Method for producing .SUP.225.Ac

Abstract

A method for producing 225.sup.A including: a method (X) for purifying a .sup.226Ra-containing solution, including an adsorption step of allowing a .sup.226Ra ion to adsorb onto a carrier having a function of selectively adsorbing a divalent cation by bringing a .sup.226Ra-containing solution into contact with the carrier under an alkaline condition, and an elution step of eluting the .sup.226Ra ion from the carrier under an acidic condition; a method for producing a .sup.226Ra target, including an electrodeposition liquid preparation step of preparing an electrodeposition liquid by using a purified .sup.226Ra-containing solution obtained by the method (X), and an electrodeposition step of electrodepositing a .sup.226Ra-containing substance on a substrate by using the electrodeposition liquid; and a step of irradiating a .sup.226Ra target produced by the method for producing a .sup.226Ra target with at least one selected from a charged particle, a photon, and a neutron by using an accelerator.

Claims

1. A method for producing .sup.225Ac, comprising: a method (X) for purifying a .sup.226Ra-containing solution, comprising an adsorption step (R1) of allowing a .sup.226Ra ion to adsorb onto a resin carrier having a function of selectively adsorbing a divalent cation by bringing a 226Ra-containing solution (a) into contact with the carrier under an alkaline condition, and an elution step (R2) of eluting the .sup.226Ra ion from the carrier under an acidic condition; a method for producing a .sup.226Ra target, comprising an electrodeposition liquid preparation step (R4) of preparing an electrodeposition liquid by using a purified .sup.226Ra-containing solution (b) obtained by the method (X), and an electrodeposition step (R5) of electrodepositing a .sup.226Ra-containing substance on a substrate by using the electrodeposition liquid; and a step (A1) of irradiating a .sup.226Ra target produced by the method for producing a .sup.226Ra target with at least one kind selected from a charged particle, a photon, and a neutron by using an accelerator to produce .sup.225Ac.

2. The method for producing .sup.225Ac according to claim 1, wherein the carrier has a divalent cation-exchange group.

3. The method for producing .sup.225Ac according to claim 1, wherein the carrier has an iminodiacetic acid group.

4. The method for producing .sup.225Ac according to claim 1, the method (X) further comprises a step (R3) of performing anion exchange by passing a solution containing a .sup.226Ra ion eluted in the elution step (R2) through an anion exchange resin.

5. The method for producing .sup.225Ac according to claim 1, wherein the .sup.226Ra-containing solution (a) is obtained by separating an .sup.225Ac component from a solution in which a .sup.226Ra target irradiated with at least one kind selected from a charged particle, a photon, and a neutron by using an accelerator has been dissolved.

6. The method for producing .sup.225Ac according to claim 1, wherein the carrier is charged in a tube.

7. The method for producing .sup.225Ac according to claim 1, further comprising a purification method (Y) comprising the steps: (R6) of allowing a .sup.226Ra ion to adsorb onto a carrier having a function of selectively adsorbing a divalent cation by bringing a .sup.226Ra-containing solution (c) after the electrodeposition step (R5) into contact with the carrier under an alkaline condition; and (R7) of eluting the .sup.226Ra ion from the carrier under an acidic condition, wherein a purified .sup.226Ra-containing solution (d) obtained by the purification method (Y) is mixed with the purified .sup.226Ra-containing solution (b), and an electrodeposition liquid is prepared in the electrodeposition liquid preparation step (R4).

8. The method for producing .sup.225Ac according to claim 7, the purification method (Y) further comprises a step (R8) of performing anion exchange by passing a solution containing a .sup.226Ra ion eluted in the elution step (R7) through an anion exchange resin.

9. The method for producing .sup.225Ac according to claim 1, further comprising the steps: (A2) of dissolving the .sup.226Ra target irradiated in the irradiation step (A1); and (A3) of separating a colloidal .sup.225Ac component by alkalizing the solution obtained in the dissolution step (A2).

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) FIG. 1 is a flow chart showing an outline of the method for purifying a .sup.226Ra-containing solution, method for producing a .sup.226Ra target, and method for producing .sup.225Ac according to the present invention.

DESCRIPTION OF EMBODIMENTS

(2) Hereinafter, the embodiments of the present invention will be described in detail. A flow chart showing an outline of the method for purifying a .sup.226Ra-containing solution, method for producing a .sup.226Ra target, and method for producing .sup.225Ac according to the present invention is shown in FIG. 1.

