METHOD AND APPARATUS FOR PRODUCING AN OBJECT BY MEANS OF ADDITIVE MANUFACTURING
20210276098 · 2021-09-09
Assignee
Inventors
- Ronnie Herman Anna HENSEN (Eindhoven, NL)
- Mark Herman Else Vaes (Eindhoven, NL)
- Rob Peter Albert Haendel (Eindhoven, NL)
Cpc classification
B22F10/32
PERFORMING OPERATIONS; TRANSPORTING
B23K26/34
PERFORMING OPERATIONS; TRANSPORTING
B33Y10/00
PERFORMING OPERATIONS; TRANSPORTING
B22F10/28
PERFORMING OPERATIONS; TRANSPORTING
B33Y30/00
PERFORMING OPERATIONS; TRANSPORTING
B33Y40/00
PERFORMING OPERATIONS; TRANSPORTING
B29C64/371
PERFORMING OPERATIONS; TRANSPORTING
B22F12/90
PERFORMING OPERATIONS; TRANSPORTING
B33Y50/02
PERFORMING OPERATIONS; TRANSPORTING
International classification
B22F10/32
PERFORMING OPERATIONS; TRANSPORTING
B22F10/28
PERFORMING OPERATIONS; TRANSPORTING
B23K26/34
PERFORMING OPERATIONS; TRANSPORTING
B33Y10/00
PERFORMING OPERATIONS; TRANSPORTING
B33Y30/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
Method for producing an object by means of additive manufacturing, wherein said method comprises the steps of: receiving, in a process chamber, a bath of material, wherein a surface level of said bath of material defines an object working area; solidifying, by a solidifying device, a selective layer-part of said material on said surface level; controlled oxidisation, of waste particles originating from said solidifying of said material, by controlling an oxygen level, such that oxidised waste particles are obtained and ignition of said waste particles is avoided. Apparatus for producing an object by means of additive manufacturing.
Claims
1-28. (canceled)
29. A method for producing an object by additive manufacturing, the method comprising the steps of: receiving, in a process chamber, a bath of material, wherein a surface level of the bath of material defines an object working area; solidifying, by a solidifying device, a selective layer-part of the material on the surface level; and controlled oxidization, of waste particles originating from the solidifying of the material, by controlling an oxygen level, such that oxidized waste particles are obtained and ignition of the waste particles is avoided.
30. The method according to claim 29, further comprising the step of extracting, by an extracting device, a mixture of gas and the waste particles from the process chamber.
31. The method according to claim 30, further comprising the step of filtering, by a filter device, the extracted mixture of the gas and the waste particles for collecting the waste particles.
32. The method according to claim 31, further comprising the step of transferring the waste particles, collected by the filter device, to a storage device for storing the waste particles removed from the filter device, wherein the storage device is configured for the controlled oxidization.
33. The method according to claim 29, further comprising the step of measuring, by a measurement device, the oxygen level in the process chamber.
34. The method according to claim 29, wherein during the step of controlled oxidization a controlled amount of oxygen is supplied to the waste particles for obtaining the oxidized waste particles while avoiding ignition of the waste particles.
35. The method according to claim 34, wherein the controlled amount of oxygen is supplied to the waste particles based on the measured oxygen level.
36. The method according to claim 34, further comprising the step of determining an oxidization rate based on the measured oxygen level and the supplied amount of oxygen.
37. The method according to claim 29, wherein during the step of controlled oxidization a controlled amount of chalk is supplied to the waste particles for preventing oxidization of a subset of the waste particles.
38. The method according to claim 29, wherein the process chamber is configured for allowing, during the step of solidifying, ambient air to enter the process chamber, and wherein during the step of controlled oxidization a controlled amount of inert gas is supplied to the process chamber for realizing a desired oxygen level in the process chamber for controlled oxidization of the waste particles for obtaining the oxidized waste particles.
39. The method according to claim 38, wherein the controlled amount of inert gas is supplied based on the determined oxidization rate.
40. The method according to claim 29, wherein during the step of solidifying, the oxygen level in the process chamber is in the range of 50 ppm to 1000 ppm.
41. The method according to claim 29, wherein the controlled oxidization is performed during the step of solidifying.
42. The method according to claim 41, wherein the controlled oxidization is performed in the process chamber, wherein the oxygen level in the process chamber during the solidifying is in the range of 50 ppm to 1000 ppm, and wherein the oxygen level is maintained constant during the solidifying.
43. The method according to claim 29, wherein the controlled oxidization is performed during a step of filtering, by a filter device, the extracted mixture of the gas and the waste particles for collecting the waste particles and/or during a step of transferring the waste particles, collected by the filter device, to a storage device for storing the waste particles removed from the filter device, wherein the storage device is configured for the controlled oxidization.
