Method for preparing CsPbX3 perovskite quantum dot film by one-step crystallization
11306245 · 2022-04-19
Assignee
Inventors
- Yong DING (Beijing, CN)
- Cheng LIU (Beijing, CN)
- Songyuan Dai (Beijing, CN)
- Yi Yang (Beijing, CN)
- Xuepeng Liu (Beijing, CN)
- Molang Cai (Beijing, CN)
Cpc classification
C23C18/1204
CHEMISTRY; METALLURGY
B82Y20/00
PERFORMING OPERATIONS; TRANSPORTING
B82Y40/00
PERFORMING OPERATIONS; TRANSPORTING
C01G21/006
CHEMISTRY; METALLURGY
B82Y30/00
PERFORMING OPERATIONS; TRANSPORTING
C01P2004/64
CHEMISTRY; METALLURGY
International classification
C23C18/12
CHEMISTRY; METALLURGY
B82Y40/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The present disclosure provides a method for preparing a perovskite quantum dot film by one-step crystallization, and belongs to the field of perovskite quantum dot material technology. The present disclosure uses adamantanemethylamine and hydrohalic acid as ligands, first mixes a cesium halide, a lead halide, and the ligands with a solvent to obtain a precursor solution, then deposits the precursor solution on a substrate, and then heats the substrate to obtain the CsPbX.sub.3 perovskite quantum dot film. The present disclosure uses adamantanemethylamine and hydrohalic acid as the ligands, which can quickly coat the perovskite, complex with the CsPbX.sub.3 perovskite, and directly form the perovskite quantum dot via a strong steric effect. Further, the present disclosure is simple and inexpensive, can directly obtain a high-quality perovskite quantum dot film with a thickness of more than 500 nm by one-step crystallization.
Claims
1. A method for preparing a CsPbX.sub.3 perovskite quantum dot film by one-step crystallization, comprising: (1) mixing a cesium halide, a lead halide, and a ligand with a solvent to obtain a precursor solution; (2) depositing the precursor solution on a substrate, and then heating the substrate to obtain the CsPbX.sub.3 perovskite quantum dot film; X in the CsPbX.sub.3 being one or more of Cl, Br, or I; and the ligand being adamantanemethylamine and hydrohalic acid.
2. The method according to claim 1, wherein a molar ratio of adamantanemethylamine to hydrohalic acid in the ligand is 1:2-2:1.
3. The method according to claim 1, wherein the solvent in step (1) is one or more of N, N-dimethyl formamide, dimethyl sulfoxide, γ-butyrolactone, or N, N-dimethyl acetamide.
4. The method according to claim 1, wherein a molar ratio of the cesium halide to the lead halide to the ligand to the solvent in step (1) is (0.1-2) mol:(0.1-2) mol:(0.1-2) mol:1 mL.
5. The method according to claim 1, wherein the depositing approach in step (2) is spin coating, drop coating, scrape coating, spray coating, or printing.
6. The method according to claim 5, wherein when the depositing approach is the spin coating, the spin coating comprises a first stage and a second stage in sequence, the spin coating in the first stage is at a rate of 1000 rpm for a duration of 10 s, and at an acceleration of 500 rpm.Math.s.sup.−1 from rest to reaching the spin coating rate; and the spin coating in the second stage is at a rate of 2000 rpm for a duration of 20 s, and at an acceleration of 1000 rpm.Math.s.sup.−1 from the spin coating rate in the first stage to reaching the spin coating rate in the second stage.
7. The method according to claim 1, wherein the heating in step (2) is at a temperature of 60° C.-180° C. for a duration of 1-30 min.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DESCRIPTION OF THE EMBODIMENTS
(17) The present disclosure provides a method for preparing a CsPbX.sub.3 perovskite quantum dot film by one-step crystallization, including the following steps:
(18) (1) mixing a cesium halide, a lead halide, and a ligand with a solvent to obtain a precursor solution;
(19) (2) depositing the precursor solution on a substrate, and then heating the substrate to obtain the CsPbX.sub.3 perovskite quantum dot film;
(20) X in the CsPbX.sub.3 being one or more of Cl, Br, or I; and
(21) the ligand being adamantanemethylamine and hydrohalic acid.
(22) The present disclosure mixes the cesium halide, the lead halide, and the ligand with the solvent to obtain the precursor solution. In the present disclosure, the ligand is adamantanamethylamine and hydrohalic acid; and a molar ratio of adamantanemethylamine to hydrohalic acid is preferably 1:2-2:1, and more preferably 1:1. The present disclosure uses adamantanemethylamine and hydrohalic acid as a strong ligand system due to the synergistic effect thereof, which can quickly coat the perovskite, complex with the CsPbX.sub.3 perovskite, and directly form the perovskite quantum dot via a strong steric effect.
