METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS

Abstract

A projection exposure apparatus includes a light source, an illumination system, and a projection lens. A method for producing or setting the projection exposure apparatus includes determining a first imaging property to be optimized. Optimizing the first imaging property includes optimizing the setting of the illumination system and/or the structure of the mask and/or at least one first adjustable optical element of the projection lens with respect to the shape of one of its at least one optically effective surfaces or with respect to the optical effect for the purposes of setting an optimized wavefront of the working light. Optimizing the illumination system, mask and/or optical element of the projection lens is implemented so that a further manipulator of the projection exposure apparatus for manipulating the wavefront is set in the central position of its manipulation range during the optimization of the first imaging property.

Claims

1. A method of producing or setting a projection exposure apparatus comprising a first manipulator configured to manipulate a wavefront of working light of the projection exposure apparatus, a light source, an illumination system, and a projection lens configured to image structures of a mask, the projection lens comprising a plurality of optical components which are adjustable to set imaging properties of the projection exposure apparatus, the method comprising: i) optimizing a setting of the illumination system to optimize a first imaging property, and/or optimizing a structure of the mask to optimize the first imaging property, and/or optimizing a shape of an optically effective surface of an adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus, and/or optimizing an optical power of the adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus, wherein i) further comprises setting the first manipulator in a central position of its manipulation range.

2. The method as claimed in claim 1, wherein: i) comprises optimizing the shape of the optically effective surface of the adjustable optical element to optimize the wavefront of the working light of the projection exposure apparatus, and/or optimizing the optical power of the adjustable optical element to optimize the wavefront of the working light of the projection exposure apparatus; and the adjustable optical element comprises a mirror.

3. The method of claim 2, further comprising, during use of the projection exposure apparatus or before use of the projection exposure apparatus, altering a shape of the optically effective surface of the mirror.

4. The method as claimed in claim 2, wherein i) comprises setting the optically effective surface of the mirror in a central position of its deformation range.

5. The method of claim 1, wherein: i) comprises optimizing the shape of the optically effective surface of the adjustable optical element to optimize the wavefront of the working light of the projection exposure apparatus, and/or optimizing the optical power of the adjustable optical element to optimize the wavefront of the working light of the projection exposure apparatus; and the adjustable optical element comprises a refractive optical element.

6. The method of claim 5, further comprising altering a shape of the optically effective surface of the refractive optical element and/or altering a refractive index of the refractive optical element.

7. The method of claim 1, wherein: the projection exposure apparatus comprises a plurality of manipulators configured to manipulate the wavefront of the working light; and i) comprises, for each manipulator, setting the manipulator in a central position of its manipulation range.

8. The method of claim 1, wherein the projection exposure apparatus comprises a second manipulator configured so that its position and/or its alignment is alterable over a movement range to manipulate the wavefront of the working light.

9. The method of claim 1, wherein i) comprises optimizing the first imaging property, and optimizing the first imaging property comprises optimizing a correction of mask-dependent aberrations.

10. The method of claim 1, wherein: i) comprises optimizing the first imaging property; and optimizing the first imaging property comprises optimizing a member selected from the group consisting of an imaging of critical structure constituents, a resolution of certain structures, a correction of aberrations due to structure widths, and a correction of aberrations due to structure spacings.

11. The method of claim 1, wherein: i) comprises optimizing the first imaging property; and optimizing the first imaging property comprises using at least one process selected from the group consisting of resolution enhancement technologies (RET), optical proximity correction (OPC), application of phase-shift masks (PSM), application of sub resolution assist features (SRAF), source mask optimization (SMO), source mask lens optimization (SMLO), source mask pupil optimization (SMPO), mask wavefront optimization (MWO), source mask wavefront optimization (SMWO), and source mask polarization wavefront optimization (SMPWO).

12. The method of claim 1, wherein: the projection exposure apparatus comprises a plurality of further manipulators; and the method further comprises, for each of the plurality of further manipulators, capturing the manipulator and determining an entire manipulation range of the manipulator.

13. The method of claim 12, wherein determining the manipulation range for each of the further manipulators comprises using aberrations.

14. The method of claim 12, wherein determining the manipulation range for each of the further manipulators comprises using aberrations in accordance with Zernike polynomials.

15. The method of claim 12, wherein, for each of the plurality of further manipulators, the further manipulator is set in its central position of its manipulation range as per Zernike polynomials for a plurality of aberrations during i).

