said vacuum chamber and to control said controllable inlet in dependence upon said signals.

12. The vacuum exhaust system according to claim 1, further comprising: a pressure sensor for monitoring a pressure within said main channel; and pressure control circuitry configured to receive signals from said pressure sensor and generate control signals for reducing fluctuations in said pressure.

13. The vacuum exhaust system according to claim 12, said pressure control circuitry being configured to generate control signals for controlling a pumping speed of said intermediate vacuum pump in dependence upon an output of said pressure sensor.

14. The vacuum exhaust system according to claim 12 and further comprising a controllable gas inlet for admitting a controlled amount of gas into said main channel, said pressure control circuitry being configured to generate control signals for controlling said controllable gas inlet.

15. The vacuum exhaust system according to claim 1, wherein said intermediate vacuum pump comprises a plurality of intermediate pressure vacuum pumps arranged in series with each other.

16. The vacuum exhaust system according to claim 1, wherein said branch channels comprise controlled restrictors, a restriction of said restrictors being set to provide a predetermined pressure at a predetermined flow rate at an exhaust of said lower pressure vacuum pump.

17. The vacuum exhaust system according to claim 1, and further comprising valve control circuitry, said valve control circuitry being configured to control a state of said valves, said valve control circuitry being configured to ensure that for each of said plurality of vacuum chambers and branch, bypass and further channels, said chamber valves and said valves in said different channels are not open at a same time.

18. The vacuum exhaust system according to claim 1, wherein said valve control circuitry is configured to control evacuation of said chambers, said valve control circuitry being configured: in response to a signal indicating a vacuum chamber is to be vented to atmosphere, to close said corresponding chamber valve and isolate said chamber from said main channel; and in response to a signal indicating said vacuum chamber is to be pumped down from atmosphere to open said valve in said bypass channel such that said chamber is in fluid communication with said higher pressure vacuum pump.

19. (canceled)

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0044] Embodiments of the present invention will now be described further, with reference to the accompanying drawings, in which:

[0045] FIG. 1 illustrates a vacuum exhaust system according to an embodiment; and

[0046] FIG. 2 illustrates a vacuum exhaust system according to a further embodiment.

DETAILED DESCRIPTION

[0047] Before discussing the embodiments in any more detail, first an overview will be provided.

[0048] Embodiments relate to a system that shares a common process pump across multiple semiconductor processing chambers and achieves a stable pressure in each processing chamber.

[0049] The chambers in the system may all be controlled independently and therefore are on total asynchronous process cycles. In one example the number of process chambers is 24—there being 6 per tool and 4 tools, all sharing a single backing pump feeding a single abatement unit.

[0050] The process chemistry of every part of the cycle is compatible with every other part of the cycle.

[0051] There may be redundancy provided to allow the system to continue if a pump or abatement unit fails, allowing it to be repaired or maintained without shutting down all 24 chambers. Thus, although the system may operate with a single set of booster and backing pumps, there may be a spare set of booster and backing pumps which are brought into operation when the other pumps become non-operational.

[0052] In embodiments, the backing pump combination is located in the subfab and comprises a backing pump and a booster and each process chamber is located in the cleanroom—typically 10-20 meters above the subfab.

[0053] In embodiments, each process chamber is fitted with a turbo pump and each turbo pump has a bypass line to allow for pump down from atmospheric pressure.

[0054] Conventionally each turbo pump is backed by its own backing pump and booster pump combination located in the subfab. In the proposed shared system of an embodiment, each turbo pump exhaust port is connected to a common manifold which is pumped by a much larger, common shared backing pump and booster combination located in the sub fab.

[0055] The objective of embodiments is to allow the process chambers to operate independently and with minimal or at least reduced interference between the chambers whilst sharing common vacuum and abatement equipment.

[0056] In one embodiment pumping down occurs via a bypass line that is connected to the backing pump. Pumping down via a turbo bypass line and restrictor is known. Conventionally the bypass line is connected to the booster or intermediate pressure pump. However, with a shared booster pump, if the chamber is connected directly to the manifold (main channel)—opening the bypass valve to pump down the chamber will produce a momentary high flow of gas into the manifold and will cause a pressure spike. This results in a pressure spike in each of the connected chambers. These are likely to be processing wafers and such a pressure spike could disrupt the process.

