Composition, film, optical sensor, and dispersant
11149141 · 2021-10-19
Assignee
Inventors
- Ryosuke Kato (Haibara-gun, JP)
- Takashi Kawashima (Haibara-gun, JP)
- Yoshinori Taguchi (Haibara-gun, JP)
Cpc classification
C08G61/122
CHEMISTRY; METALLURGY
C08L33/02
CHEMISTRY; METALLURGY
C08J3/24
CHEMISTRY; METALLURGY
C08L33/06
CHEMISTRY; METALLURGY
C08L33/062
CHEMISTRY; METALLURGY
C08L47/00
CHEMISTRY; METALLURGY
C08L33/10
CHEMISTRY; METALLURGY
C08L25/18
CHEMISTRY; METALLURGY
C08L101/02
CHEMISTRY; METALLURGY
International classification
C08L33/10
CHEMISTRY; METALLURGY
C08L33/06
CHEMISTRY; METALLURGY
C08L33/02
CHEMISTRY; METALLURGY
C08G61/12
CHEMISTRY; METALLURGY
C08J3/24
CHEMISTRY; METALLURGY
Abstract
A composition includes: a compound represented by the following Formula (1); a pigment; and a solvent. In a case where a film having a thickness of 4.0 m is formed using the composition, a maximum value of a light transmittance of the film in a thickness direction in a wavelength range of 360 nm to 700 nm is lower than 40%. In Formula (1), Z.sup.1 represents an (m+n)-valent linking group, Y.sup.1 and Y.sup.2 each independently represent a single bond or a linking group, A represents a group including a pigment adsorption portion, P.sup.1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 3 to 21, at least one of Z.sup.1, A.sup.1, or P.sup.1 includes a photocurable group. ##STR00001##
Claims
1. A composition comprising: a compound represented by the following Formula (10); a pigment; and a solvent, wherein in a case where a film having a thickness of 4.0 μm is formed using the composition, a maximum value of a light transmittance of the film in a thickness direction in a wavelength range of 360 nm to 700 nm is lower than 40%, ##STR00048## in Formula (10), Z.sup.1 represents an (m+n)-valent linking group, S represents a sulfur atom, Y.sup.11 and Y.sup.12 each independently represents a single bond or a linking group, A.sup.1 represents a group including a pigment adsorption portion, the pigment adsorption portion includes at least one selected from the group consisting of an organic colorant structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group, the organic colorant structure is a colorant structure derived from at least one selected from the group consisting of a phthalocyanine colorant, an azo colorant, an azo lake colorant, an anthraquinone colorant, a quinacridone colorant, a dioxazine colorant, a diketo pyrrolo pyrrole colorant, an anthrapyridine colorant, an anthanthrone colorant, an indanthrone colorant, a flavanthrone colorant, a perinone colorant, a perylene colorant, and a thioindigo colorant, the acid group is selected from the group consisting of a carboxyl group, a sulfo group, a phosphate group, a monosulfate group, a monophosphate group, and a borate group, P.sup.1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 3 to 21, a plurality of Y.sup.11's and a plurality of A.sup.1's may be the same as or different from each other, a plurality of Y.sup.12's and a plurality of P.sup.1's may be the same as or different from each other, and at least one of Z.sup.1, A.sup.1, or P.sup.1 includes a photocurable group.
2. The composition according to claim 1, wherein P.sup.1 represents a polymer chain that includes a repeating unit having a photocurable group at a side chain.
3. The composition according to claim 1, wherein the photocurable group is an ethylenically unsaturated bond group.
4. The composition according to claim 1, wherein the photocurable group is at least one selected from a vinyl group, a vinyloxy group, an allyl group, a (meth)acryloyl group, a maleoyl group, a styryl group, a cinnamoyl group, or a fumaroyl group.
5. The composition according to claim 1, wherein P.sup.1 represents a polymer chain that includes a repeating unit derived from a compound selected from a vinyl compound, an ester compound, or an ether compound.
6. The composition according to claim 1, wherein P.sup.1 represents a polymer chain that includes a repeating unit represented by the following Formula (2), ##STR00049## in the formula, R.sup.1 represents a hydrogen atom or a methyl group, X.sup.1 represents a single bond or an arylene group, X.sup.2 represents a single bond or an alkylene group, W.sup.1 represents a single bond or a divalent linking group, and B.sup.1 represents a group including a photocurable group.
7. The composition according to claim 1, wherein an amount of the photocurable group in the compound represented by Formula (10) is 0.01 to 2.5 mmol/g.
8. The composition according to claim 1, wherein an acid value of the compound represented by Formula (10) is 200 mgKOH/g or lower.
9. The composition according to claim 1, wherein a weight-average molecular weight of the compound represented by Formula (10) is 2000 to 150000.
10. The composition according to claim 1, further comprising: a polymerizable monomer; a resin other than the compound represented by Formula (10); and a photopolymerization initiator.
11. The composition according to claim 10, wherein a content of the polymerizable monomer is 5 to 90 parts by mass with respect to 100 parts by mass of a total mass of the compound represented by Formula (10) and the resin other than the compound represented by Formula (10).
12. The composition according to claim 1, wherein a content of the compound represented by Formula (10) is 1 to 100 parts by mass with respect to 100 parts by mass of the pigment.
13. The composition according to claim 1, wherein the pigment is a white pigment.
14. The composition according to claim 1, wherein the pigment is titanium oxide.
15. A film which is formed using the composition according to claim 1.
16. An optical sensor comprising: the film according to claim 15.
17. A pigment dispersant represented by the following Formula (10), ##STR00050## in Formula (10), Z.sup.1 represents an (m+n)-valent linking group, S represents a sulfur atom, Y.sup.11 and Y.sup.12 each independently represents a single bond or a linking group, A.sup.1 represents a group including a pigment adsorption portion, the pigment adsorption portion includes at least one selected from the group consisting of an organic colorant structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group, the organic colorant structure is a colorant structure derived from at least one selected from the group consisting of a phthalocyanine colorant, an azo colorant, an azo lake colorant, an anthraquinone colorant, a quinacridone colorant, a dioxazine colorant, a diketo pyrrolo pyrrole colorant, an anthrapyridine colorant, an anthanthrone colorant, an indanthrone colorant, a flavanthrone colorant, a perinone colorant, a perylene colorant, and a thioindigo colorant, the acid group is selected from the group consisting of a carboxyl group, a sulfo group, a phosphate group, a monosulfate group, a monophosphate group, and a borate group, P.sup.1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 3 to 21, a plurality of Y.sup.11's and a plurality of A.sup.1's may be the same as or different from each other, a plurality of Y.sup.12's and a plurality of P.sup.1's may be the same as or different from each other, and at least one of Z.sup.1, A.sup.1, or P.sup.1 includes a photocurable group.
18. The pigment dispersant according to claim 17, wherein P.sup.1 represents a polymer chain that includes a repeating unit having a photocurable group at a side chain.
