Component including an optimized multilayer torsion spring

Abstract

A component is described, in particular an inertial sensor for detecting acceleration forces, including a substrate, a mass structure, and a spring unit, the mass structure being pivotable along an axis in relation to the substrate with the aid of the spring unit, the spring unit including a first spring web and a second spring web, which are spaced apart from one another along a z direction. Furthermore, a method for manufacturing a spring unit is described.

Claims

1. A component, comprising: a substrate; a mass structure; and a spring unit, the mass structure being pivotable in relation to the substrate along an axis using the spring unit, wherein the spring unit includes a first spring web and a second spring web, which are spaced apart from one another along a z direction, wherein the first spring web and the second spring web form a spring unit which includes an H-shaped cross-sectional profile such that the first spring web and the second spring web are situated in parallel to one another and in parallel to the substrate, and the first spring web and the second spring web are connected to one another and spaced apart from one another in the z direction by a third spring web aligned perpendicularly to the substrate.

2. The component as recited in claim 1, wherein the component is an inertial sensor for detecting acceleration forces.

3. The component as recited in claim 1, wherein the mass structure includes at least two masses connected to one another via connecting walls and wherein the component further comprises: an anchor situated on the substrate, at least one of the connecting walls of the mass structure being connected using the spring unit to the anchor and being pivotable along the axis, the mass structure having an asymmetrical mass distribution in relation to the axis.

4. The component as recited in claim 3, wherein the spring unit includes two sections, which each connect one of the connecting walls of the mass structure on both sides to the anchor.

5. The component as recited in claim 1, wherein the first spring web and the second spring web are aligned in parallel to the substrate surface in an initial position of the spring unit.

6. The component as recited in claim 1, wherein the spring unit includes at least one third spring web aligned in the z direction.

7. The component as recited in claim 6, wherein the first spring web and/or the second spring web and/or the at least one third spring web is configured in the form of layers as layer sections.

8. The component as recited in claim 6, wherein: (i) the third spring web is connected to the first spring web and/or the third spring web is connected to the second spring web, or (ii) the third spring web is spaced apart from at least one of the first and second spring webs in the z direction.

9. The component as recited in claim 6, wherein the first spring web and/or the second spring web include a material thickness which is less than a material thickness of the at least one third spring web.

10. The component as recited in claim 1, wherein: (i) the first spring web includes a greater material thickness than the second spring web and/or the first spring web includes a greater width than the second spring web, or (ii) the first spring web includes a lesser material thickness than the second spring web and/or the first spring web includes a lesser width than the second spring web.

11. The component as recited in claim 1, wherein the first spring web and/or the second spring web has a perforated structure in areas.

12. A component, comprising: a substrate; a mass structure; and a spring unit, the mass structure being pivotable in relation to the substrate along an axis using the spring unit, wherein the spring unit includes a first spring web and a second spring web, which are spaced apart from one another along a z direction, wherein the spring unit includes at least one third spring web aligned in the z direction, wherein a width of the first spring web and the second spring web is greater than a width of the at least one third spring web.

13. The component as recited in claim 1, wherein the spring unit is configured in such a way that a z coordinate of the pivot axis of the spring unit forms a pivot axis of the mass structure at the same time.

14. The component as recited in claim 6, wherein at least one of the first and/or second and/or third spring webs is manufactured from a polycrystalline silicon.

15. A method for manufacturing a spring unit for a component, the method comprising: providing a wafer-shaped substrate, at least one first oxide layer being applied on a front side of the substrate; depositing a first layer section indirectly or directly on the first oxide layer to form a first spring web; depositing at least one third oxide layer on the first layer section; depositing a third layer section and applying a further oxide layer to the third layer section; depositing a second layer section on the further oxide layer to form a second spring web; and removing the deposited oxide layers at least in areas of the third layer section by oxide etching in such a way that the spring unit is formed, wherein at least one third spring web is formed by material removal of the third layer section, the first layer section being structured and the structure of the first layer section being closed by the deposition of the third oxide layer, wherein the first spring web and the second spring web form a spring unit which includes an H-shaped cross-sectional profile such that the first spring web and the second spring web are situated in parallel to one another and in parallel to the substrate, and the first spring web and the second spring web are connected to one another and spaced apart from one another in the z direction by the third spring web aligned perpendicularly to the substrate.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows a schematic top view onto an inertial sensor according to one specific embodiment.

(2) FIG. 2 shows a schematic sectional view of an inertial sensor according to one specific embodiment.

(3) FIG. 3 shows a schematic sectional view of an inertial sensor according to another specific embodiment along a section plane A-A from FIG. 1.

(4) FIG. 4 shows a schematic sectional view of the inertial sensor from FIG. 3 along a section plane B-B from FIG. 1.

(5) FIGS. 5 through 13 show schematic sectional views of spring units.

