METHOD FOR OPERATING A MEMS SYSTEM, AND MEMS SYSTEM

Abstract

A method for operating a MEMS system having a projection unit for providing an image via a light beam, and a deflecting unit for the two-dimensional deflection of the at least one light beam. The method includes: driving the deflecting unit via a reference signal, so that the deflecting unit periodically deflects a light beam at least two-dimensionally, measuring a controlled variable of the deflecting unit that corresponds to an actual position of the deflected light beam, ascertaining a current deviation of the controlled variable from a target variable that corresponds to a target position of the light beam, calculating a compensating variable based on the ascertained deviation, controlling the deflecting unit and/or controlling the projection unit based on the calculated compensating variable for reducing the deviation of the light beam from the target position. The compensating variable is additionally calculated based on an earlier deviation in an earlier period.

Claims

1-12. (canceled)

13. A method for operating a MEMS system having at least one projection unit configured to provide an image via at least one light beam, and a deflection unit configured to at least two-dimensionally deflect the at least one light beam, the method comprising the following steps: driving the deflecting unit using at least one reference signal, so that the deflecting unit periodically deflects the at least one light beam at least two-dimensionally; measuring at least one controlled variable of the deflecting unit that corresponds to an actual position of the deflected light beam; ascertaining a current deviation of the at least one controlled variable from a target variable that corresponds to a target position of the light beam; calculating at least one compensating variable based on the ascertained deviation; and controlling the deflecting unit with regard to the deflection and/or controlling the projection unit with regard to the image provision, wherein the controlling of the deflecting unit and/or the controlling of the projection unit is based on the calculated at least one compensating variable for reducing a deviation of the light beam from the target position; wherein the at least one compensating variable additionally is calculated based on an earlier deviation in at least one earlier period, for the controlling of the deflecting unit.

14. The method as recited in claim 13, wherein the at least one reference signal is provided in the form of a periodic bandwidth-limited signal.

15. The method as recited in claim 14, wherein the at least one reference signal is wave-shaped.

16. The method as recited in claim 13, wherein the at least one compensating variable is calculated within a specifiable frequency control interval, and the at least one reference signal is provided from at least one fundamental harmonic of a sawtooth signal, the at least one fundamental harmonic being provided within the frequency control interval.

17. The method as recited in claim 13, wherein the calculation of the at least one compensating variable is done using a predictor.

18. The method as recited in claim 17, wherein the predictor is a Smith predictor.

19. The method as recited in claim 13, wherein a brightness of the deflected light beam is adapted, using an adaptation unit, as a function of the actual position.

20. The method as recited in claim 13, wherein the light beam is deflected by the deflecting unit at least two-dimensionally, by deflection with different speeds about at least two different axes.

21. The method as recited in claim 20, wherein the driving of the deflecting unit takes place via two reference signals, the two reference signals having different frequencies, and a deflection via the deflecting unit taking place in such a way that using a first of the two reference signals a deflection takes place about one of the two different axes, and using the second of the two reference signals, a deflection takes place about a second of the two different axes.

22. A MEMS system, comprising: a projection unit configured to provide an image via at least one light beam; a deflecting unit configured to periodically deflect a light beam incident on the deflecting unit about two axes, based on at least one reference signal; a measuring unit configured to measure at least one controlled variable of the deflecting unit that corresponds to an actual position of the deflected light beam; a deviation measuring unit configured to ascertain a current deviation of the at least one controlled variable from a target variable that corresponds to a target position of the light beam; a predictor unit configured to calculate at least one compensating variable based on the ascertained deviation; and a controlling unit configured to control the deflecting unit with regard to the deflection and/or to control the projection device with regard to the image provision, based on the calculated at least one compensating variable for reducing a deviation of the light beam from the target position, in which, for the controlling of the deflecting unit, the at least one compensating variable is additionally calculated by the predictor unit based on an earlier deviation in at least one earlier period.

23. The MEMS system as recited in claim 22, wherein the deflecting unit includes a MEMS mirror that is movable about at least two axes or at least two MEMS mirrors each movable about a respective axis, the at least two axes having different orientations.