19. The pigment dispersant according to claim 17, wherein the photocurable group is an ethylenically unsaturated bond group.
20. The pigment dispersant according to claim 17, wherein the photocurable group is at least one selected from a vinyl group, a vinyloxy group, an allyl group, a (meth)acryloyl group, a maleoyl group, a styryl group, a cinnamoyl group, or a fumaroyl group.
21. The pigment dispersant according to claim 17, wherein P.sup.1 represents a polymer chain that includes a repeating unit derived from a compound selected from a vinyl compound, an ester compound, or an ether compound.
22. The pigment dispersant according to claim 17, wherein P.sup.1 represents a polymer chain that includes a repeating unit represented by the following Formula (2), ##STR00051## in the formula, R.sup.1 represents a hydrogen atom or a methyl group, X.sup.1 represents a single bond or an arylene group, X.sup.2 represents a single bond or an alkylene group, W.sup.1 represents a single bond or a divalent linking group, and B.sup.1 represents a group including a photocurable group.
23. The pigment dispersant according to claim 17, wherein the pigment adsorption portion includes at least one selected from the group consisting of an organic colorant structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, and an isocyanate group.
24. The pigment dispersant according to claim 17, wherein the organic colorant structure is a colorant structure derived from at least one selected from the group consisting of a phthalocyanine colorant, an azo lake colorant, an anthraquinone colorant, a dioxazine colorant, and a diketo pyrrolo pyrrole colorant.
25. The pigment dispersant according to claim 17, wherein the acid group is selected from the group consisting of a carboxyl group, a sulfo group, and a phosphate group.
26. The pigment dispersant according to claim 17, wherein P.sup.1 represents a polymer chain that includes a repeating unit derived from a vinyl compound.
27. The composition according to claim 1, wherein the pigment adsorption portion includes at least one selected from the group consisting of an organic colorant structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, and an isocyanate group.
28. The composition according to claim 1, wherein the organic colorant structure is a colorant structure derived from at least one selected from the group consisting of a phthalocyanine colorant, an azo lake colorant, an anthraquinone colorant, a dioxazine colorant, and a diketo pyrrolo pyrrole colorant.
29. The composition according to claim 1, wherein the acid group is selected from the group consisting of a carboxyl group, a sulfo group, and a phosphate group.
30. The composition according to claim 1, wherein P.sup.1 represents a polymer chain that includes a repeating unit derived from a vinyl compound.
Description
EXAMPLES
(1) Hereinafter, the present invention will be described in more detail using Examples, but the present invention is not limited to these examples. Unless specified otherwise, “part(s)” and “%” represent “part(s) by mass” and “mass %”. In addition, PGME is an abbreviation for propylene glycol monomethyl ether, and PGMEA is an abbreviation for propylene glycol monomethyl ether acetate.
(2) <Measurement of Weight-Average Molecular Weight>
(3) The weight-average molecular weights of the dispersant and the resin were measured by gel permeation chromatography (GPC) using the following conditions.
(4) Kind of column: a column in which TOSOH TSK gel Super HZM-H, TOSOH TSK gel Super HZ4000, and TOSOH TSK gel Super HZ2000 were linked to each other
(5) Developing solvent: tetrahydrofuran
(6) Column temperature: 40° C.
(7) Flow rate (sample injection volume): 1.0 μL (sample concentration: 0.1 mass %)
(8) Device name: HLC-8220 GPC (manufactured by Tosoh Corporation)
(9) Detector: refractive index (RI) detector
(10) Calibration curve base resin: a polystyrene resin
(11) <Amount of Photocurable Group>
(12) The amount of the photocurable group in the compound (1) was calculated from raw materials used for the synthesis of the compound (1).
(13) <Method of Measuring Acid Value>
(14) The acid value indicates the mass of potassium hydroxide required to neutralize an acidic component per 1 g of solid content. A measurement sample was dissolved in a mixed solvent including tetrahydrofuran and water at a ratio (tetrahydrofuran/water) of 9/1, and the obtained solution was neutralized and titrated with a 0.1 mol/L sodium hydroxide aqueous solution at 25° C. using a potentiometric titrator (trade name: AT-510, manufactured by Kyoto Electronics Manufacturing Co., Ltd.). An inflection point of a titration pH curve was set as a titration end point, and the acid value was calculated from the following expression.
(15) A=56.11×Vs×0.5×f/w
(16) A: the acid value (mgKOH/g)
(17) Vs: the amount (mL) of the 0.1 mol/L sodium hydroxide aqueous solution used for the titration
(18) f: the titer of the 0.1 mol/L sodium hydroxide aqueous solution
(19) w: the mass (g) of the measurement sample (expressed in terms of solid contents)
(20) <Synthesis of Dispersant>
(21) (Synthesis of Precursor X-1)
(22) 2-methacryloyloxyethyl phthalate (66.59 g, a compound having a group including a pigment adsorption portion), dipentaerythritol hexakis(3-mercaptopropionate) (53.49 g, a compound having a branched skeleton), and propylene glycol monomethyl ether acetate (PGMEA, 280 g) were put into a three-neck flask, and the solution was heated to 80° C. in a nitrogen atmosphere and was stirred. Next, V-601 (manufactured by Wako Pure Chemical Industries, Ltd., an azo polymerization initiator, 0.14 g) was added, and the solution was stirred for 2 hours, was heated to 90° C., and was stirred for 3 hours. As a result, a 30 mass % solution of a precursor X-1 was obtained.
(23) (Synthesis of Precursor X-3)
(24) Itaconic acid (55.15 g, a compound having a group including a pigment adsorption portion), dipentaerythritol hexakis(3-mercaptopropionate) (94.87 g, a compound having a branched skeleton), and diethylene glycol ethyl methyl ether (EDM, 350 g) were put into a three-neck flask, and the solution was heated to 80° C. in a nitrogen atmosphere and was stirred. Next, V-601 (manufactured by Wako Pure Chemical Industries, Ltd., an azo polymerization initiator, 0.25 g) was added, and the solution was stirred for 2 hours, was heated to 90° C., and was stirred for 3 hours. As a result, a 30 mass % solution of a precursor X-3 was obtained.
(25) (Synthesis of Precursor X-4)
(26) Dipentaerythritol hexakis(3-mercaptopropionate) (34.89 g, a compound having a branched skeleton) and allyl 9,10-dioxo-9,10-dihydroanthracene-2-carboxylate (65.11 g, a compound having a group including a pigment adsorption portion), were dissolved in dimethylformamide (DMF, 400 g), and the solution was heated to 70° C. V-65 (2,2′-azobis-(2,4′-dimethylvaleronitrile), manufactured by Wako Pure Chemical Industries, Ltd., 0.26 g) was added to the solution, and the solution was heated for 6 hours. By cooling the solution to room temperature, a 20 mass % solution of a precursor X-4 was obtained.
