METHOD FOR PRINTING SOLDER ONTO A WAFER AND SYSTEM THEREOF

Abstract

A method for printing solder onto a wafer (101) including the steps of depositing solder paste (102) onto a wafer (101), applying an inline reflow process to the deposited solder paste (102) to form solder bumps (103) on the wafer (101), and cleaning the reflowed solder bumps (103). The method for printing solder onto the wafer (101) is based on a system thereof that includes a wafer solder printer (1), an inline reflow means (2) and a de-fluxing means (3), wherein each step has its parameters optimized by means of a staging process control.

Claims

1. A method for printing solder onto a wafer, comprising the steps of: depositing solder paste onto the wafer, by a wafer solder printer; applying an inline reflow process to the deposited solder paste to form solder bumps on the wafer, by an inline reflow means; and cleaning the reflowed solder bumps, by a de-fluxing means; wherein each step has its parameters optimized by means of a staging process control.

2. The method according to claim 1, further comprising the step of inspecting the solder bumps.

3. The method according to claim 2, wherein the staging process control is employed to achieve a target yield of substantially 99% to 99.5% within a maximum operating time of substantially 7 hours.

4. The method according to claim 3, wherein the wafer solder printer deposits the solder paste at speed range from substantially 30 mm/s to 40 mm/s.

5. The method according to claim 4, wherein the wafer solder printer uses a squeegee for applying pressure ranging from substantially 6 kg to 8 kg onto the deposited solder paste.

6. The method according to claim 5, wherein the cleaning of the solder bumps is done using a de-fluxing means.

7. The method according to claim 6, wherein the wafer is loaded into the de-fluxing means at predetermined intervals during cleaning.

8. The method according to claim 7, wherein the de-fluxing means operates at a temperature range of substantially 50° C. to 120° C.

9. The method according to claim 8, wherein the solder bumps are inspected using a three-dimensional (3D) automated optical inspection (AOI) means and by X-ray means.

10. A system for printing solder onto a wafer, comprising: a wafer solder printer for depositing solder paste onto a wafer; an inline reflow means for applying an inline reflow process to the deposited solder paste to form solder bumps on the wafer; and a de-fluxing means for cleaning the solder bumps; wherein the system executes a method according to claim 1 with parameters that are optimized by means of a staging process control.

11. The system according to claim 10, wherein the staging process control is employed to achieve a target yield of substantially 99% to 99.5% within a maximum operating time of substantially 7 hours.

12. The system according to claim 11, wherein the solder bumps are inspected by means of a three-dimensional (3D) automated optical inspection (AOI) means and by X-ray means.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0021] For the purpose of facilitating an understanding of the invention, there is illustrated in the accompanying drawing the preferred embodiments from an inspection of which when considered in connection with the following description, the invention, its construction and operation and many of its advantages would be readily understood and appreciated.

[0022] FIG. 1 is a block diagram illustrating a method for printing solder onto a wafer.

[0023] FIG. 2 illustrates an exemplary embodiment of the method for printing solder onto the wafer.

[0024] FIG. 3 illustrates an exemplary embodiment of depositing solder paste onto the wafer.

DETAILED DESCRIPTION OF THE INVENTION

[0025] Hereinafter, the invention shall be described according to the preferred embodiments of the present invention and by referring to the accompanying description and drawings. However, it is to be understood that limiting the description to the preferred embodiments of the invention is merely to facilitate discussion of the present invention and it is envisioned that those skilled in the art may devise various modifications without departing from the scope of the appended claim.

[0026] The invention will now be described in greater detail, by way of example with reference to the drawings.

[0027] FIG. 1 is a block diagram illustrating a system for printing solder onto a wafer 101, the system comprising a wafer solder printer 1 configured to deposit solder paste 102 onto the wafer. Solder paste 102 is a mixture of minute solder spheres held within a specialised form of solder flux, the mixture having a texture of a paste. The object of the printer 1 is to accurately deposit a correct amount onto each pad on the wafer 101 to be soldered. This is achieved by screen-printing the solder paste 102, preferably through a stencil 103, but alternatively can also be applied by jet printing. The system further comprises an inline reflow means 2 for applying an inline reflow process on the deposited solder paste 102 to form solder bumps 104 on the wafer 101, wherein the inline reflow means 2 is preferably a reflow oven. The inline reflow process is a process in which the solder paste 102 is used to temporarily attach a plurality of miniscule electrical components to their contact pads, after which the entire assembly is subjected to controlled heat. The goal of the reflow process is for the solder paste 102 to reach a eutectic temperature at which the solder paste 102 undergoes a phase change to a liquid or molten state, wherein the molten solder paste demonstrates properties of adhesion, creating permanent solder joints between the electrical components and the wafer 101.

[0028] In a preferred embodiment, the system includes a de-flux means 3 for cleaning the solder bumps 104 formed during the inline reflow process. De-fluxing is a cleaning process designed to not only remove solder flux residue and by-products from the wafer 101, but also remove impurities such as solder balls, dirt, dust, organic materials, and other contaminants. Traces of flux material which remains on the wafer 101 after solder printing must be completely removed as these may cause permanent failure in circuitry through corrosion, absorption of water and other effects. Preferably, de-fluxing involves washing a surface of the wafer 101 with a solvent which is capable of dissolving the flux residue prior to having the wafer 101 being rinsed with water and dried.

[0029] Besides that, the system further includes a three-dimensional (3D) automated optical inspection (AOI) means 4 and an X-ray means 5 for inspecting the solder bumps 104 on the wafer 101 upon completion of the de-fluxing process. The 3D AOI means 4 operates to inspect and detect solder bump 104 detects which may include smears, coin, smashed solder bumps 104, insufficient solder volume, small or large solder bumps 104, oxidation, or the likes. The 3D AOI means 4 may further inspect and/or detect flux residue on surface of the solder bumps 104. In a particular embodiment, the X-ray means 5 may be able to inspect both small and large solder bumps 104 volumes, and also detect solder bump 104 voids which are substantially 25% of the individual solder bump 104 size. Further, the key parameters for each machine in the system will be discussed further herein with reference to FIG. 2.