16. The method of claim 1, wherein i) comprises optimizing a setting of the illumination system to optimize a first imaging property.

17. The method of claim 1, wherein i) comprises optimizing a structure of the mask to optimize the first imaging property.

18. The method of claim 1, wherein i) comprises optimizing the shape of the optically effective surface of the adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus.

19. The method of claim 1, wherein i) comprises optimizing the optical power of the adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus.

20. The method of claim 1, wherein i) comprises at least two members selected from the group consisting of: optimizing the setting of the illumination system to optimize the first imaging property; optimizing the structure of the mask to optimize the first imaging property; optimizing the shape of the optically effective surface of the adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus; and optimizing the optical power of the adjustable optical element of the projection lens to optimize the wavefront of the working light of the projection exposure apparatus.

Description

BRIEF DESCRIPTION OF THE FIGURES

[0017] The accompanying drawings are purely schematic.

[0018] In the drawings:

[0019] FIG. 1 is an illustration of an EUV projection exposure apparatus;

[0020] FIG. 2 is an illustration of a flowchart of a method;

[0021] FIG. 3 is an illustration of a deformable mirror, as can be used in the projection exposure apparatus of FIG. 1;

[0022] FIG. 4 is an illustration of the intensity distribution in a pupil plane for an illumination setting for the EUV projection exposure apparatus of FIG. 1;

[0023] FIG. 5 is an illustration of a portion of a mask with a sub resolution assist structure, as is used in the projection exposure apparatus of FIG. 1; and

[0024] FIG. 6 is an illustration of the manipulation ranges for various aberrations as per Zernike polynomials for a projection exposure apparatus of FIG. 1.

DESCRIPTION OF EXEMPLARY EMBODIMENTS

[0025] Further aspects, characteristics and features of the present disclosure will become evident from the following detailed description of the exemplary embodiments. However, the disclosure is not limited to these exemplary embodiments.

[0026] FIG. 1 shows an illustration of an EUV projection exposure apparatus 1, for the production or setting of which the present disclosure can be used. The EUV projection exposure apparatus 1 illustrated in FIG. 1 includes a light source unit 2 and an illumination system 3 and projection lens 4, by which the structures of a mask 5 are imaged in reduced fashion on a wafer 6. The illumination system 3 includes a field facet mirror 7 and a pupil facet mirror 8, and a first telescope mirror 9 and a second telescope mirror 10 and a deflection mirror 11, by which the EUV light of the light source 2 is prepared in order to illuminate the mask 5.

[0027] The projection lens 4 includes six mirrors 12 to 17, wherein one of these mirrors can be embodied as first adjustable optical element, for example in the form of a deformable mirror, such that a desired wavefront of the EUV light can be generated in the projection lens 4 by the setting of the surface form of the mirror such that optimized imaging of the mask 5 on the wafer 6 is facilitated.

[0028] FIG. 2 shows the sequence of a method according to the disclosure for setting the projection exposure apparatus 1.

[0029] Initially, a first imaging property to be optimized is determined, for example imaging of certain structures of the mask to be optimized or the correction of so-called proximity effects when imaging adjacent structures on the mask, as in the case of the optical proximity correction (OPC).

[0030] To this end, simulation and calculations initially determine what setting of an illumination setting should be undertaken in the illumination system, as illustrated in FIG. 4, for example, and what structures, as illustrated in FIG. 5, for example, the mask should have in order to facilitate an optimization of the first imaging properties or to bring about the correction of so-called proximity effects. Moreover, the possible look of the optimal wavefront for such an optimization of the first imaging property is determined.

[0031] After simulating and calculating the settings of illumination setting, structure of the mask, and the wavefront, the available manipulators for manipulating the wavefront are determined and the entire available manipulation range of the manipulators is calculated.

[0032] Subsequently, for a first adjustable optical element of the projection lens, the corresponding setting of this optical element is undertaken taking account of the determined setting of illumination setting, structure of the mask and desired wavefront, in such a way that, firstly, the optimization of the first imaging properties is ensured by the setting of the first adjustable optical element and the wavefront manipulation generated thereby and that, secondly, further manipulators such as further adjustable optical elements present in the projection exposure apparatus are set in the center of their manipulation range.