(6) FIGS. 14 through 23 show schematic sectional views to illustrate a method for manufacturing a spring unit according to one specific embodiment.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

(7) FIG. 1 shows a top view onto a component 1, which is designed as an inertial sensor. In particular, it is illustrated that sensor 1 includes a mass structure 4 having two masses 5, 6.

(8) First mass 5 is designed to be hollow and thus lighter than second mass 6. Masses 5, 6 are connected to one another via lateral connecting walls 7. An anchor 9 is situated between connecting walls 7 and the two masses 5, 6. Anchor 9 extends like a column in the z direction and is connected to a substrate 2. Connecting walls 7 are pivotably connected to anchor 9 via sections 17 of a spring unit 16. According to the exemplary embodiment, sections 17 are designed to be identical.

(9) FIG. 2 shows a schematic sectional view of an inertial sensor 1 according to one specific embodiment. In particular, the internal arrangement of sensor 1 is shown, which includes the functional components.

(10) Inertial sensor 1 is used for detecting acceleration forces acting in the z direction. Sensor 1 includes a substrate 2, a mass structure 4 including two different masses 5, 6 and a detection unit 8.

(11) Detection unit 8 is electrically conductively connected to electrodes 10, 12 and may ascertain the capacitance between electrodes 10, 12 and a lower layer 14 of mass structure 4. The movement of mass structure 4 in relation to substrate 2 may be detected in this way.

(12) Furthermore, sensor 1 includes a spring unit 16. Spring unit 16 is designed as a torsion spring. Mass structure 4 is pivotably connected to substrate 2 along an axis A situated in parallel to a substrate surface 3 with the aid of spring unit 16.

(13) Masses 5, 6 of mass structure 4 are situated on two opposing sides of spring unit 16 and have different weights.

(14) Spring unit 16 includes three layer sections 14, 18, 20, which form a first spring web 22, a second spring web 24, and a third spring web 26, according to the exemplary embodiment.

(15) Spring webs 22, 24, 26 form a spring unit 16, which includes an H-shaped cross-sectional profile. For this purpose, first and second spring webs 22, 24 are situated in parallel to one another and in parallel to substrate surface 3. In particular, spring webs 22, 24 are spaced apart from one another in the z direction by a third spring web 26 aligned perpendicularly to substrate surface 3 and are connected to one another via third spring web 26.

(16) A relatively low torsional stiffness for the useful movement of the rocker or mass structure 4 is maintained by this arrangement, spring unit 16 having an increased bending stiffness in relation to a simple “I-spring.” Since moreover a spring pivot point and a mass center of gravity of movable structure 4 coincide with respect to their z coordinate, no lateral sensitivity with respect to the x direction also occurs in this arrangement.

(17) Electrodes 10, 12 are positioned on an oxide layer 28, which is situated on substrate surface 3, and are formed by a polycrystalline silicon layer 29.

(18) FIG. 3 shows a schematic sectional view of an inertial sensor 1 according to another specific embodiment. In contrast to the sensor shown in FIG. 1, inertial sensor 1 has a differential electrode principle having a top electrode 11, 13 and a bottom electrode 10, 12 in each case. For the sake of clarity, the electrical connection of electrodes 10, 11, 12, 13 to detection unit 8 is not shown.

(19) The geometry of spring unit 16 is designed in such a way that first spring web 22 has a greater width than second spring web 24.

(20) The mass center of gravity of movable mass structure 4 is lower for this sensor topology. The spring pivot point thus also has to be positioned somewhat lower than in FIG. 1 to eliminate the lateral sensitivity with respect to the x acceleration. This is achieved in that the width of first spring web 22 is greater than that of second spring web 24. A favorable combination of high bending stiffness of spring unit 16 and vanishing lateral sensitivity of sensor 1 may thus also be achieved in this case.

(21) FIG. 4 shows a schematic sectional view of inertial sensor 1 from FIG. 3 along a section plane B-B from FIG. 1. In particular, the shape of anchor 9 is illustrated, which extends from substrate 2 in the form of a column in the z direction and is used as a receptacle of sections 17 of spring unit 16.

(22) Layer sections 14, 18, 20 may extend through anchor 9 or may be integrally joined laterally to anchor 9. According to the exemplary embodiment, first layer section 14 and second layer section 18 do not extend through anchor 9, but rather are coupled flush in the y direction with anchor 9.

(23) FIGS. 5 through 13 show schematic sectional views of spring units 16 according to specific embodiments according to the present invention. In particular, possible cross-sectional profiles of spring unit 16 are shown. The possible shaping of the cross-sectional profiles is not restricted to the examples shown, but rather may include different variations and combinations.

(24) FIG. 5 shows the cross-sectional profile of a spring arrangement 16 from FIG. 1. The cross-sectional profile of spring arrangement 16 from FIG. 2 is shown in FIG. 6.

(25) FIG. 7 shows an H-spring arrangement, in which first spring web 22 and second spring web 24 are spaced apart from one another in the z direction. Third spring web 26 is not connected directly to spring webs 22, 24, but rather is spaced apart in areas from spring webs 22, 24.

