ELECTRONIC SUBSTRATE HAVING DIFFERENTIAL COAXIAL VIAS
20220015225 · 2022-01-13
Inventors
- Snehamay Sinha (Plano, TX, US)
- Tapobrata Bandyopadhyay (Dallas, TX, US)
- Markarand Ramkrishna Kulkarni (Dallas, TX, US)
Cpc classification
H05K1/0222
ELECTRICITY
H01L23/06
ELECTRICITY
H05K1/0245
ELECTRICITY
H05K1/115
ELECTRICITY
H05K1/0221
ELECTRICITY
International classification
H01L21/02
ELECTRICITY
H01L23/06
ELECTRICITY
H05K1/11
ELECTRICITY
Abstract
An electronic substrate includes a dielectric core, a first conducting layer on a first side of the core and a second conducting layer on the second side of the core opposite the first side. At least one differential coaxial through-via includes a first inner signal through-via that is at least electrical conductor lined for a first signal path and at least a second inner signal through-via that is also at least electrical conductor lined positioned side-by-side and being dielectrically isolated from the first inner signal through-via for a second signal path. An annular-shaped outer ground shield enclosure is at least conductor lined that surrounds and is dielectrically isolated from both the first and second inner signal through-vias.
Claims
1. A method of manufacturing an electronic substrate, comprising: forming at least one differential coaxial through-via in a dielectric core having a first conducting layer on a first side of said dielectric core and a second conducting layer on a second side of said dielectric core opposite said first side, comprising: forming an annular-shaped outer through-via pattern extending from said first side to said second side; conductor lining said annular-shaped outer through-via pattern; filling said annular-shaped outer through-via pattern with a dielectric material or high electrically resistive material to complete an outer ground shield enclosure; forming through-holes through said dielectric material including a first and a second inner signal through-hole via, and at least lining said first and second inner through-hole vias with a conductive material to form first and second inner signal through-vias that couple from said first electrically conducting layer to said second conducting layer.
2. The method of claim 1, wherein said first conducting layer includes a first top side contact over and extending beyond said first inner signal through-via, a second top side contact over and extending beyond said second inner signal through-via, and a ground top side contact over and extending beyond said ground shield enclosure, and wherein said second conducting layer provides a first bottom side contact over and extending beyond said first inner signal through-via, a second bottom side contact over and extending beyond said second inner signal through-via, and a ground bottom side contact over and extending beyond said ground shield enclosure; further comprising: forming a top side dielectric layer on said first side and a bottom side dielectric layer on said second side; forming a first top side microvia and a second top side microvia providing top side contacts extending through said top side dielectric layer to contact said first and second top side contacts, and forming a first bottom side micro via and a second bottom side micro via providing bottom side contacts extending through said bottom side dielectric layer to contact said first and second bottom side contacts.
3. The method of claim 1, wherein said electronic substrate comprises a printed circuit board (PCB).
4. The method of claim 1, said electronic substrate comprises an IC package.
5. The method of claim 1, wherein said at least one differential coaxial via comprises a plurality of said differential coaxial through-vias.
6. The method of claim 1, where said microvias are offset by traces from said inner signal through-vias.
7. The method of claim 1, wherein said dielectric material within said ground shield enclosure comprises a dielectric fill material that is different from a material of said dielectric core.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] Reference will now be made to the accompanying drawings, which are not necessarily drawn to scale, wherein:
[0011]
[0012]
[0013]
[0014]
DETAILED DESCRIPTION
[0015] Example aspects are described with reference to the drawings, wherein like reference numerals are used to designate similar or equivalent elements. Illustrated ordering of acts or events should not be considered as limiting, as some acts or events may occur in different order and/or concurrently with other acts or events. Furthermore, some illustrated acts or events may not be required to implement a methodology in accordance with this disclosure.
[0016] Also, the terms “coupled to” or “couples with” (and the like) as used herein without further qualification are intended to describe either an indirect or direct electrical connection. Thus, if a first device “couples” to a second device, that connection can be through a direct electrical connection where there are only parasitics in the pathway, or through an indirect electrical connection via intervening items including other devices and connections. For indirect coupling, the intervening item generally does not modify the information of a signal but may adjust its current level, voltage level, and/or power level.
[0017]
[0018] The dielectric core 105 can comprise epoxy resin for example. In the case the electronic substrate 100 comprises a PCB, the PCB can generally comprise any multilayer substrate such as a buildup or laminate multilayer PCB, or a buildup or laminate package substrate. As known in the art a conventional multilayer PCB can be prepared by building up a two-sided core laminate with one or more layers of single-sided laminate added to each side of the core laminate. Examples of dielectric materials used in laminates include, but are not limited to, FR-2 phenolic cotton paper, FR-4 woven glass and epoxy resin, G-10 woven glass and epoxy, CEM-1 cotton paper and epoxy, CEM-3 woven glass and epoxy, CEM-5 woven glass and polyester, polyimide, and other dielectric materials typically used in preparing multilayer substrates.
