STACKED MONOLITHIC MULTI-JUNCTION SOLAR CELL

Abstract

A stacked monolithic multi-junction solar cell having at least four subcells, wherein the band gap increases starting from the first subcell in the direction of the fourth subcell, each subcell has an n-doped emitter and a p-doped base, the emitter and the base of the first subcell each are formed of germanium, all following subcells each have at least one element of main group III and V of the periodic table, all subcells following the first subcell are formed lattice-matched to one another, a semiconductor mirror having a plurality of doped semiconductor layers with alternately different refractive indices is placed between the first and second subcell, the semiconductor layers of the semiconductor mirror are each formed n-doped and each have a dopant concentration of at most 5.Math.10.sup.18 cm.sup.−3, the semiconductor mirror is placed between the first subcell and the first tunnel diode.

Claims

1. A stacked monolithic multi-junction solar cell comprising: a first subcell; a second subcell; a third subcell; at least one fourth subcell arranged in the order mentioned; a tunnel diode with a p-n junction is arranged between two subcells in each case; an n-doped semiconductor mirror having a plurality of doped semiconductor layers with alternately different refractive indices is arranged between the first subcell and the following second subcell; an n-doped metamorphic buffer is arranged between the first subcell and the semiconductor mirror; a first metamorphic tunnel diode is placed between the n-doped semiconductor mirror and the second subcell; and a tunnel diode is arranged between the second subcell and the semiconductor mirror so that the metamorphic buffer, the semiconductor mirror, the first metamorphic tunnel diode, and the second subcell are formed on the first subcell in the order mentioned, wherein the metamorphic buffer has at least four step layers and at least one overshoot layer, wherein a band gap increases from subcell to subcell starting from the first subcell in the direction of the fourth, wherein each subcell has an n-doped emitter and a p-doped base, wherein an emitter and a base of the first subcell each comprise germanium or consist of germanium, wherein the second, third, and fourth subcells following the first subcell, each have at least one element of main group III and V of the periodic table, wherein the second, third, and fourth subcells following the first subcell are formed lattice-matched to one another, wherein a doping in the layers of an n-doped metamorphic buffer is below a value of 1.Math.10.sup.18 cm.sup.−3, wherein the n-doped layer of the first tunnel diode between the n-doped semiconductor mirror and the second subcell comprises or consists of InGaAs, and wherein a In proportion of the n-doped layer of the first tunnel diode between the n-doped semiconductor mirror and the second subcell is at least 20%.

2. The stacked monolithic multi-junction solar cell according to claim 1, wherein the n-doped layer of the first tunnel diode is doped with at least 1.Math.10.sup.19 cm.sup.−3.

3. The stacked monolithic multi-junction solar cell according to claim 1, wherein the n-doped layer of the first tunnel diode is doped with at least 5.Math.10.sup.18 cm.sup.−3.

4. The stacked monolithic multi-junction solar cell according to claim 1, wherein the n-doped layer of the first tunnel diode has less than 1% P.

5. The stacked monolithic multi-junction solar cell according to claim 1, wherein the n-doped layer of the first tunnel diode has less than 1% Al.

6. The stacked monolithic multi-junction solar cell according to claim 1, wherein the p-doped layer of the first tunnel diode comprises at least the elements In, Ga, and As.

7. The stacked monolithic multi-junction solar cell according to claim 1, wherein both the thickness of the n-doped layer and also the thickness of the p-doped layer of the first tunnel diode are at least 10 nm and at most 100 nm thick.

8. The stacked monolithic multi-junction solar cell according to claim 1, wherein the p-doped layer of the first tunnel diode is strained by at least 0.5% compared to the n-doped layer of the first tunnel diode or the lattice constant of the p-doped layer of the first tunnel diode is at least 0.030 Å smaller than that of the n-doped layer of the first tunnel diode.

9. The stacked monolithic multi-junction solar cell according to claim 1, wherein the n-doped layer of the first tunnel diode is doped with tellurium.

10. The stacked monolithic multi-junction solar cell according to claim 1, wherein exactly four subcells are provided, wherein the fourth subcell has a band gap between 2.0 eV and 1.8 eV and the third subcell has a band gap between 1.4 eV and 1.6 eV and the second subcell has a band gap between 1 eV and 1.2 eV and the first subcell has a band gap between 0.6 eV and 0.7 eV.

11. The stacked monolithic multi-junction solar cell according to claim 1, wherein at least two layers of the metamorphic buffer have a doping less than 8.Math.10.sup.17 cm.sup.−3 or less than 3.Math.10.sup.17 cm.sup.−3 or less than 1.Math.10.sup.17 cm.sup.−3 or less than 7.Math.10.sup.16 cm.sup.−3 or less than 4.Math.10.sup.16 cm.sup.−3.

12. The stacked monolithic multi-junction solar cell according to claim 1, wherein the layers of the semiconductor mirror have a doping less than 1.Math.10.sup.19 cm.sup.−3 or less than 5.Math.10.sup.18 cm.sup.−3 or less than 3.Math.10.sup.18 cm.sup.−3 or less than 1.5.Math.10.sup.18 cm.sup.−3 or less than 8.Math.10.sup.17 cm.sup.−3.