(23) In the present disclosure, the cesium halide is preferably one or more of CsCl, CsBr, or CsI; the lead halide is preferably one or more of PbCl.sub.2, PbBr.sub.2, or PbI.sub.2; and the solvent is preferably one or more of N, N-dimethyl formamide, dimethyl sulfoxide, γ-butyrolactone, or N, N-dimethyl acetamide. In the present disclosure, a molar ratio of the cesium halide to the lead halide to the ligand to the solvent is preferably (0.1-2) mol:(0.1-2) mol:(0.1-2) mol:1 mL, and more preferably 0.6 mol:0.6 mol:1.3 mol:1 mL. The present disclosure can effectively control the thickness of the obtained film by changing concentrations of the cesium halide, the lead halide, and the ligand in the precursor solution. The present disclosure does not provide special requirements for the mixing approach, and a mixing approach familiar to those skilled in the art may be used to uniformity mix the cesium halide, the lead halide, and the ligand with the solvent.
(24) After obtaining the precursor solution, the present disclosure deposits the precursor solution on the substrate, and then heating the substrate to obtain the CsPbX.sub.3 perovskite quantum dot film. In the present disclosure, the depositing approach is preferably spin coating, drop coating, scrape coating, spray coating, or printing, and more preferably spin coating. In the present disclosure, when the depositing approach is the spin coating, the spin coating preferably includes a first stage and a second stage in sequence, the spin coating in the first stage is preferably at a rate of 1000 rpm preferably for a duration of 10 s, and preferably at an acceleration of 500 rpm.Math.s.sup.−1 from rest to reaching the spin coating rate; and the spin coating in the second stage is preferably at a rate of 2000 rpm preferably for a duration of 20 s, and preferably at an acceleration of 1000 rpm.Math.s.sup.−1 from the spin coating rate in the first stage to reaching the spin coating rate in the second stage. The present disclosure begins to compute the spin coating duration after reaching the spin coating rate in the first stage and the spin coating rate in the second stage. The present disclosure does not provide special requirements for the substrate. A substrate material familiar to those skilled in the art may be used.
(25) In the present disclosure, the heating temperature is preferably 60-180° C., and more preferably 80-140° C.; and the heating duration is preferably 1-30 min, and more preferably 10-20 min. The present disclosure preferably heats the substrate on which the precursor solution is deposited on a heating stage. The present disclosure can remove the solvent in the precursor solution by heating; and make the cesium halide and the lead halide form a CsPbX.sub.3 perovskite quantum dot crystal by one-step deposition and heating, where the ligand can quickly coat the perovskite, complex with the CsPbX.sub.3 perovskite, and directly form the perovskite quantum dot via the strong steric effect.
(26) After completing the heating, the present disclosure preferably cools the film obtained after the heating to room temperature. The present disclosure does not provide special requirements for the cooling approach. A cooling approach familiar to those skilled in the art may be used, specifically for instance statically cooling.
(27) Compared with the conventional heat injection process or ligand-assisted reprecipitation process, the present disclosure directly omits synthesizing a colloidal quantum dot dispersion, whilst omitting solvent cleaning and multi-step film deposition in the conventional film formation process by spin coating of the colloidal quantum dot dispersion. The one-step crystallization of the present disclosure directly obtains a perovskite quantum dot film only by one-step deposition, heating, and crystallization of the precursor solution, and is simple with strong controllability. The product has high repetitive rate, and very low cost, and the resulting CsPbX.sub.3 perovskite quantum dot film has a thickness of more than 500 nm. Further, the present disclosure can control the particle size of the quantum dot by controlling the concentration, the heating temperature and duration of the precursor, thus changing the emission wavelength thereof.
(28) The method for preparing a CsPbX.sub.3 perovskite quantum dot film by one-step crystallization provided in the present disclosure will be described in detail below in combination with the examples, but the examples cannot be construed as limiting the scope of protection of the present disclosure.
Example 1
(29) (1) 0.6 mol of cesium iodide and lead iodide were fully dissolved in 1 mL of DMF, respectively, then 0.65 mol of adamantanemethylamine and 0.65 mol of hydroiodic acid were added respectively as a ligand, and then the solution was fully stirred for use as a precursor solution.
(30) (2) The precursor solution was dropped on a substrate, spin coated with a spin coater at 1000 rpm for 10 s, and then spin coated at 2000 rpm for 20 s (at an acceleration of 500 and 1000 rpm.Math.s.sup.−1 respectively). The spin coated precursor solution was divided into 7 groups. Each group was heated at a heating temperature of 60° C., 80° C., 100° C., 120° C., 140° C., 160° C., and 180° C. respectively for a heating duration of 3 min, and then cooled, to obtain a CsPbI.sub.3 perovskite quantum dot film respectively.