24. The MEMS system as recited in claim 22, wherein the controlling unit includes an integrator and an anti-windup unit.

25. The MEMS system as recited in claim 22, wherein the predictor unit is configured to carry out the calculation based on a Smith predictor.

26. The MEMS system as recited in claim 22, wherein the controlling unit includes a closed linear control loop for controlling at least one of the axes of the deflecting unit.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0036] FIG. 1 schematically shows a MEMS system according to a specific example embodiment of the present invention.

[0037] FIG. 2 schematically shows a MEMS system according to a specific example embodiment of the present invention.

[0038] FIG. 3 schematically shows a method for operating a MEMS system according to a specific example embodiment of the present invention.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

[0039] FIG. 1 shows, in schematic form, a MEMS system according to a specific example embodiment of the present invention.

[0040] In detail, FIG. 1 shows a MEMS system 1. MEMS system 1 includes a reference generator 2 that produces a reference signal S1. In addition, MEMS system 1 includes a linear controller 3 that produces a control signal MS for controlling a deflecting unit 6. Control signal MS for deflecting unit 6 is transmitted to this unit. Deflecting unit 6 includes, for the deflecting of a light beam incident on deflecting unit 6, a drive unit 6a for one or more micromirrors 6b each of which is movable about a respective axis or about two axes, and that are then in particular periodically moved corresponding to control signal MS in order to correspondingly deflect a light beam.

[0041] In addition, a measuring unit 9 that measures a position of micromirror or micromirrors 6b is connected to deflecting unit 6. On the basis of the measured position, using a deviation measuring unit 10 a current deviation of a controlled variable of deflecting unit 6 (i.e., here the controlled variable for controlling the position of micromirror 6b) from a specified target variable is ascertained on the basis of reference signal S1. This deviation is then in turn transmitted to both a repetitive controller 7 and to linear controller 3.

[0042] In addition, MEMS system 1 includes two anti-windup devices 4a, 4b that are configured parallel to linear controller 3. In addition, a Smith predictor 5 is configured parallel to the input and output of linear controller 3. Linear controller 3 is used for the controlling and stabilization of micromirror 6b in a continuous frequency controlling band, or controlling range, that is as large as possible. Here, linear controller 3 is first correspondingly configured neglecting the dead time of the controlled system of MEMS system 1. MEMS system 1 shown in FIG. 1 has a control path that includes the movable axis or axes of micromirror 6b, measuring unit 9 for determining position, and (not shown in FIG. 1) an analog-digital/digital-analog converter, including analog filters. Smith predictor 5 is used in turn for the dynamic compensation of controlling errors that result from the neglecting of the dead time. Anti-windup devices 4a, 4b are used in turn to limit integrators of linear controller 3 in the case in which controlled variables for deflecting unit 6 are calculated or requested outside specified limits. In addition, using repetitive controller 7, occurrent controlling errors are compensated periodically, i.e., over at least one preceding period.

[0043] Reference signal S1 provided by reference generator 2 is, in FIG. 1, a wave-shaped, bandwidth-limited signal. Using signal S1, the image point of an image provided by a projection device (not shown here) is then projected with different speeds for the different axes of micromirror 6b. As a result, it is necessary to adapt or subsequently control the brightness of the image point. The wave-shaped, bandwidth-limited reference signal S1 can here be limited to a few, for example five, fundamental harmonic frequencies of a base signal, for example a rectangular or sinusoidal signal, with which an excitation of deflecting unit 6, in particular of micromirror 6b, is to take place. In this way, a reliable controlling out of deviations is enabled. In particular, reference signal S1 can be made up of finitely many fundamental harmonics of a sawtooth signal. The fundamental harmonics can be selected such that they lie within the controlling range, or control interval, of linear controller 3. Using repetitive controller 7, a compensation is achieved of dead times that result from the analog-digital conversion. For this purpose, repetitive controller 7 has a storage device 7a in which the controlling error is stored over at least one excitation period of the reference signal, or of micromirror 6b, from which future controlling errors and corresponding controlled variables can be derived. Periodic disturbances can in this way be efficiently controlled out, even if for example mirror resonance frequencies of micromirror 11 change.

[0044] FIG. 2 shows a MEMS system according to a specific example embodiment of the present invention.

