Workpiece Plating Treatment Method and Workpiece Manufacturing Method
20230383413 · 2023-11-30
Assignee
- Tyco Electronics (Suzhou) Ltd. (Suzhou City, CN)
- Tyco Electronics (Shanghai) Co., Ltd. (Shanghai, CN)
Inventors
- Daiqiong (Diana) Zhang (Shanghai, CN)
- Dongqing (Gates) Peng (Suzhou, CN)
- Jianhua Nie (Suzhou, CN)
- Zhongpu (Johnson) Deng (Suzhou, CN)
- Chunyan (Cherie) Zhou (Shanghai, CN)
- Zhenyu (Julie) Zhu (Shanghai, CN)
- Julian Zhang (Shanghai, CN)
- Zhongxi Huang (Shanghai, CN)
Cpc classification
International classification
Abstract
A workpiece plating treatment method includes the steps of cleaning an outer surface of an outer plating layer of a workpiece to remove a plurality of oxides and dirt on the outer surface of the outer plating layer, and reflow melting the outer plating layer of the workpiece using a reflow melting device after the cleaning.
Claims
1. A workpiece plating treatment method, comprising the steps of: cleaning an outer surface of an outer plating layer of a workpiece to remove a plurality of oxides and dirt on the outer surface of the outer plating layer; and reflow melting the outer plating layer of the workpiece using a reflow melting device after the cleaning.
2. The workpiece plating treatment method according to claim 1, further comprising: polishing the outer surface of the outer plating layer of the workpiece after the reflow melting to flatten the outer surface of the outer plating layer.
3. The workpiece plating treatment method according to claim 2, further comprising: forming a protective film on the outer surface of the outer plating layer of the workpiece after the polishing.
4. The workpiece plating treatment method according to claim 1, wherein the cleaning step includes using plasma, laser, flux, or any combination of the three to remove the oxides and dirt on the outer surface of the outer plating layer of the workpiece.
5. The workpiece plating treatment method according to claim 1, wherein the cleaning step increases a moisture content of the outer surface of the outer plating layer.
6. The workpiece plating treatment method according to claim 2, wherein, in the polishing step, the workpiece is immersed in an optical polishing liquid to perform a chemical polishing treatment on the outer surface of the outer plating layer of the workpiece.
7. The workpiece plating treatment method according to claim 2, wherein, in the polishing step, the outer surface of the outer plating layer of the workpiece is physically polished using a physical polishing device.
8. The workpiece plating treatment method according to claim 7, wherein the physical polishing device includes a sandblasting polishing device, a cloth wheel polishing device, or a plasma polishing device.
9. The workpiece plating treatment method according to claim 2, wherein, in the polishing step, the outer surface of the outer plating layer of the workpiece is subjected to a physicochemical mixed polishing treatment.
10. The workpiece plating treatment method according to claim 3, wherein the protective film includes at least one of a passivation protective film, a lubricating oil protective film, and a nano organic protective film.
11. The workpiece plating treatment method according to claim 3, wherein in forming step, the outer surface of the outer plating layer of the workpiece is passivated to form a passivation protective film on the outer surface of the outer plating layer.
12. The workpiece plating treatment method according to claim 3, wherein, in the forming step, the outer surface of the outer plating layer of the workpiece is lubricated to form a layer of lubricating oil protective film on the outer surface of the outer plating layer.
13. The workpiece plating treatment method according to claim 3, wherein, in the forming step, the outer surface of the outer plating layer of the workpiece is sputtered to form a layer of nano organic protective film on the outer surface of the outer plating layer.
14. The workpiece plating treatment method according to claim 1, wherein the reflow melting device includes at least one of a resistance wire melting furnace, an infrared radiation melting furnace, an inductance melting furnace, and a laser melting furnace.
15. A workpiece manufacturing method, comprising steps of: providing a workpiece having an outer plating layer; and processing the outer plating layer of the workpiece using the workpiece plating treatment method according to claim 1.
16. The workpiece manufacturing method according to claim 15, wherein providing the workpiece includes providing a substrate and forming the outer plating layer on the substrate.
17. The workpiece manufacturing method according to claim 16, wherein providing the workpiece includes forming an intermediate plating layer on the substrate before forming the outer plating layer on the substrate.
18. The workpiece manufacturing method according to claim 17, wherein the substrate is a copper substrate or a steel substrate.
19. The workpiece manufacturing method according to claim 18, wherein the intermediate plating layer includes a nickel plating layer.
20. The workpiece manufacturing method according to claim 15, wherein the outer plating layer is a tin plating layer, an indium plating layer, a bismuth plating layer, or a lead plating layer.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] Features of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the accompanying drawings, in which:
[0011]
[0012]
[0013]
[0014]
[0015]
[0016]
DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS
[0017] Exemplary embodiments of the present disclosure will be described hereinafter in detail with reference to the attached drawings, wherein like reference numerals refer to like elements. The present disclosure may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein; rather, these embodiments are provided so that the present disclosure will convey the concept of the disclosure to those skilled in the art.
