PREPARATION METHOD OF A FLEXIBLE TRANSPARENT RADIATION SHIELDING FILM BASED ON BISMUTH COMPOUNDS AND ITS APPLICATION

Abstract

A preparation method of flexible transparent radiation shielding film based on bismuth compounds and its application are provided, in which bismuth compound nanoparticles, polyvinyl alcohol and trace glycerol are mixed to produce a flexible transparent radiation shielding film. The invention disperses the nanoparticles in water to form a stable dispersion, which ensures the homogeneity of the sol obtained by mixing the nanoparticles with polyvinyl alcohol. This invention avoids the decrease in transparency of the composite film as induced by agglomeration of the nanoparticles, achieving a light transmission of over 70% in the visible wavelength band (400-800 nm). With the aid of trace-mount glycerol, the film features long-term stability and flexibility. Importantly, the lead-free film shows a high shielding ability from the medical X-ray band (10-100 keV), which is comparable to Cu foil of identical thickness.

Claims

1. A preparation method of a flexible transparent radiation shielding film based on bismuth compounds comprises the following step: 1) providing a bismuth source Bi(NO.sub.3).sub.3•5H.sub.2O with a fluorine source NH.sub.4F in a molar ratio of 1:3, and a reaction solvent is ethylene glycol; 2) dissolving the bismuth source Bi(NO.sub.3).sub.3•5H.sub.2O and the fluorine source NH.sub.4F weighed in step 1) each in ethylene glycol, and stirring continuously until each resulting solution is clear; 3) mixing a resulting ethylene glycol solution containing the bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with a resulting ethylene glycol solution containing the fluorine source NH.sub.4F under stirring, and allowing to react for 1 minute to obtain a resulting reaction product; 4) separating the resulting reaction product of step 3) by centrifugation to obtain a precipitate, then dispersing the precipitate in deionized water to obtain a nanoparticle dispersion; 5) mixing the nanoparticle dispersion of step 4) with an aqueous polyvinyl alcohol solution in different mass ratios, adding 0.1% by volume glycerol, stirring and mixing uniformly to obtain a mixed hydrosol; 6) taking and spreading 1-100% of the volume of the mixed hydrosol in step 5) on a substrate by a film-forming method, then putting a resulting product into an oven and drying at 30-100° C. to get a flexible transparent radiation shielding film.

2. The preparation method of the flexible transparent radiation shielding film based on the bismuth compounds as claim 1, wherein a size of a nuclear nanocrystal of the nanoparticle dispersion in step 4) is distributed in a range of 10-100 nm.

3. The preparation method of flexible transparent radiation shielding film based on the bismuth compounds as in claim 1, wherein a bismuth source is one of bismuth compounds, rare earth compounds, or other heavy metal compounds; the fluorine source is one of ammonium fluoride, hydrofluoric acid, sodium fluoride or other fluorides.

4. The preparation method of flexible transparent radiation shielding film based on the bismuth compounds as in claim 1, wherein a mass of a water-soluble core-shell nanocrystal in step 6) accounts for more than 60% of a total mass of the flexible transparent radiation shielding film.

5. The preparation method of flexible transparent radiation shielding film based on the bismuth compounds as in claim 1, wherein the film-forming method in step 6) comprises one of drip coating, spin coating, or printing.

6. The preparation method of flexible transparent radiation shielding film based on the bismuth compounds as in claim 1, wherein a material of the substrate in step 6) comprises one of polypropylene, glass, polytetrafluoroethylene, or transparent ceramic.

7. A method of using the flexible transparent radiation shielding film based on the bismuth compounds obtained according to the method described in claim 1 in the fields of medical, optoelectronic devices, and or ceramics, comprising the step of shielding radiation from a radiation source.

8. The method according to claim 7, wherein a size of a nuclear nanocrystal of the nanoparticle dispersion in step 4) is distributed in a range of 10-100 nm.

9. The method according to claim 7, wherein a bismuth source is one of bismuth compounds, rare earth compounds, or other heavy metal compounds; the fluorine source is one of ammonium fluoride, hydrofluoric acid, sodium fluoride or other fluorides.

