Reactor System for Producing and/or Treating Particles in an Oscillating Process Gas Flow

Abstract

A reactor system for the production and/or treatment of particles in an oscillating process gas stream. The reactor system includes a reactor unit that has an upstream feed unit and a downstream discharge unit and a reactor that includes a multiple burner system that has a combustion chamber, an exhaust gas pipe that follows downstream from the combustion chamber, and a plurality of burners. A part of the burners of the multiple burner systems are suitable for production of the oscillating process gas stream. The burners of the multiple burner system are arranged in the combustion chamber of the reactor unit.

Claims

1. A reactor system for the production or treatment of particles in an oscillating process gas stream, comprising: a reactor unit that has an upstream feed unit and a downstream discharge unit, wherein the reactor unit has a reactor that comprises a multiple burner system that has a combustion chamber, an exhaust gas pipe that follows downstream from the combustion chamber, and a plurality of burners, wherein a part of the burners of the multiple burner system are suitable for production of the oscillating process gas stream, and wherein the burners of the multiple burner system are arranged in the combustion chamber of the reactor unit, and wherein the feed unit has a channel system that has channel ducts, and wherein each burner has a channel duct for the fuel/combustion gas mixture configured as a feed line and/or a channel duct for fuel configured as a feed line and a channel duct for combustion gas, configured as a feed line wherein of the multiple burner systems suitable for the production of the oscillating process gas stream, each channel duct configured as a feed line has a volume stream regulation device.

2. The reactor system according to claim 1, wherein the plurality of burners are selected from the group of ignition burners, pilot burners, ring burners, diffusion burners, and swirl burners.

3. The reactor system according to claim 1, wherein the part of the burners of the multiple burner system suitable for the production of the oscillating process gas stream is configured as a diffusion burner or as a swirl burner.

4. The reactor system according to claim 1, wherein the burners of the multiple burner system are suitable for burning liquid, solid, and gaseous fuel.

5. The reactor system according to claim 1, wherein the burners of the multiple burner system are arranged concentrically to one another.

6. The reactor system according to claim 1, wherein the volume stream regulation device is configured as a sliding gate valve, regulating valve, regulating cock or an iris shutter that can be regulated.

7. The reactor system according to claim 1, wherein the volume stream regulation device has a regulation precision of less than or equal to 3%.

8. The reactor system according to claim 1, wherein the feed unit and the discharge unit have a pressure regulation device, so that the static pressure in the reactor system can be regulated.

9. The reactor system according to claim 1, wherein the reactor unit has multiple reactors that have a multiple burner system.

10. The reactor system according to claim 1, wherein the feed unit and the discharge unit each comprise a pressure loss production device that produces a pressure loss.

11. The reactor system according to claim 10, wherein the pressure loss production devices are configured in such a manner that a resonance state that can be produced in the reactor system can be set.

12. The reactor system according to claim 1, wherein a divider device is arranged upstream from the combustion chamber of the reactor unit, wherein the divider device divides a channel duct configured as a feed line, so that multiple burners can be supplied by means of the feed line.

13. The reactor system according to claim 1, wherein the feed unit has a pulsation device.

14. The reactor system according to claim 13, wherein the pulsation device is arranged in a channel duct configured as a feed line for the diffusion burner or swirl burner configured as a main burner.

15. The reactor system according to claim 1, wherein the volume stream regulation device has a regulation precision of less than or equal to 2%.

16. The reactor system according to claim 1, wherein the volume stream regulation device has a regulation precision of less than or equal to 1%.

17. The reactor system according to claim 1, wherein the volume stream regulation device has a regulation precision of less than or equal to 0.5%.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In the following, the invention will be explained in greater detail using the attached drawing, which shows in

[0030] FIG. 1 a schematic representation of a first embodiment of a reactor system,

[0031] FIG. 2 a sectional representation of a first multiple burner system of the reactor system shown in FIG. 1, having burners arranged concentric to one another,

[0032] FIG. 3 a top view of the first multiple burner system shown in FIG. 2,

[0033] FIG. 4 a schematic representation of a second embodiment of a reactor system,

[0034] FIG. 5 a sectional representation of a second multiple burner system having burners arranged concentric to one another,

[0035] FIG. 6 a top view of the second multiple burner system, and

[0036] FIG. 7 a schematic representation of a third embodiment of a reactor system.

