Dielectric Layer for Component Carrier With Varying Material Properties

Abstract

A dielectric layer for manufacturing a component carrier is described. The dielectric layer includes a first section including a first material having a first material property; and a second section including a second material having a second material property. The second material property is different from the first material property. A method for manufacturing such a component carrier and a component carrier including such a dielectric layer is further described.

Claims

1. A dielectric layer for manufacturing a component carrier, the dielectric layer comprising a first section comprising a first material having a first material property; and a second section comprising a second material having a second material property; wherein the second material property is different from the first material property.

2. The dielectric layer according to claim 1, wherein the first material and the second material are a laminable material and/or the first material and the second material are a printable material.

3. The dielectric layer according to claim 1, wherein the first section is a layer with at least one opening, in particular at least one through opening; and the second material is accommodated within the at least one opening.

4. The dielectric layer according to claim 1, wherein the first material property and/or the second material property is a physical, a chemical, and/or a biological property.

5. The dielectric layer according to claim 1, wherein the first material property and/or the second material property is a material property of the group consisting of Young modulus, mechanical robustness, coefficient of thermal expansion, thermal conductivity, electrical conductivity, magnetic permeability, electromagnetic radiation shielding capability, high frequency behavior, rheological properties such as flow behavior, halogen content, and solvent content.

6. The dielectric layer according to claim 1, wherein the dielectric layer comprises at least one of the following features: (a) a first thickness of the first section is the same as a second thickness of the second section; (b) the dielectric layer has panel format, in particular has a size of at least 12×18 inch.sup.2 and further in particular of at least 18×24 inch.sup.2.

7. The dielectric layer according to claim 1, wherein at least one of the first material and the second material comprises a curable material, in particular a curable material capable of cross-linking and/or polymerizing by the application of heat and/or pressure.

8. The dielectric layer according to claim 1, wherein, within a border region between the first section and the second section, the first material is cross linked at least partially with the second material.

9. The dielectric layer according to claim 1, wherein the dielectric layer comprises at least one of the following features: (a) at least one of the first material and the second material is made or comprises a solid material; and (b) at least one of the first material and the second material is made or comprises a liquid material, a granulate, a paste, or a material that is partially cured.

10. The dielectric layer according to claim 1, wherein the dielectric layer comprises at least one of the following features: (a) at least one of the first material and the second material comprises reinforcing particles, in particular glass fibers or glass spheres; (b) at least one of the first material and the second material is free from reinforcing particles, in particular free from glass fibers and glass spheres; and (c) the first material has a first type of filler particles and the second material has a second type of filler particles being different from the first type of filler particles.

11. A method for manufacturing a component carrier, the method comprising: laminating a stack comprising at least one electrically conductive layer structure and at least one electrically insulating layer structure, wherein at least one of the at least one electrically insulating layer structure is configured as a dielectric layer comprising a first section comprising a first material having a first material property; and a second section comprising a second material having a second material property; wherein the second material property is different from the first material property.

12. A component carrier, comprising: a laminated stack comprising at least one electrically conductive layer structure and at least one electrically insulating layer structure; wherein at least one of the at least one electrically insulating layer structure is a dielectric layer with different sections having different material properties, wherein materials of the sections are mutually permeated at interfaces between different sections.

13. The component carrier according to claim 12, further comprising: a component embedded in the stack, in particular at or next to the dielectric layer.

14. The component carrier according to claim 13, wherein the embedded component is adjacent to a section of the dielectric layer which section comprises a material having a lower Young modulus than at least one other section of the dielectric layer.

15. The component carrier according to claim 14, wherein the embedded component is adjacent to a section of the dielectric layer which section comprises a material having a higher thermal conductivity than at least one other section of the dielectric layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0072] FIG. 1 illustrates a fabrication of a dielectric layer with spatially varying material properties by punching out complementary material pieces from two different dielectric layers and assembling the complementary material pieces.

[0073] FIG. 2 shows in a top view a dielectric layer comprising six insertions of a dielectric material B placed within spatially corresponding cut outs formed within a dielectric layer made from a dielectric material A.

[0074] FIG. 3 shows in a top view a dielectric layer comprising four insertions of a dielectric material B and two insertions of a dielectric material C placed within spatially corresponding cut outs formed within a dielectric layer made from a dielectric material A.

[0075] FIG. 4 shows a component carrier with an embedded component and two dielectric layers each having varying material properties.

[0076] FIG. 5 shows a component carrier with an embedded component and one dielectric layer having varying material properties.

DETAILED DESCRIPTION OF ILLUSTRATED EMBODIMENTS

[0077] It is noted that in different figures, similar or identical elements or features are provided with the same reference signs or with reference signs, which are different from the corresponding reference signs only within the first digit. In order to avoid unnecessary repetitions, elements, or features, which have already been elucidated with respect to a previously described embodiment, are not elucidated again at a later position of the description.

[0078] FIG. 1 illustrates a fabrication of a dielectric layer 100 in accordance with an embodiment of the invention. As can be taken from the top left portion of FIG. 1, a dielectric layer 120 consisting of a uniform dielectric material MB gets cut into spatially defined material pieces 120b. Thereby, a punching out procedure can be employed. Further, as can be taken from the bottom left portion of FIG. 1, a dielectric layer 110 consisting of a uniform dielectric material MA is also punched such that within the dielectric layer 110 punched out recesses or cavities 110a are formed. Thereby, the recesses 110a extend through the entire thickness of the dielectric layer 110. The size of respectively one of the material pieces 120b corresponds to the size of respectively one of the recesses or cavities 110a.

