Apparatus for additively manufacturing three-dimensional objects

Abstract

Apparatus (1) for additively manufacturing of three-dimensional objects by means of successive layerwise selective irradiation and consolidation of layers of a build material which can be consolidated by means of an energy beam, with a stream generating unit (2) configured to generate a stream of a process gas (3) being capable of being charged with particles (4), in particular non-consolidated particulate build material and/or smoke and/or smoke residues, generated during operation of the apparatus (1) and a filter unit (5) configured to separate particles (4) from the stream of process gas (3), wherein the filter unit (5) comprises a filter chamber (6) with at least one filter element (7) at least partly arranged in the streaming path of the generated stream of process gas (3), wherein particles (4) in the stream of process gas (3) are separated from the process gas (3) by the filter element (7).

Claims

1. A system for additively-manufacturing three-dimensional objects, the system comprising: a plurality of apparatuses respectively comprising a process chamber configured to additively manufacture three-dimensional objects by successive layerwise selective irradiation and consolidation of layers of a powdered build material; a stream generating unit configured to generate a stream of process gas and to circulate the stream of process gas through a corresponding one of one or more streaming paths, the corresponding one of the one or more streaming paths respectively comprising a process chamber inlet and a process chamber outlet such that the process gas flows through the process chamber of a respective one of the plurality of apparatuses, thereby accumulating and removing charged particles therefrom; a filter unit disposed along the corresponding one of the one or more streaming paths, the filter unit configured and arranged such that the process gas having accumulated charged particles flows therethrough, the filter unit thereby separating the charged particles from the process gas; one or more particle reception chambers respectively coupled to the filter unit and/or a corresponding further filter unit by one or more particle guides, the one or more particle reception chambers configured and arranged to receive charged particles having been separated from the process gas; a passivation unit configured and arranged to supply a passivation material to the one or more particle guides and/or the one or more particle reception chambers; and a driving unit configured to facilitate movement of the one or more particle reception chambers.

2. The system of claim 1, comprising: at least two filter units respectively comprising a particle outlet coupled to the one or more particle guides.

3. The system of claim 2, wherein the one or more particle guides are coupled to the one or more particle reception chambers, and wherein the one or more particle reception chambers comprises a common particle reception chamber configured to receive charged particles having been separated from the process gas flowing from at least a first process chamber and a second process chamber of respective ones of the plurality of apparatuses.

4. The system of claim 1, wherein the filter unit comprises a particle outlet and a valve configured to close the particle outlet; and/or wherein the one or more particle reception chambers comprise a particle inlet and a valve configured to close the particle inlet.

5. The system of claim 1, wherein the filter unit comprises a particle outlet and the one or more particle reception chambers comprise a particle inlet, and wherein the one or more particle guides respectively comprise one or more valves configured to close the particle outlet and the particle inlet.

6. The system of claim 5, wherein the one or more valves configured to close the particle outlet and the particle inlet comprises a split butterfly valve or at least two disc valves.

7. The system of claim 1, wherein the one or more particle reception chambers are decouplable from the one or more particle guides.

8. The system of claim 7, wherein the one or more particle reception chambers respectively comprise a movement assembly such that the one or more particle reception chambers are movable when decoupled from the one or more particle guides, the movement assembly comprising a plurality of wheels.

9. The system of claim 1, wherein the one or more particle reception chambers respectively comprise a fill level indicator configured to indicate a fill level of particles and/or passivating material inside the respective one of the one or more particle reception chambers.

10. The system of claim 1, further comprising a further stream generating unit configured to generate a further stream of process gas and to circulate the stream of process gas through a further corresponding one of the one or more streaming paths, the further corresponding one of the one or more streaming paths respectively comprising a further process chamber inlet and a further process chamber outlet such that the process gas flows through a further process chamber of a further respective one of the plurality of apparatuses, thereby accumulating and removing charged particles therefrom; a further filter unit disposed along the further corresponding one of the one or more streaming paths, the further filter unit configured and arranged such that the process gas having accumulated charged particles flows therethrough, the further filter unit thereby separating the charged particles from the process gas.