DETAILED DESCRIPTION

[0037] FIG. 1 shows a schematic representation of a first embodiment of a preferred reactor system 1 for the production and/or treatment of particles in an oscillating process gas stream.

[0038] The reactor system 1 that forms a system 2 that is capable of oscillation or oscillates during operation has a reactor unit 5 that has an upstream feed unit 3 and a downstream discharge unit 4. The reactor unit 5 has a reactor 34 that comprises a combustion chamber 6, an exhaust gas pipe 7 that follows the combustion chamber 6 downstream, also referred to as a resonance pipe, and a reactor 34 that comprises a multiple burner system 9 that has a plurality of burners 8.

[0039] The burners 8 of the multiple burner system 9 are arranged in the combustion chamber 6 of the reactor unit 5. In the first exemplary embodiment shown in FIG. 1, the multiple burner system 9 comprises an ignition burner 10, a ring burner 11, a pilot burner 12, and a swirl burner 14 configured as the main burner 13. The burners 8 of the multiple burner systems 9 are arranged concentric to one another and are suitable for burning liquid, solid, and gaseous fuel. In this regard, a part of the burners 8 of the multiple burner systems 9 is suitable for production of the oscillating process gas stream. In the first embodiment, the oscillating or pulsating process gas stream is produced by means of the swirl burner 14 configured as a main burner 13.

[0040] After combustion, the hot, oscillating or pulsating process gas flows out of the combustion chamber 5 in the direction of the exhaust gas pipe 7 that is configured as a reaction space 15. In this regard, the combustion process is a self-regulating periodic non-stationary combustion process. Application of the starting material in the reaction space 15 takes place by means of the application device 16.

[0041] The application device 16 is preferably configured for the introduction of liquids or solids into the reaction space 15 of the reactor unit 5.

[0042] Liquids or liquid raw materials (precursors) can be introduced into the reaction space 15 preferably as a solution, suspension, melt, emulsion or as a pure liquid. The introduction of the liquid raw materials or liquids preferably takes place continuously. For the introduction of liquids into the reaction space 15 of the reactor unit 5, an application device 16 is preferably used, such as, for example, spray nozzles, feed pipes or droplet dispensers, which are configured, for example, as single-substance or multi-substance nozzles, pressure nozzles, nebulizers (aerosol) or ultrasound nozzles.

[0043] In contrast to this, for the introduction of solids, for example powders, granulates or the like, into the reactor unit 5, preferably into the reaction space 15, an application device 16 is preferably used, such as, for example, a double flap, a rotary feeder, a batching valve or an injector.

[0044] The introduction of the starting substance in the form of a liquid or of a solid can take place in or counter to the flow direction of the process gas PG that flows through the reactor system 1.

[0045] Preferably the starting substance is introduced into the reactor system 1, preferably into the reaction space 15, using a carrier gas. In an embodiment that is not illustrated, application takes place into the combustion chamber 6 of the reactor unit 5. The decision as to whether the starting substance is introduced into the reactor system 1 in or counter to the flow direction of the process gas depends decisively on the shape, mass, and density of the starting substance at a set average flow speed of the process gas PG. As a result, the possibility exists of also thermally treating starting substances that cannot be transported in the reactor system 1 by means of the process gas PG.

[0046] The starting substance is treated thermally in the treatment zone of the reactor 5, preferably in the reaction space 15, so that the particles P to be produced, preferably the inorganic or organic nano-particles, particularly preferably the nano-crystalline metal oxide particles, are formed. The region in which the starting substances are treated thermally is defined as the treatment zone.

[0047] The feed unit 3 comprises a channel system 18 that has channel ducts 17, and wherein each burner 8 has a channel duct 17 configured as a feed line 19 for the fuel/combustion gas mixture BVG, or a channel duct 17 for fuel BS configured as a feed line 19 and a channel duct 17 for combustion gas VG, in particular combustion air, configured as a feed line 19, in each instance.

[0048] At least for the part of the burners 8 of the multiple burner systems 9 that are suitable for production of the oscillating process gas stream, here the swirl burner 14 configured as the main burner 13, each channel duct 17 configured as a feed line 19 has a volume stream regulation device 20. In the embodiment of the reactor system 1 shown in FIG. 1, each channel duct 17 configured as a feed line 19 comprises a volume stream regulation device 20.