(27) (Synthesis of Precursors X-2, X-5, X-6, X-7, X-8, X-9, X-10, X-11, and X-12)
(28) Precursors X-2 and X-5 to X-12 were synthesized using the same method as that of the precursor X-1, except that raw materials shown in the following table were used.
(29) TABLE-US-00001 TABLE 1 Synthesis Method of Dispersion Precursor (gram) Compound having Compound Having A Group Including Branched Structure A Pigment Adsorption Portion Solvent Initiator Compound Amount/g Compound Amount/g Compound Amount/g Compound Amount/g X-1 DPMP 53.49 CB-1 66.59 PGMEA 280 V-601 0.14 X-2 DPMP 59.14 HO-MS 60.87 PGMEA 280 V-601 0.15 X-3 DPMP 94.87 ICA 55.15 EDM 350 V-601 0.25 X-4 DPMP 34.89 AQ 65.11 DMF 400 V-65 0.26 X-5 DPMP 68.03 VPY 31.97 PGMEA 233 V-601 0.18 X-6 DPMP 89.53 HO-MS/C16 26.23/64.15 PGMEA 420 V-601 0.07 X-7 MT BD1 51.41 CB-1 48.59 PGMEA 233 V-601 0.1 X-8 PEMP 56.10 CB-1 63.90 PGMEA 280 V-601 0.13 X-9 8B 52.37 CB-1 67.63 PGMEA 280 V-601 0.14 X-10 14B 56.19 CB-1 63.81 PGMEA 280 V-601 0.13 X-11 DPMP 59.44 CB-1/AG 52.81/7.75 PGMEA 280 V-601 0.11 X-12 DPMP 43.22 CB-1 76.78 PGMEA 280 V-601 0.16
(30) The materials shown above in the tables are as follows. DPMP: dipentaerythritol hexakis(3-mercaptopropionate) MT BD1: 1,4-bis(3-mercaptobutyryl oxy)butane PEMP: pentaerythritol tetrakis(3-mercaptopropionate) CB-1: 2-methacryloyloxyethyl phthalate HO-MS: 2-methacryloyloxyethyl succinate ICA: itaconic acid AQ: allyl 9,10-dioxo-9,10-dihydroanthracene-2-carboxylate VPY: 4-vinyl pyridine C16: hexadeca-1-ene AG: ethylene glycol monoallyl ether 8B: a compound having the following structure 14B: a compound having the following structure PGMEA: propylene glycol monomethyl ether acetate EDM: diethylene glycol ethyl methyl ether DMF: dimethylformamide V-601: V-601 (manufactured by Wako Pure Chemical Industries, Ltd., an azo polymerization initiator) V-65: 2,2′-azobis-(2,4′-dimethylvaleronitrile) (manufactured by Wako Pure Chemical Industries, Ltd.)
(31) ##STR00035##
(32) (Synthesis of Dispersant (P-1))
(33) PGEA (70.01 g) was put into a three-neck flask and was heated to 80° C. in a nitrogen atmosphere. Next, the precursor X-1 solution (114.48 g, solid content: 30 mass %), methyl methacrylate (51.42 g), 2-hydroxyethyl methacrylate (6.53 g), and V-601 (manufactured by Wako Pure Chemical Industries, Ltd., an azo polymerization initiator, 0.40 g) were dissolved in PGMEA (24.81 g) to obtain a solution. The obtained solution was added dropwise to the solution in the flask for 2.5 hours. After completion of the dropwise addition, the solution was stirred for 5.5 hours. Next, PGMEA (58.33 g) and 2,6-di-t-butyl-4-methylphenol (0.33 g) were added to obtain a mixture. Further, 2-methacryloyloxyethyl isocyanate (MOI, 7.74 g) was added dropwise to the obtained mixture for 10 minutes. The disappearance of a signal derived from MOI was verified by .sup.1H-NMR after 8 hours from completion of the dropwise addition, and then a 30 mass % solution of a dispersant (P-1) was obtained.
(34) (Synthesis of Dispersants (P-2) to (P-6), (P-8) to (P-18), (P-21) to (P-23), and (P-25) to (P-29))
(35) Dispersants (P-2) to (P-6), (P-8) to (P-18), (P-21) to (P-23), and (P-25) to (P-29) were synthesized using the same method as that of the dispersant (P-1), except that raw materials derived in the following table were used.
(36) Synthesis of Dispersant (P-7)
(37) PGMEA (70.00 g) was put into a three-neck flask and was heated to 80° C. in a nitrogen atmosphere. Next, the precursor X-1 solution (126.21 g, solid content: 30 mass %), methyl methacrylate (62.14 g), and V-601 (0.43 g) were dissolved in PGMEA (16.66 g) to obtain a solution. The obtained solution was added dropwise to the solution in the flask for 2.5 hours. After completion of the dropwise addition, the solution was stirred for 5.5 hours. Next, PGMEA (58.33 g) and 2,6-di-t-butyl-4-methylphenol (0.33 g) were added. As a result, a 30 mass % solution of a dispersant (P-7) was obtained.
(38) Synthesis of Dispersant (P-24)
(39) A dispersant (P-24) was synthesized using the same method as that of the dispersant (P-7), except that raw materials derived in the following table were used.
(40) Synthesis of Dispersant (P-19)
(41) PGMEA (70.00 g) was put into a three-neck flask and was heated to 80° C. in a nitrogen atmosphere. Next, the precursor X-3 solution (86.84 g, solid content: 30 mass %), methyl methacrylate (48.86 g), methacrylic acid (3.69 g), 2-hydroxyethyl methacrylate (9.76 g), and V-601 (0.39 g) were dissolved in PGMEA (44.21 g) to obtain a solution. The obtained solution was added dropwise to the solution in the flask for 2.5 hours. After completion of the dropwise addition, the solution was stirred for 5.5 hours. Next, PGMEA (58.33 g) and 2,6-di-t-butyl-4-methylphenol (0.33 g) were added to obtain a mixture. Further, 2-methacryloyloxyethyl isocyanate (MOI, 11.64 g) was added dropwise to the obtained mixture for 10 minutes. The disappearance of a signal derived from MOI was verified by .sup.1H-NMR after 8 hours from completion of the dropwise addition, and then a 30 mass % solution of a dispersant (P-19) was obtained.
(42) Synthesis of Dispersant (P-20)
(43) A mixed solution of the precursor X-4 solution (323.34 g, solid content: 20 mass %), methyl methacrylate (25.15 g), and glycidyl methacrylate (GMA, 10.18 g) was heated to 80° C. in a nitrogen stream. 2,2′-azobis(isobutyronitrile) (AIBN, manufactured by Wako Pure Chemical Industries, Ltd., 0.21 g) was added to the solution, and the solution was heated for 5 hours. Next, the solution was cooled to room temperature and diluted with acetone. The diluted solution underwent reprecipitation using a large amount of methanol and was dried in a vacuum. As a result, a polymer compound was obtained. The obtained polymer compound was diluted with PGMEA, and a 30 mass % solution of a dispersant (P-20) was obtained.
