Method of examining a sample using a charged particle microscope, wherein an electron energy-loss spectroscopy (EELS) spectrum is acquired
11417497 · 2022-08-16
Assignee
Inventors
Cpc classification
H01J37/244
ELECTRICITY
G01N23/20091
PHYSICS
International classification
H01J37/244
ELECTRICITY
G01N23/20091
PHYSICS
Abstract
The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; and acquiring an EELS spectrum for each of said plurality of sample positions. According to the method, it comprises the further steps of scanning, once more, said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum. With this, it is possible to acquire rapid information on the sample being investigated, allowing for faster processing of samples.
Claims
1. A method of examining a sample using a charged particle microscope, comprising the steps of: providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; acquiring an EELS spectrum for each of said plurality of sample positions; generating an image representation of said sample based on at least a portion of said EELS spectrum acquired for each of said plurality of sample positions; scanning said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum; and updating the image representation of said sample based on at least on the combining of the EELS spectrum with said further EELS spectrum.
2. Method according to claim 1, comprising the step of providing, by a control unit, the image representation of said sample, in particular wherein said image representation contains said combined EELS spectrum.
3. Method according to claim 1, comprising the step of extracting, using said EELS spectrum, one or more first features of said sample.
4. Method according to claim 1, comprising the step of extracting, using said further EELS spectrum, one or more second features of said sample.
5. Method according to claim 2, comprising the step of associating, with reference to an HSV color space, a corresponding plurality of different color hues to said first and second features, wherein said image representation contains said different color hues.
6. Method according to claim 1, comprising the step of denoising said EELS spectrum and/or said further EELS spectrum.
7. Method according to claim 1, comprising the step of denoising said combined EELS spectrum.
8. Method according to claim 1, wherein use is made of an electron dose of <20 e.sup.−/Å.sup.2.
9. Method according to claim 1, comprising the step of applying a drift correction to said EELS spectrum and/or said further EELS spectrum.
10. Method according to claim 1, comprising the step of analysing said EELS spectrum and/or said further EELS spectrum, wherein said analyzing comprises the step of using Multi-Variate analysis.
11. The method according to claim 1, further including the steps of: scanning, said charged particle beam over said sample at said plurality of sample positions one or more additional times; acquiring, for each iteration of the scanning said plurality of sample positions one or more additional times, an additional EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum and said additional EELS spectrum.
12. The method according to claim 11, further comprising the step of updating the image representation of said sample based on the combining of individual additional EELS spectrum acquired for each iteration of the scanning.
13. A charged particle microscope for examining a sample, and comprising: an optics column, including a charged particle source, a final probe forming lens and a scanner, for focusing a beam of charged particles emitted from said charged particle source onto a sample; a sample stage positioned downstream of said final probe forming lens and arranged for holding said sample; a first detector for detecting emissions of a first type originating from said sample in response to the incidence of charged particles emitted from said charged particle source; a control unit and a processing device connected to said first detector; wherein said charged particle microscope is arranged for executing a method comprising the steps of: scanning a charged particle beam over said sample at a plurality of sample positions; acquiring an EELS spectrum for each of said plurality of sample positions; generating an image representation of said sample based on at least a portion of said EELS spectrum acquired for each of said plurality of sample positions; scanning said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum; and updating the image representation of said sample based on at least on the combining of the EELS spectrum with said further EELS spectrum.
14. The charged particle microscope according to claim 13, wherein the method further comprises the step of providing, by the control unit, the image representation of said sample, in particular wherein said image representation contains said combined EELS spectrum.
15. The charged particle microscope according to claim 13, wherein the method further comprises the step of extracting, using said EELS spectrum, one or more first features of said sample.
16. The charged particle microscope according to claim 13, wherein the method further comprises the step of extracting, using said further EELS spectrum, one or more second features of said sample.
17. The charged particle microscope according to claim 16, wherein the method further comprises the step of associating, with reference to an HSV color space, a corresponding plurality of different color hues to said first and second features, wherein said image representation contains said different color hues.
18. The charged particle microscope according to claim 13, wherein use is made of an electron dose of <20 e/Å.sup.2.
19. The charged particle microscope according to claim 13, wherein the method further comprises the step of applying a drift correction to said EELS spectrum and/or said further EELS spectrum.
20. The charged particle microscope according to claim 13, wherein the method further comprises the step of analysing said EELS spectrum and/or said further EELS spectrum, wherein said analyzing comprises the step of using Multi-Variate analysis.
Description
(1) The method and device as disclosed herein will now be elucidated in more detail on the basis of exemplary embodiments and the accompanying schematic drawings, in which:
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(7) In the Figures, where pertinent, corresponding parts are indicated using corresponding reference symbols. It should be noted that, in general, the Figures are not to scale.