[0049] Preferably the volume stream regulation device 20 is configured as a sliding gate valve, regulating valve, regulating cock or an iris shutter that can be regulated. In the embodiment shown, regulating valves 21 are built into the reactor system 1. The regulation precision of the volume stream regulation devices 20 configured as regulating valves 21 is less than or equal to 3%, preferably less than or equal to 2%, particularly preferably less than or equal to 1%, and most preferably less than or equal to 0.5%.

[0050] Furthermore, each channel duct 17 of the feed unit 3, configured as a feed line 19, has a pressure loss production device 22 that produces a pressure loss. Also, each channel duct 24 of a channel system 25 of the discharge unit 4, configured as a discharge line 23, comprises a pressure loss production device 22. The pressure loss production devices 22 are configured in such a manner that optionally a resonance state that can be produced in the reactor system 1 can be set.

[0051] For reliable ignition of the oscillating or pulsating process gas, an external, self-monitoring ignition burner 10 is used. The ignition burner 10 is operated with its own channel duct 17 for the fuel/combustion gas mixture BVG, configured as a feed line 19. After successful ignition of the pilot burner 12 and the swirl burner 14 configured as the main burner 13, the ignition burner 10 can be removed from the region 27 of the burner outflow or the main flame of the swirl burner 14 by way of a displacement device 26. When ignition occurs again, the ignition burner 10 can be moved into the region 27 of the burner outflow.

[0052] In FIG. 2, a sectional representation of a first multiple burner system 9 having burners 8 that are arranged concentric to one another, of the reactor system 1 shown in FIG. 1, is shown. The concentrically arranged burners 8 are configured, from the outside to the inside, as a ring burner 11, as a swirl burner 14 configured as a main burner 13, and as a pilot burner 12.

[0053] The pilot burner 12, also configured as a swirl burner, brings about reliable ignition, close to the burner, of the lean pre-mixed main flame of the swirl burner 14. The fuel/combustion gas mixture BVG enters into the combustion chamber 6 of the reactor unit 5 in a swirled manner, as the pilot burner process gas PPG. The thermal power range of the pilot burner 12 preferably lies between 20 kW and 50 kW; the related air quantity regulation range preferably lies between 1.05 and 1.25. The swirl production of the pilot burner 12 is implemented by means of an axial blade swirl producer 28 that has a fixed swirl strength, which depends on a blade inclination angle.

[0054] The swirl burner 14 configured as a main burner 13 has two different functions. For one thing, the main flame of the swirl burner 14 provides the heat output required for the thermal material treatment, for example drying, calcination and/or phase conversion. In this regard, the production temperature and/or treatment temperature of the starting substances, which can be set, lies between 100° C. to 3,000° C., preferably at 240° C. to 2200° C., particularly preferably at 240° C. to 1800° C., very particularly preferably at 650° C. to 1800° C., most preferably at 700° C. to 1500° C. from the lean pre-mixed combustion. For another thing, the main flame of the swirl burner 14 converts part of the thermal energy from the combustion process into mechanical energy for producing and maintaining a periodically oscillating process gas stream, in which the material treatment takes place. The power range of the swirl burner 14 configured as the main burner 13 preferably lies at 75 kW to 450 kW. The air quantity of the main flame of the swirl burner 14 varies, in particular, between 1.3 and 1.8. The swirl production of the swirl burner 14 is implemented by means of infinitely adjustable tangential air inlets, not illustrated, that have an angle adjustment range of preferably 0° to 45°.

[0055] The fuel BS flows into the combustion gas swirl burner channel 30 through which combustion gas VG flows, by way of fuel exit openings 29, and is pre-mixed there. The pre-mixed fuel/combustion gas mixture enters into the combustion chamber 6 of the reactor unit 5 by way of a swirl burner exit opening 31 and ignites.

[0056] Alternatively to the swirl burner 14 structured as the main burner 13, the possibility exists of making the main energy input for thermal material treatment, at preferably up to 450 kW, available by way of a diffusion burner 32, illustrated here in FIG. 7.

