Thin-film thermocouple probe and method of preparing same

Abstract

A thin-film thermocouple probe includes a columnar substrate, a tungsten-26% rhenium film and an indium oxide (In.sub.2O.sub.3) film. A side surface of the columnar substrate is provided with a first straight groove and a second straight groove. The tungsten-26% rhenium film is arranged on a front end surface of the columnar substrate and in the first straight groove. The indium oxide film is arranged on the front end surface of the columnar substrate and in the second straight groove. The indium oxide film on the front end surface of the columnar substrate is connected to the tungsten-26% rhenium film on the front end surface of the columnar substrate. A first metal lead wire is connected to the tungsten-26% rhenium film, and a second metal lead wire is connected to the indium oxide film. A method of preparing the thin-film thermocouple probe is provided.

Claims

1. A thin-film thermocouple probe, comprising: a columnar substrate; a tungsten-26% rhenium film; and an indium oxide (In.sub.2O.sub.3) film; wherein a side surface of the columnar substrate is provided with a first straight groove and a second straight groove; the tungsten-26% rhenium film is arranged on a front end surface of the columnar substrate and in the first straight groove; the indium oxide film is arranged on the front end surface of the columnar substrate and in the second straight groove; the indium oxide film on the front end surface of the columnar substrate is connected to the tungsten-26% rhenium film on the front end surface of the columnar substrate; a first metal lead wire is connected to the tungsten-26% rhenium film; and a second metal lead wire is connected to the indium oxide film; and a surface of the indium oxide film and a surface of the tungsten-26% rhenium film are provided with a protective layer, respectively; and the protective layer comprises a first aluminum oxide layer, a silicon carbide (SiC) layer, and a second aluminum oxide layer distributed from top to bottom in sequence.

2. A thin-film thermocouple probe, comprising: a columnar substrate; a tungsten-26% rhenium film; and an indium oxide (In.sub.2O.sub.3) film; wherein a side surface of the columnar substrate is provided with a first straight groove and a second straight groove; the tungsten-26% rhenium film is arranged on a front end surface of the columnar substrate and in the first straight groove; the indium oxide film is arranged on the front end surface of the columnar substrate and in the second straight groove; the indium oxide film on the front end surface of the columnar substrate is connected to the tungsten-26% rhenium film on the front end surface of the columnar substrate; a first metal lead wire is connected to the tungsten-26% rhenium film; and a second metal lead wire is connected to the indium oxide film; and the tungsten-26% rhenium film and the indium oxide film on the front end surface of the columnar substrate form a ring-shaped structure and are connected in parallel.

3. The thin-film thermocouple probe of claim 1, wherein a joint of the first metal lead wire and the tungsten-26% rhenium film is located in the first straight groove; and a joint of the second metal lead wire and the indium oxide film is located in the second straight groove.

4. The thin-film thermocouple probe of claim 1, wherein the first metal lead wire is connected to the tungsten-26% rhenium film through a high-temperature-resistant conductive silver adhesive; and the second metal lead wire is connected to the indium oxide film through a high-temperature-resistant conductive silver adhesive.

5. The thin-film thermocouple probe of claim 1, wherein the columnar substrate is a columnar ceramic substrate or a columnar SiC substrate.

6. A method of preparing the thin-film thermocouple probe of claim 1, comprising: a) cleaning and drying the columnar substrate; b) coating a first shielding layer on the side surface of the columnar substrate; and drying the columnar substrate; c) attaching a first photomask on an end face of the columnar substrate; preparing the indium oxide film on the columnar substrate through magnetron sputtering; carrying out photoresist removal followed by cleaning and drying; d) annealing the columnar substrate obtained in step 3 in a presence of oxygen at 1000° C. for 2 h, so as to increase a density and a carrier concentration of the indium oxide; e) cleaning and drying the columnar substrate; f) coating a second shielding layer on the side surface of the columnar substrate; and drying the columnar substrate; g) attaching a second photomask on the end face of the columnar substrate; preparing tungsten-26% rhenium film on the columnar substrate through magnetron sputtering; carrying out the photoresist removal followed by cleaning and drying; h) preparing the protective layer on the surface of the tungsten-26% rhenium film and the surface of the indium oxide film through magnetron sputtering; and carrying out heat treatment, so as to eliminate an internal stress of the tungsten-26% rhenium film and the protective layer; and i) connecting the first metal lead wire to the tungsten-26% rhenium film; and connecting the second metal lead wire to the indium oxide film to obtain the thin-film thermocouple probe.

7. A thin-film thermocouple probe, comprising: a columnar substrate; a tungsten-26% rhenium film; and an indium oxide (In.sub.2O.sub.3) film; wherein a side surface of the columnar substrate is provided with a first straight groove and a second straight groove; the tungsten-26% rhenium film is arranged on a front end surface of the columnar substrate and in the first straight groove; the indium oxide film is arranged on the front end surface of the columnar substrate and in the second straight groove; the indium oxide film on the front end surface of the columnar substrate is connected to the tungsten-26% rhenium film on the front end surface of the columnar substrate; a first metal lead wire is connected to the tungsten-26% rhenium film; and a second metal lead wire is connected to the indium oxide film; and a side surface of a rear end of the columnar substrate is provided with an external thread.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a perspective view of a thin-film thermocouple probe in accordance with an embodiment of the present disclosure;

(2) FIG. 2 shows an end surface of a columnar substrate in accordance with an embodiment of the present disclosure;

(3) FIG. 3 is a cross-sectional view of the columnar substrate in accordance with an embodiment of the present disclosure; and

(4) FIG. 4 is a cross-sectional view of the thin-film thermocouple probe in accordance with an embodiment of the present disclosure.