[0019] Another disclosed differential coaxial signal via is shown in
[0020] Disclosed inner signal through-vias 121 and 122 in
[0021] Electronic substrate 100 is shown including a first electrically conducting layer 106 on its top side and a second electrically conducting layer 107 on its bottom side. The first electrically conducting layer 106 is shown providing a first top side contact 106a over and extending beyond the first inner signal through-via 121, and also a second top side contact 106b over and extending beyond the second inner signal through-via 122, and a ground top side contact 106c shown over and extending beyond the ground shield 123. The second electrically conducting layer 107 is shown providing a first bottom side contact 107a over and extending beyond the first inner signal through-via 121, and a second bottom contact 107b over and extending beyond the second inner signal through-via 122, and a ground bottom side contact 107c shown over and extending beyond the outer ground shield 123.
[0022] Also shown in
[0023]
[0024] The minimum spacing range between the closest edges of inner signal through-vias 121, 122 (or 121′, 122′) and the distance range of the closest edge of the inner signal through-vias 121, 122 (or 121′, 122′) to the outer ground shield enclosure 123 (or 123′) depends on the impedance requirements of the interface device, the technology/process limitations, package or PCB substrate, and dielectric constant of the dielectric core 105. For example, these spacings can be a few microns for a packaged IC to a few hundred microns for a PCB.
[0025]
[0026]
[0027] The IC die 310 may include or be a part of a processor, memory, switch, application specific IC (ASIC), or system-on-a-chip (SoC). In the FC configuration shown, the IC die 310 may be coupled to a top surface 332 of the FC bonding package 300a. In typical aspects, the electrical signals include differential signals, input/output (I/O) signals, power, and ground associated with operation of the IC die 310.
[0028] The BGA interconnect structures depicted by solder balls 314 and 324 are only meant to be example interconnect structures. In other aspects, a land-grid array (LGA) structure may electrically couple one or more lands on bonding package 300a with one or more pads on interposer or PCB 340, which may route electrical signals between bonding package 300a and the interposer or PCB 340. In the case of a WB package, there will be bond wire instead of solder balls.
[0029] Regarding fabrication of a disclosed electronic substrate having at least one disclosed differential coaxial via 120, and an annular shape ground through-cut for the outer ground shield enclosure 123 can be prepared by a method that comprises forming a through-hole pattern having a shape of the hole being circular, oval, or rectangle-like with two semicircles at the ends through-holes through a dielectric core 105. This is followed by lining the ground through-cut with an electrical conductor (e.g., metalizing).
[0030] The annular shape ground through-cut can be made by punching with an elongated punch, drilling multiple overlapping holes in proximity to each other or lasing the desired elongated shape, depending on considerations such as the shape and size of the hole and convenience. The annular shape ground through-cut can be lined by being plated, or metalized, by sputtering or electroplating. For example, electroless copper can be applied, followed by electrolytic copper. Other metals that can be applied during the sputtering and/or plating process include, but are not limited to, nickel, gold, palladium, or silver. Alternatively, the through-hole vias can be lined with an electrically conducting organic polymer such as polyacetylene, polypyrrole, or polyaniline.
[0031] The annular-shaped through-cut is then filled by depositing a differential signal through-via are then prepared by forming through-holes through dielectric material. These signal through-vias can as with the annular shape ground through-cut can be made by punching, drilling, or lasing. The signal through-vias are then filled or at least lined with a conductor in the same manner as the through-vias of the annular shape ground through-cut described above.
[0032] Disclosed electronic substrates do not require additional ground vias in the dielectric core 105 or 305 to reduce crosstalk or to increase signal via spacing. This helps in simplifying the electronic substrate routing and removes the potential need to increase package size and/or package layer count.
[0033] Disclosed aspects can be integrated into a variety of assembly flows to form a variety of different IC-based electronic devices and related products. The electronic devices can comprise a single IC die or multiple IC die, such as PoP configurations comprising a plurality of stacked IC die. The IC die may include various elements therein and/or layers thereon, including barrier layers, dielectric layers, device structures, active elements and passive elements including source regions, drain regions, bit lines, bases, emitters, collectors, conductive lines, conductive vias, etc. Moreover, the semiconductor die can be formed from a variety of processes including bipolar, insulated-gate bipolar transistor (IGBT), CMOS, BiCMOS and MEMS. A variety of dielectric core materials may be used. In some aspects, one or both of the dielectric core 105 and the electronic substrate 100 may be formed from a rigid and/or inflexible material.
[0034] Those skilled in the art to which this disclosure relates will appreciate that many other aspects and variations of aspects are possible within the scope of the claimed invention, and further additions, deletions, substitutions and modifications may be made to the described aspects without departing from the scope of this Disclosure.