[0057] The ring burner 11 serves for adaptation of the total thermal power as well as of the production temperatures and/or treatment temperatures to the corresponding process. The ring burner 11 allows partial uncoupling of the average main burner power and the burner setting for pulsating, oscillating main burner operation. The power range of the ring burner preferably ranges from 0 kW at an air flow to up to approximately 50 kW at a pure air quantity of 1.5. The fuel/combustion gas mixture BVG enters into the combustion chamber 6 of the reactor unit 5 as ring burner process gas RPG, by way of ring burner exit openings 33.

[0058] FIG. 3 shows a top view of the first multiple burner system 9 shown in FIG. 2 and explained in greater detail, having the ring burner 11, swirl burner 14, and pilot burner 12, arranged from the outside to the inside.

[0059] In FIG. 4, a schematic representation of a second embodiment of a reactor system 1 is shown.

[0060] The reactor system 1 has a reactor unit 5 that has two reactors 34, preceded by a feed unit 3 and followed by a discharge unit 4.

[0061] The process gas PG that flows through the reactor system 1 enters into the reactor unit 5 of the reactor system 1 by way of the feed unit 3, and from there exits by way of the discharge unit 4. The feed unit 3 comprises a channel system 18 that has channel ducts 17, and wherein each burner 8 has a channel duct 17 for the fuel/combustion gas mixture BVG, configured as a feed line 19. The discharge unit 4 also comprises a channel system 25 that has channel ducts 24 configured as discharge lines 23.

[0062] The reactor 34 of the reactor unit 5 has a combustion chamber 6, an exhaust gas pipe 7 configured as a reaction space 15, wherein the exhaust gas pipe 7 follows the combustion chamber 6 downstream. The combustion chamber 6 of the reactor 34 has a multiple burner system 9 having a plurality of burners 8, here two burners 8, namely a ring burner 11 and a swirl burner 14. Both the ring burner 11 and the swirl burner 14 burn a pre-mixed fuel/combustion gas mixture BVG.

[0063] The process gas PG that flows through the reactor system 1 is warmed or heated to a production temperature and/or treatment temperature by means of a swirl burner 14 configured as the main burner 13. The temperature for production or thermal treatment of the at least one starting substance is preferably between 100° C. and 3000° C., preferably 240° C. to 2200° C., particularly preferably 240° C. to 1800° C., very particularly preferably 650° C. to 1800° C., most preferably 700° C. to 1500° C.

[0064] By means of the combustion process, a pulsation that has a pulsation frequency and a pulsation pressure amplitude is imposed on the process gas PG that flows through the reactor system 1. The pulsation preferably has a pulsation pressure amplitude of 0.1 mbar to 350 mbar, particularly preferably of 1 mbar to 200 mbar, very particularly preferably of 3 mbar to 50 mbar, most preferably of 10 mbar to 40 mbar.

[0065] Furthermore, the possibility exists of setting the pulsation frequency of the process gas PG by means of a pulsation device 42, independently of the pulsation pressure amplitude. The pulsation frequency of the process gas PG that flows through the reactor system 1, while pulsating, can be overlaid and thereby also set by means of the pulsation device 42, preferably in the frequency range of 1 Hz to 2000 Hz, preferably between 1 Hz to 500 Hz, particularly preferably between 40 Hz and 160 Hz.

[0066] Accordingly, a pulsation that has a pulsation frequency and a pulsation pressure amplitude can also be imposed on the process gas PG that flows through the reactor system 1, by means of the pulsation device 42. The pulsation preferably has a pulsation pressure amplitude of 0.1 mbar to 350 mbar, particularly preferably of 1 mbar to 200 mbar, very particularly preferably of 3 mbar to 50 mbar, most preferably of 10 mbar to 40 mbar.

[0067] The pulsation device 42 is preferably configured as a pulsation device 42 that works without a flame. It is practical if the pulsation device 42 is configured as a compression module, in particular as a piston, or as a rotary vane or as a modified turnstile.

[0068] Downstream from the feed unit 3, the exhaust gas pipe 7 that forms a reaction space 15 is arranged on the reactor 34 of the reactor unit 5. In the reaction space 15, the starting substance is introduced into the pulsating process gas PG that flows through the reactor system 1 and the reactor 34 of the corresponding reactor unit 5, by means of an application device 16. The application takes place as has already been explained in greater detail with regard to FIG. 1.

