Abstract
An enhanced light diffusion film structure includes a first substrate, a second substrate, a first light guide diffusion layer and a second light guide diffusion layer. The first light guide diffusion layer includes a first light guide diffusion material having a first degree of light guide diffusion to guide and diffuse incident light exited by the first substrate to form first-stage guided and diffused light. The second light guide diffusion layer includes a second light guide diffusion material having a second degree of light guide diffusion to further guide and diffuse the first-stage guided and diffused light exited by the first light guide diffusion layer to form second-stage guided and diffused light. The first degree of light guide diffusion of the first light guide diffusion material is relatively higher or lower than the second degree of light guide diffusion of the second light guide diffusion material.
Claims
1. An enhanced light diffusion film structure comprising: a first substrate having a first surface and a second surface; a first light guide diffusion layer having a first surface and a second surface and provided on the second surface of the first substrate, with the first light guide diffusion layer including a first light guide diffusion material, with the first light guide diffusion material having a first degree of light guide diffusion to guide and diffuse incident light exited by the second surface of the first substrate to form first-stage guided and diffused light; a second substrate having a first surface and a second surface; and a second light guide diffusion layer having a first surface and a second surface and provided on the first surface of the second substrate, with the second light guide diffusion layer including a second light guide diffusion material, with the second light guide diffusion material having a second degree of light guide diffusion to further guide and diffuse the first-stage guided and diffused light exited by the second surface of the first light guide diffusion layer to form second-stage guided and diffused light; wherein the first degree of light guide diffusion of the first light guide diffusion material of the first light guide diffusion layer made of a first QD material or first phosphors is relatively higher than the second degree of light guide diffusion of the second light guide diffusion material of the second light guide diffusion layer made of a second QD material or second phosphors so as to enhance light diffusion effect and to reduce a total thickness of the first and second light guide diffusion layers.
2. The structure as defined in claim 1, wherein the first light guide diffusion layer and the second light guide diffusion layer are combined to form a single light guide diffusion layer having a various degree of light guide decreasing diffusion to form two-stage guided and diffused light.
3. The structure as defined in claim 1, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles.
4. The structure as defined in claim 1, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles, with the light diffusion particle layer is made of a third light guide diffusion material.
5. The structure as defined in claim 1, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles made of a fourth light guide diffusion material.
6. The structure as defined in claim 1, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles, with the light diffusion particle layer is made of a third light guide diffusion material, with the a plurality of light diffusion particles is made of a fourth light guide diffusion material.
7. The structure as defined in claim 6, wherein a third degree of light guide diffusion of the third light guide diffusion material is relatively lower than a fourth degree of light guide diffusion of the fourth light guide diffusion material.
8. The structure as defined in claim 1, wherein a thin light guide diffusion layer is further provided between the first light guide diffusion layer and the second light guide diffusion layer to form multiple light guide diffusion layers having a various degree of light guide diffusion to form multi-stage guided and diffused light.
9. The structure as defined in claim 1, wherein a protective layer is attached to the second surface of the second surface.
10. The structure as defined in claim 1, wherein the first phosphors or the second phosphors include a compound having a perovskite structure ABX3, where A includes Cs, Rb, Na, K, combinations thereof or an alkyl amine having at most 5 carbon atoms; B includes Pb, Sn, Ge, Sb, Bi or combinations thereof; X includes chloride, bromide, iodide, cyanide, thiocyanate, isothicyanate, sulfide or combinations thereof.