11. The system of claim 1, wherein the passivating material comprises water or a powder.

Description

(1) Exemplary embodiments of the invention are described with reference to the FIG. The FIG. are schematic drawings, whereby

(2) FIG. 1 shows a principle drawing of an apparatus for additively manufacturing three-dimensional objects according to an exemplary embodiment;

(3) FIG. 2 shows a detail of an apparatus for additively manufacturing three-dimensional objects according to an exemplary embodiment;

(4) FIG. 3 shows a filter unit of an apparatus for additively manufacturing three-dimensional objects according to an exemplary embodiment;

(5) FIG. 4 shows a filter unit of an apparatus for additively manufacturing three-dimensional objects according to an exemplary embodiment; and

(6) FIG. 5 shows a plant comprising two apparatuses for additively manufacturing three-dimensional objects according to an exemplary embodiment.

(7) FIG. 1 shows an apparatus 1 for additively manufacturing of three-dimensional objects by means of successive layerwise selective irradiation and consolidation of layers of a build material which can be consolidated by means of an energy beam. The apparatus 1 comprises a stream generating unit 2 configured to generate a stream of a process gas 3 (indicated by arrows) being capable of being charged with particles 4, in particular non-consolidated particulate build material and/or smoke and/or smoke residues, generated during operation of the apparatus 1 and a filter unit 5 configured to separate particles 4 from the stream of process gas 3. The filter unit 5 comprises a filter chamber 6 with at least one filter element 7 at least partly arranged in the streaming path of the generated stream of process gas 3, wherein particles 4 in the stream of process gas 3 are separated from the process gas 3 by the filter element 7.

(8) The process gas 3 enters the filter chamber 6 via a process gas inlet 8 and exits the filter chamber 6 via a process gas outlet 9. As can be seen from FIG. 1 the filter element 7 is arranged inside the fill the chamber 6 between the process gas in that 8 and the process gas outlet 9. The filter element 7 has a cylindrical shape, wherein particles 4 that are conveyed via the stream of process gas 3 into the filter chamber 6 come in contact with the filter element 7 and are thereby separated from the stream of process gas 3. The separated particles 4 fall down due to gravity and come in contact with a surface of a particle guide element 10 that is essentially funnel-shaped. The particle guide element 10 guides the particles 4 to a particle outlet 11 of the filter chamber 6. The particle outlet 11 of the filter chamber 6 is separately connected to a particle inlet 12 of a particle reception chamber 13 of the filter unit 5.

(9) FIG. 1 further shows that in the region of the particle outlet 11 and in the region of the particle inlet 12 a valve 14 is provided. Therefore, the connection between the filter chamber 6 and the particle reception chamber 13 of the filter unit 5 can be disconnected via the valves 14. In other words the opening or closing state of the valves 14 controls whether particles 4 can pass from the filter chamber 6 into the particle reception chamber 13 via the particle outlet 11 and the particle inlet 12.

(10) As can further be derived from FIG. 1 the particle reception chamber 13 can be disconnected from the filter chamber 6 of the filter unit 5 (depicted via a dashed line 15). Hence, it is possible, to close the valves 14 and therefore separate the particle reception chamber 13 from the filter chamber 6. Afterwards, the particle reception chamber 13 can be mechanically disconnected from the rest of the filter unit 5 and can be moved away, for example to a station in which the particle reception chamber 13 is cleaned and/or emptied.

(11) The stream generating unit 2 that generates the stream of process gas 3 is located downstream of the filter unit 5. In other words a process gas inlet 16 of the stream generating unit 2 is connected to a process gas outlet 9 of the filter unit 5. Therefore, the stream generating unit 2 only takes in process gas 3 that is rinsed of particles 4 via the filter unit 5. The stream of process gas 3 that enters a process chamber 17 of the apparatus 1 therefore, is free of particles 4.

(12) Additionally the apparatus 1 depicted in FIG. 1 comprises a pressure generating means 18 located topsides of the filter unit 5 and comprises a nozzle that extends into the inside or near the filter element 7. Via the pressure generating means 18 it is possible to generate an overpressure inside the filter chamber 6 to solve particles 4 that accumulated on the surface of the filter element 7.

