MICROMECHANICAL OSCILLATION SYSTEM

Abstract

A micromechanical oscillation system. The micromechanical oscillation system has a micromechanical oscillating body having at least one micromirror. In addition, the micromechanical oscillation system includes an electromagnetic drive unit which has a coil body and at least one magnet. The coil body essentially extends laterally to the micromirror. The at least one magnet extends underneath the coil body.

Claims

1. A micromechanical oscillation system, comprising: a micromechanical oscillating body having at least one micromirror; and an electromagnetic drive unit including a coil body and at least one magnet, the coil body extending laterally to the micromirror, the coil body extending laterally in a top view in a direction of an axis of symmetry of the micromirror, and the at least one magnet extending underneath the coil body, the at least one magnet extending underneath in the top view in the direction of the axis of symmetry of the micromirror.

2. The micromechanical oscillation system as recited in claim 1, wherein the micromechanical oscillation system is a micromirror array.

3. The micromechanical oscillation system as recited in claim 1, wherein the coil body extends entirely laterally to the micromirror, the coil body extending entirely laterally in the top view in the direction of the axis of symmetry of the micromirror.

4. The micromechanical oscillation system as recited in claim 1, wherein the micromechanical oscillation system additionally includes a coil carrier for carrying the coil body, and the coil carrier extends in a shared first main extension plane with the micromirror.

5. The micromechanical oscillation system as recited claim 1, wherein the magnet is situated relative to the coil body in such a way that the coil body (is situated within a stray field of magnetic field lines of the magnet disposed perpendicular to a main field.

6. The micromechanical oscillation system as recited in claim 1, wherein the micromirror is a silicon component.

7. The micromechanical oscillation system as recited in claim 1, wherein the electromagnetic drive unit has at least two magnets, and the two magnets are situated at a distance from each other, and at least one first and one second magnetic flux guide for conducting the magnetic field lines in a direction of the coil body are situated between the two magnets.

8. The micromechanical oscillation system as recited in claim 7, wherein the magnet of the electromagnetic drive unit has a first magnetization direction and a second magnetization direction that runs counter to the first magnetization direction, and the micromechanical oscillation system additionally has at least one third magnetic flux guide for conducting the magnetic field lines in the direction of the coil body.

9. The micromechanical oscillation system as recited in claim 8, wherein the magnet (of the electromagnetic drive unit has a main magnetic field, and the magnetic field lines of the main magnetic field extend in parallel with a second main extension plane of the coil body, and the micromechanical oscillation system additionally includes at least one fourth and one fifth magnetic flux guide for conducting the magnetic field lines in the direction of the coil body.

10. A micro-projection device, comprising: a micromechanical oscillation system including: a micromechanical oscillating body having at least one micromirror; and an electromagnetic drive unit including a coil body and at least one magnet, the coil body extending laterally to the micromirror, the coil body extending laterally in a top view in a direction of an axis of symmetry of the micromirror, and the at least one magnet extending underneath the coil body, the at least one magnet extending underneath in the top view in the direction of the axis of symmetry of the micromirror.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0012] FIG. 1A shows a top view of a first embodiment of a micromechanical oscillation system, in accordance with the present invention.

[0013] FIG. 1B shows a cross-section of the first embodiment of the micromechanical oscillation system, in accordance with the present invention.

[0014] FIG. 2 shows a cross-section of a second embodiment of the micromechanical oscillation system, in accordance with the present invention.

[0015] FIG. 3 shows a cross-section of a third embodiment of the micromechanical oscillation system, in accordance with the present invention.

[0016] FIG. 4 schematically shows a micro-projection device provided with a micromechanical oscillation system, in accordance with an example embodiment of the present invention.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

[0017] FIG. 1A schematically shows a top view of a first embodiment of a micromechanical oscillation system 6a. The top view here denotes a view that runs in the direction of an axis of symmetry 9 or the center axis of micromirror 4. Micromechanical oscillation system 6a includes a micromechanical oscillating body 8 having micromirror 4. In addition, micromechanical oscillation system 6a has an electromagnetic drive unit whose coil body 30a, 30b together with supply line 30c is shown here. Coil body 30a and 30b extends completely laterally to micromirror 4 and thus frames it. The current direction within the coil body is indicated by arrows 7a and 7b.

