Method for making antenna array

Abstract

A set of antenna geometries for use in integrated arrays at terahertz frequencies are described. Two fabrication techniques to construct such antennas are presented. The first technique uses an advanced laser micro-fabrication, allowing fabricating advanced 3D geometries. The second technique uses photolithographic processes, allowing the fabrication of arrays on a single wafer in parallel.

Claims

1. A device, comprising: an array of lens waveguide antennas including: an array of lenses formed in a first silicon wafer, the first silicon wafer comprising a first surface and a second surface opposite the first surface, wherein: each of the lenses in the array of the lenses comprises a non-hemispherical curved section, and the first surface comprises the non-hemispherical curved sections and a planar section separating the non-hemispherical curved sections; and a tangent to each of the non-hemispherical curved sections at an intersection with the planar section is at an angle of more than 90 degrees with respect to the planar section; and an array of waveguides comprising waveguide shaped segments aligned with the non-hemispherical curved sections so that terahertz electromagnetic radiation outputted from the waveguide shaped segments is fed to the non-hemispherical curved sections; and wherein each of the lens waveguide antennas comprises one of the lenses and one of the waveguides.

2. The device of claim 1, wherein the waveguide shaped elements are defined in the second surface or in a second wafer aligned to the first wafer.

3. The device of claim 1, wherein: the non-hemispherical curved sections are photolithographically patterned and etched into the first surface; and the waveguide shaped segments are photolithographically patterned and etched in the second surface or the second silicon wafer.

4. The device of claim 1, wherein the non-hemispherical curved sections are laser machined in the first surface and the waveguide shaped segments are laser machined in the second surface or the second silicon wafer.

5. The device of claim 1, wherein the array of the lens waveguide antennas comprises a one dimensional array of the lens waveguide antennas.

6. The device of claim 1, wherein the array of the lens waveguide antennas comprises a two-dimensional array of the lens waveguide antennas.

7. The device of claim 1, wherein each of the waveguides in the array of the waveguides is a horn.

8. The device of claim 1, wherein each of the waveguides in the array of the waveguides include a square waveguide.

9. The device of claim 1, wherein each of the lenses in the array of the lenses comprises a microlens.

10. The device of claim 1, wherein each of the lenses in the array of the lenses comprises a plano-convex lens.

11. The device of claim 1, wherein the non-hemispherical curved sections each comprise a spherical section.

12. The device of claim 11, wherein the lenses each have a thickness less than 1000 micrometers or on the order of a few 100 microns.

13. The device of claim 1, wherein the non-hemispherical curved sections each comprise a spherical cap that is less than a hemisphere.

14. The device of claim 1, further comprising: the array of waveguide shaped elements in the second silicon wafer; and the first silicon wafer and the second silicon wafer aligned and assembled so that each of the waveguides in the array of the waveguides feeds terahertz electromagnetic radiation to one of the lenses in the array of the lenses.

15. The device of claim 1, further comprising: an iris in the second silicon wafer; and the first silicon wafer and the second silicon wafer aligned so that each of the waveguides in the second silicon wafer feeds terahertz electromagnetic radiation to the one of the lenses.

16. The device of claim 1, further comprising the first silicon wafer and the second silicon wafer aligned so that each of the waveguides feeds terahertz electromagnetic radiation to the one of the lenses.

17. A device, comprising: an array of lens waveguide antennas including: an array of lenses comprising non-hemispherical curved sections formed in a first silicon wafer, wherein each of the lenses in the array of the lenses comprises a different one of the non-hemispherical curved sections and the non-hemispherical curved sections are separated by planar sections of the first silicon wafer; and an array of waveguides comprising waveguide shaped segments; and wherein: each of the lens waveguide antennas comprises one of the lenses aligned with one of the waveguides, a tangent to each of the non-hemispherical curved sections, at an intersection with an adjacent one of the planar sections, is at an angle of more than 90 degrees with respect to the adjacent one of the planar sections, and the lenses each have a thickness less than 1000 micrometers.