[0069] At least for the part of the burners 8 of the multiple burner system 9 that is suitable for production of the oscillating process gas stream, here the swirl burner 14 configured as the main burner 13, and the ring burner 11, each channel duct 17 configured as a feed line 19 has a volume stream regulation device 20. Preferably the volume stream regulation device 20 is configured as a sliding gate valve, regulating valve, regulating cock or an iris shutter that can be regulated. In the embodiment shown, iris shutters 35 that can be regulated are built into the reactor system 1. The regulation precision of the volume stream regulation devices 20 configured as iris shutters 35 is less than or equal to 3%, preferably less than or equal to 2%, particularly preferably less than or equal to 1%, and most preferably less than or equal to 0.5%. The volume stream regulation device 20 that has a great regulation precision is necessary so as to minimize or prevent feedback to the process gas volume stream caused by the resonance oscillation. In particular, great regulation precision of the process gas volume stream is necessary when using a divider device 36, so that the system 2, which is capable of oscillation or oscillates in the operating state can be operated in a stable manner.

[0070] Upstream from the combustion chambers 6 of the reactors 34 of the reactor unit 5, a divider device 36 is arranged in the feed line 19 for the fuel/combustion gas mixture BVG for the swirl burner 14. The feed line 19 is configured in such a manner that each feed line 19 between the divider device 36 and the corresponding burner chamber 6 of the reactor 34 of the reactor unit 5 has a pressure loss, wherein the pressure loss in each feed line 19 is essentially the same size. This is achieved in that in particular, the feed line 19 [sic-singular] have the same feed line length and/or the same feed line inside diameter and/or other fittings that are the same.

[0071] The discharge unit 4 that follows the reactor unit 5 comprises a separation apparatus 37. The separation apparatus 37, in particular a filter, preferably a hot gas filter, very particularly preferably a tubular, metal or fiberglass filter, a cyclone or a washer, separates the thermally treated particles P from the pulsating, hot process gas stream that flows through the reactor system 1. The particles P that are removed from the process gas stream are drawn off from the separation apparatus 37 and processed further. If necessary, the particles P that have been thermally treated in the reactor system 1 are subjected to further subsequent treatment steps, such as, for example, suspension, grinding or calcination. The non-charged process gas PG is conducted away into the environment.

[0072] The dwell time of the one starting substance introduced into the reactor system lies between 0.1 s and 25 s. Closed-cycle operation of the process gas PG is possible. If applicable, partial removal of the process gas PG from the circuit is also possible.

[0073] Furthermore, the reactor system 1, which has a static process gas pressure, is configured as an acoustic resonator 38, which has inherent resonance frequencies that each define a resonance state. The process gas PG can form a gas column that is capable of resonance in the reactor system 1, so that the resonator 38 can be excited by means of the pulsation frequency and/or the pulsation pressure amplitude of the pulsation that is generated by means of the combustion process or a pulsation device that is not illustrated, and in the resonance state, the pulsation can be amplified to produce a resonance oscillation of the process gas

[0074] PG that has a resonance frequency and a resonance pressure amplitude.

[0075] The feed unit 3 and the discharge unit 4 each comprise a pressure loss production device 22 that produces a pressure loss, wherein the pressure loss production devices 22 are configured in such a manner that optionally one of the resonance states of the resonator 38 can be set. The pressure loss production devices 22 limit a system 2 of the reactor system 1 that is capable of oscillation and oscillates in the operating state, geometrically and with regard to the process gas volume of the gas column that is formed and is capable of resonance. The pressure loss production devices 22 thereby prevent propagation of the resonance oscillation beyond the pressure loss production devices 22. The more limited the system 2 is, which is capable of oscillation or oscillates in the operating state, the more effective production and propagation of the resonance oscillation in the system 2 will be.

[0076] The pressure loss production devices 22 are arranged in the reactor system 1, in particular in the feed unit 3 and the discharge unit 4, so that their respective positions can be changed, wherein in the operating state, the pressure loss production devices 22 cannot be changed in terms of the position that has previously been set. In this way, it is ensured that the system 2, which oscillates in the operating state, does not change.