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(9) The sample S is held on a sample holder H. As here illustrated, part of this holder H (inside enclosure E) is mounted in a cradle A′ that can be positioned/moved in multiple degrees of freedom by a positioning device (stage) A; for example, the cradle A′ may (inter alia) be displaceable in the X, Y and Z directions (see the depicted Cartesian coordinate system), and may be rotated about a longitudinal axis parallel to X. Such movement allows different parts of the sample S to be irradiated/imaged/inspected by the electron beam traveling along axis B′ (and/or allows scanning motion to be performed as an alternative to beam scanning [using deflector(s) D], and/or allows selected parts of the sample S to be machined by a (non-depicted) focused ion beam, for example).
(10) The (focused) electron beam B traveling along axis B′ will interact with the sample S in such a manner as to cause various types of “stimulated” radiation to emanate from the sample S, including (for example) secondary electrons, backscattered electrons, X-rays and optical radiation (cathodoluminescence). If desired, one or more of these radiation types can be detected with the aid of detector 22, which might be a combined scintillator/photomultiplier or EDX (Energy-Dispersive X-Ray Spectroscopy) module, for instance; in such a case, an image could be constructed using basically the same principle as in a SEM. However, alternatively or supplementally, one can study electrons that traverse (pass through) the sample S, emerge (emanate) from it and continue to propagate (substantially, though generally with some deflection/scattering) along axis B′. Such a transmitted electron flux enters an imaging system (combined objective/projection lens) 24, which will generally comprise a variety of electrostatic/magnetic lenses, deflectors, correctors (such as stigmators), etc. In normal (non-scanning) TEM mode, this imaging system 24 can focus the transmitted electron flux onto a fluorescent screen 26, which, if desired, can be retracted/withdrawn (as schematically indicated by arrows 26′) so as to get it out of the way of axis B′. An image (or diffractogram) of (part of) the sample S will be formed by imaging system 24 on screen 26, and this may be viewed through viewing port 28 located in a suitable part of a wall of enclosure E. The retraction mechanism for screen 26 may, for example, be mechanical and/or electrical in nature, and is not depicted here.
(11) As an alternative to viewing an image on screen 26, one can instead make use of the fact that the depth of focus of the electron flux emerging from imaging system 24 is generally quite large (e.g. of the order of 1 meter). Consequently, various types of sensing device/analysis apparatus can be used downstream of screen 26, such as:
(12) TEM camera 30. At camera 30, the electron flux can form a static image (or diffractogram) that can be processed by controller C and displayed on a display device (not depicted), such as a flat panel display, for example. When not required, camera 30 can be retracted/withdrawn (as schematically indicated by arrows 30′) so as to get it out of the way of axis B′.
(13) STEM recorder 32. An output from recorder 32 can be recorded as a function of (X,Y) scanning position of the beam B on the sample S, and an image can be constructed that is a “map” of output from recorder 32 as a function of X,Y. Recorder 32 can comprise a single pixel with a diameter of e.g. 20 mm, as opposed to the matrix of pixels characteristically present in camera 30. Moreover, recorder 32 will generally have a much higher acquisition rate (e.g. 10.sup.6 points per second) than camera 30 (e.g. 10.sup.2 images per second). Once again, when not required, recorder 32 can be retracted/withdrawn (as schematically indicated by arrows 32′) so as to get it out of the way of axis B′ (although such retraction would not be a necessity in the case of a donut-shaped annular dark field recorder 32, for example; in such a recorder, a central hole would allow beam passage when the recorder was not in use).
(14) As an alternative to imaging using camera 30 or recorder 32, one can also invoke spectroscopic apparatus 34, which could be an EELS module, for example.
(15) It should be noted that the order/location of items 30, 32 and 34 is not strict, and many possible variations are conceivable. For example, spectroscopic apparatus 34 can also be integrated into the imaging system 24.
(16) Note that the controller (which may be a combined controller and processor) C is connected to various illustrated components via control lines (buses) C′. Controller can be connected to a computer screen 51, which may be provided with a user interface (UI). This controller C can provide a variety of functions, such as synchronizing actions, providing setpoints, processing signals, performing calculations, and displaying messages/information on a display device (not depicted). It will be understood that the (schematically depicted) controller C may be (partially) inside or outside the enclosure E, and may have a unitary or composite structure, as desired. The skilled artisan will understand that the interior of the enclosure E does not have to be kept at a strict vacuum; for example, in a so-called “Environmental TEM/STEM”, a background atmosphere of a given gas is deliberately introduced/maintained within the enclosure E. The skilled artisan will also understand that, in practice, it may be advantageous to confine the volume of enclosure E so that, where possible, it essentially hugs the axis B′, taking the form of a small tube (e.g. of the order of 1 cm in diameter) through which the employed electron beam passes, but widening out to accommodate structures such as the source 4, sample holder H, screen 26, camera 30, recorder 32, spectroscopic apparatus 34, etc.