[0018] In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the disclosed embodiments. It will be apparent, however, that one or more embodiments may be practiced without these specific details. In other instances, well-known structures and devices are schematically shown in order to simplify the drawing.
[0019] As shown in
[0020] S100: cleaning an outer surface of the outer plating layer 11 of the workpiece 100 to remove oxides and dirt on the outer surface of the outer plating layer 11; and
[0021] S200: after step S100, the outer plating layer 11 of the workpiece 100 is reflow melted using a reflow melting device.
[0022]
[0023] As shown in
[0024] In various embodiments, the reflow melting device used in the step S200 can include at least one of a resistance wire melting furnace, an infrared radiation melting furnace, an inductance melting furnace, and a laser melting furnace.
[0025] As shown in
[0026] S300: After step S200, the outer surface of the outer plating layer 11 of the workpiece 100 is polished to flatten the outer surface of the outer plating layer 11.
[0027] In an exemplary embodiment of the present invention, in the step S300, for example, the workpiece 100 can be immersed in an optical polishing liquid to perform a chemical polishing treatment on the outer surface of the outer plating layer 11 of the workpiece 100. In another embodiment, in the step S300, for example, the outer surface of the outer plating layer 11 of the workpiece 100 can be physically polished using a physical polishing device. The physical polishing device may include a sandblasting polishing device, a cloth wheel polishing device, or a plasma polishing device. In the step S300, a physical chemical mixing polishing device can be used to perform a physical chemical mixing polishing treatment on the outer surface of the outer plating layer 11 of the workpiece 100.
[0028]
[0029] S400: After step S300, a protective film 12 is formed on the outer surface of the outer plating layer 11 of the workpiece 100.
[0030] In the step S400, the protective film 12 may include at least one of a passivation protective film, a lubricating oil protective film, and a nano organic protective film. In the step S400, the outer surface of the outer plating layer 11 of the workpiece 100 can be passivated to form a passivation protective film on the outer surface of the outer plating layer 11. In the step S400, the outer surface of the outer plating layer 11 of the workpiece 100 can be lubricated to form a protective film of lubricating oil on the outer surface of the outer plating layer 11. In an embodiment, in the step S400, the outer surface of the outer plating layer 11 of the workpiece 100 can be sputtered to form a layer of nano organic protective film on the outer surface of the outer plating layer 11.
[0031] In an exemplary embodiment of the present invention, a workpiece manufacturing method is also disclosed, comprising the following steps:
[0032] S10: providing a workpiece 100 with an outer plating layer 11; and
[0033] S20: using the aforementioned workpiece plating treatment method to treat the outer plating layer 11 of the workpiece 100.
[0034] The aforementioned step S10 includes:
[0035] S11: providing substrate 10; and
[0036] S13: forming an outer plating layer 11 on the substrate 10.
[0037] In various embodiments, the outer plating layer 11 can be formed on the surface of the substrate 10 by an electroplating process or an electroless plating process.
[0038]
[0039] In the embodiment of
[0040] S12: Before step 13, at least one intermediate plating layer 13 is formed on the substrate 10.
[0041] In various embodiments, the substrate 10 of the workpiece 100 may be a copper substrate, a steel substrate, or other suitable conductive substrate. The aforementioned at least one intermediate layer 13 may include a nickel-plating layer and/or other suitable plating layer.
[0042] In various embodiments, the outer plating layer 11 on the workpiece 100 may be a tin plating layer, an indium plating layer, a bismuth plating layer, a lead plating layer, or other suitable metal or alloy plating layer.
[0043] It should be appreciated for those skilled in this art that the above embodiments are intended to be illustrative, and not restrictive. For example, many modifications may be made to the above embodiments by those skilled in this art, and various features described in different embodiments may be freely combined with each other without conflicting in configuration or principle.
[0044] Although several exemplary embodiments have been shown and described, it would be appreciated by those skilled in the art that various changes or modifications may be made in these embodiments without departing from the principles and spirit of the disclosure, the scope of which is defined in the claims and their equivalents.
[0045] As used herein, an element recited in the singular and proceeded with the word “a” or “an” should be understood as not excluding plural of said elements or steps, unless such exclusion is explicitly stated. Furthermore, references to “one embodiment” of the present invention are not intended to be interpreted as excluding the existence of additional embodiments that also incorporate the recited features. Moreover, unless explicitly stated to the contrary, embodiments “comprising” or “having” an element or a plurality of elements having a particular property may include additional such elements not having that property.