13. The stacked monolithic multi-junction solar cell according to claim 1, wherein the layers of the semiconductor mirror have a doping greater than 5.Math.10.sup.16 cm.sup.−3 or greater than 1.Math.10.sup.17 cm.sup.−3 or greater than 5.Math.10.sup.17 cm.sup.−3.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0064] The present invention will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only, and thus, are not limitive of the present invention, and wherein:

[0065] FIG. 1 shows a view of a stacked monolithic multi-junction solar cell;

[0066] FIG. 2 shows a view of a stacked monolithic multi-junction solar cell; and

[0067] FIG. 3 shows a view of a stacked monolithic multi-junction solar cell

DETAILED DESCRIPTION

[0068] The diagram in FIG. 1 shows a schematic cross section through a multi-junction solar cell with four monolithic subcells SC1, SC2, SC3, and SC4 arranged in a stack.

[0069] Each subcell has a p-doped base B1, B2, B3, or B4 and an n-doped emitter E1, E2, E3, or E4, wherein emitter E1 and base B1 of the first subcell SC1 have or consist of germanium and emitters E2, E3, and E4 and base B2, B3, B4 of subcells SC2, SC3, and SC4 following the first subcell SC1 each have at least one element of main group III and at least one element of main group V.

[0070] Each of the further subcells SC2, SC3, and SC4 is formed either as a homo subcell or as a hetero subcell.

[0071] Subcells SC1, SC2, SC3, and SC4 have band gaps that increase from subcell to subcell from first subcell SC1 in the direction of fourth subcell SC4.

[0072] Second, third, and fourth subcells SC2, SC3, and SC4 are made lattice-matched to one another, whereas first subcell SC1 has a lattice constant different from the lattice constant of the further subcells SC2, SC3, and SC4.

[0073] In order to compensate for the difference in the lattice constant, the stacked multi-junction solar cell additionally has a metamorphic buffer MP with lattice constants that change along a height of metamorphic buffer MP.

[0074] Metamorphic buffer MP is placed between a top side of first subcell SC1 and a bottom side of semiconductor mirror BR and is n-doped. The lattice constant of metamorphic buffer MP changes, for example, along the height in a ramp-like or step-like manner from a value corresponding to the lattice constants of first subcell SC1 to a value corresponding to the lattice constants of second subcell SC2 and has an overshoot layer, so that the lattice constant first increases from layer to layer and then decreases again to the value of the lattice constant of second subcell SC2.

[0075] Metamorphic buffer MP in FIG. 2 is n-doped and comprises at least four step layers and at least one overshoot layer. At least two of the buffer layers have a doping less than 8.Math.10.sup.17 cm.sup.−3.

[0076] The difference in the doping of the metamorphic buffer layers from one another is preferably less than a factor of 2.

[0077] A semiconductor mirror BR adjacent to emitter E1 of first subcell SC1 is placed on a top side of first subcell SC1. Semiconductor mirror BR has a plurality of n-doped semiconductor layers with alternately different refractive indices and a dopant concentration in each case of at most 1.Math.10.sup.19 cm.sup.−3 or at most 5.Math.10.sup.18 cm.sup.−3.

[0078] A first tunnel diode TD1 with an n-doped layer N1 adjacent to the semiconductor mirror and with a p-doped layer P1 adjacent to second subcell SC2 is placed on a top side of semiconductor mirror BR and adjacent to base B2 of second subcell SC2.

[0079] Stated differently, the first tunnel diode TD1 is placed between the n-doped buffer MP and second subcell SC2. Furthermore, first tunnel diode TD1 has an InGaAs layer N1 n-doped with tellurium.

[0080] The n-doped layer N1 of first tunnel diode TD1 is placed below a p-doped layer P1. As a result, the n-doped layer N1 is preferably integrally connected to the topmost layer of semiconductor mirror BR.

[0081] With the embodiment of the n-doped layer N1 of the tunnel diode according to the invention, n-layer N1 or the entire first tunnel diode TD1 becomes very stable with respect to the thermal load due to the further growth of the III-V layers of subcells SC2, SC3, and SC4, in comparison, e.g., with an n-InAlP layer.

[0082] It should be noted that in contrast to the usual arrangement in which semiconductor mirror BR is placed directly below a subcell, e.g., directly below second subcell SC2, in the present case the semiconductor mirror BR is placed below first tunnel diode TD1.

[0083] Accordingly, in contrast to the usual p-doped design, semiconductor mirror BR is formed n-doped.

[0084] A second tunnel diode TD2 is placed between second subcell SC2 and third subcell SC3 and a third tunnel diode TD3 is placed between third subcell SC3 and fourth subcell SC4, each tunnel diode TD1, TD2, and TD3 having a p-n junction, therefore, an n-doped layer and a p-doped layer.

[0085] A further embodiment is shown in the diagram in FIG. 3. Only the differences from the diagram in FIG. 1 will be explained below.

[0086] The multi-junction solar cell is formed as a metamorphic five-junction solar cell, wherein the second, third, fourth, and fifth subcells SC2, SC3, SC4, and SC5 are made lattice-matched to one another, wherein first subcell SC1 has a lattice constant that differs from the lattice constant of the following subcells SC2, SC3, SC4, and SC5.

[0087] The difference in the lattice constants is compensated for by means of a metamorphic buffer MP placed between first subcell SC1 and semiconductor mirror BR.

[0088] In an embodiment that is not shown, the fifth subcell is placed between the fourth subcell and the third subcell and has InGaP or consists of InGaP.

[0089] The invention being thus described, it will be obvious that the same may be varied in many ways. Such variations are not to be regarded as a departure from the spirit and scope of the invention, and all such modifications as would be obvious to one skilled in the art are to be included within the scope of the following claims.