DEVICE FOR DIFFUSING A PRECURSOR WITH A CONTAINER HAVING AT LEAST ONE POROUS ELEMENT ALLOWING THE GENERATION OF AN AEROSOL TOWARDS A GROWTH SURFACE
20230332289 · 2023-10-19
Assignee
Inventors
- Hicham MASKROT (Monthléry, FR)
- Alexandre MICHAU (Bures-sur-Yvette, FR)
- Olivier HERCHER (Fontenay-les-Briis, FR)
Cpc classification
B33Y10/00
PERFORMING OPERATIONS; TRANSPORTING
C23C16/045
CHEMISTRY; METALLURGY
B33Y80/00
PERFORMING OPERATIONS; TRANSPORTING
C23C16/4486
CHEMISTRY; METALLURGY
International classification
C23C16/455
CHEMISTRY; METALLURGY
C23C16/448
CHEMISTRY; METALLURGY
B33Y10/00
PERFORMING OPERATIONS; TRANSPORTING
B33Y80/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A precursor diffusion device configured to diffuse a growth precursor towards an external growth surface included on an external growth member, the diffusion device including a container including at least one porous element having a porosity configured to allow or prevent the passage of a precursor fluid through a thickness of the porous element, the porous element being configured so that the precursor fluid which passes through the thickness of the porous element generates an aerosol by fragmentation of the precursor fluid, the aerosol being formed of droplets of the precursor fluid. Also, a method for depositing a layer on a growth surface by such a diffusion device.
Claims
1. A diffusion device of a precursor configured to diffuse a growth precursor towards an external growth surface comprised on an external growth member, the diffusion device comprising a container internally delimiting at least one receiving enclosure, the container being at least partially constituted by at least one porous element, the porous element internally delimiting an inner surface, the inner surface at least partially delimiting the at least one receiving enclosure, the porous element externally delimiting a diffusion surface intended to face towards the external growth surface, the at least one receiving enclosure being configured to contain a precursor fluid comprising the growth precursor, the diffusion device comprising the precursor fluid contained in the receiving enclosure, the porous element having a porosity configured on the one hand to allow the precursor fluid to pass through a thickness of the porous element counted between the inner surface and the diffusion surface as long as a pressure of the precursor fluid contained in the receiving enclosure is strictly higher than a threshold pressure, on the other hand to prevent the precursor fluid from passing through the thickness of the porous element when the pressure of the precursor fluid contained in the receiving enclosure is lower than the threshold pressure, the threshold pressure being strictly higher than an external pressure prevailing outside the container; the porous element being configured so that the precursor fluid which passes through the thickness of the porous element generates, from the diffusion surface, an aerosol by fragmentation of the precursor fluid, the aerosol being formed of droplets of the precursor fluid and contained between the diffusion surface and the external growth surface.
2. The diffusion device according to claim 1, wherein the container is entirely formed by the porous element.
3. The diffusion device according to claim 1, comprising at least one pressurizing member configured to vary the pressure of the precursor fluid inside the receiving enclosure, so as to place the precursor fluid at a pressure higher than the threshold pressure, to allow the precursor fluid to pass through the porous element from the inner surface towards the diffusion surface.
4. The diffusion device according to claim 1, wherein the container extends generally along a longitudinal axis and comprises a sealed end and a fluid inlet end spaced apart from each other along the longitudinal axis, the porous element being located between these two ends and the receiving enclosure being configured to receive the precursor fluid at the fluid inlet end and to be closed at the sealed end.
5. The diffusion device according to claim 4, wherein the diffusion surface of the porous element has a first prismatic shape characterized by a first basic profile, the first prismatic shape being generated by the rectilinear translation of the first basic profile along the longitudinal axis, and wherein the inner surface of the porous element has a second prismatic shape characterized by a second basic profile, the second prismatic shape being generated by the rectilinear translation of the second basic profile along the longitudinal axis.
6. The diffusion device according to claim 5, wherein the first basic profile is a circle having a first radius, and wherein the second basic profile is a circle having a second radius strictly lower than the first radius, the thickness of the porous element being equal to a difference between the first radius and the second radius.
