MULTI-DIRECTIONAL PHOTOGRAMMETRY TARGET
20210348921 · 2021-11-11
Inventors
- Charlene Cheung (San Diego, CA, US)
- Larry W. Brannock (San Diego, CA, US)
- Nicholas A. Leitch (San Diego, CA, US)
Cpc classification
G01C11/02
PHYSICS
International classification
Abstract
A photogrammetry target includes a base including a first base side, configured to be fixedly mounted directly to a surface of a component, and a convex second base side opposite the first base side. The convex second base side is defined by a dome. The photogrammetry target further includes a plurality of retroreflective targets fixedly mounted to the dome. Each retroreflective target of the plurality of retroreflective targets includes a retroreflective surface facing a direction which is different than each other retroreflective surface of the plurality of retroreflective targets.
Claims
1. A photogrammetry target comprising: a base comprising a first base side, configured to be fixedly mounted directly to a surface of a component, and a convex second base side opposite the first base side, the convex second base side defined by a dome; a plurality of retroreflective targets fixedly mounted to the dome, each retroreflective target of the plurality of retroreflective targets comprising a retroreflective surface facing a direction which is different than each other retroreflective surface of the plurality of retroreflective targets.
2. The photogrammetry target of claim 1, wherein the base is defined about an axial centerline and the plurality of retroreflective targets comprises a center retroreflective target centered about the axial centerline, the retroreflective surface of the center retroreflective target facing in an axial direction.
3. The photogrammetry target of claim 2, wherein the plurality of retroreflective targets further comprises a circumferential arrangement of retroreflective targets disposed about the center retroreflective target with respect to the axial centerline.
4. The photogrammetry target of claim 3, wherein each retroreflective target of the circumferential arrangement of retroreflective targets is oriented at a same angle relative to the axial centerline.
5. The photogrammetry target of claim 4, wherein the angle is between 10 degrees and 60 degrees, inclusive.
6. The photogrammetry target of claim 1, wherein the dome comprises a plurality of mount portions, each mount portion comprising a recess into which a respective retroreflector of the plurality of retroreflectors is disposed.
7. The photogrammetry target of claim 1, further comprising a cap configured to engage with the base and cover the plurality of retroreflectors.
8. A photogrammetry system comprising: a component comprising a surface; a plurality of photogrammetry targets mounted to the surface of the component, each photogrammetry target of the plurality of photogrammetry target comprising: a base comprising a first base side, fixedly mounted directly to the surface of the component, and a convex second base side opposite the first base side, the convex second base side defined by a dome; a plurality of retroreflective targets fixedly mounted to the dome, each retroreflective target of the plurality of retroreflective targets comprising a retroreflective surface facing a direction which is different than each other retroreflective surface of the plurality of retroreflective targets.
9. The photogrammetry system of claim 8, further comprising an imaging device positioned to direct light from a light source to one or more photogrammetry targets of the plurality of photogrammetry targets and receive a reflected light from the one or more photogrammetry targets.
10. The photogrammetry system of claim 8, wherein the base is defined about an axial centerline and the plurality of retroreflective targets comprises a center retroreflective target centered about the axial centerline and facing in an axial direction.
11. The photogrammetry system of claim 10, wherein the plurality of retroreflective targets further comprises a circumferential arrangement of retroreflective targets disposed about the center retroreflective target with respect to the axial centerline.
12. The photogrammetry system of claim 11, wherein each retroreflective target of the circumferential arrangement of retroreflective targets is oriented at a same angle relative to the axial centerline.
13. The photogrammetry system of claim 8, wherein each retroreflective target is positionally fixed relative to the component.
14. The photogrammetry system of claim 8, wherein the base further comprises at least one mounting aperture extending through the first base side.
15. A method for making a photogrammetry target, the method comprising: additively manufacturing a base comprising a first base side, configured to be fixedly mounted directly to a surface of a component, and a convex second base side opposite the first base side, the convex second base side defined by a dome; and fixedly mounting a plurality of retroreflective targets to the dome, each retroreflective target of the plurality of retroreflective targets comprising a retroreflective surface facing a direction which is different than each other retroreflective surface of the plurality of retroreflective targets.
16. The method of claim 15, wherein the base is defined about an axial centerline and the plurality of retroreflective targets comprises a center retroreflective target centered about the axial centerline and facing in an axial direction.
17. The method of claim 16, wherein the plurality of retroreflective targets further comprises a circumferential arrangement of retroreflective targets disposed about the center retroreflective target with respect to the axial centerline.
18. The method of claim 17, wherein each retroreflective target of the circumferential arrangement of retroreflective targets is oriented at a same angle relative to the axial centerline.
19. The method of claim 15, wherein the dome comprises a plurality of mount portions, each mount portion comprising a recess into which a respective retroreflector of the plurality of retroreflectors is disposed.
20. The method of claim 15, wherein the base further comprises at least one mounting aperture extending through the first base side.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
[0032] It is noted that various connections are set forth between elements in the following description and in the drawings. It is noted that these connections are general and, unless specified otherwise, may be direct or indirect and that this specification is not intended to be limiting in this respect. A coupling between two or more entities may refer to a direct connection or an indirect connection. An indirect connection may incorporate one or more intervening entities. It is further noted that various method or process steps for embodiments of the present disclosure are described in the following description and drawings. The description may present the method and/or process steps as a particular sequence. However, to the extent that the method or process does not rely on the particular order of steps set forth herein, the method or process should not be limited to the particular sequence of steps described. As one of ordinary skill in the art would appreciate, other sequences of steps may be possible. Therefore, the particular order of the steps set forth in the description should not be construed as a limitation.