(13) FIG. 2 shows an alternative exemplary embodiment of the valve 14 in which the valve 14 is built as a split butterfly valve. Hence, the sealing of the particle reception chamber 13 and the filter chamber 6 and the mechanical disconnection of the particle reception chamber 13 from the rest of the filter unit 5 is integrated into the valve 14 being built as a split butterfly valve.

(14) FIG. 3 shows an apparatus 1 as described before, wherein the particle reception chamber 13 comprises moving means 19. Therefore, the particle reception chamber 13 is movable via the moving means 19, in particular drivable via a motor connected to the moving means 19. It is further possible to arrange a motor or a driving unit in general, outside or separate to the particle reception chamber 13.

(15) FIG. 4 shows an apparatus 1 according to another exemplary embodiment. The apparatus 1 is basically built like the apparatus 1 as described before, therefore, the same numerals are used for the same components of the apparatus 1. Deviant from or additional to the apparatuses 1 described before the apparatus 1 depicted in FIG. 4 comprises a passivation unit 20 separably connected with the particle reception chamber 13. The passivation unit 20 is configured to fill passivating material 21 (depicted by an arrow) into the particle reception chamber 13. The passivating material 21 is preferably water, wherein any other passivating material 21 may be used that is configured to passivate the particles 4 inside the particle reception chamber 13, for example passivating material in powder form. To passivate the particles 4 inside the particle reception chamber 13 a valve 14 is provided in the connection between the passivation unit 20 and the particle reception chamber 13. Dependent on an opening state of the valve 14 the passivating material 21 can be filled into the particle reception chamber 13, for example sprayed, wherein the particles 4 can be wetted or moistened.

(16) FIG. 4 further shows a fill level indicator 22 that is configured to indicate a fill level of particles 4 and/or passivating material 21 inside the particle reception chamber 13. The fill level indicated by the fill level indicator 22 can further be sent to a control unit 23 so that corresponding process steps can be initiated by the control unit 23, such as the initiation of a change and/or a separation of the particle reception chamber 13 from the rest of the filter unit 5. Self-evidently, the control unit 23 may also control the opening state of the valves 14 and any other component of the apparatus 1 necessary for the manufacturing cycle.

(17) FIG. 5 shows a plant 24 exemplary comprising two apparatuses 1. Of course, the plant 24 can comprise a plurality of apparatuses 1 but for the sake of simplicity only two apparatuses 1 are depicted in this FIG. There are two filter units 5 assigned to the plant 24, wherein the particle outlets 11 of the filter chambers 6 of the filter units 5 are separably connected to a common particle guide means 25. The common particle guide means 25 is configured to convey the particles 4 that are filled in from the filter chambers 6 of the filter units 5 via their particle outlets 11 and are conveyed inside the common particle guide means 25 to a common particle reception chamber 26. Therefore, a passivation unit 20 is assigned to the plant 24 generating a stream of passivating material 21 and/or a stream of fluid containing passivating material 21. The passivating material 21 is filled into the common particle guide means 25 and conveys the particles 4 inserted into the common particle guide means 25 via the particle outlets 11 of the filter units 5 to the common particle reception chamber 26. Thereby, the particles 4 entering the common particle guide means 25 are not only conveyed to the common particle reception chamber 26 but are passivated at the same time as they come in contact with the passivating material 21 as soon as they enter the common particle guide means 25.

(18) FIG. 5 shows that a second common particle guide means 27 is provided that conveys the particles 4 and the passivating material 21 to a second common particle reception chamber 28. Of course, an arbitrary amount of common particle guide means 25, 27 and common particle reception chambers 26, 28 can be provided. It is also possible, to arrange and connect the various common particle guide means 25, 27 and the various common particle reception chambers 26, 28 in an arbitrary manner.

(19) All features, advantages and details depicted in the FIGS. 1 to 5 are arbitrarily interchangeable and transferable to all the embodiments.