44. The method according to claim 29, wherein the material is a metal powder.
45. The method according to claim 30, wherein the extracted gas is returned to the process chamber.
46. The method according to claim 33, wherein during the step of solidifying, the solidifying device is controlled for controlling the solidifying based on the measured oxygen level and a determined oxidization rate based on the measured oxygen level and the supplied amount of oxygen.
47. The method according to claim 31, wherein the controlled oxidization is performed during the step of filtering and/or during a step of transferring the waste particles, collected by the filter device, to a storage device for storing the waste particles removed from the filter device, wherein the storage device is configured for the controlled oxidization.
48. The method according to claim 47, wherein the filter device and/or the storage device is configured for allowing, during the step of solidifying, ambient air to enter the filter device and/or the storage device, wherein during the step of controlled oxidization a controlled amount of inert gas is supplied to the filter device and/or the storage device for realizing a desired oxygen level in the filter device and/or the storage device for controlled oxidization of the waste particles for obtaining the oxidized waste particles.
49. The method according to claim 48, wherein the controlled amount of inert gas is supplied based on the determined oxidization rate.
50. An apparatus for producing an object by additive manufacturing, comprising: a process chamber for receiving a bath of material, wherein a surface level of the bath of material defines an object working area; a solidifying device for solidifying a selective layer-part of the material on the surface level; and an oxidization device configured for controlled oxidization of waste particles originating from the solidifying of the material, by controlling an oxygen level, in use, such that oxidized waste particles are obtained and ignition of the waste particles is avoided.
51. The apparatus according to claim 50, further comprising an extracting device for extracting a mixture of gas and the waste particles from the process chamber.
52. The apparatus according to claim 51, further comprising a filter device for collecting the waste particles from the extracted mixture of the gas and the waste particles.
53. The apparatus according to claim 50, further comprising a storage device for storing the waste particles, wherein the storage device is configured for the controlled oxidization.
54. The apparatus according to claim 50, wherein the oxidization device is configured for maintaining an oxygen level in the process chamber, in use, during solidification of the material, in the range of 50 ppm to 1000 ppm.
55. The apparatus according to claim 50, further comprising a measurement device for measuring an oxygen level in the process chamber.
56. The apparatus according to claim 55, wherein the measurement device is configured for measuring an oxygen level in at least one of the filter device and a storage area of a storage device for storing the waste particles, wherein the storage device is configured for the controlled oxidization.
Description
[0058] The method and apparatus according to the present disclosure will next be explained by means of the accompanying figures. In the figures:
[0059]
[0060]
[0061]
[0062]
[0063]
[0064] Apparatus 1 is provided with an oxidization device 81 coupled to an oxygen supply (not shown). The oxygen supply may contain dry clean air comprising approximately 20% oxygen and 80% nitrogen. The oxidization device 81 further comprises a supply organ 83 for supplying oxygen from the oxygen supply into the process chamber 3. The process chamber 3 is substantially air tight and may be filled with an inert gas such as Argon or nitrogen via a gas supply 6.
[0065] A measurement device 85 comprising a sensor 86 is provided for measuring the oxygen level in the process chamber 3. The measurement device 85 and the oxidization device 81 are communicatively coupled to a controller 87. The controller 87 is arranged for controlling the amount of oxygen supplied via the supply organ 83 into the process chamber 3 taking into account the oxygen level in the process chamber 3 measured by the measurement device 85 for maintaining the oxygen level in the process chamber 3 at a predetermined concentration within a predetermined range of 50 ppm to 1000 ppm.
[0066] Alternatively, it is conceivable that the oxygen level in the process chamber of apparatus 1 is maintained at a predetermined concentration within a predetermined range of 50 ppm to 1000 ppm by communicatively coupling the gas supply 6 to the controller 87 instead or in addition to the coupling of the oxygen supply to the controller 87. In this alternative configuration of apparatus 1, wherein air may leak into the process chamber, the oxygen level may be controlled by controlling the amount of inert gas supplied via the gas supply 6 into the process chamber taking into account the oxygen level in the process chamber 3 measured by the measurement device 85.
[0067] A further embodiment of an apparatus 101 according to the present disclosure is shown in
[0068] Measurement device 185 comprises sensor 186 and a further sensor 188. Sensor 186 is provided for measuring the oxygen level in the process chamber 103. The further sensor 188 is arranged for measuring the oxygen level in the filter device 191. The measurement device 185 and the oxidization device 181 are communicatively coupled to a controller 187. The controller 187 is arranged for controlling the amount of oxygen supplied via the supply organ 183 into the process chamber 103 taking into account the oxygen level in the process chamber 103 measured by the measurement device 185 for maintaining the oxygen level in the process chamber 103 at a predetermined concentration within a predetermined range of 50 ppm to 1000 ppm. The controller 187 is further arranged for controlling the amount of oxygen supplied via the further supply organ 110 into the filter device 191 taking into account the further oxygen level in the filter device 191 at a predetermined concentration within a predetermined range of 50 ppm to 1000 ppm.