11. An enhanced light diffusion film structure comprising: a first substrate having a first surface and a second surface; a first light guide diffusion layer having a first surface and a second surface and provided on the second surface of the first substrate, with the first light guide diffusion layer including a first light guide diffusion material, with the first light guide diffusion material having a first degree of light guide diffusion to guide and diffuse incident light exited by the second surface of the first substrate to form first-stage guided and diffused light; a second substrate having a first surface and a second surface; and a second light guide diffusion layer having a first surface and a second surface and provided on the first surface of the second substrate, with the second light guide diffusion layer including a second light guide diffusion material, with the second light guide diffusion material having a second degree of light guide diffusion to further guide and diffuse the first-stage guided and diffused light exited by the second surface of the first light guide diffusion layer to form second-stage guided and diffused light; wherein the first degree of light guide diffusion of the first light guide diffusion material of the first light guide diffusion layer made of a first QD material or first phosphors is relatively lower than the second degree of light guide diffusion of the second light guide diffusion material of the second light guide diffusion layer made of a second QD material or second phosphors so as to enhance light diffusion effect and to reduce a total thickness of the first and second light guide diffusion layers.
12. The structure as defined in claim 11, wherein the first light guide diffusion layer and the second light guide diffusion layer are combined to form a single light guide diffusion layer having a various degree of light guide increasing diffusion to form two-stage guided and diffused light.
13. The structure as defined in claim 11, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles.
14. The structure as defined in claim 11, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles, with the light diffusion particle layer is made of a third light guide diffusion material.
15. The structure as defined in claim 11, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles made of a fourth light guide diffusion material.
16. The structure as defined in claim 11, wherein the first surface of the first substrate is provided with a light diffusion particle layer, including a plurality of light diffusion particles, with the light diffusion particle layer is made of a third light guide diffusion material, with the a plurality of light diffusion particles is made of a fourth light guide diffusion material.
17. The structure as defined in claim 16, wherein a third degree of light guide diffusion of the third light guide diffusion material is relatively lower than a fourth degree of light guide diffusion of the fourth light guide diffusion material.
18. The structure as defined in claim 11, wherein a thin light guide diffusion layer is further provided between the first light guide diffusion layer and the second light guide diffusion layer to form multiple light guide diffusion layers having a various degree of light guide diffusion to form multi-stage guided and diffused light.
19. The structure as defined in claim 11, wherein a protective layer is attached to the second surface of the second surface.
20. The structure as defined in claim 11, wherein first phosphors or the second phosphors include a compound having a perovskite structure ABX3, where A includes Cs, Rb, Na, K, combinations thereof or an alkyl amine having at most 5 carbon atoms; B includes Pb, Sn, Ge, Sb, Bi or combinations thereof; X includes chloride, bromide, iodide, cyanide, thiocyanate, isothicyanate, sulfide or combinations thereof.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The present invention will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only, and thus are not limitative of the present invention, and wherein:
(2) FIG. 1 is a schematic view of an enhanced light diffusion film structure in accordance with a first preferred embodiment of the present invention.
(3) FIG. 1A is a schematic view of an enhanced light diffusion film structure in accordance with another preferred embodiment of the present invention.
(4) FIG. 2 is a schematic view of an enhanced light diffusion film structure in accordance with a second preferred embodiment of the present invention.
(5) FIG. 3 is a schematic view of an enhanced light diffusion film structure in accordance with a third preferred embodiment of the present invention.
(6) FIG. 4 is a schematic view of an enhanced light diffusion film structure in accordance with a fourth preferred embodiment of the present invention.
(7) FIG. 5 is a schematic view of an enhanced light diffusion film structure in accordance with a fifth preferred embodiment of the present invention.
(8) FIGS. 6-1 and 6-2 are a set of chemical structure views of trimethoxysilylpropyl materials applied in a phosphor stabilizer in accordance with a preferred embodiment of the present invention.
(9) FIGS. 7-1 to 7-50 are a set of chemical structure views of various epoxy materials applied in the phosphor stabilizer in accordance with the preferred embodiment of the present invention.
(10) FIG. 8 is a flow chart of a manufacturing method of the phosphor stabilizer in accordance with a preferred embodiment of the present invention.
(11) FIG. 8A is a flow chart of a manufacturing method of the phosphor stabilizer in accordance with another preferred embodiment of the present invention.
(12) FIG. 9 is a chart illustrating wavelengths in relation to luminous intensities of a phosphor in accordance with a preferred embodiment of the present invention.