[0018] Micromechanical oscillation system 6a furthermore includes a coil carrier 3 for carrying coil body 30a, 30b and its supply line 30c. Coil carrier 3 in turn is connected to micromirror 4 with the aid of two first springs 12a and 12b which extend in a straight line. The micromechanical oscillation system also includes two springs 2a and 2b that extend in a straight line and fasten micromechanical oscillating body 8 to a frame part 1a and 1b. Supply line 30c for the electrical contacting runs on a surface along second spring 2b. Springs 2a and 2b extending in a straight line may alternatively also be replaced by meandering spring forms in order to reduce the required space or to change frequency characteristics, for example.

[0019] In this embodiment, complete micromechanical oscillating body 8 having micromirror 4 is developed in one part as a silicon component.

[0020] FIG. 1b schematically shows the first embodiment of micromechanical oscillation system 6a in a cross-section along plane 14 in FIG. 1A. Here, a first magnet 50a and a second magnet 50b of the electromagnetic drive unit of micromechanical oscillation system 6a can be seen. The two magnets 50a and 50b extend underneath coil body 30a and 30b. The two magnets 40a and 50b are situated relative to coil body 30a and 30b in such a way that coil body 30a and 30b in essence is situated within a stray field 55a and 55b of magnetic field lines of respective magnet 50a and 50b which lies perpendicular to a main field. Magnets 50a and 50b are set apart from each other. A first magnetic flux guide 60a and a second magnetic flux guide 60b for conducting the magnetic field lines in the direction of coil body 30a and 30b are situated between magnets 50a and 50b. Magnetic flux guides 60a and 60b have a curved development and at least partially shield the respective magnet 50a and 50b from an external environment. In addition, magnetic flux guides 60a and 60b amplify the magnetic field in the coil region.

[0021] Coil carrier 3 extends in a shared first main extension plane 10a with micromirror 4. Coil body 30a and 30b attached to coil carrier 3 extends in a second main extension plane 10b in parallel with first main extension plane 10a. Magnets 50a and 50b in turn extend in a third main extension plane 10c which in turn is situated in parallel with first main extension plane 10a and second main extension plane 10b.

[0022] FIG. 2 shows a second embodiment of a micromechanical oscillation system 6b in a cross-section that extends along the same plane 14 as in FIG. 1B. In contrast to the first embodiment, only a single third magnet 50c is situated underneath coil body 30a and 30b. Third magnet 50c has a first magnetization direction 55c and a second magnetization direction 55d that runs counter to first magnetization direction 55c. In addition, micromechanical oscillation system 6b has a third, curved magnetic flux guide 60 for conducting the magnetic field lines in the direction of coil body 30a and 30b. Third magnetic flux guide 60c at least partially shields third magnet 50c from an external environment.

[0023] FIG. 3 shows a third embodiment of a micromechanical oscillation system 6c in a cross-section that extends along the same plane 14 as in FIG. 1B. Here, too, as in FIG. 2, only a single, fourth magnet 50d is situated underneath coil body 30a and 30b. Magnetic field lines 55e of the main magnetic field of the fourth magnet in essence extend in parallel with second main extension plane 10b of coil body 30a and 30b. Accordingly, fourth magnet 50d is situated at an angle, rotated by 180°, underneath coil body 30a and 30b. Micromechanical oscillation system 6c additionally has a fourth magnetic flux guide 60d and a fifth magnetic flux guide 60e for conducting magnetic field lines 55e in the direction of coil body 30a and 30b. Fourth magnetic flux guide 60d and fifth magnetic flux guide 60e lie flat against an outer side of fourth magnet 50d. In addition, micromechanical oscillation system 6c has a further, sixth magnetic flux guide 60f for conducting magnetic field lines 55e in the direction of coil body 30a and 30b. This sixth magnetic flux guide 60f rests flat against a topside of fourth magnet 50d.

[0024] FIG. 4 schematically shows by way of example a micro-projection device 220 provided with a micromirror array 200 as a micromechanical oscillation system. In addition to micromirror array 200, such a micro-projection device has a laser unit 190, which is designed to radiate light of at least one wavelength onto micromirror array 200. Micromirror array 200 in turn is designed to deflect the light of at least one wavelength onto a projection unit 210 as a function of a deflection of the micromirror of micromirror array 200.