Multi-super lattice for switchable arrays
11309388 · 2022-04-19
Assignee
Inventors
- Benjamin Stassen Cook (Addison, TX, US)
- Luigi Colombo (Dallas, TX)
- Nazila Dadvand (Richardson, TX, US)
- Archana Venugopal (Dallas, TX, US)
Cpc classification
H01L27/098
ELECTRICITY
H01L29/775
ELECTRICITY
H01L29/66439
ELECTRICITY
B82Y10/00
PERFORMING OPERATIONS; TRANSPORTING
B82Y40/00
PERFORMING OPERATIONS; TRANSPORTING
H01L21/8256
ELECTRICITY
International classification
H01L29/15
ELECTRICITY
H01L29/423
ELECTRICITY
H01L29/66
ELECTRICITY
Abstract
A switchable array includes: a microstructure of interconnected units formed of graphene tubes with open spaces in the microstructure bounded by the graphene tubes; at least one JFET gate in at least one of the graphene tubes; and a control line having an end connected to the at least one JFET gate. The control line extends to a periphery of the microstructure.
Claims
1. A switchable array comprising: a microstructure of interconnected units formed of graphene tubes with open spaces in the microstructure bounded by the graphene tubes; at least one field-effect transistor (FET) gate in at least one of the graphene tubes; and a control line having an end connected to the at least one FET gate, the control line extending to a periphery of the microstructure.
2. The switchable array of claim 1, wherein the graphene tubes are arranged in an ordered structure and form symmetric patterns that repeat along principal directions of three-dimensional space.
3. The switchable array of claim 1, wherein the graphene tubes form a rigid structure.
4. The switchable array of claim 1, wherein the microstructure forms a micro-lattice.
5. The switchable array of claim 1, wherein the graphene tubes are hollow.
6. The switchable array of claim 1, wherein the graphene tubes are interconnected by chemical electronic bonds.
7. The switchable array of claim 1, wherein the control line passes through at least one open space bounded by the microstructure.
8. The switchable array of claim 7, wherein the control line passes through open spaces bounded by the microstructure.
9. The switchable array of claim 1, wherein the control line comprises a polymer plated with an electrically conductive metal.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
(16) An organic/inorganic superstructure may be used as a template for the formation of a 3D metal superstructure that may then be used to grow graphitic carbon on the surface of the metal. The template may be fabricated through a self-propagating photopolymer waveguide technique (see, e.g., Xiaoyu Zheng et. al., Ultralight, Ultrastiff Mechanical Metamaterials; Science 344 (2014) 1373-1377 and T. A. Schaedler, et al., Ultralight Metallic Micro-lattices; Science 334 (2011) 962-965). As illustrated schematically in
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(18) This description describes a “periodically structured” carbon nanostructure. Conventional carbon nanostructures are irregular and have much larger dimensions than those which may be achieved using the methodology disclosed herein.
(19) The process herein is useful to create a regular array with superstructure dimensions (unit) and structure that may be optimized for strength, thermal and other fundamental properties.
(20) Several aspects of this procedure are noteworthy: it provides a regular structure with specific defined dimensions; it can form very thin metal (e.g. Ni, Co, Ru, Cu, Ag, Au, and alloys thereof) micro-lattices; it enables the formation of graphitic carbon on very thin metals and thin metal wires or tubes.
(21) The process herein uses a polymeric structure as a template for such fabrication with the subsequent formation of a metal superstructure that may then be exposed to a hydrocarbon (e.g. methane, ethylene, acetylene, benzene) to form graphene, followed by etching of the metal from under the resulting graphene microstructure using appropriate etchants such as, for example, FeCl.sub.3 or potassium permanganate.
(22) Collimated UV light 12 through a photomask 14 or multi-photon lithography may be used in a photo-initiated polymerization process to produce a polymer micro-lattice 18 including interconnected units. Example polymers include polystyrene and poly(methyl methacrylate) (PMMA). Once polymerized in the desired pattern, the remaining un-polymerized monomer may be removed.
(23) The polymer structure (polymer scaffold) may then be plated with a suitable metal using an electroless plating process.
