DYNAMIC JOINT DISTRIBUTION ALIGNMENT NETWORK-BASED BEARING FAULT DIAGNOSIS METHOD UNDER VARIABLE WORKING CONDITIONS
20230314795 · 2023-10-05
Inventors
Cpc classification
G02B27/0012
PHYSICS
International classification
G02B27/00
PHYSICS
Abstract
The invention discloses a design method of a wavenumber linearity dispersion optical system and an imaging spectrometer, including: building an optical system including a grating, a prism and an objective lens that are sequentially arranged, the grating adjoins the prism; defining a linearity evaluation coefficient RMS; assigning a minimum value to the linearity evaluation coefficient RMS through adjustment to the vertex angle of the prism, when the linearity evaluation coefficient RMS is at minimum, the vertex angle of the prism being α.sub.1; acquiring compensations for distortion and longitudinal chromatic aberration of the objective lens based on the interval between equal-difference wavenumbers on the image plane when the vertex angle of the prism is α.sub.1; and optimizing the objective lens based on the compensations for distortion and longitudinal chromatic aberration of the objective lens to obtain an optimized optical system. Higher wavenumber linearity can be achieved through objective-lens-aberration compensated wavenumber linearity.
Claims
1. A design method of a wavenumber linearity dispersion optical system, comprising steps of: S1: building an optical system including a grating, a prism and an objective lens that are sequentially arranged, the grating adjoining the prism, wherein collimated light is split through the grating and the prism into rays of different wavenumbers, and the rays of different wavenumbers enter the objective lens at different angles and image on an image plane; S2: defining a linearity evaluation coefficient RMS, which is the root-mean-square error of intervals between equal-difference wavenumbers in an operating band on the image plane; S3: assuming a length of the image plane Y as a constant value, assigning a minimum value to the linearity evaluation coefficient RMS through adjustment to the vertex angle of the prism α, when the linearity evaluation coefficient RMS is at minimum, the vertex angle of the prism is α.sub.1; S4: acquiring compensations for distortion and longitudinal chromatic aberration of the objective lens based on the interval between the equal-difference wavenumbers in the image plane when the vertex angle of the prism is α.sub.1; and S5: optimizing the objective lens based on the compensations for distortion and longitudinal chromatic aberration of the objective lens to obtain an optimized optical system.
2. The design method of a wavenumber linearity dispersion optical system of claim 1, wherein between the steps S4 and S5 the method further comprises designing an objective lens in which negative distortion and longitudinal chromatic aberration can be introduced.
3. The design method of a wavenumber linearity dispersion optical system of claim 2, wherein the objective lens includes a first positive lens, a first negative lens, a second positive lens and a third positive lens that are sequentially arranged, the incident height and incident angle of an off-axis view field chief ray on the third positive lens are increased to produce negative spherical aberration in order to introduce negative distortion.
4. The design method of a wavenumber linearity dispersion optical system of claim 3, wherein a second negative lens is provided at the side of the third positive lens far away from the second positive lens to correct the field curvature.
5. The design method of a wavenumber linearity dispersion optical system of claim 4, wherein the first positive lens, the first negative lens, the second positive lens, the third positive lens and the second negative lens are made of the same material to introduce longitudinal chromatic aberration.
6. The design method of a wavenumber linearity dispersion optical system of claim 5, wherein the first positive lens, the first negative lens, the second positive lens, the third positive lens and the second negative lens have a refractive index in the range of 1.5 to 2.3.
7. The design method of a wavenumber linearity dispersion optical system of claim 5, wherein the step S5 comprises optimizing the optical system by changing the curvature of the objective lens, the interval between adjacent lenses, the thickness of the lens, and the material of the lens.
8. The design method of a wavenumber linearity dispersion optical system of claim 1, wherein the step S2 comprises steps of: S21: selecting n equal-difference wavenumbers from the operating band; S22: assuming the incident angle of a collimated ray on the grating as θ.sub.in, the diffraction angle as θ.sub.d, an included angle between the grating and the prism as β, a vertex angle of the prism as α, incident angles of the ray on the front and back surfaces of the prism respectively as θ.sub.1 and θ.sub.3 and the corresponding exit angles respectively as θ.sub.2 and θ, the refractive index of the prism as n(λ), and an exit angle of the center wavenumber
9. The design method of a wavenumber linearity dispersion optical system of claim 8, wherein in the step S4, the compensation for distortion of the objective lens is
10. An imaging spectrometer fabricated by the design method of a wavenumber linearity dispersion optical system of claim 1.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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REFERENCE NUMBERS IN THE DRAWINGS
[0045] 10 grating, [0046] 11 front protective glass of the grating, [0047] 12 back protective glass of the grating, [0048] 20 prism, [0049] 30 objective lens, [0050] 31 first positive lens, [0051] 32 first negative lens, [0052] 33 second positive lens, [0053] 34 third positive lens, [0054] 35 second negative lens, [0055] 40 image plane, [0056] 50 collimating lens.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0057] The invention will be further illustrated with reference to the drawings and particular embodiments, so that those skilled in the art can better understand and implement the present invention, but the listed embodiments are intended as limitations of the present invention.