(31) Scanning electron microscopic analysis results of surface of the CsPbI.sub.3 perovsakite quantum dot film at the heating temperature of 100° C. are shown in
(32) Scanning electron microscopic analysis results of a section of the CsPbI.sub.3 perovskite quantum dot film at the heating temperature of 100° C. are shown in
(33) Fluorescent photos of the CsPbI.sub.3 perovakite quantum dot films prepared at different heating temperatures under UV irradiation are shown in
(34) UV-visible-near IR absorption spectra of the CsPbI.sub.3 perovskite quantum dot film prepared at different heating temperatures are shown in
(35) Photoluminescence spectra of the CsPbI.sub.3 perovskite quantum dot film prepared at different heating temperatures are shown in
(36) Transmission electron microscopic analysis results of the CsPbI.sub.3 perovskite quantum dot film at the heating temperature of 100° C. after peeling and dispersion are shown in
(37) Humidity aging of the CsPbI.sub.3 perovskite quantum dot film at the heating temperature of 100° C. was tested under a test condition of humidity (humidity≈40%) aging in 30 days, and the results are shown in
Example 2
(38) (1) 0.5 mol of cesium iodide and lead iodide were fully dissolved in 1 mL of DMSO respectively, then 0.65 mol of adamantanmethylamine and 0.65 mol of hydrobromic acid were added respectively as a ligand, and then the solution was fully stirred for use as a precursor solution.
(39) (2) The precursor solution was dropped on a substrate, spin coated with a spin coater at 1000 rpm for 10 s, and then spin coated at 2000 rpm for 20 s (at an acceleration of 500 and 1000 rpm.Math.s.sup.−1 respectively). The spin coated precursor solution was divided into 6 groups. Each group was heated at a heating temperature of 60° C., 80° C., 100° C., 120° C., 140° C., and 160° C. respectively for a heating duration of 3 min, and then cooled, to obtain a CsPbBr.sub.3 perovskite quantum dot film.
(40) Fluorescent photos of the CsPbBr.sub.3 perovskite quantum dot film prepared at different heating temperatures are shown in
(41) A UV-visible-near IR absorption spectrum of the CsPbBr.sub.3 perovskite quantum dot film at the heating temperature of 120° C. is shown in
(42) A photoluminescence spectrum of the CsPbBr.sub.3 perovskite quantum dot film at the heating temperature of 120° C. is shown in
(43) Transmission electron microscopic analysis results of the CsPbBr.sub.3 perovakite quantum dot film at 120° C. after peeling and dispersion are shown in
Example 3
(44) (1) 0.2 mol of cesium chloride and lead chloride were fully dissolved in 1 mL of DMF respectively, then 0.65 M of adamantanemethylamine and 0.65 M of hydrochloric acid were added respectively as a ligand, and then the solution was fully stirred for use as a precursor solution.
(45) (2) The precursor solution was dropped on a substrate, spin coated with a spin coater at 1000 rpm for 10 s, and then spin coated at 2000 rpm for 20 s (at an acceleration of 500 and 1000 rpm.Math.s.sup.−1 respectively). The precursor solution was crystallized at a heating and temperature of 140° C. for a heating duration of 3 min, and then cooled, to obtain a CsPbCl.sub.3 perovskite quantum dot film.
(46) The resulting CsPbCl.sub.3 perovakite quantum dot film was scraped into powder, and formulated into a chlorobenzene dispersion at a mass concentration of 5 mg/mL. A photo of fluorescence emitted from the resulting dispersion under UV irradiation is shown in
(47) A UV-visible-near IR absorption spectrum of the resulting CsPbCl.sub.3 perovskite quantum dot film is shown in
(48) A photoluminescence spectrum of the resulting CsPbCl.sub.3 perovskite quantum dot film is shown in
(49) Transmission electron microscopic analysis results of the CsPbCl.sub.3 perovskite quantum dot film after peeling and dispersion are shown in
Comparison Example 1
(50) The ligands in Example 1 were replaced with oleylamine, octylamine, or 4-phenyl butylamine respectively, while other components remained unchanged, to obtain a precursor solution. The precursor solution was spin coated on a substrate by a similar approach, heated at 100° C. for 3 min, and then cooled to obtain perovskite quantum dot films of different ligands respectively.
(51) Thickness analysis results of a section of the above perovskite quantum dot film and a section of the perovskite quantum dot film in Example 1 with a step profiler are shown in
(52) As can be seen from the above examples, the method for preparing a CsPbX.sub.3 perovskite quantum dot film by one-step crystallization provided in the present disclosure involves simple operations, and can obtain a high-quality perovskite quantum dot film with a thickness of more than 500 nm by one-step deposition and direct crystallization. The resulting perovskite quantum dot film is characterized by good fluorescence properties, uniform crystal grain distribution, and good stability.
(53) The above description only provides preferred embodiments of the present disclosure. It should be noted that those of ordinary skills in the art may further make a number of improvements and modifications without departing from the principle of the present disclosure, and such improvements and modifications should also be regarded as falling within the scope of protection of the present disclosure.