DETAILED DESCRIPTION OF THE INVENTION
(13) It is noted that an enhanced light diffusion film structure in accordance with the preferred embodiment of the present invention can be applicable to various phosphor materials (or fluorescent materials) and devices thereof. The enhanced light diffusion film structure in accordance with the preferred embodiment of the present invention can be applicable to displays or other technical field, which are not limitative of the present invention.
(14) FIG. 1 shows a schematic view of an enhanced light diffusion film structure in accordance with a first preferred embodiment of the present invention. Referring now to FIG. 1, the enhanced light diffusion film structure 1A in accordance with the first preferred embodiment of the present invention includes a first substrate 10a, a second substrate 10b, a first light guide diffusion layer 20a, a second light guide diffusion layer 20b, a light diffusion particle layer 3a and a protective layer 9. The first substrate 10a has a first surface (as best shown at an upper side) and a second surface (as best shown at a lower side) while the second substrate 10b has a first surface (as best shown at an upper side) and a second surface (as best shown at a lower side).
(15) With continued reference to FIG. 1, by way of example, the first light guide diffusion layer 20a has a first surface (as best shown at an upper side) and a second surface (as best shown at a lower side) while the second light guide diffusion layer 20b has a first surface (as best shown at an upper side) and a second surface (as best shown at a lower side). The first light guide diffusion layer 20a is provided on the second surface of the first substrate 10a while the second light guide diffusion layer 20b is provided on the first surface of the second substrate 10b.
(16) With continued reference to FIG. 1, by way of example, the first light guide diffusion layer 20a includes a first light guide diffusion material 5a which has a first (relatively higher or lower) degree of light guide diffusion to guide and diffuse incident light exited by the second surface of the first substrate 10a to form first-stage guided and diffused light. Correspondingly, the second light guide diffusion layer 20b includes a second light guide diffusion material 5b which has a second (relatively lower or higher) degree of light guide diffusion to further guide and diffuse the first-stage guided and diffused light exited by the second surface of the first light guide diffusion layer 20a to form second-stage guided and diffused light. Preferably, the first degree of light guide diffusion of the first light guide diffusion material 5a of the first light guide diffusion layer 20a is relatively lower than the second degree of light guide diffusion of the second light guide diffusion material 5b of the second light guide diffusion layer 20b so as to enhance light diffusion effect and to reduce a total thickness of the first and second light guide diffusion layers 20a, 20b.
(17) In a preferred embodiment, the first light guide diffusion material 5a and the second light guide diffusion material 5b contain a predetermined amount of phosphor materials or QD materials (i.e. dispersion carrier of phosphor or QD material). The phosphor materials or QD materials of first light guide diffusion material 5a to second light guide diffusion material 5b has a predetermined ratio A:B (e.g., 1:3 or 3:1).
(18) With continued reference to FIG. 1, by way of example, the light diffusion particle layer 3a is provided on the first surface of the first substrate 10a for preliminary diffusion of incident light. The light diffusion particle layer 3a includes a plurality of light diffusion particles 30 deployed therein. The protective layer 9 is further attached to the second surface of the second surface 10b and is made from a degree of hardness materials so as to protect the second surface of the second surface 10b or the enhanced light diffusion film structure.
(19) FIG. 1A shows a schematic view of an enhanced light diffusion film structure in accordance with another preferred embodiment of the present invention. Referring to FIG. 1A, the enhanced light diffusion film structure 1A in accordance with the preferred embodiment of the present invention has the first degree of light guide diffusion of the first light guide diffusion material 5a of the first light guide diffusion layer 20a relatively higher than the second degree of light guide diffusion of the second light guide diffusion material 5b of the second light guide diffusion layer 20b so as to provide higher light diffusion effect and to reduce a total thickness of the first light guide diffusion layer 20a and the second light guide diffusion layer 20b.