[0077] In the case of certain processes, it is advantageous to be able to set or regulate the static pressure in the reactor system 1. For this purpose, each channel duct 17 of the feed unit 3, configured as a feed line 19, has a pressure regulation device 37. Also, each channel duct 24 of a channel system 25 of the discharge unit 4, configured as a discharge line 23, comprises a pressure regulation device 39. Feed unit 3 and discharge unit 4 have the pressure regulation devices 389, so that the static pressure in the reactor system 1 can be regulated.

[0078] The pressure loss production devices 22 that limit the system 2, which is capable of oscillation or oscillates in the operating state, are arranged within the process gas regulation device 39. Upstream from the reactor unit 5, the pressure regulation device 15 39 therefore arranged upstream from the pressure loss production devices 22, and downstream from the reactor unit 5, it is arranged downstream from the pressure loss production devices 22. Without such a pressure regulation device 39, the static process gas pressure in the reactor system 1 corresponds to atmospheric pressure.

[0079] By means of adapting the static process gas pressure in the reactor system 1, an influence can be exerted on the properties of the acoustic resonator 38. Flow resistances, acoustic phenomena, and changes in the material properties of the process gas as well as of the starting substance applied to it can damp the resonance oscillation. The energy expenditure for resonance oscillation production is accordingly increased and/or the ability to regulate the resonance oscillation is influenced. In particular, the reactor system 1 can be adapted, in this way, to the factors that damp the resonance pressure amplitude of the resonance oscillation.

[0080] A higher static process gas pressure changes the acoustic properties of the resonator 38, for example to the effect that its inherent resonance frequencies shift. For this reason, excitation of the reactor system 1 is possible only by means of the imposition of other pulsation frequencies onto the process gas.

[0081] In addition, the reactor system 1 can also comprise a process gas cooling segment 40, in particular a quenching apparatus 41, which is used to stop the reaction taking place in the reactor system 1 at a certain point in time and/or to adapt the process gas stream to a maximally permissible temperature of a subsequent separation device 37, in particular a filter. The process gas cooling segment 40, preferably the quenching apparatus 41, is arranged, here, in the discharge unit 4, upstream from the separation device 37 that is configured as a filter.

[0082] To stop the reaction and/or to limit the temperature of the process gas stream to a maximally permissible temperature of a subsequent separation device 37, a cooling gas is mixed into the pulsating, hot process gas stream that flows through the reactor system 1, by way of the process gas cooling segment 40, preferably air, particularly preferably cold air or compressed air. The air mixed in by way of the process gas cooling segment can be filtered or conditioned beforehand, if necessary, depending on the requirements. Furthermore, it is possible, alternatively to mixing in air or gas, to undertake injection of an evaporating liquid, for example of solvents or liquefied gases, but preferably of water.

[0083] The process gas cooling segment 40 arranged in the reactor system 1 as a quenching apparatus 41 can have fittings or is built into the reactor system 1 without fittings. Other gases, such as, for example, nitrogen (N.sub.2), argon (Ar), other inert gases or noble gases or the like can also be used as a cooling gas.

[0084] Furthermore, the discharge device 4 has at least a plurality of discharge lines 23 that corresponds to the plurality of the reactors 34 of the reactor unit, wherein each discharge line 23 has a pressure loss production device 22.

[0085] The discharge lines 23 are brought together, and the particles P are separated from the process gas stream, preferably from the hot process gas stream by way of the separation apparatus 37.

[0086] In FIG. 5, a sectional representation of a second multiple burner system 9 for a reactor system 1, having burners 8 arranged concentrically to one another, is shown. The concentrically arranged burners 8 are configured, from the outside to the inside, as a ring burner 11, as a swirl burner 14 configured as a main burner 13, as a pilot burner 12, and as a diffusion burner 32 configured as a main burner 13. The swirl burner 14 and diffusion burner 32 can be used and operated alternatively or together.

[0087] The pilot burner 12 configured as a swirl burner brings about, as was already described for FIG. 2, reliable ignition, close to the burner, of the lean pre-mixed main flame of the swirl burner 14 or, alternatively, of the diffusion burner 32. The fuel/combustion gas mixture BVG enters into the combustion chamber 6 of the reactor unit 5 in a swirled manner, as pilot burner process gas PPG. The thermal power range of the pilot burner 12 preferably lies between 20 kW and 50 kW; the related air quantity regulation range preferably lies between 1.05 and 1.25. The swirl generation of the pilot burner 12 is implemented by means of an axial blade swirl generator 26 having a fixed swirl strength that is dependent on a blade inclination angle.