18. The device of claim 17, wherein: the first silicon wafer comprises a first surface and a second surface opposite the first surface, the array of lenses are formed in a first surface, and the waveguide shape segments are defined in the second surface.

19. The device of claim 17, wherein the waveguide shaped segments are defined in a second silicon wafer aligned to the first silicon wafer.

20. A device, comprising: an array of lenses comprising non-hemispherical curved sections formed in a first silicon wafer, wherein: each of the lenses in the array of the lenses comprises a different one of the non-hemispherical curved sections and the non-hemispherical curved sections are separated by planar sections of the first silicon wafer; and a tangent to each of the non-hemispherical curved sections, at an intersection with an adjacent one of the planar sections, is at an angle of more than 90 degrees with respect to the adjacent one of the planar sections, and the lenses each have a thickness less than 1000 micrometers.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The objects and features of the invention can be better understood with reference to the drawings described below, and the claims. The drawings are not necessarily to scale, emphasis instead generally being placed upon illustrating the principles of the invention. In the drawings, like numerals are used to indicate like parts throughout the various views.

(2) FIG. 1 is an image of an embodiment of an array of silicon micro-lenses.

(3) FIG. 2 is a cross sectional view of the micro-lens geometry of an array.

(4) FIG. 3A is a perspective view of a silicon lens antenna geometry.

(5) FIG. 3B is a plan view of the iris, which is a double arc slot etched through a ground plane. The iris is excited by a square waveguide shown at the bottom of FIG. 3A. The arrow pointing to the iris shows where the iris is located in FIG. 3A.

(6) FIG. 4 is a graph illustrating the E-plane and H-plane radiation patterns at 550 GHz of the antenna shown in FIG. 3A.

(7) FIG. 5 is a graph showing the value of S 11 of the antenna shown in FIG. 3A.

(8) FIG. 6 is an image of one embodiment of a hom antenna made by stacking micro-machined gold plated silicon wafers.

(9) FIG. 7 is a graph illustrating the E-plane and H-plane radiation patterns at 550 GHz of the antenna shown in FIG. 6.

(10) FIG. 8 is a graph showing the value of S11 input reflection coefficient of the antenna shown in FIG. 6.

(11) FIG. 9 is a cross sectional view of an array of waveguide coupled lenses.

(12) FIG. 10 is a diagram showing the detailed geometry of one lens in the array of waveguide coupled lenses of FIG. 9.

(13) FIG. 11 is a diagram that shows the impedance matching at the waveguide transition from silicon to air.

(14) FIG. 12 is a graph showing the value of S11 input reflection coefficient of a waveguide with the impedance matching transition of FIG. 11.

(15) FIG. 13A is a graph that illustrates the E-plane of the lens waveguide antenna as compared to a Pickett Potter hom antenna.

(16) FIG. 13B is a graph that illustrates the H-plane of the lens waveguide antenna as compared to a Pickett Potter hom antenna.

DETAILED DESCRIPTION

(17) A set of antenna geometries for use in integrated arrays at terahertz frequencies are described. Two fabrication techniques to construct such antennas are presented. The first technique uses an advanced laser micro-fabrication, allowing fabricating advanced 3D geometries. The second technique uses photolithographic processes, allowing the fabrication of arrays on a single wafer in parallel.

(18) The present description addresses two approaches to fabricate an antenna array that can be used with the stacked structures referred to hereinabove. One approach uses advanced laser micro-fabrication, for example as described in V. M. Lubecke, K. Mizuno, G. M. Rebeiz; “Micromachining for Terahertz Applications”, IEEE Trans. MTT, vol. 46, no. 11, pp. 1821-1831, November 1998.