(20) Referring again to FIGS. 1 and 1A, in a preferred embodiment, the light diffusion particle layer 3a and the protective layer 9 of the enhanced light diffusion film structure 1A are made of same materials, similar materials or dissimilar materials, including hardness protection materials or light diffusion materials.
(21) FIG. 2 shows a schematic view of an enhanced light diffusion film structure in accordance with a second preferred embodiment of the present invention. Referring to FIGS. 1, 1A and 2, in comparison with the first embodiment, the enhanced light diffusion film structure 1B in accordance with the second preferred embodiment of the present invention includes the first light guide diffusion layer 20a (as best shown in FIGS. 1 and 1A) and the second light guide diffusion layer 20b (as best shown in FIGS. 1 and 1A) combined to form a single light guide diffusion layer 20 to minimize a total thickness of the first and second light guide diffusion layers 20a, 20b between which existing a light guide diffusion transition layer (dotted line). However, the single light guide diffusion layer 20 has a various degree of light guide increasing or decreasing diffusion (lower-to-higher diffusion or higher-to-lower diffusion) to form two-stage guided and diffused light.
(22) FIG. 3 shows a schematic view of an enhanced light diffusion film structure in accordance with a third preferred embodiment of the present invention. Referring to FIGS. 1, 1A and 3, in comparison with the first embodiment, the enhanced light diffusion film structure 1C in accordance with the third preferred embodiment of the present invention includes the first surface of the first substrate 10a provided with a light diffusion particle layer 3a, including a plurality of light diffusion particles 30, with the light diffusion particle layer made of a third light guide diffusion material 5. FIG. 4 shows a schematic view of an enhanced light diffusion film structure in accordance with a fourth preferred embodiment of the present invention. Referring to FIGS. 2 and 4, in comparison with the second embodiment, the enhanced light diffusion film structure 1D in accordance with the fourth preferred embodiment of the present invention includes a thin light guide diffusion layer 21 (dotted lines) further provided between the first light guide diffusion layer 20a and the second light guide diffusion layer 20b to form multiple light guide diffusion layers having a various degree of light guide diffusion to form multi-stage guided and diffused light. Further, the light diffusion particles 30 are made of a fourth light guide diffusion material 50 for enhancing preliminary diffusion of incident light.
(23) FIG. 5 shows a schematic view of an enhanced light diffusion film structure in accordance with a fifth preferred embodiment of the present invention. Referring to FIGS. 3, 4 and 5, in comparison with the third and fourth embodiments, the enhanced light diffusion film structure 1E in accordance with the fifth preferred embodiment of the present invention includes the light diffusion particle layer 3a made of a third light guide diffusion material 5 and the a plurality of light diffusion particles 30 made of a fourth light guide diffusion material 50. In a preferred embodiment, a third degree of light guide diffusion of the third light guide diffusion material 5 is relatively lower than a fourth degree of light guide diffusion of the fourth light guide diffusion material 50.
(24) In a preferred embodiment, the third light guide diffusion material 5 and the fourth light guide diffusion material 50 also contain a predetermined amount of phosphor materials or QD materials (i.e. dispersion carrier of phosphor or QD material). The phosphor materials or QD materials of third light guide diffusion material 5 to the fourth light guide diffusion material 50 has a predetermined ratio A1:B1 (e.g., 1:3 or 3:1).
(25) As is described in greater detail below, a phosphor stabilizer and manufacturing method thereof in accordance with the preferred embodiment of the present invention can be applicable to various phosphor materials (or fluorescent materials) and devices thereof. The phosphor stabilizer in accordance with the preferred embodiment of the present invention can be used as a stabilizer, an absorbent or a dispersion carrier for phosphors or are applicable to phosphorescent materials, displays, optoelectronics, biomedical engineering or other technical field, which are not limitative of the present invention.
