DISTRIBUTED LIGHT PROJECTION DEVICE
20210231861 · 2021-07-29
Assignee
Inventors
Cpc classification
G02B6/0076
PHYSICS
G02B6/0038
PHYSICS
International classification
Abstract
A Distributed light projection device, including: one or a plurality of waveguides; and above each waveguide, a plurality of extraction cells coupled to distinct portions of the guide, each extraction cell including first and second stacked diffraction gratings.
Claims
1. Distributed light projection device , comprising: one or a plurality of waveguides ; and above each waveguide, a plurality of extraction cells coupled to distinct portions of the guide, each extraction cell comprising first and second stacked diffraction gratings, wherein different extraction cells have different offset values between the first and second diffraction gratings, whereby the different cells have different extraction coefficients.
2. Device according to claim 1, wherein, for each waveguide, the different extraction cells coupled to the guide have offset values between the first and second diffraction gratings decreasing as the distance to an input end of the guide increases, whereby the different cells have extraction coefficients increasing as the distance to the input end of the guide increases.
3. Device according to claim 1, wherein, in each extraction cell, the first and second diffraction gratings have the same pitch.
4. Device according to claim 1, wherein the first diffraction gratings of the different cells have the same pitch, and wherein the second diffraction gratings of the different cells have the same pitch.
5. Device according to claim 1, comprising a plurality of waveguides, wherein the first and second diffraction gratings of an extraction cell of a waveguide laterally extend opposite the other waveguides and form extraction cells of the other waveguides.
6. Device according to claim 1, wherein each waveguide is a monomode waveguide.
7. Image projection device, comprising a distributed light projection device according to claim 1, and, opposite each light extraction cell of the distributed light projection device, a holographic element for orienting the light extracted by the cell.
8. Image projection device according to claim 7, further comprising, opposite each extraction cell, a controllable element for activating or deactivating the cell.
9. Image projection device according to claim 7, comprising no controllable elements for activating or deactivating the extraction cells.
10. Optical phase-control network comprising a distributed light projection device according to claim 1 and, upstream of this device, a device for modifying the phase of the light injected into the waveguides of the distributed light projection device.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0016] The foregoing features and advantages, as well as others, will be described in detail in the following description of specific embodiments given by way of illustration and not limitation with reference to the accompanying drawings, in which:
[0017]
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[0020]
[0021]
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[0025]
DESCRIPTION OF THE EMBODIMENTS
[0026] Like features have been designated by like references in the various figures. In particular, the structural and/or functional features that are common among the various embodiments may have the same references and may dispose identical structural, dimensional and material properties.
[0027] For the sake of clarity, only the steps and elements that are useful for an understanding of the embodiments described herein have been illustrated and described in detail. In particular, the following description manly concerns the forming of a distributed projection device comprising one or a plurality of waveguides and, coupled to each waveguide, a plurality of extraction cells enabling to extract light from the guide according to a predefined intensity profile, for example, but not necessarily, a uniform profile. The various applications capable of taking advantage of such a projection device have not been detailed. It should in particular be noted that the application of such a device to a retinal projection device described in relation with the above-mentioned patent application US2015/0370073, and with Christophe Martinez et al.'s above-mentioned article, which is incorporated herein by reference, is within the abilities of those skilled in the art on reading of the present disclosure. Further, the manufacturing methods capable of being implemented to form the described structures have not been detailed, the described embodiments being compatible with usual integrated optical component forming methods.
[0028] In the following description, when reference is made to terms qualifying absolute positions, such as terms “front”, “rear”, “top”, “bottom”, “left”, “right”, etc., or relative positions, such as terms “above”, “under”, “upper”, “lower”, etc., or to terms qualifying directions, such as terms “horizontal”, “vertical”, etc., unless otherwise specified, it is referred to the orientation of the drawings, it being understood that, in practice, the described devices may be oriented differently.
[0029] Unless specified otherwise, the expressions “around”, “approximately”, “substantially” and “in the order of” signify within 10%, and preferably within 5%.
[0030]
[0031] The device 100 of
[0032] Each waveguide 102.sub.i is made of a transparent material having a first refraction index, for example, silicon nitride (SiN) having a refraction index in the order of 1.9, and is totally surrounded, on the side of its longitudinal surfaces, with a second transparent material having a refraction index smaller than the first index, for example, silicon dioxide (SiO.sub.2) or glass having a refraction index in the order of 1.5. As a variant, guides 102.sub.i may be made of silicon, surrounded by silicon dioxide. The described embodiments are not limited to these specific examples.
[0033] Waveguides 102.sub.i are preferably monomode waveguides, that is, excited by a single propagation mode. As an example, in transverse cross-section, the largest dimension of each of waveguides 102.sub.i does not exceed 2 μm.