[0079] As can be taken from the right portion of FIG. 1, the material pieces 120b are inserted into the recesses or cavities 110a. As a result, the dielectric layer 100 comprises regions made from the dielectric material MA and other regions made from the (different) dielectric material MB. Thereby, both dielectric materials MA and MB have the same thickness. This results in that the dielectric layer 100, although consisting of different materials with different material properties, has a uniform thickness. This is visualized in the cross-sectional view of the resulting dielectric layer 100 depicted in FIG. 1 at left (below the top view of the dielectric layer 100).

[0080] It is mentioned that depending on the types of the source dielectric materials MA and MB a mixture of different material properties in one and the same dielectric layer 100 is possible. Exemplary material properties are for instance

[0081] low/high dielectric permittivity,

[0082] low/high elastic modulus,

[0083] low/high halogen content,

[0084] presence/absence of glass fibers, and

[0085] low/high Coefficient of Thermal Expansion (CTE).

[0086] FIG. 2 shows in a top view a dielectric layer 200 comprising six insertions of a dielectric material MB placed within spatially corresponding cut outs formed within a dielectric layer made from a dielectric material MA. According to the exemplary embodiment described here both dielectric materials are prepreg materials.

[0087] Further, according to the exemplary embodiment described here the dielectric prepreg material MB provides a functional material property which is suitable for a non-depicted embedded component being located below the respective material piece MB. Thereby, the functional material property may be for instance a good heat transfer capability for dissipating heat generated within the respective embedded component during operation. The material property of the prepreg material MA, which is located farer off the non-depicted embedded components, may be for instance a low elastic modulus. This may allow to reduce an unwanted warpage of a component carrier comprising the entire dielectric layer 200.

[0088] FIG. 3 shows in a top view a dielectric layer 300 according to a further embodiment of the invention. The dielectric layer 300 comprises (a) four material insertions of a dielectric material MB and (b) two material insertions of a dielectric material MC. All the material insertions are located within spatially corresponding cutouts formed within a basic dielectric layer made from a dielectric material MA.

[0089] FIG. 4 shows a component carrier 450 with an embedded component 470 and two dielectric layers each having spatially different or varying material properties. One dielectric layer 400 (with varying material properties) is located above the embedded component 470 and a further dielectric layer 402 (with varying material properties) is located below the embedded component 470.

[0090] The embedded component 470 is located without a recess formed within a core 460 of the component carrier 450. The size of the recess is slightly larger than the size of the embedded component 470. This means that the embedded component 470 is not in direct mechanical contact with the core 460. Instead, there is a dielectric material A, which is also comprised in the two dielectric layers 400 and 402, which accommodates the embedded component 470.

[0091] As can be taken from FIG. 4, the upper dielectric layer 400 comprises a dielectric material A with a comparatively large insert of a dielectric material B. The lower dielectric layer 402 comprises the dielectric material A with two comparatively small inserts of the dielectric material B. According to the exemplary embodiment described here the dielectric material B is a material which can be etched (easily) by a usual plasma etching procedure. For such a plasma etching procedure the/a concept of conformal masks can be employed.

[0092] It is mentioned that it is also possible to choose a dielectric material B with a sufficiently higher etch rate than material A. Hence, the sections with material A can be etched away much easier. Such a difference in the capability to be etched may provide the advantage that there is no need to add a conformal mask at all as the sections with material A are more readily etchable. Thereby, voids may be realized without a need to employ laser radiation or mechanical drilling.

[0093] Specifically, an opening within an upper metal/copper layer 480a can be used for a spatially selective plasma etching process at the upper side of the component 470. Thereby, the upper surface of the component 470 can be exposed. Further, two openings within a lower metal/copper layer 480b can be used for a spatially selective plasma etching process at the lower side of the component 470. Thereby, contact pads 485 of the component 470 may be exposed in order to electrically connect, with non-depicted further process steps, the component 470 to further non-depicted electric circuitry.

[0094] Employing the conformal mask concept in connection with the use of a proper plasma etchable material B may provide the advantage that the component 470 can be (partially) exposed without causing a large thermal stress for the component 470.

[0095] FIG. 5 shows a component carrier 550 in accordance with a further embodiment of the invention. The component carrier 550 may result from a further processing of the component carrier 450 depicted in FIG. 4. Thereby, the two small regions with the material B at the bottom side have been removed by plasma etching and the resulting voids have been filled with an electrically conductive material in order to form metallic interconnects 590. These metallic interconnects 590 are used for electrically connecting the embedded component 470 with a so far not structured/patterned metal layer 480b.

[0096] According to the exemplary embodiment described here the material B exhibits improved heat transfer properties as compared to the material A. This provides for a better heat transfer away from the component to outer non-depicted layer(s) of the component carrier 550. The material B may be for instance a thermo prepreg material or a heat transfer paste.

[0097] It should be noted that the term “comprising” does not exclude other elements or steps and the use of articles “a” or “an” does not exclude a plurality. Also, elements described in association with different embodiments may be combined. It should also be noted that reference signs in the claims should not be construed as limiting the scope of the claims.

LIST OF REFERENCE SIGNS

[0098] 100 dielectric layer with varying material properties [0099] 110 dielectric material A [0100] 110a punched out recess [0101] 120 dielectric material B [0102] 120b punched out material piece [0103] MA dielectric material A [0104] MB dielectric material B [0105] MC dielectric material C [0106] 200 dielectric layer with varying material properties [0107] 300 dielectric layer with varying material properties [0108] 400 dielectric layer with varying material properties [0109] 402 further dielectric layer with varying material properties [0110] 450 component carrier [0111] 460 core structure [0112] 470 embedded component [0113] 480a metal layer/copper layer [0114] 480b metal layer/copper layer [0115] 485 contact pad [0116] A dielectric material A [0117] B dielectric material B [0118] 550 component carrier [0119] 590 metallic interconnect