(3) Method for Purifying .sup.226Ra-Containing Solution The method for purifying a .sup.226Ra-containing solution (hereinafter, also referred to as “purification method (X)”) according to the present invention is characterized by including: an adsorption step (R1) of allowing a .sup.226Ra ion to adsorb onto a carrier having a function of selectively adsorbing a divalent cation (hereinafter, also referred to as “carrier (i)”) by bringing a .sup.226Ra-containing solution (a) into contact with the carrier (i) under an alkaline condition; and an elution step (R2) of eluting the .sup.226Ra ions from the carrier (i) under an acidic condition. In this way, .sup.226Ra ions are concentrated, and impurities can be reduced. The solution obtained by the purification method (X) is referred to as a purified .sup.226Ra-containing solution (b).

(4) The .sup.226Ra-containing solution (a) is not particularly limited as long as it is a solution containing .sup.226Ra ions, and is preferably an aqueous solution containing .sup.226Ra ions. In order to perform an adsorption step (R1) under an alkaline condition, the .sup.226Ra-containing solution (a) is preferably an alkaline aqueous solution, and has a pH of preferably 8 or more, and more preferably 9 or more. Examples of the alkaline aqueous solution include an aqueous ammonium solution, an aqueous sodium hydroxide solution, and an aqueous potassium hydroxide solution. In this way, .sup.226Ra ions can be adsorbed onto a carrier (i) efficiently.

(5) As the .sup.226Ra-containing solution (a), a solution after an irradiation step (A1), a dissolution step (A2), and a separation step (A3) in the production method for producing .sup.225Ac to be described later, that is, a solution obtained by separating an .sup.225Ac component from a solution in which a .sup.226Ra target irradiated with at least one kind selected from a charged particle, a photon, and a neutron by using an accelerator has been dissolved may be used.

Adsorption Step (R1)

(6) In an adsorption step (R1), .sup.226Ra ions are adsorbed onto a carrier (i) by bringing a .sup.226Ra-containing solution (a) into contact with the carrier (i) under an alkaline condition.

(7) The carrier (i) is not particularly limited as long as it can form a complex with a metal ion under an alkaline condition and elute the metal ion under an acidic condition. As the carrier (i), for example, a carrier having a divalent cation-exchange group can be mentioned. As the divalent cation-exchange group, specifically, an iminodiacetic acid group, a polyamine group, or a methyl glycan group can be mentioned. As the divalent cation-exchange group, an iminodiacetic acid group is preferable.

(8) The carrier having a divalent cation-exchange group is not particularly limited as long as the divalent cation-exchange group is retained on a solid-phase carrier such as a resin. A more preferable example of the carrier includes a styrene-divinylbenzene copolymer retaining an iminodiacetic acid group. Examples of the commercially available resin having an iminodiacetic acid group include the “Chelex” series manufactured by Bio-Rad Laboratories, Inc., “DIAION” series manufactured by Mitsubishi Chemical Corporation, and “Amberlite” series manufactured by The Dow Chemical Company, and more specifically include “Chelex 100” (particle diameter: 50 to 100 mesh, and ionic form: Na form, Fe form) manufactured by Bio-Rad Laboratories, Inc. The carrier (i) may be charged in a tube for use. The tube is not particularly limited as long as the carrier (i) can be charged in the tube and the tube has flexibility, and is preferably a flexible tube made of rubber, a resin, or the like, and more preferably a tube for medical use.

(9) By using such a tube, a length longer than that of a common glass column can be obtained, that is, the number of theoretical plates can be increased, so that the adsorption efficiency of .sup.226Ra ions can be increased. Further, the carrier (i) through which a radioactive substance (.sup.226R-containing solution) has been passed can be easily discarded while being charged in a tube without radioactively contaminating other instruments, devices, and the like.

Elution Step (R2)

(10) In an elution step (R2), .sup.226Ra ions are eluted from a carrier (i) under an acidic condition. Specifically, by passing an inorganic acid through the carrier (i), the .sup.226Ra ions adsorbed onto the carrier (i) can be eluted.

(11) The inorganic acid is not particularly limited as long as it can dissolve a .sup.226Ra component adsorbed onto the carrier (i) and generate ions, and examples of the inorganic acid include hydrochloric acid and nitric acid.

(12) In this regard, from the viewpoints that .sup.226Ra ions can be efficiently eluted from the carrier and that anions derived from an inorganic acid can be efficiently removed in the later step, the concentration of the inorganic acid is preferably 0.1 to 12 mol/L, more preferably 0.3 to 5 mol/L, furthermore preferably 0.5 to 2 mol/L, and particularly preferably 0.7 to 1.5 mol/L.