(19) The first approach allows fabricating advanced 3D geometries, and therefore one could envision fabricating an array of Picket-Potter horns (see P. D. Potter, “A new hom antenna with suppressed sidelobes and equal beamwidths”, Microwave J., p. 71, June 1963) or silicon hemisphere lenses (see T. H. Buttgenbach, “An Improved Solution for Integrated Array Optics in Quasi-Optical mm and Submm Receivers: the Hybrid Antenna” IEEE MTT. vol 41, October 1993). A drawback of this approach is that it is a linear process which may not be cost-efficient, and therefore not practical, for large arrays in ground based applications as is the case of the imager radar.

(20) A second approach uses photolithographic fabrication, as described in S.-K. Lee, M.-G. Kim, K.-W. Jo, S.-M. Shin and J.-H. Lee, “A glass reflowed microlens array on a Si substrate with rectangular through-holes” J. Opt. A. 10 (2008) 044003, 2008. The photolithographic technique allows the fabrication of arrays on a single wafer in parallel such as the fabrication of micro-thick lenses by reflowing a photo-resist material applied to a silicon object and then etching the silicon. A picture of an array fabricated using this approach is shown in FIG. 1.

(21) Antenna Geometries

(22) We describe several integrated antenna geometries that are expected to optimize the advantages of each of these techniques.

(23) The antenna structures are intended to couple efficiently a waveguide mode to a certain optical system characterized by an f-number. Therefore, the antenna preferably should be directive and should be simple to integrate with the mixers and sources.

(24) Antennas Fabricated Using Photolithographic Methods

(25) An array of silicon lenses with a thickness of the order of a few hundred microns can be fabricated by reflowing a photo-resist material applied to a silicon layer and then etching the silicon. To illuminate such thin lenses, a directivity primary feed is needed in order to increase the effective f-number and improve the coating layer fabrication, spill over and off axis distortions. See, for example, D. F. Filippovic, S. S. Gearhart and G. M. Rebeiz, “Double Slot on Extended Hemispherical and Elliptical Silicon Dielectric Lenses”, IEEE Trans. on MTT, Vol. 41, no. 10, October 1993. An air cavity can be used to illuminate the upper part of the lens with a directive primary feed, as well as to match the waveguide feed impedance with the silicon medium. See. For example, N. Llombart, G. Chattopadhyay, A. Skalare. I. Mehdi, “Novel Terahertz Antenna Based on a Silicon Lens Fed by a Leaky Wave Enhanced Waveguide”, IEEE Trans. AP., accepted for publication. The geometry of such an antenna array is shown in FIG. 2.

(26) The antenna directivity that is obtained depends on the diameter of the lens and not on the leaky wave feed properties. Therefore, the impedance bandwidth will be only limited by the cavity design, and not by the antenna directivity.

(27) The fabrication of the array in FIG. 2 can be directly fabricated on a single wafer. See, for example, S.-K. Lee, M.-G. Kim, K.-W. Jo, S.-M. Shin and J.-H. Lee, “A glass reflowed microlens array on a Si substrate with rectangular through-holes” J. Opt. A. 10 (2008) 044003, 2008. The waveguide feeds can be constructed in another wafer, leaving the assembly of the antenna array to the stacking and alignment of only these two wafers. See FIG. 4A which shows a perspective view of a silicon lens antenna geometry fabricated using the photolithographic method.

(28) The antenna design has been validated with simulations with CST Microwave Studio at 550 GHz. CST MICROWAVE STUDIO® is a specialist tool for the 3D EM simulation of high frequency components available from Computer Simulation Technology AG, at CST of America®, Inc. 492 Old Connecticut Path, Suite 505, Framingham, Mass. 01701. Measurements of an embodiment are reported in N. Llombart, G. Chattopadhyay, A. Skalare. I. Mehdi, “Novel Terahertz Antenna Based on a Silicon Lens Fed by a Leaky Wave Enhanced Waveguide”, IEEE Trans. AP., accepted for publication. FIG. 4 shows the radiation pattern and FIG. 5 shows the S11 that has been determined by simulation with CST.