[0057] Embodiments connect the bypass line and restrictor to a secondary manifold system (shared bypass channel) that connects to the backing pump inlet in the subfab—between the booster exhaust and the backing pump. Alternatively it may connect to a completely separate backing pump. This can be done using small diameter pipe. Furthermore, it will not see process gas so does not need to be heated. This secondary manifold operates at a higher pressure than the main process manifold and therefore is less affected by the pressure spike. Additionally, the booster pump helps to isolate the pressure spike in the secondary manifold from the process manifold. Once the chamber has been pumped down to that of the secondary manifold, typically 10 mbar, then the valve V1 (see FIG. 1) can be closed and V2 is opened allowing the chamber to be pumped down by the main process manifold, typically at 1 mbar. This final pumping stage has a very small gas flow and so does not produce a significant pressure spike. Once this has been completed then the main turbo pump valve V3 can be opened as normal.

[0058] A further way to reduce crosstalk between chambers is to reduce any pressure fluctuations in the manifold.

[0059] Given that in some embodiments the manifold is pumped by a single pump running at constant speed, pressure fluctuations may be caused by changes in flow from one or more chambers. The flow from each chamber can vary due to the process being initiated or stopped or step changes during the process. In order to reduce the effect of these on the system, a nitrogen flow is added to each chamber backing line and is adjusted to keep the net flow in the line at a constant value. For example when the process is flowing maximum process gas then no additional gas flow is required, if however the process flow is reduced, or stopped, then the nitrogen flow is added to make up for the difference.

[0060] The process flow can be determined directly from the process tool itself or by monitoring the power consumption of the turbo pump.

[0061] In this system a single set of backing and booster pump combination is used to pump several chambers. If however the number of chambers is reduced due to maintenance, or product demand say, or simply some chambers not yet being installed, then the system needs to maintain substantially the same pressure in the process manifold. This can be achieved by monitoring the pressure with a pressure gauge and using this information to control the speed of the booster pump. Alternatively, a nitrogen flow can be added, either at the booster inlet or outlet.

[0062] FIG. 1 shows a vacuum exhaust system according to an embodiment. Vacuum exhaust system 5 is configured to exhaust gas from a plurality of processing chambers 10. These processing chambers are connected to low pressure turbo pumps 12 via valves V3. These turbo pumps exhaust via branch channels 14 to a main shared channel 16 which in turn leads to two booster or intermediate pressure pumps 20, 21 arranged in series. The booster or intermediate vacuum pumps are backed by a higher pressure or backing pump 22. During normal operation of the vacuum chambers the valve V3 is open and gas is evacuated from the vacuum chambers 10 via the turbomolecular pumps 12 along branch channel 14 through the shared main channel 16 to booster pumps 20, 21 and backing pump 22 where it is then exhausted.

[0063] Each branch channel has a flow restrictor 34 which is controllable to provide a uniform pressure output from the different vacuum chambers when they are operating in the same way. Thus, during a configuration or initialisation phase a standard gas flow is exhausted from the vacuum chamber via the turbo molecular pump 12 and the flow restrictor is set such that a pressure measured at the exhaust output of the turbo pump is a predetermined value. This helps compensate for differences in the pressure felt at the exhaust of the low pressure pumps due to differences in distance between these pumps and the shared booster pumps. In this regard where many chambers share one set of booster and backing pumps, then the distance between the low pressure pumps and the booster and backing pumps may vary considerably and thus, having a flow restrictor to compensate for these differences will provide a more uniform system.

[0064] Although having a main shared channel 16 and a single set of booster 20, 21 and backing 22 pumps leads to efficiency in hardware there are challenges with such a set up and in particular where many vacuum chambers that are operating asynchronously are connected to the shared channel 16 there will be variations in the pressure felt within this channel and these will affect the pressure at the exhaust of the turbomolecular pump and will in this way feed back to the pressure in the vacuum chambers 10. In order to reduce these pressure fluctuations there are various arrangements provided.

[0065] One of these comprises the bypass channel 42 which connects the vacuum chamber 10 with the backing pump 22. This bypass channel 42 has a valve V1 and when the pressure in the vacuum chamber 10 is high perhaps following it being vented to atmosphere and it is required to pump this chamber down to a lower pressure the valves V3 and V2 will be closed and the valve V1 opened and the higher pressure backing pump 22 will then be used to initially pump the chamber 10 down via the bypass channel 42 to a pressure of operation of the backing pump which in this embodiment is of the order of 10 mbars.

[0066] There may be a flow restrictor 43 on the bypass channel 42 to modify flow rates. Once the pressure in the vacuum chamber 10 reaches or nears the operational pressure of the backing pump 22 then valve V1 may be closed and valve V2 in a connecting channel 44 for connecting the bypass channel 42 to the branch channel 14 may be opened and at this point the vacuum chamber is connected to the booster pumps 20, 21. The booster pumps 20, 21 may then evacuate the chamber down to its operational pressure which is about 1 mbar. At this point the valve v2 may be closed and valve V3 may be opened and the turbomolecular pump can be used to produce the high vacuum for operation of the vacuum chamber.