10. The method according to claim 7, wherein a mass of a water-soluble core-shell nanocrystal in step 6) accounts for more than 60% of a total mass of the flexible transparent radiation shielding film.

11. The method according to claim 7, wherein the film-forming method in step 6) comprises one of drip coating, spin coating, or printing.

12. The method according to claim 7, wherein a material of the substrate in step 6) comprises one of polypropylene, glass, polytetrafluoroethylene, or transparent ceramic.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0024] FIG. 1: XRD of the nanocrystals of the present invention and the flexible transparent radiation shielding film.

[0025] FIG. 2: Comparison of the protective effect of the flexible transparent radiation shielding film of the invention with copper and lead sheets and transparency presentations. The X-ray shielding ability of 35-.Math.m film was better than 63-.Math.m Cu foil, but weaker than 159-.Math.m Pb sheet.

DETAILED DESCRIPTION OF THE EMBODIMENTS

[0026] To make up for the shortcomings of conventional protective materials, the present invention provides a preparation method of flexible transparent radiation shielding film based on bismuth compounds and its application to solve the problems in the background art described above.

[0027] The preparation method of flexible transparent radiation shielding film based on bismuth compounds, including the following steps: [0028] 1) Providing a reactant bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with a reactant fluorine source NH.sub.4F in a molar ratio of 1:3, and a reaction solvent is ethylene glycol; [0029] 2) Dissolving the reactant bismuth source Bi(NO.sub.3).sub.3•5H.sub.2O and the reactant fluorine source NH.sub.4F weighed in step 1) in ethylene glycol, respectively, and stirring continuously until resulting the solutions are clear; [0030] 3) Mixing the ethylene glycol solution containing the bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with the ethylene glycol solution containing the fluorine source NH.sub.4F under stirring, and the reaction lasts for 1 minute; [0031] 4) Separating the reaction product of step 3) by centrifugation to obtain a precipitate, then dispersing the precipitate in deionized water to obtain a nanoparticle dispersion; [0032] 5) Mixing the nanoparticle dispersion of step 4) with the aqueous polyvinyl alcohol solution in different mass ratios, adding 0.1% by volume glycerol, stirring and mixing uniformly, resulting in a mixed hydrosol; [0033] 6) Taking 1-100% of the volume of the mixed hydrosol in step 5) and dropping it on a substrate by the film-forming method, then putting the resulting product into an oven and drying at 30-100° C. to get a flexible and transparent radiation shielding film.

[0034] The size of the nuclear nanocrystal of the nanoparticle dispersion in step 4) is distributed in the range of 10-100 nm.

[0035] The bismuth source is one of the bismuth compounds, rare earth compounds, and other heavy metal compounds; the fluorine source is one of ammonium fluoride, hydrofluoric acid, sodium fluoride and other fluorides.

[0036] Under rapid stirring in step 3), slowly pouring the ethylene glycol solution of bismuth nitrate into the ethylene glycol solution of ammonium fluoride;

[0037] The mass of the water-soluble core-shell nanocrystals in step 6) accounts for more than 60% of the total mass of the flexible and transparent radiation shielding film.

[0038] The film-forming method in step 6) includes one of drip coating, spin coating and printing.

[0039] The substrate material in step 6) includes one of polypropylene, glass, PTFE, and transparent ceramic.

[0040] The invention also discloses the applications for the flexible and transparent radiation shielding film based on bismuth compounds in the fields of medical, optoelectronic devices and ceramics.

[0041] To make the technical means, the creative features, the purpose, and efficacy achieved by the present invention easy to understand, the invention is further elaborated below in conjunction with specific embodiments.

