High throughput electro-thermal poling
11773015 · 2023-10-03
Assignee
Inventors
- Christopher William Drewnowski (Corning, NY, US)
- Michael Thomas Gallagher (Painted Post, NY, US)
- Charles Thomas McLaren (Elmira, NY, US)
- Nicholas James Smith (Port Matilda, PA, US)
- Nicholas Ryan Wheeler (Corning, NY, US)
- Thomas Michael Zajicek (Big Flats, NY, US)
Cpc classification
International classification
Abstract
An apparatus for continuous electro-thermal poling of glass or glass ceramic material, includes a lower support conveying and contacting electrode structure, an upper contacting electrode structure positioned above the lower support structure, and one or more DC bias voltage sources connected to one or both of the upper contacting structure and the lower support structure. A process for continuous electro-thermal poling of glass or glass ceramic sheets or substrates includes heating the sheet or substrate, feeding the sheet or substrate continuously or continually, while applying a DC voltage bias, and cooling the sheet or substrate to within 0-30° C. of ambient temperature.
Claims
1. An apparatus for continuous electro-thermal poling of glass or glass ceramic material, the apparatus comprising: a lower support conveyor and contacting electrode structure, wherein the lower support conveyor and contacting electrode structure comprises a plurality of moveable trays; an upper contacting electrode structure positioned above the lower support conveyor and contacting electrode structure; and one or more DC bias voltage sources connected to one or both of the upper contacting electrode structure and the lower support conveyor and contacting electrode structure.
2. The apparatus according to claim 1 wherein the lower support conveyor and contacting electrode structure comprises a lower conveyor belt.
3. The apparatus according to claim 1 wherein the upper contacting electrode structure comprises a plurality of upper rollers.
4. The apparatus according to claim 1 wherein the upper contacting electrode structure comprises a plurality of upper flat contacting structures.
5. The apparatus according to claim 1 wherein the upper contacting electrode structure comprises an upper conveyor.
6. The apparatus according to claim 1 wherein the upper contacting electrode structure comprises a flexible contacting structure.
7. The apparatus according to claim 6 wherein the flexible contacting structure comprises a contacting brush.
8. A process for continuous electro-thermal poling a sheet or substrate of glass or glass ceramic material, the process comprising: heating the sheet or substrate to a temperature Te within the range of from 100° C. to Tg, where Tg is the glass transition temperature of the material of the sheet or substrate; feeding the sheet or substrate continuously or continually using an apparatus while applying a DC voltage bias VB within the range of from 100V to 10 kV; applying the VB, whether constant or ramped or both, for a time Ti within the range of from 2 seconds to 30 minutes; and cooling the sheet or substrate to within 0-30° C. of ambient temperature; wherein the apparatus comprises: a lower support conveyor and contacting electrode structure, wherein the lower support conveyor and contacting electrode structure comprises a plurality of moveable trays; an upper contacting electrode structure positioned above the lower support conveyor and contacting electrode structure; and one or more DC bias voltage sources connected to one or both of the upper contacting electrode structure and the lower support conveyor and contacting electrode structure.
9. An apparatus for continuous electro-thermal poling of glass or glass ceramic material, the apparatus comprising: a lower support conveyor and contacting electrode structure; an upper contacting electrode structure positioned above the lower support conveyor and contacting electrode structure, wherein the upper contacting electrode structure comprises a plurality of flat electrodes and a plurality of pressing arms, each of the plurality of flat electrodes attached to one of the plurality of pressing arms; and one or more DC bias voltage sources connected to one or both of the upper contacting electrode structure and the lower support conveyor and contacting electrode structure.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11)
DETAILED DESCRIPTION
(12) Reference will now be made in detail to various embodiment(s).
(13) As shown in
(14) Step 120 can optionally be conducted in continuous fashion. Steps 130 and 140 can optionally be conducted in an inert or low-reactivity atmosphere. Step 130 can optionally include applying voltage by contact with the substrate or sheet. Step 150 can optionally be performed during the time Ti of step 140. Step 150, particularly if not performed during the time Ti of step 140, is desirably performed within 2 seconds to 5 minutes. The step 150 desirably includes cooling to within 0-10° C. of ambient temperature. The DC voltage bias applied in steps 130 and 140 may additionally have an time varying voltage superimposed upon the DC voltage bias.
(15) The high throughput thermal poling process utilizing the steps described above with reference to
(16) With reference to
(17) A preheated sheet or substrate 20 of glass or glass ceramic is passed between the rollers 30, 40 as shown in the figure. The glass will be thermally poled in a line contact area across the sheet between the rollers of opposite voltage bias. The rollers will pull the sheet of glass along the system to the next rollers for a cumulative residence time during the thermal poling process at a continuous linear velocity.
(18) The rollers can optionally have varying roller diameters and pitches between rollers to increase or decrease the thermal poling residence time that the sheet or substrate 20 experiences in contact with the rollers, which function as electrodes in the poling process. Some other variations of the electrodes and rollers are shown in additional figures. A simple variation of an apparatus 10 having smaller roller diameters is shown in
(19) The rollers of any of the present embodiments can be compliant to the substrate or sheet by either structural or material methods, or by means of compliant suspension of the rollers. Some examples of complaint rollers for use with glass are discussed, for instance, in U.S. Pat. Nos. 8,991,216B2 and 9,016,093B2. An example of a compliant roller 50, in this case produced by a 3D laser powder bed fusion printing process, is shown in diagrammatic side view in
(20) With reference to
(21) The voltage can also be applied by many other configurations, such as pairs of rollers (or more than pairs) that are tied to the same voltage. This concept is shown in the apparatus 10 of
(22) Controlling the applied voltage of the rollers independently (or in pairs or larger groupings that a still smaller than the total) allows for voltage ramping as illustrated in
(23) With reference to
(24) The surface of the rollers can be either smooth or textured. Smooth rollers will make uniform contact with the glass and create a uniform depletion layer thickness where electrical contact is made with the glass. Textured roller can be used to create differential thermal poling areas on the glass as well as creating surface structural features via electrical imprinting.
(25) With reference to
(26) This embodiment is useful for when longer contact times are needed for the desired poling process to occur. Again, the anode arm surface can be flat as mentioned to make uniform contact, or textured to make differential contact, if desired. The pressing anode and the cathode tray can also have 3D surface shapes to enable thermal poling of substrates or sheets having curved surfaces.
(27) With reference to
(28) The apparatuses described herein can be used for feeding continuous sheets or single article substrates continuously into the process. The electrode fixtures can be held by electrically insulating materials such as refractories to prevent heat loss and electrical shorts in the poling circuit for safety.
(29) With reference to
(30) The electrode materials used can be either ion-blocking or non-blocking. Ion-blocking electrodes prevent the migration of mobile ions from the glass into the electrodes/environment and vice versa. Non-blocking electrodes allow for the migration of mobile ions across the electrode glass interface and potentially with the environment.
(31) Thermal poling methods and apparatuses of the present disclosure have the ability to selectively alter glass composition and surface topography depending on electrode contact area which can be controlled or varied by patterning. The electrode could be patterned using machine tooling, additive manufacturing or lithography techniques. Thermal poling has the ability to pole an article of glass at once instead of rastering across it such as laser ablation or without masking for chemical etching. The main mechanism of thermal poling is ionic migration which is driven by electric field lines and therefore can create higher resolution features than thermal pressing and most laser ablation and chemical etching techniques.
(32) It will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit or scope of the disclosure.