[0067] Although, the vacuum chamber 10 is connected to the booster pumps 20, 21 via the shared channel 16 when the pressure in the vacuum chamber is above the standard pressure of operation, it is significantly lower than atmospheric pressure (in this example of the order of 1 mbar) and produces a much reduced pressure spike in the shared main channel 16. Furthermore, the presence of the two booster pumps 20, 21 between the shared bypass channel 46 outlet and the main channel 16 acts as a buffer to further reduce any pressure spike felt in the main channel 16.

[0068] As the bypass channels only operate at a relatively high pressure they may have a significantly smaller diameter than the branch channels and furthermore as they only pump gasses when the chamber has been vented and do not pump process gasses they will not require the heating required by the branch channels. Thus, providing these additional bypass channels is relatively cost effective.

[0069] It should be noted that each of the bypass channels 42 combine into a shared bypass channel 46 which then leads to backing pump 22 in this embodiment. In other embodiments there may be a separate backing pump (not shown) for pumping down the vacuum chambers from atmosphere. Where there is a separate backing pump for pumping the bypass channels, then generally only a single booster pump will be used in the main exhaust system, as the advantage of multiple booster pumps in series providing improved isolation between the outlet of the bypass channel and the main channel is no longer felt.

[0070] A further way in which reductions in variations in the pressure fluctuations in the main channel can be achieved is with the use of a gas input 50 in each of the branch channels. In this regard, the gas flow rate in the branch channels varies with the process variations in the process chambers 10. In order to compensate for these variations a gas inlet with a controllable restrictor or valve 50 may be used to admit a controlled amount of gas. The controlled amount is set to compensate for variations in the process flow such that a relatively constant gas flow is output to the shared channel 16. The gas admitted is generally one that is relatively non-reactive and acceptable to exhaust from the system, in this embodiment Nitrogen is used. The admission of the gas may be controlled in response to a signal from the chamber indicating the current process being performed or a signal from the turbomolecular pump indicating its current power consumption. In this regard, the power consumption of the turbomolecular pump will vary with flow rate and thus, the current power consumption is an indication of current flow rate.

[0071] FIG. 2 shows an exhaust system similar to that of FIG. 1, but with only a single booster pump 20. In this embodiment there are additional arrangements for reducing pressure fluctuations in the main channel 16. These comprise a gas inlet 60 for admitting gas, in this example Nitrogen to the shared channel 16. This inlet can be controlled by control circuitry 70 which receives signals from a pressure sensor 62 which measures the pressure in the shared channel 16. In this way the pressure within the shared channel can be actively maintained at a relatively constant value in response to readings from a pressure sensor 62.

[0072] Alternatively and/or additionally to the addition of a gas to the shared channel 16, the pressure may be controlled with a controllable flow restrictor (not shown) within the shared channel and/or with control of the speed of booster pump 20 and/or with the speed backing pump 22.

[0073] Control circuitry 70 is shown receiving signals from the pressure sensor and controlling the booster and backing pumps. The control circuitry may also control the valves V1, V2 and V3, the flow restrictor 34 and the variable inlet 50. It may receive signals from the process chambers, and/or from the turbomolecular pumps 12 indicating their power consumption and/or from pressure sensor 36. In this regard the branch channels 14 may have a pressure sensor 35 that is used to determine the pressure in the branch channel and may be used to set the restriction amount of flow restrictor 34 to provide a more uniform flow from the turbomolecular pump 12.

[0074] Embodiments seek to provide an exhaust system for pumping multiple chambers using a shared booster and backing pump where pressure fluctuations in the shared main channel which may lead to pressure variations in the vacuum chambers themselves are reduced. These pressure fluctuations may be reduced by the use of bypass channels to avoid higher pressure gasses from vented chambers flowing through the shared main channel and/or with gas inlets in the branch channels to compensate for the variations in flow output by the chambers and/or with use of controllable flow restrictors in the branch channels to maintain a uniform flow for each branch channel and/or with pressure sensors in the main channel and control circuitry for controlling pumping speeds and/or flow restrictors and/or gas inputs to maintain a stable pressure in the main channel.

[0075] Although illustrative embodiments of the invention have been disclosed in detail herein, with reference to the accompanying drawings, it is understood that the invention is not limited to the precise embodiment and that various changes and modifications can be effected therein by one skilled in the art without departing from the scope of the invention as defined by the appended claims and their equivalents.

[0076] Although elements have been shown or described as separate embodiments above, portions of each embodiment may be combined with all or part of other embodiments described above.

[0077] Although the subject matter has been described in language specific to structural features and/or methodological acts, it is to be understood that the subject matter defined in the appended claims is not necessarily limited to the specific features or acts described above. Rather, the specific features and acts described above are described as example forms of implementing the claims.