Anion Exchange Step (R3)

(13) The purification method (X) according to the present invention may further include an anion exchange step (R3) in which a solution containing .sup.226Ra ions eluted in an elution step (R3) is passed through an anion exchange resin.

(14) If any anions (for example, chloride ions or the like) derived from an inorganic acid (for example, hydrochloric acid or the like) used in the elution step (R2) remain in the solution, such anions may affect the electrodeposition rate of .sup.226Ra ions in an electrodeposition step (R5) described later. For this reason, it is preferable to treat the solution containing the .sup.226Ra ions eluted in the elution step (R2), in the anion exchange step (R3) because the anions derived from an inorganic acid can be reduced by being exchanged for hydroxide ions, and the electrodeposition efficiency of .sup.226Ra ions in the electrodeposition step (R5) can be improved.

(15) The anion exchange resin is not particularly limited as long as it can exchange anions (for example, chloride ions or the like) derived from an inorganic acid for hydroxide ions, and is preferably a strongly basic anion exchange resin, and more preferably a resin having a quaternary ammonium salt. Examples of the commercially available anion exchange resin include the “MONOSPHERE” series manufactured by The Dow Chemical Company, and the “AG” series manufactured by Bio-Rad Laboratories, Inc., and more specifically include “MONOSPHERE 550A” (particle diameter: 590±50 mesh, ionic form: OH form).

(16) In this regard, the anion exchange resin may be charged in a tube for use in a similar manner as in the case of a carrier (i). As the tube capable of being used for the charging, a tube similar to that in which the above-described carrier (i) is to be charged can be mentioned.

Other Step

(17) A step of washing a carrier (i) may be included between the step (R1) and the step (R2) in a purification method (X). Specifically, a step can be mentioned in which water is passed through a carrier (i). In this way, the proportion of impurities contained in a purified .sup.226Ra-containing solution (b) can be reduced.

(18) Method for Producing .sup.226Ra Target The method for producing a .sup.226Ra target according to the present invention is characterized by including an electrodeposition liquid preparation step (R4) of preparing an electrodeposition liquid by using a purified 226Ra-containing solution (b) obtained by a purification method (X), and an electrodeposition step (R5) of electrodepositing a .sup.226Ra-containing substance on a substrate by using the electrodeposition liquid.

(19) It is preferable that the method for producing a .sup.226Ra target according to the present invention further includes a purification method (hereinafter, also referred to as “purification method (Y)”) including an adsorption step (R6) of allowing .sup.226Ra ions to adsorb onto a carrier having a function of selectively adsorbing divalent cations (hereinafter, also referred to as “carrier (ii)”) by bringing a .sup.226Ra-containing solution (c) after the electrodeposition step (R5) into contact with the carrier (ii) under an alkaline condition, and an elution step (R7) of eluting the .sup.226Ra ions from the carrier (ii) under an acidic condition. The solution obtained by the purification method (Y) is referred to as a purified .sup.226Ra-containing solution (d).

Electrodeposition Liquid Preparation Step (R4)

(20) In an electrodeposition liquid preparation step (R4), an electrodeposition liquid is prepared by using a purified .sup.226Ra-containing solution (b), and at this time, a purified .sup.226Ra-containing solution (d) obtained by a purification method (Y) may be mixed with the purified .sup.226Ra-containing solution (b) to prepare an electrodeposition liquid. In this way, the recovery rate of .sup.226Ra can be further increased, and .sup.226Ra can be recovered more efficiently.

(21) By adding as needed a buffer agent, an acid, or the like to a purified .sup.226Ra-containing solution (b) or a mixture of a purified .sup.226Ra-containing solution (b) and a purified .sup.226Ra-containing solution (d), an electrodeposition liquid to be used in an electrodeposition step (R5) described later can be prepared.

(22) Examples of the buffer agent include a chloride salt such as ammonium chloride; a carbonate such as ammonium carbonate, sodium carbonate, potassium carbonate, calcium carbonate, or magnesium carbonate; a hydrogen carbonate such as ammonium hydrogen carbonate, sodium hydrogen carbonate, or potassium hydrogen carbonate; an acetate such as ammonium acetate, sodium acetate, or potassium acetate; a succinate such as monosodium succinate, disodium succinate, monopotassium succinate, dipotassium succinate, monoammonium succinate, or diammonium succinate; and a benzoate such as sodium benzoate, potassium benzoate, or ammonium benzoate. Among them, ammonium acetate is preferable from the viewpoints, for example, of being easy to maintain the pH of an electrodeposition liquid within the desired range described later, and of electrodepositing .sup.226Ra ions on a substrate more efficiently.