[0088] The swirl burner 14 that is configured as the main burner 13 has two different functions. For one thing, the main flame of the swirl burner 14 delivers the heat power required for the thermal material treatment, for example drying, calcination and/or phase conversion. In this regard, the adjustable production and/or treatment temperature of the starting substances lies between 100° C. to 3,000° C., preferably 240° C. to 2200° C., particularly preferably 240° C. to 1800° C., very particularly preferably 650° C. to 1800° C., most preferably 700° C. to 1500° C. from the lean pre-mixed combustion. For another thing, the main flame of the swirl burner 14 converts part of the thermal energy from the combustion process into mechanical energy for producing and maintaining a periodically oscillating process gas stream, in which the material treatment takes place. The power range of the swirl burner 14 configured as the main burner 13 preferably lies at 75 kW to 450 kW. The air quantity of the pre-mixture of the main flame of the swirl burner 14 varies, in particular, between 1.3 and 1.8. The swirl production of the swirl burner 14 is implemented by means of infinitely adjustable tangential air inlets having an angle adjustment range of preferably 0° to 45°.

[0089] The fuel BS flows into the swirl burner channel 30 through which combustion gas VG flows, by way of fuel exit openings 29, and is premixed there. The pre-mixed fuel/combustion gas mixture enters into the combustion chamber 6 of the reactor unit 5 by way of a swirl burner exit opening 31.

[0090] Alternatively to the swirl burner 14 configured as the main burner 13, the possibility exists of making the main energy input to the thermal material treatment of preferably up to 450 kW by way of a diffusion burner 32. If the diffusion burner 32 is made available as a main burner, the swirl burner 14 is preferably not in use.

[0091] The diffusion burner 32 configured as a main burner 13 has the same functions as the swirl burner 14 described above. For one thing, the main flame of the diffusion burner 32 delivers the heat power required for the thermal material treatment, for example drying, calcination and/or phase conversion. In this regard, the adjustable production and/or treatment temperature of the starting substances lies between 100° C. to 3,000° C., preferably 240° C. to 2200° C., particularly preferably 240° C. to 1800° C., very particularly preferably 650° C. to 1800° C., most preferably 700° C. to 1500° C. from the lean pre-mixed combustion. For another thing, the main flame of the diffusion burner 32 converts a part of the thermal energy from the combustion process into mechanical energy for producing and maintaining a periodically oscillating process gas stream, in which the material treatment takes place. The power range of the diffusion burner 14 configured as a main burner 13 preferably lies at 75 kW to 450 kW. The fuel BS flows into the combustion chamber 6 by way of a fuel channel 43 and by way of fuel exit openings 44, while the combustion gas VG flows into the combustion chamber 6 through the VG swirl burner channel 30. The fuel BS and combustion gas VG, in particular combustion air, mix in the combustion chamber 6 and ignite there.

[0092] The ring burner 11 serves for adapting the total thermal power as well as the production and/or treatment temperatures to the process, in each instance. The ring burner 11 allows partial uncoupling from the average main burner power and setting the burner for pulsating, oscillating main burner operation. The power range of the ring burner preferably ranges from 0 kW at a pure air stream to approximately 50 kW at a pure air quantity of 1.5. The fuel/combustion gas mixture BVG enters into the combustion chamber 6 of the reactor unit 5, as ring burner process gas RPG, by way of ring burner exit openings 33.

[0093] FIG. 6 shows a top view of the first multiple burner system 9 shown in FIG. 5 and explained in greater detail, having the ring burner 11, swirl burner 14, pilot burner 12, and diffusion burner 32, arranged from the outside to the inside.

[0094] FIG. 7 shows a schematic representation of a third embodiment of a preferred reactor system 1 for the production and/or treatment of particles in an oscillating process gas stream.

[0095] The embodiment shown in FIG. 7 corresponds to the reactor system 1 described for FIG. 1, wherein the swirl burner 14 has been replaced by a diffusion burner 32 configured as a main burner 13, which now produces the oscillating or pulsating process gas stream.