High mobility silicon on flexible substrates

Abstract

A semiconductor device and method for fabricating same is disclosed. Embodiments are directed to a semiconductor device and fabrication of same which include a flexible substrate and a buffer stack overlying the substrate. The buffer stack comprises at least one epitaxial buffer layer. An epitaxial doped layer comprised predominantly of silicon overlies the at least one epitaxial buffer layer. Mobility of the device is greater than 100 cm.sup.2/Vs and carrier concentration of the epitaxial doped layer is less than 10.sup.16 cm.sup.−3.

Claims

1. A semiconductor device comprising: a flexible substrate; a buffer stack overlying the substrate, wherein the buffer stack comprises at least one epitaxial buffer layer; and an epitaxial doped layer comprised predominantly of silicon and overlying the at least one epitaxial buffer layer; wherein mobility of the device is greater than 100 cm.sup.2/Vs.

2. The semiconductor device of claim 1, wherein mobility of the epitaxial doped layer is greater than 100 cm.sup.2/Vs.

3. The semiconductor device of claim 1, wherein the at least one epitaxial buffer layer comprises an epitaxial non-oxide buffer layer.

4. The semiconductor device of claim 1, wherein the at least one epitaxial buffer layer is comprised predominantly of germanium.

5. The semiconductor device of claim 1, wherein the flexible substrate comprises a non-single crystal material.

6. The semiconductor device of claim 1, wherein the flexible substrate comprises a flexible material selected from the group consisting of metals, glasses, ceramics, and combinations thereof.

7. The semiconductor device of claim 1, wherein the buffer stack comprises a biaxially-textured Ion Beam-Assisted Deposition (IBAD) layer.

8. The semiconductor device of claim 1, wherein the epitaxial doped layer is at least 0.05 μm thick.

9. The semiconductor device of claim 1, wherein the buffer stack comprises an amorphous buffer layer positioned between the flexible substrate and the biaxially-textured IBAD layer.

10. The semiconductor device of claim 1, further comprising an epitaxial undoped layer comprised predominantly of silicon and overlying the at least one epitaxial buffer layer, wherein the epitaxial doped layer overlies the epitaxial undoped layer.

11. The semiconductor device of claim 10, wherein the epitaxial undoped layer is at least 0.5 μm thick.

12. A method for fabricating a semiconductor device, the method comprising: providing a flexible substrate; forming a buffer stack on the substrate, wherein the buffer stack comprises at least one epitaxial buffer layer; and forming an epitaxial doped layer comprised predominantly of silicon on the at least one epitaxial buffer layer; wherein mobility of the device is greater than 100 cm.sup.2/Vs.

13. The method of claim 12, wherein mobility of the epitaxial doped layer is greater than 100 cm.sup.2/Vs.

14. The method of claim 12, wherein the at least one epitaxial buffer layer comprises an epitaxial non-oxide buffer layer.

15. The method of claim 12, wherein the at least one epitaxial buffer layer is comprised predominantly of germanium.

16. The method of claim 12, wherein the flexible substrate comprises a non-single crystal material.

17. The method of claim 12, wherein the flexible substrate comprises a flexible material selected from the group consisting of metals, glasses, ceramics, and combinations thereof.

18. The method of claim 12, wherein the buffer stack comprises a biaxially-textured Ion Beam-Assisted Deposition (IBAD) layer.

19. The method of claim 12, wherein the step of forming the epitaxial doped layer comprises growing the epitaxial doped layer via plasma enhanced chemical vapor deposition.

20. The method of claim 12, wherein the buffer stack comprises an amorphous buffer layer positioned between the flexible substrate and the biaxially-textured IBAD layer.

21. The method of claim 12, further comprising forming an epitaxial undoped layer comprised predominantly of silicon on the at least one epitaxial buffer layer, and forming the epitaxial doped layer on the epitaxial undoped layer.