(23) Examples of the acid include an inorganic acid, and a carboxylic acid having 2 to 6 carbon atoms. Examples of the inorganic acid include nitric acid, hydrochloric acid, and boric acid. Further, examples of the carboxylic acid having 2 to 6 carbon atoms include acetic acid, succinic acid, and benzoic acid.

(24) The acid is preferably a monovalent or divalent acid from the viewpoint of improving the yield of .sup.225Ac.

(25) From the viewpoint that .sup.226Ra ions can be more efficiently electrodeposited on a substrate, the pH of an electrodeposition liquid is preferably 4 to 7, and more preferably 5 to 6. The pH of the electrodeposition liquid can be kept within the above range by appropriately adding a buffer agent or an acid.

(26) The electrodeposition liquid may contain as needed a component that has been used in conventional electroplating or the like within a range that does not impair the effects of the present invention. As the other components, one kind may be used, or two or more kinds may be used.

Electrodeposition Step (R5)

(27) In an electrodeposition step (R5), a .sup.226Ra-containing substance is electrodeposited on a substrate by using an electrodeposition liquid prepared in an electrodeposition liquid preparation step (R4).

(28) Examples of the .sup.226Ra-containing substance include a .sup.226Ra metal, and a .sup.226Ra salt. The obtained .sup.226Ra target can be reused in an irradiation step (A1) in a method for producing .sup.225Ac described later.

(29) Examples of the metal to be used for the substrate include aluminum, copper, titanium, silver, gold, iron, nickel, niobium, and alloys containing these metals (such as phosphor bronze, brass, nickel silver, beryllium copper, Corson alloy, and stainless steel).

(30) Further, the substrate may be plated a conductive support with these metals.

(31) As the substrate, a gold plate is preferable, for example, from the viewpoint of being less likely to cause adverse effects on an accelerator and the like even during irradiation with at least one kind selected from a charged particle, a photon, and a neutron by using the accelerator and of being capable of preventing contamination with a metal derived from the substrate during the irradiation or the dissolution of a target, and from the viewpoint of being capable of electrodepositing .sup.226Ra ions on a substrate more efficiently.

(32) The electrodeposition step (R5) can be performed by a known method. Specifically, by energizing an electrodeposition liquid, a .sup.226Ra-containing substance is electrodeposited on a substrate.

(33) As the power source for energization, it is not particularly limited, and a direct current (DC) power source, an alternating current (AC) power source, a pulse power source, a PR pulse power source, or the like can be used. Among them, a pulse power source or a PR pulse power source is preferably used, for example, from the viewpoints of being easy to improve the diffusion of .sup.226Ra ions and to uniformly electrodeposit a .sup.226Ra-containing substance, being capable of suppressing the generation of heat, and being capable of performing the electrodeposition with a small power source.

(34) As the temperature (temperature of electrodeposition liquid) in the electrodeposition step (R5), it is not particularly limited, and a temperature of, for example, around 10 to 80° C. can be employed.

Adsorption Step (R6)

(35) In an adsorption step (R6), .sup.226Ra ions are allowed to adsorb onto a carrier (ii) by bringing a .sup.226Ra-containing solution (c) containing residual .sup.226Ra ions after an electrodeposition step (R5) into contact with the carrier (ii) under an alkaline condition.

(36) As the carrier (ii), a carrier similar to the carrier (i) to be used in an adsorption step (R1) in a purification method (X) can be used, and the carrier (ii) may be charged in a tube for use in a similar manner as in the case of the purification method (X).

Elution Step (R7)

(37) In an elution step (R7), .sup.226Ra ions are eluted from a carrier (ii) under an acidic condition. Specifically, by passing an inorganic acid through the carrier (ii), the .sup.226Ra ions adsorbed onto the carrier (ii) can be eluted.

(38) As the inorganic acid to be used in the elution step (R7), an inorganic acid similar to that to be used in an elution step (R2) can be used, and the inorganic acid can also have a concentration similar to that of the inorganic acid to be used in the elution step (R2).

Anion Exchange Step (R8)

(39) A purification method (Y) may further include an anion exchange step (R8) in which a solution containing .sup.226Ra ions eluted in an elution step (R7) is passed through an anion exchange resin.