(44) TABLE-US-00002 TABLE 2 Weight- Acid Amount Dispersant Configuration Average Value of Photo- Precursor Monomer 1 Monomer 2 Monomer 3 Polymerizable Unit Mole- (mg- curable Amount/ Com- Amount/ Com- Amount/ Com- Amount/ Com- Amount/ cular KOH/ Group Name g pound g pound g pound g pound g Weight g) (mmol/g) Dispersant X-1 34.36 MMA 51.41 — 0 HEMA 6.49 MOI 7.74 6000 34 0.5 P-1 Dispersant X-1 32.59 MMA 45.97 — 0 HEMA 9.78 MOI 11.66 6000 34 0.75 P-2 Dispersant X-1 30.85 MMA 40.60 — 0 HEMA 13.02 MOI 15.53 7000 31 1 P-3 Dispersant X-1 29.10 MMA 35.23 — 0 HEMA 16.27 MOI 19.4 7000 30 1.25 P-4 Dispersant X-1 27.35 MMA 29.85 — 0 HEMA 19.52 MOI 23.28 7000 28 1.5 P-5 Dispersant X-1 23.84 MMA 19.10 — 0 HEMA 26.03 MOI 31.03 7000 24 2 P-6 Dispersant X-1 37.86 MMA 62.14 — 0 — 0 — 0 6000 42 0 P-7 Dispersant X-1 47.32 MMA 31.33 — 0 HEMA 9.74 MOI 11.61 3000 53 0.75 14.8 Dispersant X-1 14.53 MMA 64.00 — 0 HEMA 9.79 MOI 11.68 20000 16 0.75 P-9 Dispersant X-1 5.46 MMA 73.17 — 0 HEMA 9.75 MOI 11.62 61000 6 0.75 P-10 Dispersant X-1 2.20 MMA 76.41 — 0 HEMA 9.76 MOI 11.63 175000 2 0.75 P-11 Dispersant X-1 32.81 MMA 42.44 MAA 3.36 HEMA 9.76 MOI 11.63 6000 51 0.75 P-12 Dispersant X-1 32.92 MMA 40.65 MAA 5.03 HEMA 9.76 MOI 11.64 6000 63 0.75 P-13 Dispersant X-1 33.02 MMA 38.89 MAA 6.7 HEMA 9.76 MOI 11.63 6000 71 0.75 P-14 Dispersant X-1 33.41 MMA 31.80 MAA 13.35 HEMA 9.78 MOI 11.66 6000 124 0.75 P-15 Dispersant X-2 30.79 MMA 44.35 MAA 3.46 HEMA 9.76 MOI 11.64 6000 65 0.75 P-16 Dispersant X-2 31.14 MMA 44.95 MAA 3.44 HEMA 9.82 AOI 10.65 6000 61 0.75 P-47 Dispersant X-2 30.86 MMA 48.54 — 0 HEMA 9.74 STI 10.86 7000 38 0.75 P-18 Dispersant X-3 26.05 MMA 48.86 MAA 3.69 HEMA 9.76 MOI 11.64 7000 107 0.75 P-19 Dispersant X-4 64.67 MMA 25.15 GMA 10.18 — 0 — 0 5000 0 0.8 P-20 Dispersant X-5 24.57 MMA 54.03 — 0 HEMA 9.76 MOI 11.64 6000 0 0.75 P-21 Dispersant X-6 30.42 MMA 48.20 — 0 HEMA 9.75 MOI 11.63 6000 11 0.75 P-22 Dispersant X-7 39.53 MMA 46.16 — 0 HEMA 6.53 MOI 7.78 4000 24 0.5 P-23 Dispersant X-7 43.59 MMA 56.41 — 0 — 0 — 0 4000 27 0 P-24 Dispersant X-8 89.50 MMA 51.75 — 0 HEMA 9.76 MOI 11.64 4000 29 0 75 P-25 Dispersant X-9 119.53 MMA 42.76 — 0 HEMA 9.75 MOI 11.63 8000 41 0.75 P-26 Dispersant X-10 108.19 MMA 46.14 — 0 HEMA 9.77 MOI 11.64 11000 34 0.75 P-27 Dispersant X-11 98.22 MMA 46.24 — 0 HEMA 9.76 MOI 14.53 6000 26 0.75 P-28 Dispersant X-12 123.42 MMA 41.60 — 0 HEMA 9.75 MOI 11.63 5000 72 0.75 P-29
(45) In the tables, a numerical value shown in the column “Precursor” is a value expressed in terms of solid contents. In addition, the raw materials shown above in the tables are as follows. X-1 to X-12: the precursors X-1 to X-12 MMA: methyl methacrylate MAA: methacrylic acid HEMA: 2-hydroxyethyl methacrylate GMA: glycidyl methacrylate MOI: 2-methacryloyloxyethyl isocyanate AOI: 2-acryloyloxyethyl isocyanate STI: 1-isocyanato-4-vinylbenzene
(46) Structures of the dispersants (P-1) to (P-29) are as follows. The dispersants (P-1) to (P-6), (P-8) to (P-22), and (P-25) to (P-29) are also the compounds (1) according to the embodiment of the present invention.
(47) ##STR00036## ##STR00037## ##STR00038## ##STR00039## ##STR00040##
(48) <Preparation of Dispersion>
(49) By using ULTRA APEX MILL (manufactured by Kotobuki Industries Co., Ltd.) as a circulation type dispersion apparatus (beads mill), a mixed solution having the following composition shown in the following table was dispersed. This way, dispersions 1 to 50 were manufactured. After the start of dispersion, the average particle size of particles was measured at intervals of 30 minutes. The average particle size of the particles decreased along with the elapse of the time after the dispersion, but a variation thereof gradually decreased. When a variation of d50 (cumulative value: 50%) in the particle size distribution became zero, the dispersion ended.