(29) Another approach to develop an array of antennas using a photo-lithographic process is to stack thin gold plated silicon wafers with tapered holes in order to build a hom, as illustrated in FIG. 6. The figure shows one-half side of the hom divided into 9 steps. The fabrication process over etches with a 5 degree angle each of the 9 wafers. All wafers have a thickness of 1 mm. After that, the wafers are assembled together to construct a conical hom as shown in FIG. 6. The hom operates at 550 GHz. FIG. 7 shows the simulated radiation pattern. FIG. 8 shows the simulated S11 input reflection coefficient of the antenna.

(30) Antennas Fabricated Using Laser Machining

(31) One can also fabricate the same antenna geometries previously described using a laser machining technique. Such lens design has an f-number around 1.9, which corresponds to a sector of 15 degree width (i.e. 8 of FIG. 2 is equal to 30 degrees). This means that for a 5 mm diameter design, a silicon wafer of 9.5 mm thickness is needed. A similar thick wafer will be needed if one wants to fabricate a conical Potter hom array which has a small flare angle to avoid the excitation of higher order modes, as explained hereinabove.

(32) However, in order to reduce the fabrication cost, antennas with a reduced thickness are advantageous. The laser machining technique can be used to fabricate a thicker lens. One embodiment involves the use of silicon hemisphere lenses coupled to a waveguide as shown in FIG. 9 and FIG. 10.

(33) FIG. 9 is a cross sectional view of an array of waveguide coupled lenses.

(34) FIG. 10 is a diagram showing the detailed geometry of one lens in the array of waveguide coupled lenses of FIG. 9.

(35) The impedance match between the air waveguide and lens can be easily achieved with a taper silicon tip as shown in FIG. 11, which can be also fabricated with the same laser machining technique. FIG. 11 is a diagram that shows the impedance matching at the waveguide transition from silicon to air. The directivity of the primary field, i.e. field inside the dielectric, is defined by the dimension of the waveguide opening. The minimum opening is limited by the propagation of the TE10 mode in air and this will fixed the angular sector of the lens in FIG. 9. For the example shown here, this angle is 71 deg. FIG. 12 is a graph showing the value of S11 input reflection coefficient of a waveguide with the impedance matching transition of FIG. 11.

(36) FIG. 13A is a graph that illustrates the E-plane of the lens waveguide antenna as compared to a Pickett Potter hom antenna.

(37) FIG. 13B is a graph that illustrates the H-plane of the lens waveguide antenna as compared to a Pickett Potter hom antenna.

(38) Micro-fabrication allows us to fabricate specific and precise 3D geometries. An embodiment involves an array based on extended silicon lens excited with a leaky wave waveguide feed. A second fabrication technique is based on photolithographic processes, which enables the fabrication of multiple arrays on a single wafer in parallel. One embodiment is an array of micro-lens. Another embodiment uses conical horns.

Definitions

(39) Unless otherwise explicitly recited herein, any reference to an electronic signal or an electromagnetic signal (or their equivalents) is to be understood as referring to a non-transitory electronic signal or a non-transitory electromagnetic signal.

(40) Theoretical Discussion

(41) Although the theoretical description given herein is thought to be correct, the operation of the devices described and claimed herein does not depend upon the accuracy or validity of the theoretical description. That is, later theoretical developments that may explain the observed results on a basis different from the theory presented herein will not detract from the inventions described herein.

(42) Any patent, patent application, or publication identified in the specification is hereby incorporated by reference herein in its entirety. Any material, or portion thereof, that is said to be incorporated by reference herein, but which conflicts with existing definitions, statements, or other disclosure material explicitly set forth herein is only incorporated to the extent that no conflict arises between that incorporated material and the present disclosure material. In the event of a conflict, the conflict is to be resolved in favor of the present disclosure as the preferred disclosure.

(43) While the present invention has been particularly shown and described with reference to the preferred mode as illustrated in the drawing, it will be understood by one skilled in the art that various changes in detail may be affected therein without departing from the spirit and scope of the invention as defined by the claims.