7. The diffusion device according to claim 4, wherein the porous element has a length, counted longitudinally along the longitudinal axis, the length being strictly greater than 80 cm.
8. The diffusion device according to claim 1, comprising: a first receiving enclosure delimited by a first inner surface, and configured to receive a first precursor fluid; and a second receiving enclosure delimited by a second inner surface and configured to receive a second precursor fluid.
9. The diffusion device according to claim 1, comprising an assembly member disposed at an assembly end of the diffusion device, the assembly member being configured to allow the fastening, at the assembly end, of an external element selected from: another diffusion device and the growth member.
10. The diffusion device according to claim 1, wherein the porous element is obtained by three-dimensional printing.
11. The diffusion device according to claim 1, wherein the container is shaped so that it can be inserted into a tubular clad.
12. A deposition method for depositing a layer on a growth surface, the deposition method comprising: a providing step in which a diffusion device according to claim 1 is provided, the at least one receiving enclosure being at least partially filled with a precursor fluid; a step of delivering a growth member comprising a growth surface; a positioning step, in which the growth surface is disposed opposite the diffusion surface of the diffusion device; a step of pressurizing the receiving enclosure of the diffusion device, in which the precursor fluid is placed at a pressure higher than the threshold pressure, so as to allow the precursor fluid to pass through the thickness of the porous element, so as to generate an aerosol by fragmentation of the precursor fluid when the precursor fluid passes through the thickness of the porous element, the aerosol then being formed of droplets of the precursor fluid, and directed towards the growth surface; a growth step in which the aerosol undergoes a chemical reaction at the growth surface to form the layer.
13. The deposition method according to claim 12, wherein the positioning step is implemented before the pressurizing step.
14. The deposition method according to claim 12, wherein at least one step selected from the positioning step, the pressurizing step and the growth step, is implemented in a growth chamber of a chemical growth furnace.
15. The deposition method according to claim 14, wherein the growth step is implemented in the chemical growth furnace, so that the chemical growth furnace places the growth chamber at a growth temperature to heat the growth member and the diffusion device at the growth temperature to promote the chemical reaction of the aerosol at the growth surface.
16. The deposition method according to claim 12, wherein the step of providing a diffusion device comprises a step of manufacturing the porous element by three-dimensional printing.
17. The deposition method according to claim 12, comprising a filling step in which the precursor fluid is introduced into the at least one receiving enclosure of the diffusion device.
18. The deposition method according to claim 12, wherein the providing step comprises providing a diffusion device according to claim 6, device wherein the first basic profile is a circle having a first radius, and wherein the second basic profile is a circle having a second radius strictly lower than the first radius, the thickness of the porous element being equal to a difference between the first radius and the second radius; and wherein the step of delivering a growth member comprises the delivery of a generally tubular growth member along a main axis, the growth member internally delimiting an outwardly open cavity at an insertion opening disposed at one end of the growth member considered along the main axis, the cavity delimiting at least the growth surface and being in the form of a third prismatic shape characterized by a third basic profile, the third prismatic shape being generated by the rectilinear translation of the third basic profile along of the main axis, the third basic profile being a circle having a radius strictly greater than the first radius, the positioning step comprising a step of inserting the diffusion device inside the cavity of the growth member through the insertion opening along the main axis.
19. The deposition method according to claim 18, wherein a length of the porous element counted along the longitudinal axis axis of the container is strictly greater than a length of the growth member counted along the main axis, so that after the step of inserting the diffusion device inside the growth member, the entire growth surface faces at least one portion of the external surface of the porous element.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0096] Other aspects, aims, advantages and features of the invention will better appear on reading the following detailed description of preferred embodiments thereof, given as a non-limiting example, and made with reference to the appended drawings in which:
[0097]
[0098]
[0099]
[0100]
[0101]
[0102]
DETAILED DESCRIPTION
[0103] In the figures and in the following description, the same reference numerals represent identical or similar elements. In addition, the different elements are not represented to scale in order to promote clarity of the figures. Furthermore, the different embodiments and variants do not exclude each other and can be combined together.