Example 1

[0042] 1) Providing the reactant bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with the reactant fluorine source NH.sub.4F in a molar ratio of 1:3, and a reaction solvent is ethylene glycol; [0043] 2) Dissolving the reactant bismuth source Bi(NO.sub.3).sub.3•5H.sub.2O and the reactant fluorine source NH.sub.4F weighed in step 1) in ethylene glycol, respectively, and stirring continuously until resulting the solutions are clear; [0044] 3) Mixing the ethylene glycol solution containing the bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with the ethylene glycol solution containing the fluorine source NH.sub.4F under stirring, and the reaction lasts for 1 minute; [0045] 4) Separating the reaction product of step 3) by centrifugation to obtain a precipitate, then dispersing the precipitate in deionized water to obtain a nanoparticle dispersion; [0046] 5) Mixing the nanoparticle dispersion of step 4) with the aqueous polyvinyl alcohol solution in different mass ratios, adding 0.1% by volume glycerol, stirring and mixing uniformly, resulting in a mixed hydrosol; [0047] 6) Taking 1-100% of the volume of the mixed hydrosol in step 5) and dropping it on a substrate by the film-forming method, then putting the resulting product into an oven and drying at 30-100° C. to get a flexible and transparent radiation shielding film.

[0048] The size of the nuclear nanocrystal of the nanoparticle dispersion in step 4) is distributed in the range of 10-100 nm.

[0049] The bismuth source is one of the bismuth compounds, rare earth compounds, and other heavy metal compounds; the fluorine source is one of ammonium fluoride, hydrofluoric acid, sodium fluoride and other fluorides.

[0050] Under rapid stirring in step 3), slowly pouring the ethylene glycol solution of bismuth nitrate into the ethylene glycol solution of ammonium fluoride;

[0051] The mass of the water-soluble core-shell nanocrystals in step 6) accounts for more than 60% of the total mass of the flexible and transparent radiation shielding film.

[0052] The film-forming method in step 6) includes one of drip coating, spin coating and printing.

[0053] The substrate material in step 6) includes one of polypropylene, glass, PTFE, and transparent ceramic.

Example 2

[0054] 1) Providing the reactant bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with the reactant fluorine source NH.sub.4F in a molar ratio of 1:3, and a reaction solvent is ethylene glycol; [0055] 2) Dissolving the reactant bismuth source Bi(NO.sub.3).sub.3•5H.sub.2O and the reactant fluorine source NH.sub.4F weighed in step 1) in ethylene glycol, respectively, and stirring continuously until resulting the solutions are clear; [0056] 3) Mixing the ethylene glycol solution containing the bismuth source Bi(NO.sub.3).sub.3 • 5H.sub.2O with the ethylene glycol solution containing the fluorine source NH.sub.4F under stirring, and the reaction lasts for 1 minute; [0057] 4) Separating the reaction product of step 3) by centrifugation to obtain a precipitate, then dispersing the precipitate in deionized water to obtain a nanoparticle dispersion; [0058] 5) Mixing the nanoparticle dispersion of step 4) with the aqueous polyvinyl alcohol solution in different mass ratios, adding 0.1% by volume glycerol, stirring and mixing uniformly, resulting in a mixed hydrosol; [0059] 6) Taking 1-100% of the volume of the mixed hydrosol in step 5) and dropping it on a substrate by the film-forming method, then putting the resulting product into an oven and drying at 30-100° C. to get a flexible and transparent radiation shielding film.

[0060] The size of the nuclear nanocrystal of the nanoparticle dispersion in step 4) is distributed in the range of 10-100 nm.

[0061] Under rapid stirring in step 3), slowly pouring the ethylene glycol solution of bismuth nitrate into the ethylene glycol solution of ammonium fluoride.

[0062] The mass of the water-soluble core-shell nanocrystals in step 6) accounts for 0.1%-99.9% of the total mass of the flexible and transparent radiation shielding film.

[0063] The film-forming method in step 6) includes one of drip coating, spin coating and printing.

[0064] In step 1), the reactant bismuth source is bismuth nitrate, and the fluorine source is ammonium fluoride.

[0065] In step 6), the substrate material is polypropylene.

[0066] The above shows and describes the basic principle of the present invention, the main features and the advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited by the above-mentioned embodiments, that what is described in the above embodiments and in the specification only illustrates the principles of the present invention, and that there will be various variations and improvements to the present invention without departing from the spirit and scope of the present invention, all of which fall within the scope of the present invention for which protection is claimed. The scope of protection claimed for the present invention is defined by the appended claims and their equivalents.