Sensor Package and Method of Producing the Sensor Package
20210229981 · 2021-07-29
Inventors
- Willem Frederik Adrianus Besling (JN Eindhoven, NL)
- Casper Van Der Avoort (Waalre, NL)
- Coenraad Cornelis Tak (Waalre, NL)
- Remco Henricus Wilhelmus Pijnenburg (Hoogeloon, NL)
- Olaf Wunnicke (AE Eindhoven, NL)
- Hendrik Bouman (Nijmegen, NL)
Cpc classification
H01L2924/16152
ELECTRICITY
B81C1/0023
PERFORMING OPERATIONS; TRANSPORTING
B81B2207/015
PERFORMING OPERATIONS; TRANSPORTING
H01L2924/00014
ELECTRICITY
B81C2203/0785
PERFORMING OPERATIONS; TRANSPORTING
H01L2224/32014
ELECTRICITY
B81B7/0048
PERFORMING OPERATIONS; TRANSPORTING
H01L2924/00014
ELECTRICITY
H01L2924/16151
ELECTRICITY
International classification
B81B7/00
PERFORMING OPERATIONS; TRANSPORTING
B81C1/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A sensor package and a method for producing a sensor package are disclosed. In an embodiment a method for producing a sensor package includes providing a carrier including electric conductors, fastening a dummy die or interposer to the carrier, providing an ASIC device including an integrated sensor element and fastening the ASIC device to the dummy die or interposer.
Claims
1. A method for producing a sensor package, the method comprising: providing a carrier including electric conductors; fastening a dummy die or interposer to the carrier; providing an ASIC device comprising an integrated sensor element; and fastening the ASIC device to the dummy die or interposer.
2. The method according to claim 1, wherein the ASIC device is fastened to the dummy die or interposer by an adhesive layer.
3. The method according to claim 2, wherein the adhesive layer comprises silicone.
4. The method according to claim 2, wherein the adhesive layer is formed at least 80 μm thick.
5. The method according to claim 1, wherein the dummy die or interposer is fastened to the carrier by a bond layer comprising a die attach foil.
6. The method according to claim 1, wherein the sensor element is arranged on a portion of the ASIC device that laterally overhangs the dummy die or interposer.
7. The method according to claim 1, wherein a coefficient of thermal expansion of the dummy die or interposer is adapted to a coefficient of thermal expansion of the ASIC device.
8. The method according to claim 1, further comprising providing a cover with an opening, wherein the dummy die or interposer and the ASIC device are arranged between the carrier and the cover.
9. The method according to claim 1, wherein the dummy die or interposer includes an electrically inactive semiconductor substrate.
10. The method according to claim 1, wherein the dummy die or interposer comprises an insulator or glass.
11. The method according to claim 1, wherein the dummy die or interposer has smaller lateral dimensions than the ASIC device so that a lateral overhang is formed on at least one lateral side of the ASIC device.
12. The method according to claim 1, wherein the dummy die or interposer has smaller lateral dimensions than the ASIC device so that a lateral overhang is formed on at least two lateral side of the ASIC device.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0016] The following is a detailed description of examples of the sensor package and the method of production in conjunction with the appended figures.
[0017]
[0018]
[0019]
[0020]
[0021]
DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS
[0022]
[0023] The carrier 1 may be a printed circuit board, for instance, in particular a laminate. The terminal contacts 12 on the rear surface 11 of the carrier 1 may be formed in the shape of a land grid array, for instance. The integrated electric conductors 13 may provide a wiring or redistribution. The dummy die or interposer 4 may comprise semiconductor material, which may in particular be silicon, and may especially include an electrically inactive semiconductor substrate. The dummy die or interposer 4 may instead comprise an insulator or glass, for instance. The coefficient of thermal expansion of the insulator or glass may in particular be adapted to the coefficient of thermal expansion of the ASIC device 6.
[0024] The bottom pad 2 is optional. The bond layer 3 may be a die attach foil, for instance.
[0025] The adhesive layer 5 may especially comprise silicone, i. e. a compound obtained by polymerizing siloxane. The silicone may be applied like a glue to fasten the ASIC device 6 to the dummy die or interposer 4. The thickness t of the adhesive layer 5 is larger than 60 μm, typically at least 80 μm for an effective mechanical decoupling between the ASIC device 6 and the dummy die or interposer 4.
[0026] The ASIC device 6 may be a CMOS device, for instance. The sensor element 7 may be any conventional sensor, especially a pressure sensor or array of pressure sensors, which may be realized as a microelectromechanical system, for instance. The sensor element 7 may also comprise a sensor sensitive to stress. The mechanical decoupling of the ASIC device 6 from the carrier 1 is improved if the dummy die or interposer 4 has smaller lateral dimensions than the ASIC device 6, so that a lateral overhang 15 is formed at least on one lateral side or edge of the ASIC device 6. The overhang 15 may be considerably larger than the overhang 15 shown in
[0027] The electric interconnections 8 between the ASIC device 6 and contact pads 14 on the top surface 10 of the carrier 1 may be bond wires, for instance, as shown in
[0028] Typically the thickness of the carrier 1 may be in the range from 130 μm to 170 μm, the thickness of the bond layer 3 about 20 μm, the thickness of the dummy die or interposer 4 in the range from 50 μm to 200 μm, the thickness of the adhesive layer 5 in the range from 60 μm to more than 100 μm, the height h of the ASIC device 6 in the range from 140 μm to 400 μm, and the overall height H of the sensor package, including the cover 9, in the range from 600 μm to 1100 μm.
[0029]
[0030]
[0031]
[0032]
[0033] The sensor package is especially favorable for stress sensitive sensors. The sensor element and the circuitry are integrated on a single die, which allows to reduce the overall height of the sensor package substantially. At the same time stress decoupling is enhanced by the electrically inactive dummy die or interposer. Stress caused by thermal expansion is prevented if the coefficient of thermal expansion of the dummy die or interposer is adapted to the coefficient of thermal expansion of the ASIC device, in particular if the dummy die or interposer comprises the same semiconductor material and hence the same coefficient of thermal expansion as the ASIC device.
[0034] While this invention has been described with reference to illustrative embodiments, this description is not intended to be construed in a limiting sense. Various modifications and combinations of the illustrative embodiments, as well as other embodiments of the invention, will be apparent to persons skilled in the art upon reference to the description. It is therefore intended that the appended claims encompass any such modifications or embodiments.