[0104] As illustrated in
[0105] As will be described in more detail below with reference to the deposition method, the diffusion device 1 is suitable for use in a chemical vapor deposition process. Consequently, the diffusion device 1 is adapted to remain intact at temperatures comprised between 1000° C. and 1500° C., and/or at low pressures, typically less than 10-6 Pa.
[0106] With reference to
[0107] Advantageously, the porous element 30 consists essentially of or comprises a metallic material. The metallic material of the porous element 30 comprises at least one of the following materials in pure, alloy or oxide form: aluminum, stainless steel, nickel, or tungsten.
[0108] According to the non-limiting variants represented in
[0109] Said at least one receiving enclosure 11 of the diffusion device 1 is configured to contain a precursor fluid 15 comprising the growth precursor. In general, the receiving enclosure 11 is configured to receive the precursor fluid 15 at the fluid inlet end 21. The diffusion device 1 therefore comprises the precursor fluid 15 contained in the receiving enclosure 11. According to a first embodiment, the precursor fluid 15 is liquid, for example, the precursor fluid 15 may comprise a solid precursor agent dissolved in a solvent. Alternatively, the precursor fluid 15 may comprise a mixture of a solvent and a liquid precursor agent. According to one embodiment, the precursor agent comprises chromium oxide Cr.sub.2O.sub.3. In the non-limiting variant represented in
[0110] The porous element 30 has a porosity configured on the one hand to allow said precursor fluid 15 to pass through a thickness e31 of the porous element 30 counted between said inner surface s31 and said diffusion surface s33 as long as a pressure of the precursor fluid 15 contained in the receiving enclosure 11 is strictly higher than a threshold pressure, and on the other hand to prevent the precursor fluid 15 from passing through said thickness e31 of the porous element 30 when the pressure of the precursor fluid 15 contained in the receiving enclosure 11 is lower than said threshold pressure. For example, the porous element 30 can comprise pores having an average diameter comprised between 2 μm and 100 μm. The threshold pressure is strictly higher than an external pressure prevailing outside the container 10. For example, the threshold pressure is between 2.105 Pa and 20.105 Pa. The porous element 30 is further configured so that the precursor fluid 15 which passes through the thickness e31 of the porous element 30 generates, from the diffusion surface s33, an aerosol 17 by fragmentation of the precursor fluid 15. Said aerosol 17 is formed of droplets of the precursor fluid 15 and is contained between the diffusion surface s33 and the external growth surface s101. According to the variant illustrated in
[0111] In general, the diffusion device 1 is configured to supply an aerosol 17 comprising at least one precursor agent at the growth surface s101 in a manner allowing the growth of a layer 103 on the growth surface s101. For example, said layer 103 may be a protective layer 103. Advantageously, the diffusion device 1 allows controlling the thickness of the protective layer 103 deposited on the growth surface s101.
[0112]
[0113] Finally, and with particular reference to
[0114] Advantageously, it can be provided that the porous element 30 is obtained by three-dimensional printing. Indeed, the manufacture of the porous element 30 by 3D printing allows both simply defining the shape of the porous element 30 even if this shape is complex, and also reducing the manufacturing costs. Furthermore, it is possible to obtain a specific shape of the porous element 30, for example a shape integrating a plurality of receiving enclosures 11a, 11b allowing storing different precursor fluids 15a, 15b before the implementation of a pressurizing step. In addition, 3D printing simply allows providing at least one assembly member 53 at the assembly end 55 of the diffusion device 1.
[0115] Alternatively, the porous element 30 can be obtained by a powder melting method.
[0116] The previously described arrangements allow proposing a diffusion device 1 adapted to generate an aerosol 17 comprising droplets of a precursor fluid 15 at a growth surface s101. Advantageously, the previously described diffusion device 1 allows controlling both the type of precursor fluid 15 comprised in the diffused aerosol 17, and the quantity of diffused aerosol 17. Furthermore, it is possible to locally diffuse said aerosol 17 close to the growth surface s101. Thus, any losses of precursor fluid 15 are limited. Finally, the diffusion device 1 allows homogeneously diffusing the precursor fluid 15 in the form of an ultra-divided or gaseous liquid over the entire growth surface s101, avoiding inhomogeneities. The fragmentation of the precursor fluid 15 allows improving its evaporation and its reactivity, in particular when used in a chemical vapor deposition method in a chemical growth furnace.