22. The method of claim 21, wherein the step of forming the epitaxial undoped layer comprises growing the epitaxial undoped layer via plasma enhanced chemical vapor deposition.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The foregoing summary, as well as the following detailed description, will be better understood when read in conjunction with the appended drawings. For the purpose of illustration only, there is shown in the drawings certain embodiments. It's understood, however, that the inventive concepts disclosed herein are not limited to the precise arrangements and instrumentalities shown in the figures.

(2) FIG. 1 illustrates an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(3) FIG. 2 illustrates a cross-sectional microstructure of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(4) FIG. 3 illustrates a theta-2theta X-Ray Diffraction of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(5) FIG. 4 illustrates an X-Ray Diffraction polefigure of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(6) FIG. 5 illustrates an X-Ray Diffraction phi scan of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(7) FIG. 6 illustrates a Raman Spectroscopy of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(8) FIG. 7 illustrates mobility and carrier concentration levels of an epitaxial silicon film grown on an inexpensive, flexible metal substrate in phosphine gas flow, in accordance with an embodiment.

(9) FIG. 8 illustrates mobility and carrier concentration levels of an epitaxial silicon film grown on an inexpensive, flexible metal substrate in silane gas flow, in accordance with an embodiment.

(10) FIG. 9 illustrates the trend of mobility and carrier concentration levels of an epitaxial silicon film grown on an inexpensive, flexible metal substrate, in accordance with an embodiment.

(11) FIG. 10 is a flowchart illustrating an embodiment of a method for fabricating a semiconductor device having high mobility and low carrier concentration levels, in accordance with an embodiment.

DETAILED DESCRIPTION

(12) It is to be understood that the figures and descriptions of the present invention may have been simplified to illustrate elements that are relevant for a clear understanding of the present invention, while eliminating, for purposes of clarity, other elements found in a typical semiconductor device or typical method for fabricating a semiconductor device. Those of ordinary skill in the art will recognize that other elements may be desirable and/or required in order to implement the present invention. However, because such elements are well known in the art, and because they do not facilitate a better understanding of the present invention, a discussion of such elements is not provided herein. It is also to be understood that the drawings included herewith only provide diagrammatic representations of the presently preferred structures of the present invention and that structures falling within the scope of the present invention may include structures different than those shown in the drawings. Reference will be made to the drawings wherein like structures are provided with like reference designations.

(13) Before explaining at least one embodiment in detail, it should be understood that the inventive concepts set forth herein are not limited in their application to the construction details or component arrangements set forth in the following description or illustrated in the drawings. It should also be understood that the phraseology and terminology employed herein are merely for descriptive purposes and should not be considered limiting.

(14) It should further be understood that any one of the described features may be used separately or in combination with other features. Other invented devices, systems, methods, features, and advantages will be or become apparent to one with skill in the art upon examining the drawings and the detailed description herein. It's intended that all such additional devices, systems, methods, features, and advantages be protected by the accompanying claims.

(15) For purposes of this disclosure, the terms “film” and “layer” may be used interchangeably.

(16) It is an objective of the embodiments described herein to provide semiconductor devices and corresponding methods of manufacturing semiconductor devices with high carrier mobilities and low carrier concentrations.

(17) In an embodiment, an epitaxial doped film that predominantly includes silicon (e.g., >50% silicon) (hereafter “epitaxial doped film”) is grown on a flexible substrate and has a carrier mobility over 100 cm.sup.2/Vs as well as a carrier concentration less than 10.sup.16 cm.sup.−3. The carrier mobility of either or both the epitaxial doped film and the semiconductor device as a whole (i.e., including, inter alia, the epitaxial doped film, buffer stack (discussed below), and flexible substrate) is over 100 cm.sup.2/Vs. The carrier concentration of the epitaxial doped film is less than 10.sup.16 cm.sup.−3.