(40) If any anions (for example, chloride ions or the like) derived from an inorganic acid (for example, hydrochloric acid or the like) used in the elution step (R7) remain in the solution, such anions may affect the electrodeposition efficiency of .sup.226Ra ions when an electrodeposition liquid is prepared in an electrodeposition liquid preparation step (R4) and then an electrodeposition step (R4) is performed. For this reason, it is preferable to treat a solution containing the .sup.226Ra ions eluted in the elution step (R7), in an anion exchange step (R8) because the anions derived from an inorganic acid can be reduced by being exchanged for hydroxide ions, and the electrodeposition rate of the .sup.226Ra ions can be improved in a case where the solution is used again as an electrodeposition liquid in the electrodeposition step (R4).

Other Step

(41) A step of washing a carrier (ii) may be included between the step (R6) and the step (R7) in a purification method (Y). Specifically, a step can be mentioned in which water is passed through a carrier (ii). In this way, the proportion of impurities contained in a purified .sup.226Ra-containing solution (d) is reduced.

Method for Producing .SUP.225.Ac

(42) The method for producing .sup.225Ac according to the present invention is characterized by including an irradiation step (A1) of irradiating a .sup.226Ra target produced by the above-described method for producing a .sup.226Ra target according to the present invention with at least one kind selected from a charged particle, a photon, and a neutron by using an accelerator. It is preferable that the method for producing .sup.225Ac according to the present invention further includes a dissolution step (2) of dissolving the .sup.226Ra target irradiated in the irradiation step (A1), and a separation step (A3) of separating a colloidal .sup.225Ac component by alkalizing the solution obtained in the dissolution step (A2).

Irradiation Step (A1)

(43) In an irradiation step (A1), a .sup.226Ra target produced by the above-described method for producing a .sup.226Ra target according to the present invention is irradiated with at least one kind selected from a charged particle, a photon, and a neutron by using an accelerator, and .sup.225Ac is allowed to generate by a nuclear reaction. As the particle, a proton, a deuteron, an a particle, or a γ particleis preferable, and a proton is more preferable.

(44) In this regard, as for the irradiation method and the irradiation condition, a known method and a known condition can be adopted.

Dissolution Step (A2)

(45) In a dissolution step (A2), a .sup.226Ra target irradiated in an irradiation step (A1) is dissolved in an acid solution. As a result, a solution containing .sup.226Ra ions and .sup.225Ac ions is obtained.

(46) As the acid solution, an acid solution that can dissolve .sup.225Ac and .sup.226Ra as ions is mentioned, and specifically an aqueous solution of an inorganic acid such as hydrochloric acid, or nitric acid, preferably an aqueous solution of hydrochloric acid is mentioned.

Separation Step (A3)

(47) In a separation step (A3), a colloidal .sup.225Ac component by alkalizing a solution obtained in a dissolution step (A2) is separated.

(48) The .sup.225Ac dissolved in water as .sup.225Ac ions under an acidic condition becomes actinium hydroxide .sup.225Ac (OH).sub.3) under an alkaline condition, and forms colloids in an aqueous solution. The colloidal actinium hydroxide is collected on a filter by filtering with a membrane filter or the like, and can be separated from the solution.

(49) In addition, a .sup.226Ra component exists as ions in a solution to which an alkaline solution has been added, and is separated from an .sup.225Ac component by a separation step (A3), and a .sup.226Ra-containing solution (a) is obtained. The obtained .sup.226Ra-containing solution (a) is supplied to an adsorption step (R1) in a purification method (X).

Recovery Step (A4)

(50) By dissolving .sup.225Ac separated in a separation step (A3) with an acid solution, an .sup.225Ac-containing solution is obtained. The obtained .sup.225Ac-containing solution may be further purified by a known method, as needed.

Dissolution

(51) Actinium hydroxide separated in a separation step (A3) can be dissolved by using an acid solution. The acid solution to be used for dissolution is not particularly limited as long as it can dissolve actinium hydroxide as ions, and for example, the same acid solution as that used in a dissolution step (A2) can be used. Further, it is preferable that the concentration is 1 to 6 mol/L, and more preferably 2 to 5 mol/L, from the viewpoints that actinium hydroxide is easily dissolved as ions and that a carrier easily adsorbs .sup.226Ra.

Purification

(52) A solution containing .sup.225Ac ions dissolved with an acid solution can be purified, for example, by a solid-phase extraction method. A solid-phase extraction agent to be used in the solid-phase extraction method is not particularly limited as long as it can capture .sup.225Ac ions and then elute the .sup.225Ac ions under a predetermined condition, and examples of the solid-phase extraction agent include ones containing a compound represented by the formula (1).