(26) FIG. 8 shows a spring unit 16, which is designed as a so-called “O-spring.” In contrast to the preceding exemplary embodiments, this spring unit includes two third spring webs 26, which are spaced apart from one another in the x direction. The two third spring webs 26 are directly connected in the z direction to first and second spring webs 22, 24. In this way, the bending stiffness of the arrangement is increased even more strongly than the torsional stiffness.

(27) FIG. 9 shows an O-spring arrangement in which first spring web 22 and second spring web 24 are spaced apart from the two third spring webs 26 in the z direction. Spring webs 22, 24, 26 may be in areas or completely connected or spaced apart from one another.

(28) FIG. 10 shows an H-spring arrangement in which not the width, but rather the thickness of first spring web 22 was increased. Of course, torsional stiffness, bending stiffness, and location of the spring pivot point may also be influenced by thickness variations. Such an adaptation of the thickness or material thickness may also be implemented on second spring web 24 and at least one third spring web 26. Alternatively, second spring web 24 may also be formed having a greater thickness than first spring web 22.

(29) FIGS. 11 and 12 show a spring unit 16 designed as an H-spring including individual perforation holes or slots in first and second spring webs 22, 24. These perforation holes 30 may be necessary to facilitate the removal of sacrificial oxides during the exposure of the micromechanical structure.

(30) FIG. 13 shows a spring unit 16, in which the torsion spring is solely still formed by first spring web 22 and second spring web 24. Such a spring unit 16 is particularly advantageous with respect to a rough offset of sensor 1, since the thin spring webs 22, 24 grow in fine-crystalline manner and therefore have minimal intrinsic tensions. In this way, the stiffness of spring unit 16 with respect to z bending may be set in a reducing manner.

(31) FIGS. 14 through 23 show schematic sectional views to illustrate a method for manufacturing a spring unit 16 according to one specific embodiment. A section 17 of spring unit 16 is schematically shown.

(32) The method is shown by way of example on the basis of a surface micromechanical process, in which four polysilicon layers 29, 14, 20, 18 are used. The fundamental method steps for the manufacturing of spring unit 16 are illustrated in FIGS. 14 through 23.

(33) A wafer-shaped substrate 2 including a first oxide layer 28, a polysilicon layer 29 for forming counter electrodes 10, 12, and a second oxide layer 32 are provided in FIG. 14.

(34) First layer section 14 is deposited on second oxide layer 32 and structured with the aid of fine trenches in FIG. 15. The trenches form perforation holes 30. First spring web 22 of spring unit 16 is formed by first layer section 14.

(35) FIG. 16 shows how a third oxide layer 34 is deposited. Perforation holes 30 are temporarily closed in this way. Further process steps may be carried out, which are relevant for the formation of mass structure 4. However, these process steps do not relate to the manufacturing of spring unit 16. Furthermore, third oxide layer 34 may be in areas opened to introduce fine slots into first layer section 14 in an etching method, for example, using SF6 or XeF2. Oxide layer 34 is used in this case as a mask.

(36) A fourth oxide layer 36 is deposited on third oxide layer 34 in FIG. 17. In this way, irregularities may be compensated for or openings functioning as a mask may be closed again. Broad areas of first layer section 14 may be cleared out in this way without leaving behind noticeable topography on the surface of the fourth oxide layer.

(37) FIG. 18 shows how third layer section 20 for forming at least one third spring web 26 is deposited and subsequently structured by fine trenches 38.

(38) A further oxide layer 40 is deposited in FIG. 19. In this case, trenches 38 are filled and a level surface is formed. Subsequently, openings 42 may be introduced into oxide layer 40 to remove unneeded sections 44 of third layer section 20.

(39) Unneeded sections 44 are removed via openings 42 in fifth oxide layer 40 using a further etching step, shown in FIG. 20, which may be carried out by isotropic material removal. Unneeded sections 44 of third layer section 20 are used here as sacrificial silicon areas.

(40) A further oxide layer 46 is applied to the structure in FIG. 21, whereby openings 42 of fifth oxide layer 40 are closed.

(41) Subsequently, second layer section 18 may be deposited in a step shown in FIG. 22. Perforation holes 30 in the form of trenches may be introduced here in a structuring step.

(42) Subsequently, oxide layers 28, 32, 34, 36, 40, 46 may be at least sectionally removed from the structure by oxide etching, whereby spring unit 16 is finished. The oxide etching is preferably carried out using gaseous HF.

(43) A spring unit 16, which is also shown in FIG. 12, is formed in FIGS. 14 through 23. The other spring units shown by way of example in FIGS. 5 through 13 may be manufactured similarly by the method.

(44) Although the described exemplary embodiments relate by way of example to an inertial sensor for measuring acceleration in the z direction, the spring arrangements according to the present invention and the manufacturing method may thus also be used for further micromechanical components such as micromirrors, resonators, rotation rate sensors, Lorentz magnetometers, and the like.