(26) By way of example, the phosphor stabilizer includes at least one trimethoxysilylpropyl-modified polyethylenimine material and at least one epoxy material. The trimethoxysilylpropyl-modified polyethylenimine material is provided with a first predetermined amount while the epoxy material is provided with a second predetermined amount. In combination reaction, the first predetermined amount of the trimethoxysilylpropyl-modified polyethylenimine material reacts with the second predetermined amount of the epoxy material to form a reactant. The reactant is used as a dispersion carrier which can further react with a phosphor or a QD material for enhancing a degree of luminous stability and thermal stability thereof.
(27) Furthermore, the phosphor stabilizer of the present invention can be used as a stabilizer or an absorbent to stabilize the phosphor or the QD material, or as a surface stabilizer to coat or to displace a surface of the phosphor or the QD material. By way of example, the phosphor includes compounds of AgINS.sub.2 and CuINS.sub.2 in groups I-VI; compounds of CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe in groups II-VI; compounds of GaN, GaP, GaAs, GaSb, AN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs and InAlPSb in groups III-V; compounds of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe in groups IV-VI; compounds of Si, Ge, SiC and SiGe in group IV.
(28) FIGS. 6-1 and 6-2 show a set of chemical structure views of the trimethoxysilylpropyl materials suitably applied in the phosphor stabilizer in accordance with a preferred embodiment of the present invention. Referring now to FIGS. 6-1 and 6-2, the phosphor stabilizer in accordance with the preferred embodiment of the present invention can utilize the trimethoxysilylpropyl-modified polyethylenimine material having a functional group for modifying and bonding polyethylenimine is a free radical of the trimethoxysilylpropyl material. For example, the trimethoxysilylpropyl material can be selected from C.sub.6H.sub.15O.sub.3Si (as shown in FIG. 6-1) or C.sub.6H.sub.17O.sub.3NSi (as shown in FIG. 6-2).
(29) FIGS. 7-1 to 7-50 show a set of chemical structure views of various epoxy materials suitably applied in the phosphor stabilizer in accordance with the preferred embodiment of the present invention. Referring to FIGS. 7-1 to 7-50, the phosphor stabilizer in accordance with the preferred embodiment of the present invention can utilize the epoxy materials for reacting with the trimethoxysilylpropyl-modified polyethylenimine material. By way of example, the epoxy material can be selected from C.sub.13H.sub.16O.sub.4 (as shown in FIG. 7-1), C.sub.9H.sub.10O.sub.2 (as shown in FIG. 7-2), C.sub.10H.sub.12O.sub.2 (as shown in FIG. 7-3), C.sub.12H.sub.16O.sub.2 (as shown in FIG. 7-4), C.sub.11H.sub.14O.sub.2 (as shown in FIG. 7-5), C.sub.9H.sub.10O (as shown in FIG. 7-6), C.sub.12H.sub.16O.sub.3 (as shown in FIG. 7-7), C.sub.12H.sub.14O.sub.4 (as shown in FIG. 7-8), C.sub.10H.sub.12O.sub.3 (as shown in FIGS. 7-9 and 7-10), C.sub.18H.sub.28O.sub.2 (as shown in FIG. 7-11), C.sub.11H.sub.14O.sub.3 (as shown in FIG. 7-12), C.sub.9H.sub.10O (as shown in FIG. 7-13), C.sub.11H.sub.12O.sub.3 (as shown in FIG. 7-14), C.sub.9H.sub.9O.sub.2F (as shown in FIG. 7-15), C.sub.10H.sub.12O.sub.2 (as shown in FIG. 7-16), C.sub.15H.sub.14O.sub.2 (as shown in FIG. 7-17), C.sub.11H.sub.14O.sub.3 (as shown in FIG. 7-18), C.sub.9H.sub.10O.sub.2 (as shown in FIG. 7-19), C.sub.14H.sub.16O.sub.3N.sub.2 (as shown in FIG. 7-20), C.sub.12H.sub.14O.sub.3 (as shown in FIG. 7-21), C.sub.9H.sub.9O.sub.3N (as shown in FIG. 7-22), C.sub.18H.sub.18O.sub.3 (as shown in FIG. 7-23), C.sub.15H.sub.13O.sub.2N (as shown in FIG. 7-24), C.sub.13H.sub.12O.sub.2 (as shown in FIG. 7-25), C.sub.19H.sub.38O.sub.2 (as shown in FIG. 7-26), C.sub.11H.sub.22O.sub.2 (as shown in FIG. 7-27), C.sub.13H.sub.26O.sub.2 (as shown in FIG. 7-27), C.sub.15H.sub.30O.sub.2 (as shown in FIG. 7-28), C.sub.17H.sub.34O.sub.2 (as shown in FIG. 7-28), C.sub.12H.sub.8O.sub.2F.sub.16 (as shown in FIG. 7-29), C.sub.8H.sub.8O.sub.2F.sub.8 (as shown in FIG. 7-30), C.sub.5H.sub.6O.sub.2F.sub.4 (as shown in FIG. 7-31), C.sub.11H.sub.5OF.sub.17 (as shown in FIG. 7-32), C.sub.9H.sub.5OF.sub.13 (as shown in FIG. 7-33), C.sub.11H.sub.14O.sub.4 (as shown in FIG. 7-34), C.sub.11H.sub.13O.sub.3N (as shown in FIG. 7-35), C.sub.12H.sub.14O.sub.3 (as shown in FIG. 7-36), C.sub.13H.sub.18O.sub.2 (as shown in FIGS. 7-37 and 7-38), C.sub.14H.sub.20O.sub.2 (as shown in FIG. 7-39), C.sub.11H.sub.14O.sub.3 (as shown in FIG. 7-40), C.sub.12H.sub.14O.sub.3 (as shown in FIG. 7-41), C.sub.13H.sub.18O.sub.2 (as shown in FIGS. 7-42 and 7-43), C.sub.10H.sub.9O.sub.2F.sub.3 (as shown in FIG. 7-44), C.sub.10H.sub.10O.sub.4 (as shown in FIG. 7-45), C.sub.12H.sub.14O.sub.2 (as shown in FIG. 7-46), C.sub.14H.sub.18O.sub.2 (as shown in FIG. 7-47), C.sub.13H.sub.16O.sub.4 (as shown in FIG. 7-48), C.sub.11H.sub.14O.sub.2 (as shown in FIG. 7-49) or C.sub.12H.sub.16O.sub.2 (as shown in FIG. 7-50).
(30) FIG. 8 shows a flow chart of a manufacturing method of the phosphor stabilizer in accordance with a first preferred embodiment of the present invention. Referring to FIGS. 6-1 and 8, the manufacturing method of the phosphor stabilizer of the first preferred embodiment of the present invention includes the step S1: modifying the trimethoxysilylpropyl material with the polyethylenimine material in methylbenzene to obtain the trimethoxysilylpropyl-modified polyethylenimine material in a first solution and repeating the step if necessary. By way of example, a predetermined amount (e.g., 62 grams) of the polyethylenimine material is dissolved in the methylbenzene and is modified by the trimethoxysilylpropyl material, as shown in FIG. 6-1, to form the first solution which contains the trimethoxysilylpropyl-modified polyethylenimine material (CAS: 136856-91-2).
(31) Referring again to FIG. 8, the manufacturing method of the phosphor stabilizer of the first preferred embodiment of the present invention includes the step S2: heating the trimethoxysilylpropyl-modified polyethylenimine material of the first solution in a predetermined temperature. By way of example, the predetermined temperature ranges between 80 and 120 degrees centigrade. In combination reaction, the heated first solution is supplied with a predetermined flow rate to a bottom or other suitable portion of a nitrogen filled reactor.
(32) Referring again to FIGS. 6-1 and 8, the manufacturing method of the phosphor stabilizer of the first preferred embodiment of the present invention includes the step S3: dissolving the epoxy material in the methylbenzene to obtain a second solution. By way of example, a predetermined amount (e.g., 92 grams) of epoxy material C.sub.13H.sub.16O.sub.4 (ethyl 2-[4-(oxiran-2-ylmethoxy)phenyl]acetate, CAS: 136856-91-2), as shown in FIG. 7-1, is dissolved in the methylbenzene to form the second solution which is supplied to a buffer device or the like.