(5) In the drawings: 1, columnar substrate; 2, tungsten-26% rhenium film; 3, indium oxide film; 4, first metal lead wire; and 5, external thread

DETAILED DESCRIPTION OF EMBODIMENTS

(6) The present disclosure will be further described below with reference to the accompany drawings.

(7) As shown in FIGS. 1-4, the present disclosure provides a thin-film thermocouple probe, which includes a columnar substrate 1, a tungsten-26% rhenium film 2 and an indium oxide (In.sub.2O.sub.3) film 3. A side surface of the columnar substrate 1 is provided with a first straight groove and a second straight groove. The tungsten-26% rhenium film 2 is arranged on a front end surface of the columnar substrate 1 and in the first straight groove. The indium oxide film 3 is arranged on the front end surface of the columnar substrate 1 and in the second straight groove. The indium oxide film 3 on the front end surface of the columnar substrate 1 is connected to the tungsten-26% rhenium film 2 on the front end surface of the columnar substrate 1. A first metal lead wire 4 is connected to the tungsten-26% rhenium film 2, and a second metal lead wire is connected to the indium oxide film 3. A width of each of the first straight groove and the second straight groove is 2 mm. Round corners are adopted as transitions from the first straight groove and the second straight groove to the front end surface of the columnar substrate 1.

(8) A surface of the indium oxide film 3 and a surface of the tungsten-26% rhenium film 2 are provided with a protective layer, respectively. The protective layer includes a first aluminum oxide layer, a SiC layer, and a second aluminum oxide layer distributed from top to bottom in sequence.

(9) Tungsten-26% rhenium and indium oxide are used as thermoelectric materials, and a hot junction of the thermocouple is integrated at an end of a sensor through performing magnetron sputtering on a three-dimensional complex anisotropic ceramic substrate. A cold junction is led out through the straight grove at the side surface of the columnar substrate 1, so as to avoid being in the same high temperature zone as the hot junction. The tungsten-26% rhenium film 2 and the indium oxide film 3 at an end of the columnar substrate 1 form a ring-shaped structure and are connected in parallel. Two hot junctions are symmetrically arranged at the end of the sensor. The ring-shaped parallel structure formed by the indium oxide film 3 and the tungsten-26% rhenium film 2 on the columnar substrate 1 has an inner diameter of 4.5 mm, an outer diameter of 7.5 mm and a thickness of 1 mm.

(10) A joint of the first metal lead wire 4 and the tungsten-26% rhenium film 2 is located in the first straight groove, and a joint of the second metal lead wire and the indium oxide film 3 is located in the second straight groove. The first metal lead wire 4 is connected to the tungsten-26% rhenium film 2 through a high-temperature-resistant conductive silver adhesive, and the second metal lead wire is connected to the indium oxide film 3 through a high-temperature-resistant conductive silver adhesive.

(11) The columnar substrate 1 is a columnar ceramic substrate or a columnar SiC substrate, which has excellent high-temperature resistance property, and shock and explosion resistance property. A side surface of a rear end of the columnar substrate 1 is provided with an external thread 5.

(12) A method of preparing the thin-film thermocouple probe includes the following steps.

(13) 1) The columnar substrate 1 is cleaned and dried. Specially, the columnar substrate 1 is ultrasonically cleaned in an acetone solution for 10 min and in an anhydrous ethanol solution for 10 min, respectively. The cleaned columnar substrate 1 is then rinsed with deionized water and dried.

(14) 2) A first shielding layer is coated on the side surface of the columnar substrate 1, and then the columnar substrate 1 is dried at 95° C. for 10 min.

(15) 3) A first photomask is attached on an end face of the columnar substrate 1. The indium oxide film 3 is prepared on the columnar substrate 1 through magnetron sputtering. The magnetron sputtering is carried out for 4 h with a power of 150 W and a vacuum degree of 1×10.sup.−6 Pa. Then, photoresistis removal is carried out for the columnar substrate 1 followed by cleaning and drying. Specifically, the columnar substrate 1 is soaked and cleaned with an acetone solution.

(16) 4) The columnar substrate 1 obtained in step 3 is annealed in a presence of oxygen at 1000° C. for 2 h, so as to increase a density and a carrier concentration of the indium oxide.

(17) 5) The columnar substrate 1 is cleaned and dried. Specially, the columnar substrate 1 is ultrasonically cleaned in an acetone solution for 10 min and in an anhydrous ethanol solution for 10 min, respectively. The cleaned columnar substrate 1 is then rinsed with deionized water and dried.

(18) 6) A second shielding layer is coated on the side surface of the columnar substrate 1, and then the columnar substrate 1 is dried at 95° C. for 10 min.

(19) 7) A second photomask is attached on the end face of the columnar substrate 1. The tungsten-26% rhenium film 2 is prepared on the columnar substrate 1 through magnetron sputtering. The magnetron sputtering is carried out for 90 min with a power of 400 W and a vacuum degree of 1×10.sup.−6 Pa. The second photomask is then removed, and the removing of photoresist is carried out followed by cleaning and drying.

(20) 8) The protective layer is prepared on the surface of the tungsten-26% rhenium 2 film and the indium oxide film 3 through multiple times of the magnetron sputtering. Heat treatment is then carried out at 200° C. for 3 h, so as to eliminate an internal stress of the tungsten-26% rhenium film 2 and the protective layer.

(21) 9) The first metal lead wire 4 is connected to the tungsten-26% rhenium film 2, and the second metal lead wire is connected to the indium oxide film 3 to obtain a thin-film thermocouple probe.