[0033] By way of example, a deformable mirror 20, as illustrated in FIG. 3, can find use as first adjustable optical element. The deformable mirror 20 can be deformed in such a way that elevations and/or depressions arise at the mirror surface, as is illustrated by way of the contour lines 19 in FIG. 3, for example. Using this deformable mirror 20 and the setting of the corresponding mirror surface, it is possible to manipulate the wavefront in such a way that it corresponds to the determined setting of the wavefront for the optimization of the first imaging properties, i.e., for example, for correcting proximity effects when imaging adjacent structures of the mask. Moreover, the deformable mirror can also be constructed or set in such a way that the actuators for setting the desired deformation are in the central position of their actuation range such that further deformations of the deformable mirror are possible with a maximum actuation range.

[0034] At the same time, further manipulators of the projection exposure apparatus and, for example, of the projection lens are set in the central position of their manipulation range such that maximal manipulation ranges are ensured in these, too. By way of example, if the mirror 14 is embodied as a deformable mirror 20 in the EUV projection exposure apparatus 1, for example, the remaining mirrors 12 and 15 to 17 can be varied in terms of their position and/or alignment in order thus to generate a manipulation of the wavefront.

[0035] According to some embodiments of the disclosure, the first adjustable optical element, i.e., the deformable mirror 14, 20, is set on the basis of the determination of the entire available manipulation range of the manipulators such that the remaining mirrors 12 and 15 to 17 are in the center of their manipulation range such that a maximum of further manipulation options is provided for the further operation of the projection exposure apparatus and the correction of further imaging properties, for example if adaptations to the wavefront are involved on account of mirrors heating up, or the like. If the manipulation range is given by the position and/or alignment range of the mirrors 12 and 15 to 17, the center of the manipulation range accordingly is at the central position of the respective position and/or alignment range.

[0036] Instead of a deformable mirror, which can be deformed in a certain way over the entire mirror surface by way of a multiplicity of actuators, use can also be made of a mirror whose mirror surface is shaped in accordance with the result of the present disclosure and is fixed accordingly. Accordingly, the shape in the case of such a mirror is set prior to the operation and the correction of further imaging properties during the operation of the projection exposure apparatus can be undertaken by the setting of further manipulators. By contrast, in the case of a deformable mirror as a first adjustable optical element, the corresponding adaptation can be undertaken in variable fashion at any time desired.

[0037] For different aberrations, FIG. 6 shows by way of an appropriate cross the different manipulation ranges as per the Zernike polynomials and the position of the set wavefront in the respective manipulation ranges after setting the projection exposure apparatus according to the present disclosure. As is evident from FIG. 6, what the setting as per the present disclosure achieves is that a large manipulation range still is available for setting further imaging properties or for correcting further aberrations which may arise during the operation of the projection exposure apparatus. While the totality of the further available manipulators are set in such a way in the exemplary embodiment shown that the imaging properties or aberrations to be manipulated therewith overall are each located in a central position of the manipulation range, an individual further manipulator can also be provided or individual further manipulators can also each be provided for certain settings of imaging properties or corrections for aberrations in a corresponding central position of the manipulation range.

[0038] Although the present disclosure has been described in detail on the basis of the exemplary embodiments, it is obvious to a person skilled in the art that the disclosure is not restricted to these exemplary embodiments but rather that modifications are possible, such that individual features can be omitted or different types of combinations of features can be implemented, without departing from the scope of protection of the appended claims. For example, the present disclosure covers all combinations of the individual features shown in the various exemplary embodiments, such that individual features described only in connection with one exemplary embodiment can also be used in other exemplary embodiments or in non-explicitly shown combinations of individual features.

LIST OF REFERENCE SIGNS

[0039] 1 Projection exposure apparatus

[0040] 2 Light source unit

[0041] 3 Illumination system

[0042] 4 Projection lens

[0043] 5 Reticle or mask

[0044] 6 Wafer

[0045] 7 Field facet mirror

[0046] 8 Pupil facet mirror

[0047] 9 First telescope mirror

[0048] 10 Second telescope mirror

[0049] 11 Deflection mirror

[0050] 12 First mirror

[0051] 13 Second mirror

[0052] 14 Third mirror

[0053] 15 Fourth mirror

[0054] 16 Fifth mirror

[0055] 17 Sixth mirror

[0056] 19 Contour lines

[0057] 20 Deformable mirror

[0058] 21 Pupil

[0059] 22 Intensity maximum

[0060] 23 Structure parts

[0061] 24 Sub resolution assist feature (SRAF)