(24) Electroless nickel plating (EN) is an auto-catalytic chemical technique that may be used to deposit a layer of nickel-phosphorus or nickel-boron alloy on a solid workpiece, such as metal, plastic, or ceramic. The process relies on the presence of a reducing agent, for example hydrated sodium hypophosphite (NaPO.sub.2H.sub.2.H.sub.2O) which reacts with the metal ions to deposit the metal. Alloys with different percentages of phosphorus, ranging from 2-5 weight percent (low phosphorus) to up to 11-14 weight percent (high phosphorus) are possible. The metallurgical properties of the alloys depend on the percentage of phosphorus.
(25) Electroless plating has several advantages over electroplating. Free from flux-density and power supply issues, it provides an even deposit regardless of workpiece geometry, and with the proper pre-plate catalyst, may be used to deposit metals on non-conductive surfaces. In contrast, electroplating can only be performed on electrically conductive substrates.
(26) Before performing electroless plating, the material to be plated must be cleaned by a series of chemicals; this is known as a pre-treatment process. Failure to remove surface contaminants may result in poor plating. Each chemical pre-treatment must be followed by water rinsing (normally two to three times) to remove residual chemicals that may adhere to the surface. For example, de-greasing chemicals can be used to remove oils from surfaces, whereas acid cleaning is used to remove metal oxides.
(27) Activation may be done with an immersion into a sensitizer/activator solution—for example, a mixture of palladium chloride, tin chloride, and hydrochloric acid.
(28) The pre-treatment required for the deposition of metals on a non-conductive surface usually consists of an initial surface treatment to render the substrate hydrophilic. Following this initial step, the surface may be activated by a solution of a noble metal, e.g., palladium chloride. The substrate is then ready for electroless deposition.
(29) The electroless plating reaction is accomplished when hydrogen is released by a reducing agent, normally sodium hypophosphite (with the hydrogen leaving as a hydride ion) or thiourea, and oxidized, thus producing a negative charge on the surface of the part. The most common electroless plating method is electroless nickel plating, although silver, gold and copper layers can also be applied in this manner.
(30) In principle, any hydrogen-based reducing agent can be used although the redox potential of the reducing half-cell must be high enough to overcome the energy barriers inherent in liquid chemistry. Electroless nickel plating most often employs hypophosphite as the reducer while plating of other metals like silver, gold and copper typically makes use of low-molecular-weight aldehydes.
(31) A benefit of this approach is that the technique can be used to plate diverse shapes and types of surfaces.
(32) As illustrated in
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(34) In an example, the growth of graphene on the metal tubes may be omitted in order to produce a microlattice of interconnected metal tubes. A process for forming such a metal microstructure may include: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer micro-lattice; removing unpolymerized monomer; coating the polymer micro-lattice with a metal; and removing the polymer micro-lattice to leave a micro-lattice of interconnected metal tubes in a pattern of interconnected units.
(35) In another example, a metal/graphene microstructure of graphene-coated metal tubes in a pattern of interconnected units which may be prepared by the process including steps of: photo-initiating the polymerization of a monomer in a pattern of interconnected units to form a polymer micro-lattice; removing unpolymerized monomer; coating the polymer micro-lattice with a metal; removing the polymer micro-lattice to leave a metal micro-lattice; and forming graphene on the metal micro-lattice.
(36) As illustrated in
(37) Various methods are known to introduce a bandgap into graphene—e.g. by fabricating graphene in specific shapes (like ribbons), or by forming bi-layers of graphene. Further, other 2D materials such as transition metal dichalcogenides, boron-carbon-nitride, or graphene-oxide, -hydride or—fluoride, can form films with a bandgap, and thus can be used instead of or together with graphene.
(38) Referring to
(39) The following reference numbers are used in the drawings: 10 CAD design model 12 collimated UV light 14 digital mask 16 photomonomer 18 organic polymer template 20 electroless plating on template 22 removal of template 24 applications 26 fillers for polymer matrix application 28 template to grow carbon nanotubes and graphene application 30 graphene or metallic network 32 organic or inorganic polymer 34 composite 36 metallic template 38 hydroxylated metal surface 100 graphene/cnt superlattice 102 interconnected lattice members 104 polymer surrounding connections 106 dielectric and metal coating (on 102) 108 central void 110 graphene 112 insulator 114 metal 116 gate 118 external gate contact 120 polymer surrounding gate 122 metal 124 external surface of superlattice 126 connection 128 opening in lattice 130 gate 132 gate connector
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(48) Modifications are possible in the described embodiments, and other embodiments are possible, within the scope of the claims.