(33) Referring back to FIG. 8, the manufacturing method of the phosphor stabilizer of the first preferred embodiment of the present invention includes the step S4: reacting the heated first solution with the second solution in the nitrogen filled reactor by stirring to obtain a first reactant. By way of example, the heated first solution and the second solution are supplied with a predetermined molar ratio ranging between 1:2 to 1:4. The first reactant can be used as a dispersion carrier for reacting with the phosphors or the QD materials (e.g., 16 grams) to form a first phosphorescent synthetic which is further cooled and purified to obtain a colloid phosphor material. The first phosphorescent synthetic has a functional group to combine with the phosphor for enhancing a degree of luminous stability and thermal stability thereof. In a preferred embodiment, the manufacturing method of the phosphor stabilizer of the present invention can utilize other trimethoxysilylpropyl material and polyethylenimine material (e.g., C.sub.6H.sub.15O.sub.3Si).
(34) FIG. 8A shows a flow chart of a manufacturing method of the phosphor stabilizer in accordance with another preferred embodiment of the present invention. Referring to FIGS. 6-1 and 8A, the manufacturing method of the phosphor stabilizer of the preferred embodiment of the present invention includes the steps S1 and S2 identical with those of the first preferred embodiment, as shown in FIG. 8, and the detailed description will be omitted.
(35) Turning now to FIGS. 7-2 and 8A, the manufacturing method of the phosphor stabilizer of the preferred embodiment of the present invention includes the step S3A: by way of example, dissolving a predetermined amount (e.g., 32 grams) of epoxy material C.sub.9H.sub.10O.sub.2, as shown in FIG. 7-2, in the methylbenzene to form a third solution which is supplied to a buffer device or the like.
(36) Referring back to FIG. 8A, the manufacturing method of the phosphor stabilizer of the preferred embodiment of the present invention includes the step S4A: reacting the heated first solution with the third solution in the nitrogen filled reactor by stirring to obtain a second reactant. By way of example, the heated first solution and the third solution are supplied with a predetermined molar ratio ranging between 1:2 to 1:4. The second reactant can be also used as a dispersion carrier for reacting with the phosphors or the QD materials (e.g., 16 grams) to form a second phosphorescent synthetic which is further cooled and purified to obtain a colloid phosphor material.
(37) FIG. 9 shows a chart illustrating wavelengths in relation to luminous intensities of a phosphor in accordance with a preferred embodiment of the present invention, including three peaks. Referring to FIG. 9, by way of example, the second reactant is formed from trimethoxysilylpropyl material C.sub.6H.sub.15O.sub.3Si reacting with polyethylenimine material C.sub.9H.sub.10O.sub.2 and reacts with the phosphor to form a phosphorescent synthetic such as a blue-excited phosphor. The phosphorescent synthetic is a blue (468 nm) excited phosphor, as best shown in an arrow at left portion in FIG. 9, including a green (520 nm-580 nm) QD material, as best shown in an arrow at middle portion in FIG. 9, and a red (570 nm-660 nm) QD material, as best shown in an arrow at right portion in FIG. 9. Advantageously, the phosphorescent synthetic has a high degree of luminous stability and thermal stability and can be used as a surface stabilizer (agent) to coat or to displace a surface of the phosphor or the QD material.
(38) Advantageously, the manufacturing method of the phosphor stabilizer of the present invention is obviously rapid, clean, high efficient, economic, easy-to-process, simplifies in purification, lowers byproduct, enhances luminous efficiency of the phosphorescent material, lowers the occurrence of shrinkage of products, and is suitable for mass production.
(39) Although the invention has been described in detail with reference to its presently preferred embodiment, it will be understood by one of ordinary skills in the art that various modifications can be made without departing from the spirit and the scope of the invention, as set forth in the appended claims.