(18) FIG. 1 illustrates a semiconductor device 100 including an epitaxial doped film with high carrier mobility and low carrier concentration. The epitaxial doped film includes epitaxial doped silicon stacked on top of an epitaxial buffer film that predominantly includes germanium (e.g., >50% germanium) (hereafter “epitaxial germanium film”), intermediate epitaxial layer(s), a biaxially-textured IBAD layer, amorphous buffer layer(s), and a flexible substrate. In one embodiment, the epitaxial doped film is grown on top of epitaxial germanium film. First, the epitaxial germanium film can be grown on a flexible metal or glass substrate using a known technique called ion-beam assisted deposition (IBAD). In the IBAD process, materials with rock-salt structures such as MgO are deposited on amorphous layers on any flexible substrate (e.g., glass, metal, ceramics, or combinations thereof), with simultaneous ion beam bombardment. Under proper conditions, within a first few nanometers of the film, a good degree of biaxial crystallographic orientation can be achieved. Grains are aligned with respect to each other both in-plane and out-of-plane, resembling a single-crystalline-like texture. Second, the epitaxial doped film is then deposited (formed) on the epitaxial germanium film via plasma enhanced chemical vapor deposition (PECVD). In one embodiment, an epitaxial undoped silicon layer is deposited on the epitaxial germanium film with at least 0.5 μm thickness followed by depositing (forming) an epitaxial doped film on the epitaxial undoped silicon layer.

(19) In an embodiment, the process for fabricating the epitaxial doped film of FIG. 1 results in an epitaxial doped film with only a few defects in the top region of the layer. FIG. 2 exhibits the cross-sectional microstructure of the epitaxial doped film described with respect to FIG. 1. As illustrated, the top part of the epitaxial doped film contains far fewer defects than the bottom part of the film. This is critical for achieving high electrical performance because the active device layers will be grown directly on top of the film (i.e., on top of the low defect density region).

(20) In an embodiment, the epitaxial doped film of FIG. 1 can have a sharp out-of-plane and in-plane texture, indicating strong epitaxial growth. FIG. 3 illustrates a theta-2theta pattern of the epitaxial doped film of FIG. 1 compared to a theta-2theta pattern of the epitaxial germanium film, which can be obtained by X-ray diffraction (XRD). As illustrated in FIG. 3, in the device of FIG. 1, the addition of the epitaxial doped film only results in a single XRD silicon peak, indicating strong out-of-plane texture. FIG. 4 illustrates an X-ray diffraction polefigure of the epitaxial doped film of FIG. 1. As illustrated in FIG. 4, the epitaxial doped film of FIG. 1 has four sharp poles corresponding to the four-fold symmetric peak positions silicon, indicating strong in-plane texture. Specifically, the polefigure shows no rings of polycrystalline structure or anything other than a single orientation of silicon. FIG. 5 illustrates a phi scan of the epitaxial doped film of FIG. 1. As illustrated in FIG. 5, the epitaxial doped film of FIG. 1 has only four sharp silicon peaks with a spread in in-plane texture of only approximately 1.8°. This indicates that the silicon grains are oriented with respect to each other within approximately 2.0° (i.e., strong in-plane texture). In an embodiment, the silicon grains are oriented with respect to each other between approximately 0.1° to 5°. FIG. 6 illustrates a Raman spectroscopy analysis of the epitaxial doped film of FIG. 1 compared to a silicon wafer as a reference. As illustrated in FIG. 6, there are no broad peaks corresponding to the presence of amorphous silicon in the epitaxial doped film of FIG. 1. Furthermore, the silicon peak from the epitaxial doped film of FIG. 1 is sharp with a full-width-at-maximum (FWHM) of 4.5°, which compares well with the 3.4° FWHM seen in the silicon wafer. Such a sharp peak of the epitaxial doped film on a metal substrate indicates crystal quality comparable with that of crystalline wafer, and hence, comparable electronic properties are expected.