(53) ##STR00001##

(54) In the formula (1), m and n are independently 0 or 1, and preferably 1; and R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently a straight or branched chain alkyl group having 8 or more and 12 or less carbon atoms, and preferably independently an octyl group or 2-ethylhexyl. Such a solid-phase extraction agent is commercially available, for example, as “DGA Resin” manufactured by Eichrom Technologies Inc.

(55) As the specific purification method, first, an .sup.225Ac-containing solution is passed through a solid-phase extraction agent to capture .sup.225Ac ions and the like in the solid-phase extraction agent. Next, the captured unnecessary .sup.226Ra is eluted by passing the solution through a solid-phase extraction agent with an inorganic acid such as hydrochloric acid. At this time, the concentration of the inorganic acid is set to a relatively high concentration so that .sup.225Ac does not elute. After that, .sup.225Ac ions can be eluted from the solid-phase extraction agent by passing through an inorganic acid having a relatively low concentration.

EXAMPLES

(56) Hereinafter, the present invention is further specifically described on the basis of Examples, however, the present invention is in no way limited to these Examples.

Examples 1 and 2

Evaluation Item 1: Mass Balance of .SUP.226.Ra in Purification Method (X)

(57) An irradiated .sup.226Ra target (size: 010 mm, thickness: 2 to 3 mm, and .sup.226Ra mass: 0.3 to 1 mg) was dissolved in 5 mL of 1 mol/L hydrochloric acid, and then the obtained solution was filtered with a membrane filter to remove insoluble matters. To the filtrate, 1 mL of 28% by mass ammonia water (product name: Ammonia solution (25.0 to 27.9%) for atomic absorption spectrometry, manufactured by KANTO CHEMICAL CO., INC.) was added to adjust the pH to 10 to 12, and colloid of actinium hydroxide was generated. Next, the generated actinium hydroxide was filtered by using a membrane filter at a flow rate of 1 to 2 mL/min to recover a .sup.226Ra-containing solution (a-1). The radioactivity of the obtained .sup.226Ra-containing solution (a-1) was measured by a germanium semiconductor detector manufactured by EURISYS MESURES.

(58) Next, in order to prevent contamination by Na in a purified .sup.226Ra-containing solution (b-1) described later, one that had been obtained by converting Chelex 100 (particle diameter: 50 to 100 mesh, ionic form: Na form, and use amount: 3 mL, manufactured by Bio-Rad Laboratories, Inc.) to a NH.sub.4+ form was charged in a medical tube having an inner diameter of 3.2 mm, an outer diameter of 4.4 mm, and a length of 50 cm (extension tube, 3.2×4.4×500 mm (4 mL), MS-FL, manufactured by HAKKO CO., LTD.), 50 to 80 mL of the obtained .sup.226Ra-containing solution (a-1) (pH >9) was passed through the medical tube at a flow rate of 1 to 2 mL/min, and the eluate was taken as a waste liquid (W1). Next, 10 mL of water was passed through Chelex 100 at a flow rate of 1 to 2 mL/min, and the eluate was merged with the waste liquid (W1).

(59) Next, MONOSPHERE 550A (particle diameter: 590 ±50 mesh, ionic form: OH form, and use amount: 20 mL, manufactured by The Dow Chemical Company) was washed with hydrochloric acid, water, sodium hydroxide, and water in this order, and then the washed MONOSPHERE 550A was charged in a medical tube having an inner diameter of 3.2 mm, an outer diameter of 4.4 mm, and a length of 200 cm (extension tube, 3.2×4.4×500 mm (4 mL), MS-FL, manufactured by HAKKO CO., LTD.), and the medical tube was connected to a tube filled with Chelex 100. 10 mL of 1 mol/L hydrochloric acid was passed through Chelex 100 and MONOSPHERE 550A in this order at a flow rate of 1 to 2 mL/min, and then 8 mL of water was further passed through the resultant Chelex 100 and MONOSPHERE 550A at a flow rate of 1 to 2 mL/min, and 18 mL of a purified .sup.226Ra-containing solution (b-1) was obtained.

(60) The radioactivity of the obtained purified .sup.226Ra-containing solution (b-1) was measured by a germanium semiconductor detector. Further, the radioactivity of each of the waste liquid (W1) and the materials of Chelex and MONOSPHERE 550A was measured in order to examine the distribution of residual .sup.226Ra.

(61) The same operation was performed twice in total (Examples 1 and 2), and the mass balance of each .sup.226Ra was calculated. The results are shown in Table 1.