[0045] FIG. 2 shows a MEMS system 1 having a linear controller 3 and a deflecting unit 6. A sawtooth-shaped periodic reference signal S1 is supplied to linear controller 3, which then provides a corresponding periodic adjusting signal MS for deflecting unit 6. Based on the measured controlled variable of deflecting unit 6, via a measuring unit 9 and a corresponding deviation measuring unit 10, linear controller 3 then controls deflecting unit 6 on the basis of the comparison with periodic reference signal S1, and produces the corresponding periodic adjusting signal MS for deflecting unit 6.

[0046] The overall deviation MSA is stored in a storage unit 7a. Storage unit 7a stores not only the current deviation of the current period of reference signal S1, but also the deviation over at least one earlier period. Storage unit 7a provides this information to an image processing device 8b of a projection device 8 that includes an image providing device 8a for providing an image. Image processing device 8b receives as information, on the one hand, for example a sinusoidal high-frequency signal S2 on one axis, and receives signal S1 on the other axis. Image processing device 8b now ascertains a two-dimensional image having a corresponding pixel function p for each pixel to be projected, taking into account the deviation, and forms the pixel function p via a projector 8c for the projection of the image. In other words, image processing device 8b takes into account not only the two reference signals S1, S2 for representing the image, but also takes into account the measured deviations MSA at at least one different point in time. Here, controlling errors of a deflecting unit 6, in particular of a micromirror 6b, which are periodic in a certain time window, are used to correct projected image contents so that a consistency is enabled between the controlling of deflecting unit 6, in particular a micromirror position, and the image contents to be projected, even if controlling errors continuously change.

[0047] As stated above, reference signals S1, S2 are used to control deflecting unit 6 about different axes. The movement of micromirror 6b of deflecting unit 6 can take place with different speeds about different axes, corresponding to different periods of the respective reference signal S1, S2. Image processing device 8b in turn uses these signals S1, S2 to determine that pixel in the image to be projected that is to be represented at a particular time by projector 8c of projection device 8. Storage unit 7a is fashioned in particular as a ring memory, preferably for the “lower” axis, which stores, over a period, the measured deviation between a reference position of micromirror 6b of deflecting unit 6 and the actual position of micromirror 6b. Under the assumption that this deviation between two temporally successive periods is equal, this deviation is used to correct reference signal S2 of image processing device 8b, and thus of the image to be projected.

[0048] In addition, the method described in relation to FIG. 1 and the method described in relation to FIG. 2 can be combined with one another, which further improves the precision of the controlling of deflecting unit 6 and of image processing unit 8b. Storage unit 7a can be used here both by repetitive controller 7 and by image processing device 8b.

[0049] FIG. 3 schematically shows a method according to a specific example embodiment of the present invention.

[0050] In detail, FIG. 3 shows a method for operating a MEMS system having at least one projection unit for providing an image via at least one light beam, and a deflecting unit for the two-dimensional deflection of the at least one light beam.

[0051] The method includes the following steps:

[0052] In a step T1, there takes place a driving of the deflecting unit using at least one reference signal, so that the deflecting unit periodically deflects a light beam at least two-dimensionally.

[0053] In a further step T2, there takes place a measurement of at least a controlled variable of the deflecting unit that corresponds to a position of the deflected light beam.

[0054] In a further step T3 there takes place an ascertaining of a current deviation of the at least one controlled variable from a target variable that corresponds to a target position of the light beam.

[0055] In a further step T4 there takes place a calculation of at least one compensating variable based on the ascertained deviation.

[0056] In a further step T5, there takes place a controlling of the deflecting unit with regard to the deflection and/or of the projection unit with regard to the image provision, based on the calculated at least one compensating variable for reducing the deviation of the light beam from the target position, the at least one compensating variable being additionally calculated on the basis of an earlier deviation in at least one earlier period, for the controlling of the deflecting unit.

[0057] In sum, at least one of the specific embodiments of the present invention has at least one of the following advantages: [0058] controlling over a large controlling range [0059] higher precision in the representation of images [0060] greater flexibility [0061] compensation of dead times

[0062] Although the present invention has been described on the basis of preferred exemplary embodiments, it is not limited thereto, but can be modified in many ways.