(21) In an embodiment, the epitaxial doped film of FIG. 1 has a high mobility and low carrier concentration. FIG. 7 illustrates the mobility and carrier concentration levels of the epitaxial doped film of FIG. 1 with phosphine gas flow rate. The mobility and carrier concentration measurements can be conducted at different levels of PH.sub.3 flow rates. As illustrated in FIG. 7, mobility and carrier concentration levels are sensitive to the flow rate of the phosphine source. The mobility peaks at ˜213 cm.sup.2/Vs, and the carrier concentration dips to ˜10.sup.16 cm.sup.−3 at a phosphine flow rate of 1 sccm.

(22) FIG. 8 illustrates the mobility and carrier concentration levels of the epitaxial doped film of FIG. 1 with silane gas flow rate. The mobility and carrier concentration measurements can be conducted at different levels of silane flow rates. As illustrated in FIG. 8, mobility and carrier concentration levels are sensitive to the flow rate of the silane source. The mobility peaks at ˜236 cm.sup.2/Vs, and the carrier concentration dips to 10.sup.15 cm.sup.−3 at a silane flow rate of 40 sccm. Therefore, with controlled reactant gas flows, the epitaxial doped film of FIG. 1 can achieve a mobility boost upwards of ˜236 cm.sup.2/Vs, compared to the ˜80 cm.sup.2/Vs observed in prior art films. The epitaxial doped film can also achieve a carrier concentration drop to 10.sup.15 cm.sup.−3, compared to the 10.sup.16 cm.sup.−3 observed in prior art films.

(23) Embodiments are directed to a semiconductor device comprising: a flexible substrate; a buffer stack overlying the substrate, wherein the buffer stack comprises at least one epitaxial buffer layer; and an epitaxial doped layer comprised predominantly of silicon and overlying the at least one epitaxial buffer layer. Mobility of the device is greater than 100 cm.sup.2/Vs and carrier concentration of the epitaxial doped layer is less than 10.sup.16 cm.sup.−3.

(24) In an embodiment, mobility of the epitaxial doped layer is greater than 100 cm.sup.2/Vs.

(25) In an embodiment, the at least one epitaxial buffer layer is comprised predominantly of germanium.

(26) In an embodiment, the flexible substrate comprises a non-single crystal material.

(27) In an embodiment, the flexible substrate comprises a flexible material selected from the group consisting of metals, glasses, ceramics, and combinations thereof.

(28) In an embodiment, the buffer stack comprises a biaxially-textured Ion Beam-Assisted Deposition (IBAD) layer.

(29) In an embodiment, the epitaxial doped layer is at least 0.05 μm thick.

(30) In an embodiment, the epitaxial doped layer is grown via plasma enhanced chemical vapor deposition.

(31) In an embodiment, the buffer stack comprises an amorphous buffer layer positioned between the flexible substrate and the biaxially-textured IBAD layer.

(32) In an embodiment, the semiconductor device further comprises an epitaxial undoped layer comprised predominantly of silicon and overlies the at least one epitaxial buffer layer, wherein the epitaxial doped layer overlies the epitaxial undoped layer.

(33) In an embodiment, the epitaxial undoped layer is at least 0.5 μm thick.

(34) In an embodiment, the epitaxial undoped layer is grown via plasma enhanced chemical vapor deposition.

(35) Embodiments are also directed to a method for fabricating a semiconductor device. FIG. 10 is a flowchart illustrating an embodiment of a method 1000 for fabricating a semiconductor device. In an embodiment, the method comprises providing a flexible substrate (block 1002). The method also comprises forming a buffer stack on the substrate, wherein the buffer stack comprises at least one epitaxial buffer layer (block 1004). The method further comprises forming an epitaxial doped layer comprised predominantly of silicon on the at least one epitaxial buffer layer (block 1006). Mobility of the device is greater than 100 cm.sup.2/Vs and carrier concentration of the epitaxial doped layer is less than 10.sup.16 cm.sup.−3.

(36) In an embodiment, mobility of the epitaxial doped layer is greater than 100 cm.sup.2/Vs.