[0058] To achieve miniaturization of the wavenumber linearity spectrometer and increase the wavenumber linearity, in the present invention, objective-lens-aberration compensated wavenumber linearity is utilized to achieve higher wavenumber linearity without separating the grating from the prism. The basic principle is as follows. After the collimated light is split by a beam splitting element, rays of different wavenumbers enter the objective lens at different angles. As shown in
[0059] As shown in
[0060] First step: building an optical system including a grating 10, a prism 20 and an objective lens 30 that are sequentially arranged, wherein the grating 10 adjoins the prism 20. That is, the included angle β between the grating and the prism is 0. Collimated light is split through the grating 10 and the prism 20 into rays of different wavenumbers, and rays of different wavenumbers enter the objective lens 30 at different angles and image on an image plane 40.
[0061] Second step: defining a linearity evaluation coefficient RMS, which is the root-mean-square error of intervals between equal-difference wavenumbers in an operating band on the image plane, this step includes specifically the following steps.
[0062] S21: selecting n equal-difference wavenumbers from the operating band.
[0063] S22: assuming the incident angle of a collimated ray on the grating as θ.sub.in, the diffraction angle as θ.sub.d, the included angle between the grating and the prism as β, the vertex angle of the prism as α, the incident angles of the ray on the front and back surfaces of the prism respectively as θ.sub.1 and θ.sub.3 and the corresponding exit angles respectively as θ.sub.2 and θ, the refractive index of the prism as n(λ), and the exit angle of the center wavenumber
on the back surface or the prism as
with its exit direction as the optical axis direction of the objective lens, and based on the geometrical relationship, the grating equation and the law of refraction, obtaining:
[0064] where d is the grating constant, λ=2π/k is the wavelength of the light, β=θ.sub.1−θ.sub.d, and θ.sub.3=α−θ.sub.2.
[0065] S23: combining equation (1) with equation (2) and obtaining the exit angle of the ray on the back surface of the prism as:
is the view field angle at which the ray of wavenumber k.sub.n enters the objective lens, and
is the view field angle at which the ray of wavenumber k.sub.1 enters the objective lens.
[0068] S24: defining a linearity evaluation coefficient R.sub.MS:
[0070] S3: assuming the length of the image plane Y as a constant value, assigning a minimum value to the linearity evaluation coefficient RMS through adjustment to the vertex angle α of the prism. When the linearity evaluation coefficient RMS is at minimum, the vertex angle of the prism is α.sub.1.
[0071] S4: acquiring compensations for distortion and longitudinal chromatic aberration of the objective lens based on the location interval between equal-difference wavenumbers on the image plane when the vertex angle of the prism is α.sub.1, including specifically: [0072] the compensation for distortion of the objective lens
and [0073] the compensation for longitudinal chromatic aberration of the objective lens C=y.sub.k.sub.
[0074] In the present invention, the structure of the objective lens can be designed to introduce negative distortion and longitudinal chromatic aberration. The objective lens may include a combination of multiple lenses.
[0075] With reference to
[0076] Fifth step: optimizing the objective lens based on the compensations for distortion and longitudinal chromatic aberration of the objective lens to obtain an optimized optical system, including: optimizing the optical system by changing the curvature of the objective lens, the interval between adjacent lenses, the thickness of the lens, and the material of the lens and obtaining values assigned to these variables through the least square method.
[0077] The technical solution of the present invention is to be further described below with a specific embodiment.
[0078] In this embodiment, the operating band of the wavenumber linearity spectrometer is 750 nm to 950 nm, the protective glasses on both sides of the transmissive grating 10 are BK7, the grating line pair number is 1200/mm, the material of the prism is ZnS, the size of the line detector is 20.4 mm, the size of the pixel is 10 μm×20 μm, and the spectral resolution is 0.1 nm. The equal-difference wavenumber samples are shown in Table 1.
TABLE-US-00001 TABLE 1 Sample 1 2 3 4 5 6 7 Wavenumber/μm.sup.−1 8.3776 8.2306 8.0836 7.9367 7.7897 7.6427 7.4957 Wavelength/μm 0.7500 0.7634 0.7773 0.7917 0.8066 0.8221 0.8382 Sample 8 9 10 11 12 13 Wavenumber/μm.sup.−1 7.3488 7.2018 7.0548 6.9078 6.7609 6.6139 Wavelength/μm 0.8550 0.8724 0.8906 0.9096 0.9293 0.9500
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[0080] The grating adjoins the prism with a vertex angle of 32.0° to form an initial structure of the beam splitting element. The compensations for distortion and longitudinal chromatic aberration in the largest view field needed for the objective lens are estimated respectively as:
[0081] The corresponding objective lens is designed based on the estimated aberration to obtain an optimized wavenumber linearity spectrometer system.
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[0083] As shown in
[0084] As shown in
[0085] The above described embodiments are only preferred embodiments to fully illustrate the present invention, and the scope of protection of the present invention is not limited thereto. Any equivalent substitution or variation made by those skilled in the art on the basis of the present invention shall fall within the scope of protection of the present invention. The scope of protection of the present invention is defined by the claims.