(62) TABLE-US-00001 TABLE 1 Example 1 Example 2 Numerical Numerical value Percentage value Percentage .sup.226Ra-Containing 9.13 MBq 100%  2.97 MBq 100%  solution (a-1) (calculated value) Waste liquid (W1) N.D <0.2%*.sup.1 N.D <0.7%*.sup.1 Residual Chelex after N.D <0.2%*.sup.1 N.D <0.7%*.sup.1 in elution material MONO- N.D <0.2%*.sup.1 N.D <0.7%*.sup.1 SPHERE 550A after elution Purified .sup.226Ra-containing 9.13 MBq >99.3%   2.97 MBq >98.0%   solution (b-1)

(63) In Table 1, the .sup.226Ra-containing solution (a-1) was calculated from the following formula (1).

(64) .sup.226Ra (calculation value) of .sup.226Ra-containing solution (a-1)=purified .sup.226Ra-containing solution (b-1)+residual .sup.226Ra in Chelex 100+residual .sup.226Ra in MONOSPHERE 550A+waste liquid (W1) . . . (1)

(65) In this regard, for the purified .sup.226Ra-containing solution (b-1) of Example 2, a value calculated from the difference in radioactivity between the Ra-adsorbed Chelex and the Ra-eluted Chelex was used.

(66) The values with *1 shown in Table 1 were calculated assuming that a maximum of 0.02 MBq was detected because it is unclear whether the measurement of less than 0.02 MBq is possible although the measured value was N.D.

(67) As in Examples 1 and 2, by passing the .sup.226Ra-containing solution (a-1) through Chelex 100, impurities (ammonium chloride (hydrochloric acid+ammonia), ammonia, and the like) other than .sup.226Ra can be removed. Further, most of the chloride ions can be removed by these adsorption step (R1), elution step (R2), and anion exchange step (R3).

Examples 3 to 8

Evaluation Item 2: Mass Balance of .SUP.226.Ra after Dissolution Step (A2) and Separation Step (A3)

(68) An irradiated .sup.226Ra target (size: Φ10 mm, thickness: 2 to 3 mm, and .sup.226Ra mass: 0.3 to 1 mg) was dissolved in 5 mL of 1 mol/L hydrochloric acid, and then the obtained solution was filtered with a membrane filter to remove insoluble matters. To the filtrate, 1 mL of 28% by mass ammonia water (product name: Ammonia solution (25.0 to 27.9%) for atomic absorption spectrometry, manufactured by KANTO CHEMICAL CO., INC.) was added to adjust the pH to 10 to 12, and colloid of actinium hydroxide was generated. Next, the generated actinium hydroxide was filtered by using a membrane filter at a flow rate of 1 to 2 mL/min to obtain a .sup.226Ra-containing solution (a-2).

(69) Next, DGA Resin (DGA Normal Resin, 1-mL cartridge, manufactured by Eichrom Technologies Inc.) was connected to a membrane filter. 6 mL of 4 mol/L nitric acid was passed through the membrane filter and the DGA Resin in this order at a flow rate of 1 to 2 mL/min, and the eluate was taken as a waste liquid (W2).

(70) The radioactivity of the solution after the dissolution step (A2) was measured by a germanium semiconductor detector. Further, the radioactivity of each of the waste liquid (W2) and the materials of membrane filter and DGA Resin was measured by a germanium semiconductor detector in order to examine the distribution of residual .sup.226Ra. The same operation was performed three times in total (Examples 3 to 5), and the mass balance of each .sup.226Ra was calculated. The results are shown in Table 2.

Evaluation Item 3: Mass Balance of .SUP.225.Ac

(71) Next, the DGA Resin was removed from the membrane filter, 6 mL of 8 mol/L hydrochloric acid was passed through the DGA Resin at a flow rate of 1 to 2 mL/min, and the eluate was taken as a waste liquid (W3). After that, 10 mL of 0.01 mol/L hydrochloric acid was passed through the DGA Resin at a flow rate of 1 to 2 mL/min, and an .sup.225Ac-containing solution was obtained.

(72) The radioactivity of the obtained .sup.225Ac-containing solution was measured by a germanium semiconductor detector. Further, the radioactivity of each of the waste liquid (W3) and the materials of membrane filter and DGA Resin was measured by a germanium semiconductor detector in order to examine the distribution of residual .sup.225Ac. The same operation was performed three times in total (Examples 6 to 8), and the results are shown in Table 3.