(50) Bead diameter: 0.2 mm
(51) Bead filling rate: 65 vol %
(52) Circumferential speed: 6 m/sec
(53) Pump supply rate: 10.8 kg/hr
(54) Cooling water: tap water
(55) Inner volume of circular path of beads mill: 0.15 L
(56) Amount of mixed Solution to be dispersed: 0.65 kg
(57) TABLE-US-00003 TABLE 3 Pigment Dispersant Solvent Addition Addition Addition Solid Amount Amount Amount Content (Part(s) (Part(s) (Part(s) (mass Kind by Mass) Kind by Mass) Solvent by Mass) %) Dispersion 1 Titanium Oxide 38.5 P-1 38.3 PGMEA 23.2 50 Dispersion 2 Titanium Oxide 38.5 P-2 38.3 PGMEA 23.2 50 Dispersion 3 Titanium Oxide 38.5 P-3 38.3 PGMEA 23.2 50 Dispersion 4 Titanium Oxide 38.5 P-4 38.3 PGMEA 23.2 50 Dispersion 5 Titanium Oxide 38.5 P-5 38.3 PGMEA 23.2 50 Dispersion 6 Titanium Oxide 38.5 P-6 38.3 PGMEA 23.2 50 Dispersion 7 Titanium Oxide 38.5 P-7 38.3 PGMEA 23.2 50 Dispersion 8 Titanium Oxide 38.5 P-8 38.3 PGMEA 23.2 50 Dispersion 9 Titanium Oxide 38.5 P-9 38.3 PGMEA 23.2 50 Dispersion 10 Titanium Oxide 38.5 P-10 38.3 PGMEA 23.2 50 Dispersion 11 Titanium Oxide 38.5 P-11 38.3 PGMEA 23.2 50 Dispersion 12 Titanium Oxide 38.5 P-12 38.3 PGMEA 23.2 50 Dispersion 13 Titanium Oxide 38.5 P-13 38.3 PGMEA 23.2 50 Dispersion 14 Titanium Oxide 38.5 P-14 38.3 PGMEA 23.2 50 Dispersion 15 Titanium Oxide 38.5 P-15 38.3 PGMEA 23.2 50 Dispersion 16 Titarium Oxide 38.5 P-16 38.3 PGMEA 23.2 50 Dispersion 17 Titanium Oxide 38.5 P-17 38.3 PGMEA 23.2 50 Dispersion 18 Titanium Oxide 38.5 P-18 38.3 PGMEA 23.2 50 Dispersion 19 Titanium Oxide 39.5 P-19 38.3 PGMEA 23.2 50 Dispersion 20 Titanium Oxide 38.5 P-20 38.3 PGMEA 23.2 50 Dispersion 21 Titanium Oxide 38.5 P-21 38.3 PGMEA 23.2 50 Dispersion 22 Titanium Oxide 38.5 P-22 38.3 PGMEA 23.2 50 Dispersion 23 Titanium Oxide 38.5 P-2/P-16 26.8/11.5 PGMEA 23.2 50 Dispersion 24 Titanium Oxide 38.5 P-2/P-7 26.8/11.5 PGMEA 23.2 50 Dispersion 25 Titanium Oxide 38.5 P-2/P-23 26.8/11.5 PGMEA 23.2 50 Dispersion 26 Titanium Oxide 38.5 P-2/P-24 26.8/11.5 PGMEA 23.2 50 Dispersion 27 Zinc Oxide 38.5 P-2 38.3 PGMEA 23.2 50 Dispersion 28 Titanium Oxide/ 27.0/11.5 P-2 38.3 PGMEA 23.2 50 Zinc Oxide Dispersion 29 Titanium Black 25 P-2 25 PGMEA/PGME/ 9.1/13.9/27 32.5 (TiON) Butyl Acetate Dispersion 30 Titanium Oxide 25 P-2 25 PGMEA/PGME/ 9.1/13.9/27 32.5 (TiN) Butyl Acetate Dispersion 31 PR254 13.5 P-2 13.3 PGMEA 73.2 17.5 Dispersion 32 PY139 14.8 P-2 17.3 PGMEA 67.9 20 Dispersion 33 PB15:6 13.5 P-2 13.3 PGMEA 73.2 17.5 Dispersion 34 PV23 14.8 P-2 17.3 PGMEA 67.9 20 Dispersion 35 Titanium Oxide 38.5 P-2 20 PGMEA 41.5 44.5 Dispersion 36 Titanium Oxide 38.5 P-2 27 PGMEA 34.5 46.6 Dispersion 7 Titanium Oxide 38.5 P-2 50 PGMEA 11.5 53.5 Dispersion 38 Titanium Oxide 38.5 P-2 60 PGMEA 1.5 50.5 Dispersion 39 Titanium Oxide 38.5 P-25 38.3 PGMEA 23.2 50 Dispersion 40 Titanium Oxide 38.5 P-26 38.3 PGMEA 23.2 50 Dispersion 41 Titanium Oxide 38.5 P-27 38.3 PGMEA 23.2 50 Dispersion 42 Titanium Oxide 38.5 P-28 38.3 PGMEA 23.2 50 Dispersion 43 Titanium Oxide 38.5 P-29 38.3 PGMEA 23.2 50 Dispersion 44 Titanium 25 P-7 25 PGMEA/PGME/ 9.1/13.9/27 32.5 Black(TiON) Butyl Acetate Dispersion 45 Titanium Nitride 25 P-7 25 PGMEA/PGME/ 9.1/13.9/27 32.5 (TiN) Butyl Acetate Dispersion 46 PR254 13.5 P-7 13.3 PGMEA 73.2 17.5 Dispersion 47 PY139 14.8 P-7 17.3 PGMEA 67.9 20 Dispersion 48 PB15:6 13.5 P-7 13.3 PGMEA 73.2 17.5 Dispersion 49 PV23 14.8 P-7 17.3 PGMEA 07.9 20 Dispersion 50 Titanium Oxide 38.5 P-23 38.3 PGMEA 23.2 50
(58) The raw materials shown above in the table are as follows. P-1 to P-29: the dispersants (P-1) to (P-29) (30 mass % solutions) Titanium oxide: MPT-141 (manufactured by Ishihara Sangyo Kaisha Ltd.) Zinc oxide: Zincox Super F-1 (manufactured by Hakusui Chemical Co., Ltd.). Titanium black: Titanium Black A-1 described below Titanium nitride: Titanium Nitride TiN-1 described below PR254: C.I. Pigment Red 254 PY139: C.I. Pigment Yellow 139 PB 15:6: C.I. Pigment Blue 15:6 PV23: C.I. Pigment Violet 23 PGMEA: propylene glycol monomethyl ether acetate PGME: propylene glycol monomethyl ether
(59) Preparation of Titanium Black A-1
(60) 100 g of Titanium Oxide MT-150A (trade name: manufactured by TAYCA Corporation) having an average primary particle size of 15 nm, 25 g of silica particles AEROSIL 300 (registered trade name) 300/30 (manufactured by Evonik Degussa Gmbh) having a Brunauer, Emmett, Teller (BET) specific surface area of 300 m.sup.2/g, and 100 g Disperbyk 190 (trade name, manufactured by BYK-Chemie Japan K.K.) were weighed, and 71 g of ion exchange water was added. As a result, a mixture was obtained. Next, using MAZERSTAR KK-400W (manufactured by Kurabo Industries Ltd.), the mixture was treated at a revolution speed of 1360 rpm and a rotation speed of 1047 rpm for 30 minutes. As a result, a uniform mixture aqueous solution was obtained. This mixture aqueous solution was filled into a quartz container and was heated to 920° C. in an oxygen atmosphere using a small rotary kiln (manufactured by Motoyama Co., Ltd.). Next, the atmosphere in the small rotary kiln was purged with nitrogen, and ammonia gas was caused to flow at the same temperature at 100 mL/min for 5 hours. As a result, a nitrogen reduction treatment was performed. After completion of the nitrogen reduction treatment, the collected powder was crushed in a mortar. As a result, titanium black (titanium black A-1) powder having a Si atom and a specific surface area of 73 m.sup.2/g was obtained.