[0033] Referring to
[0034] The second side 18 of the base 12 is defined by a dome 20. A center portion 22 of the dome 20 is located at the axial centerline 14 and may represent an axially distal portion of the dome 20 with respect to the first side 16 of the base 12. A peripheral portion 24 of the dome 20 is located along a radially exterior perimeter of the dome 20 and may represent an axially proximate portion of the dome 20 with respect to the first side 16 of the base. The dome 20 may define a convex curve between the peripheral portion 24 and the center portion 22 of the dome 20. The first and second sides 16, 18 of the base 12 are connected by a sidewall 26 which extends generally axially between first and second sides 16, 18 and forms a radial perimeter of the base 12.
[0035] The photogrammetry target 10 includes a plurality of retroreflective targets 28 mounted to the dome 20. Each retroreflective target of the plurality of retroreflective targets 28 includes a retroreflective surface 30 facing away from the dome 20. In various embodiments, the dome 20 may include a plurality of mount portions 32 with each mount portion of the plurality of mount portions 32 including a recess 34. The plurality of retroreflective targets 28 may each be disposed in a respective recess 34. In various embodiments, the mount portions 32 may have a hexagonal shape with sides 36 of the mount portions 32 aligned with the sides 36 of adjacent mount portions 32. However, it should be understood that the mount portions 32 may have any suitable shape. Further, while the photogrammetry target 10 is illustrated with 7 retroreflective targets 28, it should be understood that any suitable number of retroreflective targets 28 may be used.
[0036] In various embodiments, each retroreflective surface 30 of the plurality of retroreflective targets 28 may face a direction D (e.g., a direction perpendicular to the retroreflective surface 30 of the respective retroreflective target 28) which is different than each other retroreflective surface 30 of the plurality of retroreflective targets 28. The plurality of retroreflective targets 28 may include a center retroreflective target 36 centered about the axial centerline 14 and having a retroreflective surface 30 facing in an axial direction (e.g., facing in a direction which is parallel to the axial centerline 14). The plurality of retroreflective targets 28 may further include a circumferential arrangement of retroreflective targets 38 disposed about the center retroreflective target 36 and/or the axial centerline 14.
[0037] As shown, for example, in
[0038] As shown in
[0039] In various embodiments, the photogrammetry target 10 may include a cap 42 configured to surround the second side 18 of the base 12 so as to cover and protect the plurality of retroreflective targets 28. The cap 42 may include a cover portion 44 and an annular side portion 46. The side portion 46 may be configured to tightly engage with the sidewall 26 of the base 12 so as to maintain the cap 42 in position with respect to the base 12 when installed on the base 12. In various embodiments, the side portion 46 and the sidewall 26 may include threads for threaded engagement between the side portion 46 and the sidewall 26.
[0040] In various embodiments, the base 12 may be a single, monolithic (e.g., integral) component. Because of the orientation of the plurality of retroreflective targets 28 about the dome 20, repositioning the photogrammetry target between images of a photogrammetric inspection may not be necessary. Unlike prior art photogrammetry targets, the photogrammetry target 10 does not require any movable/rotatable components for repositioning the photogrammetry target 10 relative to the imaging device 200. Accordingly, the base 12 of the photogrammetry device 10 may be quickly additively manufactured at a relatively low cost. In various embodiments, the base 12 may be formed from a plastic material (e.g., a thermoset or thermoplastic material). For example, in various embodiments, the base 12 may be formed from a nylon material which may include carbon fiber strands. In various embodiments, the material of the base 12 may be a low-reflectivity material in order to improve contrast between the base 12 and the plurality of retroreflective targets 28.
[0041] As shown in
[0042] The photogrammetry target 10, according to embodiments of the present disclosure, obviates the need to reposition or adjust photogrammetry targets as image data of components is obtained from multiple perspectives. Accordingly, cycle times required for a photogrammetric inspection may be reduced. Further, the photogrammetric target 10 may eliminate the need for personnel assigned to reposition/adjust photogrammetry targets during photogrammetric inspections. This may provide the additional advantage of reducing or eliminating technician-caused error as a result of improper placement and/or orientation of photogrammetry targets.
[0043] While various aspects of the present disclosure have been disclosed, it will be apparent to those of ordinary skill in the art that many more embodiments and implementations are possible within the scope of the present disclosure. For example, the present disclosure as described herein includes several aspects and embodiments that include particular features. Although these particular features may be described individually, it is within the scope of the present disclosure that some or all of these features may be combined with any one of the aspects and remain within the scope of the present disclosure. References to “various embodiments,” “one embodiment,” “an embodiment,” “an example embodiment,” etc., indicate that the embodiment described may include a particular feature, structure, or characteristic, but every embodiment may not necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Further, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is submitted that it is within the knowledge of one skilled in the art to effect such feature, structure, or characteristic in connection with other embodiments whether or not explicitly described. Accordingly, the present disclosure is not to be restricted except in light of the attached claims and their equivalents.