(37) In an embodiment, the at least one epitaxial buffer layer is comprised predominantly of germanium.

(38) In an embodiment, the flexible substrate comprises a non-single crystal material.

(39) In an embodiment, the flexible substrate comprises a flexible material selected from the group consisting of metals, glasses, ceramics, and combinations thereof.

(40) In an embodiment, the buffer stack comprises a biaxially-textured Ion Beam-Assisted Deposition (IBAD) layer.

(41) In an embodiment, the epitaxial doped layer is at least 0.05 μm thick.

(42) In an embodiment, the step of forming the epitaxial doped layer comprises growing the epitaxial doped layer via plasma enhanced chemical vapor deposition.

(43) In an embodiment, the buffer stack comprises an amorphous buffer layer positioned between the flexible substrate and the biaxially-textured IBAD layer.

(44) In an embodiment, the method further comprises forming an epitaxial undoped layer comprised predominantly of silicon on the at least one epitaxial buffer layer, and forming the epitaxial doped layer on the epitaxial undoped layer.

(45) In an embodiment, the epitaxial undoped layer is at least 0.5 μm thick.

(46) In an embodiment, the step of forming the epitaxial undoped layer comprises growing the epitaxial undoped layer via plasma enhanced chemical vapor deposition.

(47) Although embodiments are described above with reference to carrier mobility of the epitaxial doped film being over 100 cm.sup.2/Vs, the carrier mobility of the semiconductor device as a whole (i.e., including, inter alia, the epitaxial doped film, buffer stack, and flexible substrate) is also over 100 cm.sup.2/Vs.

(48) The method steps in any of the embodiments described herein are not restricted to being performed in any particular order. Also, structures mentioned in any of the method embodiments may utilize structures mentioned in any of the device embodiments. Such structures may be described in detail with respect to the device embodiments only but are applicable to any of the method embodiments.

(49) Features in any of the embodiments described above may be employed in combination with features in other embodiments described above, such combinations are considered to be within the spirit and scope of the present invention.

(50) The contemplated modifications and variations specifically mentioned above are considered to be within the spirit and scope of the present invention.

(51) It's understood that the above description is intended to be illustrative, and not restrictive. The material has been presented to enable any person skilled in the art to make and use the concepts described herein, and is provided in the context of particular embodiments, variations of which will be readily apparent to those skilled in the art (e.g., some of the disclosed embodiments may be used in combination with each other). Many other embodiments will be apparent to those of skill in the art upon reviewing the above description. The scope of the embodiments herein therefore should be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled. In the appended claims, the terms “including” and “in which” are used as the plain-English equivalents of the respective terms “comprising” and “wherein.”

EXAMPLE

(52) A flexible tape of Hastelloy C-276 was electropolished to a surface roughness of 1 nm. A buffer stack consisting of Al.sub.2O.sub.3, Y.sub.2O.sub.3, MgO, LaMnO3, CeO2, and epitaxial germanium film were deposited on the substrate. The MgO was deposited by ion beam-assisted deposition to achieve a biaxial texture. This biaxial texture was transferred epitaxially to subsequent layers. A 300-1000 nm thick germanium film was epitaxially grown on the CeO2 layer. The germanium film was annealed at 750° C. for 10 minutes at a base pressure of 2.5×10.sup.−7 Torr. Next, the germanium film was cleaned and smoothened with a hydrogen plasma at a power level of 300 W for 5 min. 80 sccm H2 was used at a pressure of 75 mTorr. Then, a 1 μm thick undoped layer of silicon was epitaxially grown on the germanium film by plasma enhanced chemical vapor deposition at 300 W and pressure of 75 mTorr using a reactive gas of 40 sccm SiH4 and dilution gas of 120 sccm H2. This gas flow was then continued with an additional dopant flow of 0.4 sccm PH3 for 20 minutes. The deposition of the n-doped epitaxial silicon (i.e., the epitaxial doped film) was conducted at 300 W and 75 mTorr.