(73) TABLE-US-00002 TABLE 2 Example 3 Example 4 Example 5 Numerical Numerical Numerical value Percentage value Percentage value Percentage Solution after 11.70 MBq    100% 17.03 MBq    100% 35.90 MBq    100% dissolution step (A2) Residual Membrane filter N.D  <0.2%.sup.*1 N.D  <0.1%*.sup.1  0.02 MBq    0.1% in DGA Resin N.D  <0.2%.sup.*1 N.D  <0.1%*.sup.1 N.D  <0.1%.sup.*1 material Waste liquid (W2)  0.18 MBq    1.5%  0.03 MBq    0.2%  0.46 MBq    1.3% Recovered .sup.226Ra-Containing 11.52 MBq >98.1% 17.00 MBq >99.6% 35.43 MBq >98.6% amount solution (a-2) not containing waste liquid (W2) (calculated value) .sup.226Ra-Containing 11.70 MBq >98.7% 17.03 MBq >99.8% 35.88 MBq >99.9% solution (a-2) containing waste liquid (W2) (calculated value)

(74) TABLE-US-00003 TABLE 3 Example 6 Example 7 Example 8 Numerical Numerical Numerical value Percentage value Percentage value Percentage Membrane filter-collected 49.30 kBq    100% 47.55 kBq    100% 73.45 kBq    100% amount (calculated value) Residual Membrane filter.sup.*2 N.D  <1.2%.sup.*1 N.D  <1.2%.sup.*1  0.93 kBq   1.27% in DGA Resin.sup.*2 N.D  <1.2%.sup.*1 N.D  <1.2%.sup.*1 N.D  <0.8%.sup.*1 material Waste liquid (W3) after N.D  <1.2%.sup.*1  1.67 kBq   3.50% N.D  <0.8%.sup.*1 passed through DGA Resin.sup.*2 Recovered After membrane 49.30 kBq >96.5%.sup.*3 45.88 kBq >94.1%.sup.*3 72.51 kBq >97.1%.sup.*3 amount collection.sup.*2

(75) The values with *1 shown in Table 2 were calculated assuming that a maximum of 0.02 MBq was detected because it is unclear whether the measurement of less than 0.02 MBq is possible although the measured value was N.D.

(76) The .sup.226Ra-containing solution (a-2) not containing the waste liquid (W2) after the separation step (A3) in Table 2 was calculated from the following formula (2).

(77) .sup.226Ra-containing solution (a-2) not containing waste liquid (W2) (calculation value) =.sup.226Ra contained in the solution after dissolution step (A2)—residual .sup.226Ra in the material after separation step (A3) (membrane filter)—residual .sup.226Ra in the material after separation step (A3) (DGA Resin) —.sup.226Ra amount of the waste liquid (W2) after separation step (A3) . . . (2)

(78) The amount of .sup.226Ra contained in the solution after the dissolution step (A2) was calculated by collecting a part of the solution, measuring the amount of the part, and converting the measured amount of the part to an amount for the entire solution.

(79) The values with *1 shown in Table 3 were calculated assuming that a maximum of 0.58 kBq was detected because it is unclear whether the measurement of less than 0.58 kBq is possible although the measured value was N.D.

(80) The values with *2 shown in Table 3 were used to calculate the .sup.225Ac membrane filter-collected amount after the separation step (A3).

(81) The values of the membrane filter-collected amount shown in Table 3 were calculated from the following calculation formula (3).

(82) Membrane filter-collected amount (calculation value) after separation step (A3)=residual .sup.225Ac in the material after .sup.225Ac recovery step (A4) (membrane filter)+residual .sup.225Ac in the material after .sup.225Ac recovery step (A4) (DGA Resin) +.sup.225Ac amount of the waste liquid (W3) after being passed through DGA Resin of .sup.225Ac recovery step (A4) .sup.225Ac recovered amount in purified .sup.225Ac-containing solution (3)

(83) In this regard, as the .sup.225Ac recovered amount in the purified .sup.225Ac-containing solution of Example 6, a value calculated from the difference in radioactivity between the Ac adsorbed-DGA and the Ac-eluted DGA was used.

(84) The values with *3 shown in Table 3 are each the mass balance after collection by a membrane filter, and the uncollected matters by the membrane filter are not taken into consideration. Further, since the radioactivity of .sup.225Ac in the .sup.226Ra solutions before and after being passed through a membrane filter cannot be measured due to the influence of .sup.226Ra, the recovery rate was calculated by assuming the denominator as “the membrane filter-collected amount after separation step (A3) (calculation value)”.