(61) Preparation of Titanium Nitride TiN-1
(62) A plasma treatment was performed on Ti particles (TC-200, manufactured by Toho Technical Service Co., Ltd.) in Ar gas to obtain Ti nanoparticles. The Ti nanoparticles were left to stand in an Ar gas atmosphere under conditions of O.sub.2 concentration: 50 ppm or lower and 30° C. for 24 hours. Next, in a state where O.sub.2 gas was introduced into the Ar gas atmosphere such that the O.sub.2 concentration was 100 ppm, the Ti nanoparticles were left to stand at 30° C. for 24 hours (this process will be referred to as “pre-treatment of Ti particles). Next, using a TTSP separator (manufactured by Hosokawa Micron Corporation), the obtained Ti nanoparticles were classified under a condition of yield: 10%. As a result, powder of Ti nanoparticles was obtained. The primary particle size of the obtained powder was 120 nm in case of being measured by observing the powder using a transmission electron microscope (TEM) to obtain particle sizes of 100 particles and obtaining the arithmetic average value thereof.
(63) Titanium Nitride TiN-1 was manufactured using a device corresponding to a black composite particle producing apparatus shown in FIG. 1 of WO2010/147098A. Specifically, in the black composite particle producing apparatus, a high frequency voltage of about 4 MHz and about 80 kVa was applied to a high-frequency oscillating coil of a plasma torch. Mixed gas of 50 L/min of argon gas and 50 L/min of nitrogen was supplied as plasma gas from a plasma gas supply source. An argon-nitrogen thermal plasma flame was generated in the plasma torch. In addition, 10 L/min of carrier gas (Ar gas) was supplied from a spraying gas supply source of a material-supplying apparatus. Next, 0.05 mass % of Fe particles (JIP270M, manufactured by JFE Steel Corporation, primary particle size: 150 μm), 0.05 mass % of silicon particles (primary particle size: 45 μm), and 99 mass % of the Ti nanoparticles obtained as described above were mixed with each other, the obtained mixture was supplied to the thermal plasma flame in the plasma torch together with the Ar gas as the carrier gas such that the supplied particles were evaporated in the thermal plasma flame and were highly dispersed in a gas-phase state. As gas supplied into a chamber by a gas-supplying apparatus, nitrogen gas was used. At this time, the flow rate of the nitrogen gas in the chamber was 5 m/sec, and the supply rate of the nitrogen gas was 1000 L/min. In addition, the internal pressure in a cyclone was 50 kPa, and the supply rate of each of raw materials from the chamber to the cyclone was 10 m/s (average value). This way, Titanium Nitride TiN-1 was obtained.
(64) <Preparation of Composition (Curable composition)>
(65) Raw materials shown in the following tables were mixed with each other to prepare compositions 1 to 55.
(66) TABLE-US-00004 TABLE 4 Poly- Photopoly- Anti- merizable merization Coloring Adherence Dispersion Resin Monomer Initiator Solvent Agent Agent Surfactant Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) by by by by by by by by Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 1 1 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 2 2 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 3 3 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 4 4 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 5 5 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 6 6 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 7 7 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 8 8 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 9 9 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 10 10 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 11 11 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 12 12 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 13 13 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 14 14 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 15 15 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 16 16 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 17 17 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 18 18 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 19 19 Compo- Disper- 52 A-1 10.3 B-1 11 C-1 2.5 PGMEA 24 D-1 0.2 — 0 F-1 0.03 sition sion 20 20 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 21 21 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 22 22 Compo- Disper- 52 A-1 4 B-1 6.8 C-1 2.5 PGMEA 34 D-1 0.2 E-1 3.5 F-1 0.03 sition sion 23 2 Compo- Disper- 52 A-1 6 B-1 7.8 C-1 2.5 PGMEA 29 D-1 0.2 E-1 4.5 F-1 0.03 sition sion 24 2 Compo- Disper- 52 A-1 12 B-1 11.8 C-1 2.5 PGMEA 19 D-1 0.2 E-1 5.5 F-1 0.03 sition sion 25 2 Compo- Disper- 52 A-1 15 B-1 13.8 C-1 2.5 PGMEA 14 D-1 0.2 E-1 6.5 F-1 0.03 sition sion 26 2 Compo- Disper- 52 A-1 11 B-1 7.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 7.5 F-1 0.03 sition sion 27 2 Compo- Disper- 52 A-1 10.3 B-1 8.5 C-1 2.5 PGMEA 24 D-1 0.2 E-1 8.5 F-1 0.03 sition sion 28 2 Compo- Disper- 52 A-1 8.6 B-1 10.2 C-1 2.5 PGMEA 24 D-1 0.2 E-1 9.5 F-1 0.03 sition sion 29 2 Compo- Disper- 52 A-1 7.8 B-1 11 C-1 2.5 PGMEA 24 D-1 0.2 E-1 10.5 F-1 0.03 sition sion 30 2 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 31 23 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 32 24
(67) TABLE-US-00005 TABLE 5 Poly- Photopoly- Anti- merizable merization Coloring Adherence Dispersion Resin Monomer Initiator Solvent Agent Agent Surfactant Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) Part(s) by by by by by by by by Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Kind Mass Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 33 25 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 34 26 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 35 27 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 36 28 Compo- Disper- 52 A-1 4 B-1 9 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion A-2 5.8 37 2 Compo- Disper- 52 A-1 9.8 B-1 5 C-1 2.5 PGMEA 24 D-1 0 E-1 2.5 F-1 0.03 sition sion B-3 4 38 2 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 12 D-1 0.2 E-1 2.5 F-1 0.03 sition sion Cyclo- 12 39 2 pent- anone Compo- Disper- 75.4 A-1 9.8 B-4 10 C-3 4.8 — 0 — 0 — 0 — 0 sition sion 40 29 Compo- Disper- 75.4 A-1 9.8 B-4 10 C-3 4.8 — 0 — 0 — 0 — 0 sition sion 41 30 Compo- Disper- 11.7 A-1 17 B-4 13.5 C-3 5 — 0 — 0 — 0 — 0 sition sion 42 31 Disper- 14.95 sion 32 Disper- 30.55 sion 33 Disper- 8.45 sion 34 Compo- Disper- 52 A-1 9.8 B-1 9 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 43 35 Compo- Disper- 52 A-1 9.8 B-1 9 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 44 36 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 45 37 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 46 38 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 47 39 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.93 sition sion 48 40 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 49 41 Compo- Disper- 52 A-1 9 B-1 9.8 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 50 42 Compo- Disper- 52 A-1 9 B-1 98 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 51 43 Compo- Disper- 75.4 A-1 9.8 B-4 10 C-3 4.8 — 0 — 0 — 0 — 0 sition sion 52 44 Compo- Disper- 75.4 A-1 9.8 B-4 10 C-3 4.8 — 0 — 0 — 0 — 0 sition sion 53 45 Compo- Disper- 11.7 A-1 17 B-4 13.5 C-3 5 — 0 — 0 — 0 — 0 sition sion 54 46 Disper- 14.95 sion 47 Disper- 30.55 sion 48 Disper- 8.45 sion 49 Compo- Disper- 52 A-1 9.8 B-1 9 C-1 2.5 PGMEA 24 D-1 0.2 E-1 2.5 F-1 0.03 sition sion 55 50
(68) The raw materials shown above in the table are as follows.