[0030] FIG. 2 is a flow chart illustrating a method for printing solder onto the wafer 101 based on the above-mentioned system. Firstly, the wafer 101 is loaded into the wafer solder printer 1. At Step 201, a stencil is placed on top of the wafer 101 and solder paste 102 is subsequently printed onto said wafer 101 by using a squeegee 105, such as illustrated in FIG. 3. Preferably, the stencil 103 may be substantially 100 μm in diameter with a 175 μm pitch, and aperture spacing of substantially 25 μm to 75 μm in between each aperture. The squeegee 105 is a tool used to apply necessary force required to move the solder paste 102 across the stencil 103 and on to the wafer 101, in which the squeegee 105 may be made from metal and/or polyurethane. The solder printing process deposits the solder paste 102 onto the wafer 101 preferably at a print speed ranging from substantially 30 mm/s to 40 mm/s with the squeegee 105 blade applying a pressure at substantially 6 kg to 8 kg. During the print cycle, sufficient pressure across the entire length of the squeegee 105 is required to ensure a clean wipe of the stencil 103. Too little pressure can cause “smearing” of the solder paste 102 on the stencil 103, poor deposition, and an incomplete transfer to the wafer 101. Too much pressure can cause “scooping” of the solder paste 102 from larger apertures, excess wear on the stencil 103 and the squeegee 105, and may cause “bleeding” of the solder paste 102 between the stencil 103 and the wafer 101. Another key parameter to be noted is an angle of the squeegee 105 when applying the solder paste 102 onto the stencil 103 and wafer 101. The angle of the squeegee 103 is also preferably set to 60° by holders that the squeegee 105 is fixed to. If the angle is increased, it can cause “scooping” of the solder paste 102 from the stencil 103 apertures, causing less solder paste 102 to be deposited onto the wafer 101. However, if the angle is reduced, it can cause a residue of solder paste 102 to be left on the stencil 103 after the squeegee 105 has completed the print.

[0031] In a preferred embodiment, the solder printing process operates for a maximum of substantially 7 hours, wherein a staging process control with optimized parameters is employed within the 7 hours. Preferably, viscosity of the solder paste 102 is firstly checked so that said solder paste 102 do not cling onto the squeegee 105. Further, the solder paste 102 is kneaded onto the stencil 103 in a backward and forward motion until the solder paste 102 reaches a desired viscosity. Once the solder paste 102 has reached a desired viscosity, the printing process will commence by depositing the solder paste 102 into the apertures of the stencil 103 uniformly across the wafer 101. Within the substantially 7 hours of operation, consistency of the solder paste 102 may be examined to ensure performance of the printer 1 is at optimum efficiency.

[0032] At Step 202, the wafer 101 is then loaded into the inline reflow means 2 wherein the solder paste 102 residue on top of the wafer 101 are formed into solder bumps 104. The inline reflow system 2 comprises a plurality of reflow sections, preferably 9, with a control temperature of substantially 250° C. to fully cure the solder bumps 104. Preferably, the wafer 101 is heated at a predetermined rate to ensure that no defects such as components cracking or the solder paste 102 splattering during the reflow process. Further, oxygen levels in the inline reflow means 2 may also be controlled to operate at a minimum of substantially 75 parts per million (PPM) for a complete reflow cycle. Each solder bump 104 may have a bump height of substantially 45 μm to 55 μm, diameter ranging from substantially 90 μm to 110 μm, and a maximum solder bump 104 co-planarity of substantially 10 μm.

[0033] At Step 203, the wafer 101 is loaded into the de-fluxing means 3 for cleaning. In a preferred embodiment, the de-fluxing means 3 requires the wafer 101 to be loaded into said de-fluxing means 3 at predetermined intervals during the cleaning process. Once loaded in, active wafer 101 surfaces are required to be faced down during the cleaning, such that all flex residues or chemical substances on the active wafer 101 surfaces will be rinsed off with the help of gravity. Some of the characteristics/parameters of the cleaning process include a wash fixture turning speed of substantially 60 to 80 RPM for substantially 3 to 5 seconds, temperatures ranging from substantially 50° C. to 120° C., a wash cycle of at least substantially 25 to 60 cycles, a chemical concentration of substantially 13% to 20%; and a reservoir stirring time of substantially 800 to 1000 seconds with pre-heat temperature to promote chemical reaction in the reservoir and cleaning effectiveness on the wafer 101.

[0034] In another preferred embodiment, the dried wafer 101 is transferred to the 3D AOI means 4 and the X-ray means 5 for further inspection before being transferred to the next station in the production line. Particularly, the 3D AOI means 4 inspect several criteria which include Average Bump Height (ABH) performance from substantially 40 to 65 μm across the entire wafer 101, solder bump 104 defects detection and flux residue detection on the wafer 101 surface. The solder bump 104 defects may include smear, coin, smash, insufficient solder volume, small, large, and oxidation or the likes. However, the X-ray means 5 inspect criteria, such as solder bump 104 void, for up to substantially 25% of the solder bump 104 size, small and large solder bump 104 volume, and solder bump 104 traceability.

[0035] The present disclosure includes as contained in the appended claims, as well as that of the foregoing description. Although this invention has been described in its preferred form with a degree of particularly, it is understood that the present disclosure of the preferred form has been made only by way of example and that numerous changes in the details of construction and the combination and arrangements of parts may be resorted to without departing from the scope of the invention.