[0117] As indicated above, the invention also concerns a deposition method for depositing a layer 103 on a growth surface s101 of a growth member 100.
[0118] The deposition method illustrated for example in
[0119] Then, it can be provided that the deposition method comprises a filling step E03 in which the precursor fluid 15 is introduced into the at least one receiving enclosure 11 of the diffusion device 1. This filling step E03 is implemented before the pressurizing step E50. In this way, the at least one receiving enclosure 11 is at least partially filled with a precursor fluid 15 during the providing step E10.
[0120] The deposition method also comprises a step E20 of delivering a growth member 100 comprising a growth surface s101. According to the non-limiting variant illustrated in
[0121] Then, the deposition method comprises a positioning step E30, in which the growth surface s101 is disposed opposite the diffusion surface s33 of the diffusion device 1. As illustrated in
[0122] The deposition method further comprises a step E50 of pressurizing the receiving enclosure 11 of the diffusion device 1 generally implemented after the positioning step E30. In this way, it is possible to position the external surface of the porous element 30 opposite the growth surface s101 to ensure a localized aerosol 17 generation close to the growth surface s101, homogeneously over the entire growth surface s101. During this pressurizing step E50, the precursor fluid 15 is placed at a pressure higher than the threshold pressure, so as to allow said precursor fluid 15 to pass through the thickness e31 of the porous element 30, in order to generate the aerosol 17 by fragmentation of the precursor fluid 15 when the precursor fluid 15 passes through the thickness e31 of the porous element 30, said aerosol 17 then being formed of droplets of the precursor fluid 15, and directed towards the growth surface s101. According to the embodiment represented in
[0123] Finally, the deposition method comprises a growth step E60 in which the aerosol 17 undergoes a chemical reaction at the growth surface s101 to form said layer 103. Therefore, the growth step E60 can be implemented in the chemical growth furnace, so that the chemical growth furnace places the growth chamber at a growth temperature to heat the growth member 100 and the diffusion device 1 at said growth temperature to promote the chemical reaction of the aerosol 17 at the growth surface s101. For example, the growth temperature is comprised between 1000° C. and 1500° C. Furthermore, during this growth step E60, the chemical growth furnace can place the growth chamber at a growth pressure so as to generate a growth vacuum allowing the growth of the layer 103 on the growth surface s101. For example, the growth pressure is lower than 10-6 Pa. Finally, the growth chamber can be placed in an inert atmosphere during the growth step E60, said inert atmosphere being obtained by the injection of an inert gas, for example argon or nitrogen. Advantageously, the pressurizing gas used during the pressurizing step E50 is identical to the inert gas used to place the growth chamber in an inert atmosphere.
[0124] In general, at least one step selected from the positioning step E30, the pressurizing step E50 and the growth step E60, is implemented in the growth chamber of the chemical growth furnace, preferably a chemical vapor deposition furnace. In this way, the pressurizing step E50 allows locally supplying a precursor agent contained in the precursor fluid 15 at the growth surface s101 to allow the growth of a layer 103 in the chemical vapor deposition furnace during the growth step E60.
[0125] In the case where the porous element 30 comprises a first receiving enclosure 11a and a second receiving enclosure 11b, the second receiving enclosure 11b can be configured to receive a coolant configured to cool the porous element 30 during the growth step E60. Thus, it is possible to cool the porous element 30 to avoid an undesirable deposition of the precursor fluid 15 in pores of the porous element 30, which could lead to clogging of said pores of the porous element 30 and/or to disruption of a homogeneous growth on the growth surface s101.
[0126] The previously described arrangements allow proposing a deposition method in which an aerosol 17 comprising droplets of a precursor fluid 15 is locally injected at Zo a growth surface s101. In this way, it is possible to control both the type of diffused aerosol 17, and the quantity of diffused aerosol 17. Thus, any losses of precursor fluid 15 are limited.