[0069] The waste particles and the oxidized waste particles, collected by the filter device 191, are transferable to a storage device 197 for storing the waste particles and the oxidized waste particles. The waste particles are removable from the filter device 191 by applying a flow of gas in a reverse direction, i.e. from the side of the return line 195. To this end, the apparatus 101 is provided with a cleaning nozzle 190 that is directed to the clean side of the filter device 191 for providing said flow of gas in said reverse direction. Alternatively, it is conceivable that the waste particles and the oxidized waste particles may be removed from the filter device by vibrating the filter device.
[0070] Apparatus 101 is further provided with a chalk supply 108 for supplying chalk to the filter device 191 at a side of the filter device 191 turned away from the return line 195. The chalk supply 108 is arranged for applying a layer of chalk to the filter device 191 for binding the waste particles to the chalk applied to the filter device 191. Any chalk applied to the filter device 191 may be removed from the filter device 191 and stored in the storage device 197 by applying said flow of gas in said reverse direction or said vibrating action. The chalk supply 108 is communicatively coupled to the controller 187 for controlling the amount of chalk supplied by said chalk supply 108 taking into account said measured oxygen level and/or said further oxygen level and/or said amount of oxygen supplied to said mixture of gas, waste particles and oxidized waste particles.
[0071]
[0072] In the embodiment shown in
[0073] It can be seen furthermore in
[0074]
[0075] Using the apparatus 1, waste particles originating from solidification of material 4, either directly or after condensation, by irradiation of the material 4 with the laser device 7, may be oxidized in a controlled manner by controlling the oxygen level in the process chamber 3. The oxygen level in the process chamber 3 is measured during solidification of the material 4 using sensor 86. The measured oxygen level is compared to a target oxygen level by the controller 87. If it is determined that the oxygen level in the process chamber 3 is below the predetermined level, oxygen is supplied via the supply organ 83 into the process chamber 3 until the predetermined oxygen level is realized. The oxygen level in the process chamber 3 is maintained at the predetermined value by continuously supplying oxygen via the supply organ 83. Based on the rate of oxygen supply via the supply organ 83 and the measured oxygen level in the process chamber 3 an oxidization rate is determined by said controller 87. A relative low oxidization rate may be used as an indication that the waste particles are produced at a relative low rate or that a relative large amount of the waste particles are oxidized. If it is determined that a relative high oxidation rate occurs at or below the target oxygen level the solidification rate of the material may be reduced for maintaining a relative safe operating condition.
[0076] Using the apparatus 201, waste particles originating from solidification of material 204, either directly or after condensation, by irradiation of the material 204 with the laser device 207 and further laser 207′, may be oxidized in a controlled manner by controlling the oxygen level in the process chamber 203 in a manner similar as describe before when using apparatus 1.
[0077] Using apparatus 101, waste particles originating from solidification of material 104, either directly or after condensation, by irradiation of the material 104 with the laser device 107, may be oxidized in a controlled manner by controlling the oxygen level in the process chamber 103 and by controlling a further oxygen level in the filter device 191. The oxygen level in the process chamber 103 is measured during solidification of the material 104 using sensor 186. The measured oxygen level is compared to a target oxygen level by the controller 187. If it is determined that the oxygen level in the process chamber 103 is below the predetermined level, oxygen is supplied via the supply organ 183 into the process chamber 103 until the predetermined oxygen level is realized. The oxygen level in the process chamber 103 is maintained at the predetermined value by continuously supplying oxygen via the supply organ 183. Based on the rate of oxygen supply via the supply organ 183 and the measured oxygen level in the process chamber 103 an oxidization rate is determined by said controller 187.
[0078] The further oxygen level in the filter device 191 is measured during solidification of the material 104 using sensor 188. The measured further oxygen level is compared to a target oxygen level by the controller 187. If it is determined that the oxygen level in the filter device 191 is below the predetermined level, oxygen is supplied via the further supply organ 110 into the filter device 191 until the predetermined further oxygen level is realized. The oxygen level in the filter device 191 is maintained at the predetermined value by continuously supplying oxygen via the further supply organ 110. Based on the rate of oxygen supply via the further supply organ 110 and the measured oxygen level in the filter device 110 a further oxidization rate is determined by said controller 187.
[0079] After filtering the waste particles and the oxidized waste particles in the filter device 191, the filtered gas is returned via return line 195 back into the process chamber 103. If it is determined that the further oxidization rate is zero, or relatively low, the waste particles and the oxidized waste particles are removed from the filter device 191 and transferred to the storage device 197 by applying a flow of gas in a reverse direction using the cleaning nozzle 190.
[0080] Using the apparatus 301, waste particles originating from solidification of material 304, either directly or after condensation, by irradiation of the material 304 with the laser device 307 and further laser 307′, may be oxidized in a controlled manner in a manner similar as describe before when using apparatus 101.