(69) (Dispersion)
(70) Dispersions 1 to 50: the above-described dispersions 1 to 50
(71) (Resin)
(72) A-1: a resin having the following structure (acid value=32 mgKOH/g, Mw=10000, a numerical value added to a repeating unit represents the content [molar ratio] of the repeating unit)
(73) A-2: a resin having the following structure (acid value=113 mgKOH/g, Mw=33000, a numerical value added to a repeating unit represents the content [molar ratio] of the repeating unit)
(74) ##STR00041##
(75) (Polymerizable Monomer)
(76) B-1 to B-4: compounds having the following structures
(77) ##STR00042## ##STR00043##
(78) (Photopolymerization Initiator)
(79) C-1 to C-3: compounds having the following structures
(80) ##STR00044##
(81) (Anti-Coloring Agent)
(82) D-1: a compound having the following structure
(83) ##STR00045##
(84) (Adherence Agent)
(85) E-1: a compound having the following structure
(86) ##STR00046##
(87) (Surfactant)
(88) F-1: the following compound (M2=14,000, a numerical value added to a repeating unit represents the content [molar ratio] of the repeating unit, and a numerical value added to a side chain represents the number of repeating units)
(89) ##STR00047##
(90) (Solvent)
(91) PGMEA: propylene glycol monomethyl ether acetate
(92) <Measurement of Transmittance>
(93) Each of the compositions was applied to an 8-inch (203.2 mm) glass wafer with an undercoat layer (manufactured by Fujifilm Electronic Materials Co., Ltd., CT-4000L, thickness: 0.1 μm) using a spin coater such that the thickness after drying was 4.0 μm. The coating film was heated (pre-baked) using a hot plate at 110° C. for 30 minutes. Next, using an i-ray stepper exposure device FPA-3000 i5+ (manufactured by Canon Corporation), the coating film was exposed to light having a wavelength of 365 nm at an exposure dose of 1000 mJ/cm.sup.2. As a result, a film was formed. A transmittance of the glass wafer on which the film was formed in a wavelength range of 360 to 700 nm was measured using a spectrophotometer (manufactured by Hitachi High-Technologies Corporation, U-4100), and a maximum value of the transmittance in the above-described wavelength range was measured. The maximum value of the transmittance was evaluated based on the following standards.
(94) A: the maximum value of the transmittance was lower than 20%
(95) B: the maximum value of the transmittance was 20% or higher and lower than 30%
(96) C: the maximum value of the transmittance was 30% or higher and lower than 40%
(97) <Evaluation of Curing Properties>
(98) Each of the compositions was applied to an 8-inch (203.2 mm) glass wafer with an undercoat layer (manufactured by Fujifilm Electronic Materials Co., Ltd., CT-4000L, thickness: 0.1 μm) using a spin coater such that the thickness after drying was 4.0 μm. The coating film was heated (pre-baked) using a hot plate at 110° C. for 30 minutes. Next, using an i-ray stepper exposure device FPA-3000 i5+ (manufactured by Canon Corporation), the coating film was irradiated with and exposed to light having a wavelength of 365 nm through a mask having a 2 μm×2 μm pattern at an adhesion exposure dose while increasing the exposure dose from 50 mJ/cm.sup.2 at an interval of 50 mJ/cm.sup.2. The adhesion exposure dose refers to an exposure dose in a state where 95% or higher of the formed pattern adhered to the glass wafer.
(99) Next, the glass wafer on which the exposed film was formed was placed on a horizontal rotary table of a spin-shower developing machine (DW-30, manufactured by Chemitronics Co., Ltd.) and underwent puddle development at 23° C. for 65 seconds using CD-2060 (a tetramethylammonium hydroxide aqueous solution, manufactured by Fujifilm Electronic Materials Co., Ltd.) to form a pattern on the glass wafer. The glass wafer on which the pattern was formed was fixed to the horizontal rotary table using a vacuum chuck method. While rotating the glass wafer at a rotation speed of 50 rpm using a rotating device, the glass wafer was rinsed with pure water supplied from a region above the rotation center through a spray nozzle and then was spray-dried. As a result, a pattern was formed. The curing properties were evaluated based on the following standards.
(100) The evaluation A, B, or C is preferable, the evaluation A or B is more preferable, and the evaluation A is most preferable.
(101) A: the adhesion exposure dose was lower than 250 mJ/cm.sup.2
(102) B: the adhesion exposure dose was 250 mJ/cm.sup.2 or higher and lower than 500 mJ/cm.sup.2
(103) C: the adhesion exposure dose was 500 mJ/cm.sup.2 or higher and lower than 1000 mJ/cm.sup.2
(104) D: the adhesion exposure dose was 1000 mJ/cm.sup.2 or higher and lower than 1500 mJ/cm.sup.2
(105) E: the adhesion exposure dose was 1500 mJ/cm.sup.2 or higher
(106) <Evaluation of Chromaticity>
(107) (Preparation of Pattern for Chromaticity Evaluation)
(108) Each of the compositions was applied to the 8-inch glass wafer with the undercoat layer using a spin coater such that the thickness after drying was 4.0 μm, and the coating film was heated (pre-baked) using a hot plate at 110° C. for 30 minutes. Next, using an i-ray stepper exposure device FPA-3000 i5+(manufactured by Canon Corporation), the coating film was irradiated with and exposed to light having a wavelength of 365 nm through a mask having a 2 cm×2 cm pattern at 1000 mJ/cm.sup.2. Next, the glass wafer on which the exposed coating film was formed was placed on a horizontal rotary table of a spin-shower developing machine (DW-30, manufactured by Chemitronics Co., Ltd.) and underwent puddle development at 23° C. for 65 seconds using a tetramethylammonium hydroxide (TMAH) 0.3 mass % aqueous solution to form a pattern on the glass wafer. The glass wafer on which the pattern was formed was fixed to the horizontal rotary table using a vacuum chuck method. While rotating the glass wafer at a rotation speed of 50 rpm using a rotating device, the glass wafer was rinsed with pure water supplied from a region above the rotation center through a spray nozzle and then was spray-dried. As a result, a pattern for chromaticity evaluation was formed.
Chromaticity Evaluation of Examples 1 to 47 and Comparative Examples 1 to 2
(109) The value of L* of the obtained pattern in the L*a*b* color system of CIE 1976 was measured using a spectrophotometer (X-rite 528, manufactured by X-rite Inc.). A D65 light source was used as a light source, an observation field of view was 2°, and a white reference was set using a white patch of a calibration reference plate attached to the spectrophotometer. The evaluation A or B is preferable, and the evaluation A is more preferable.