(17) Turning now to
(18) Downstream of the dispersing device 3, the array 5 of sub-beams encounters an adjustable/retractable slit (letterbox) 7, which can, for example, be used in EFTEM-mode to select/admit a given portion of the array 5 and to discard/occlude other portions thereof; to this end, the slit 7 is connected to an actuation device 7a that can be invoked to open/close/move the (opening in the) slit 7 as desired. In EELS mode, this slit 7 is usually (fully) open/retracted. The skilled artisan will understand that the slit 7 is advantageously disposed at a location at or proximal to a dispersion plane of the spectroscopic apparatus 34; similarly, the detector 11 is also advantageously located at or proximal to such a plane. If required, it is possible to aim/shift the array 5 of spectral sub-beams falling upon the slit 7 by appropriately adjusting, for example, (an electrical signal to) the dispersing device 3 and/or a drift tube/deflector (not depicted) provided between the dispersing device 3 and slit 7, for instance.
(19) After having traversed slit 7, the (selected portion of the) array 5 passes through post-dispersion electron optics 9, where it is magnified/focused, for example, and ultimately directed/projected onto detector 11. The detector 11 may comprise an assembly of sub-detectors arranged along dispersion direction X, with different sub-detectors being adjustable so as to have different detection sensitivities. For illustration purposes, three of these sub-detectors are labelled 11p, 11q and 11r in the Figure. Each of these sub-detectors (e.g. 11p, 11q, 11r) may, for example, be: An avalanche photodiode, or a linear array of such avalanche photodiodes extending along Y; A pixel (e.g. a 3T pixel) of a CMOS or CCD sensor, or a linear array of such pixels extending along Y.
(20) The sensitivity of a given sub-detector (e.g. 11p, 11q, 11r) can be matched to suit the intensity of the portion of the array 5 that impinges upon it.
(21) It is noted that other detector configurations for measuring EELS spectra are known to those skilled in the art and are applicable in the method as disclosed herein as well. The method is in principle not limited to the use of a specific detector.
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(23) A Zero-Loss Peak ZLP, representing electrons that traverse the sample without undergoing inelastic scattering therein;
(24) A Plasmon Resonance Peak component/section PRP (sometimes referred to as a Valence Loss component), a relatively broad series of peaks/shoulders associated with single or multiple scattering of electrons on plasmons in the specimen. This typically extends from about 0 to 50 eV, although there is no strict definition of its upper limit. It is characterized by peaks/shoulders resulting from outer-shell scattering events in the sample, such as peaks 31. Note that the PRP component usually has a significantly lower intensity than the ZLP.
(25) A Core Loss Peak component/section CLP. This typically starts at about 50 eV (after the PRP component), although there is no strict definition of its lower limit. It is typically of such a low intensity relative to the ZLP/PRP components that, as rendered in
(26) The EELS spectrum shown in
(27) Sub-beam 5a comprises (part of) a ZLP spectral component, and impinges upon sub-detector 11r, which is adjusted to have a relatively low detection sensitivity;
(28) Sub-beam 5b comprises (part of) a PRP spectral component, and impinges upon sub-detector 11q, which is adjusted to have an intermediate-value detection sensitivity;
(29) Sub-beam 5c comprises (part of) a CLP spectral component, and impinges upon sub-detector 11p, which is adjusted to have a relatively high detection sensitivity.
(30) Since the acquisition of EELS spectra for the entire sample takes a long time, the method as disclosed herein provides an alternative of performing EELS on a sample. The method is schematically depicted in
(31) The acquired EELS spectra for a plurality of sample points during a single scan may be combined in so-called spectral cubes (or Scubes) that contain positional (x, y) and spectral (energy) information. In a way, steps 103 and 104 as defined above, relating to scanning and acquiring EELS spectra a first time, result in the acquisition of a first Scube. Steps 104 and 105, relating to scanning and acquiring EELS spectra a second time, result in the acquisition of a second Scube. It is noted that the method may comprise the step of acquiring one or more further Scubes, by performing said steps of scanning 104 and acquiring 105 a further EELS spectrum for each of said plurality of sample positions at least one more time. Data analysis may be performed on one or more obtained Scubes, such as on single Scubes or on a combination of Scubes.
(32) In effect, the method allows a relatively sparse EELS spectrum to be obtained for a plurality of sample points, and then acquire a further (relatively sparse) EELS spectrum for the plurality of sample points. Data analysis may be performed on one or more of the EELS spectra obtained during each or every individual scanning. The obtained information may be combined, in particular for acquiring a complete EELS spectrum for the plurality of sample positions. This way, each complete scan allows information about the sample to be obtained, either from the obtained EELS spectra or the performed data analysis thereon. The information can be combined and shown to a user. This allows the user, in particular a human operator, to evaluate the obtained information and to decide on how to continue the data acquisition.
(33) In an embodiment, the method as described herein allows an image representation of said sample to be provided. Said image representation may contain said combined EELS spectrum or at least information thereof.
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(35) The obtained features result in a qualitative representation which is connected to characteristic properties such as structures, phases, or compositions. These features may not be the actual individual atomic elemental representations, but they serve to be quite inferential to aid an expert user in real time navigating or assessing the region of interest. The individual features can be combined, back-transformed as images (as shown in
(36) It is noted that the final image representation
(37) The images may be enhanced by the use of one or more image processing techniques. In particular, a denoising technique and/or a drift correction may be applied to the images or to the raw data.
(38) The desired protection is conferred by the appended claims.