(110) A: the value of L* was 80 or higher
(111) B: the value of L* was 60 or higher and lower than 80
(112) C: the value of L* was lower than 60
Chromaticity Evaluation of Examples 101 and 102 and Comparative Examples 101 and 102
(113) Using V-7200 F (manufactured by JASCO Corporation), an optical density (OD) of the obtained pattern in a wavelength range of 380 to 1100 nm per thickness of 1.0 am was calculated. Among the OD values, a minimum OD in a wavelength range of 380 to 1100 nm (a minimum value of the OD in a wavelength range of 380 to 1100 nm was extracted and was evaluated based on the following standards.
(114) A: the minimum OD was 3.0 or higher
(115) B: the minimum OD was 2.5 or higher and lower than 3.0
(116) C: the minimum OD was lower than 2.5
Chromaticity Evaluation of Example 201 and Comparative Example 201
(117) Using a spectrophotometer (manufactured by Hitachi High-Technologies Corporation, U-4100), a transmittance of the obtained pattern in a wavelength range of 360 to 700 nm was measured, and a maximum transmittance value in a wavelength range of 400 to 700 nm was evaluated based on the following standards.
(118) A: the maximum transmittance was lower than 10%
(119) B: the maximum transmittance was 10% or higher and lower than 20%
(120) C: the maximum transmittance was 20% or higher
(121) <Temporal Stability>
(122) Each of the compositions obtained as described above was dried using an oven under conditions of 160° C. for 1 hour. The mass was measured before and after drying to obtain a volatilization amount, and a difference between the mass of each of the compositions before drying and the volatilization amount to calculate “Solid Content before Centrifugal Separation”. In addition, centrifugal separation was performed on the obtained composition under conditions of room temperature and 3400 rpm for 50 minutes to obtain a supernatant liquid, and “Solid Content before Centrifugal Separation” of the supernatant liquid was calculated using the same method as described above. A difference between “Solid Content before Centrifugal Separation” and “Solid Content after Centrifugal Separation” was divided by “Solid Content before Centrifugal Separation” to calculate a solid content sedimentation rate by percentage, classification was performed as described below, and temporal stability was evaluated. The evaluation A, B, C, or D was determined to have no problems in practice.
(123) The evaluation A, B, or C is preferable, the evaluation A or B is more preferable, and the evaluation A is still more preferable. The obtained results are shown in Table 1 below.
(124) A: the solid content sedimentation rate was in a range of 2 mass % or lower
(125) B: the solid content sedimentation rate was in a range of higher than 2 mass % and 5 mass % or lower
(126) C: the solid content sedimentation rate was in a range of higher than 5 mass % and 10 mass % or lower
(127) D: the solid content sedimentation rate was in a range of higher than 10 mass % and 15 mass % or lower
(128) E: the solid content sedimentation rate was higher than 15 mass %
(129) <Defects>
(130) Each of the compositions obtained as described above was applied to an 8-inch silicon wafer with an undercoat layer (manufactured by Fujifilm Electronic Materials Co., Ltd., CT-4000L, thickness: 0.1 μm) using a spin coater such that the thickness after drying was 4.0 μm. The coating film was heated (pre-baked) using a hot plate at 110° C. for 120 seconds. As a result, a composition layer was formed. Using a defect evaluation device Com PLUS (manufactured by Applied Materials Inc.), the number of foreign matters having a size of 5.0 jam or more in the substrate on which the composition layer was formed was counted.
(131) This evaluation was performed on each of the composition immediately after the preparation and the composition after 1-month storage at room temperature (23° C.), and a foreign matter increase rate was evaluated based on the following determination standards.
(132) The foreign matter increase rate was calculated from (Number of Defects after 1-Month Storage at Room Temperature/Number of Defects immediately after Preparation) The evaluation A or B is preferable, and the evaluation A is more preferable. The obtained results are shown in Table 1 below.
(133) A: lower than 1.1
(134) B: 1.1 or higher and lower than 1.5
(135) C: 1.5 or higher
(136) TABLE-US-00006 TABLE 6 Curing Temporal Maximum Value Composition Properties Chromaticity Stability Defect of Transmittance Example 1 Composition 1 B B B B B Example 2 Composition 2 A A A A A Example 3 Composition 3 A A A B A Example 4 Composition 4 A B B B B Example 5 Composition 5 B B B B B Example 6 Composition 6 B B C B B Example 7 Composition 8 B B B B B Example 8 Composition 9 A B B B B Example 9 Composition 10 B B C B B Example 10 Composition 11 C C C B C Example 11 Composition 12 A A A A A Example 12 Composition 13 A A B A A Example 13 Composition 14 A A B A A Example 14 Composition 15 B B C A B Example 15 Composition 16 A A B A A Example 16 Composition 17 A A B A A Example 17 Composition 18 B B C B B Example 18 Composition 19 A A A A A Example 19 Composition 20 C C C C C Example 20 Composition 21 B B B C B Example 21 Composition 22 A A B B A Example 22 Composition 23 B B B B B Example 23 Composition 24 A A A B A Example 24 Composition 25 A A A B A Example 25 Composition 26 B B B B B Example 26 Composition 27 B B C C B Example 27 Composition 28 A A B B A Example 28 Composition 29 A A B B A Example 29 Composition 30 B B C C B Example 30 Composition 31 A A A B A Example 31 Composition 32 B B A B B Example 32 Composition 33 B B B B B Example 33 Composition 34 B B B C B Example 34 Composition 35 B B B B C Example 35 Composition 36 A B B B C Example 36 Composition 37 A A B B A Example 37 Composition 38 A A B B A Example 38 Composition 39 A A B B A Example 39 Composition 43 B B C C B Example 40 Composition 44 A A B B B Example 41 Composition 45 A A B B B Example 42 Composition 46 B B C C B Example 43 Composition 47 B B C B B Example 44 Composition 48 A A B B A Example 45 Composition 49 B B B B B Example 46 Composition 50 B B B B B Example 47 Composition 51 C C C C C Comparative Composition 7 E C D C C Example 1 Comparative Composition 55 D C E C C Example 2
(137) TABLE-US-00007 TABLE 7 Curing Temporal Maximum Value of Composition Properties Chromaticity Stability Defect Transmittance Example 101 Composition 40 C A B B A Example 102 Composition 41 C A B B A Comparative Composition 52 E B B C A Example 101 Comparative Composition 53 E B B C A Example 102
(138) TABLE-US-00008 TABLE 8 Curing Temporal Maximum Value of Composition Properties Chromaticity Stability Defect Transmittance Example 201 Composition 42 B A B C A Comparative Composition 54 D B B C A Example 201
(139) As shown above in the tables, a film having excellent curing properties and excellent chromaticity was able to be formed with each of the composition according to Examples, and the temporal stability of the composition was also excellent.