[0034] In the shown example, waveguides 102.sub.i are located in a same mid-plane approximately parallel to an upper surface of substrate 34. In other words, waveguides 102.sub.i have respective longitudinal axes which are substantially coplanar and parallel to the upper surface of substrate 34, and have upper, respectively lower surfaces which are substantially coplanar and parallel to the upper surface of substrate 34.
[0035] In practice, each waveguide is coupled, at one of its ends, to a laser source (not shown), for example, having a controllable intensity, capable of injecting into the guide a light beam of constant orientation, capable of propagating in the guide. Different waveguides 102.sub.i of the device may be coupled to a same laser source, or to distinct laser sources. In the example of
[0036] The device 100 of
[0037] Each cell 104.sub.ij is capable of extracting part of the light propagating in the underlying waveguide 102.sub.i and of projecting this light towards the outside of device 100, particularly on the upper surface side of device 100.
[0038] In the example of
[0039] According to an aspect of the embodiment of
[0040] In the shown example, in each of diffraction gratings D1 and D2, the strips b1 and b2 of the grating are arranged in a same mid-plane substantially parallel to the upper surface of the underlying waveguide 102.sub.i. In other words, the lower, respectively upper, surfaces of the strips b1 and b2 of each diffraction grating are substantially coplanar and parallel to the upper surface of the underlying waveguide 102.sub.i.
[0041] In this example, in each extraction cell 104.sub.ij, the strips b1 and b2 of the diffraction gratings D1 and D2 of the cell are, in top view, orthogonal to the longitudinal axis of the underlying waveguide 102.sub.i. The described embodiments are not limited to this specific case. Preferably, the strips b1 and b2 of the diffraction gratings D1 and D2 of the cell form, in top view, an angle in the range from −45° to +45° with the normal to the longitudinal axis of the underlying waveguide 102.sub.i.
[0042] For clarity, only the strips of high index b1 of gratings D1 and D2 have been shown in the top view of
[0043] In each extraction cell 104.sub.ij, diffraction gratings D1 and D2 each have a period (or pitch) in the order of or smaller than the wavelength of the light guided by the underlying waveguide 102.sub.i.
[0044] As an example, in each extraction cell 104.sub.ij, the periods of the diffraction gratings D1 and D2 of the cell are identical, to within manufacturing dispersions. Further, the periods of the diffraction gratings D1 and D2 of the extraction cells 104.sub.ij coupled to a same waveguide 102.sub.i may be identical, to within manufacturing dispersions. Preferably, the periods of the diffraction gratings D1 and D2 of the different extraction cells 104.sub.ij of device 100 are identical, to within manufacturing dispersions. The provision of gratings D1 and D2 having the same pitch advantageously enables to simplify the manufacturing of the device.
[0045] As an example, in each extraction cell 104.sub.ij, the strips b1 of diffraction gratings D1 and D2 have the same width (in top view) and the strips b2 of diffraction gratings D1 and D2 have the same width (in top view), to within manufacturing dispersions. Further, the widths of the strips b1, respectively b2, of the extraction cells coupled to a same waveguide may be identical, to within manufacturing dispersions. Preferably, the widths of the strips b1, respectively b2, of the different extraction cells 104.sub.ij of the device are identical to within manufacturing dispersions. The provision of gratings D1 and D2 having strips b1, respectively b2 of same width advantageously enables to simplify the manufacturing of the device. As a variant, the width of the strips b1 and b2 of a same grating D1 and/or D2 may be different.
[0046] In the example shown in
[0047] In the example of
[0048] The thickness of layer 106 is for example in the range from 10 to 500 nm, for example, from 20 to 200 nm. The thickness of layer 108 is for example in the range from 5 to 100 nm, for example, from 10 to 50 nm. The thickness of grating D1 is for example in the range from 10 to 150 nm, for example, from 20 to 60 nm. The thickness of grating D2 is for example in the range from 10 to 500 nm, for example, from 50 to 150 nm.
[0049] In the example of
[0050] In the shown example, the offset Δ.sub.ij between the gratings D1 and D2 of a same cell 104.sub.ij is constant all along the length of the cell.
[0051] When offset Δ.sub.ij is null (that is, when gratings D1 and D2 are in phase), the respective effects of diffraction gratings D1 and D2 of the cell tend to cumulate, which results in maximizing the light extraction. Conversely, when offset Δ.sub.ij is high (that is, when gratings D1 and D2 are in phase opposition), the respective effects of diffraction gratings D1 and D2 of the cell tend to cancel, which results in minimizing the light extraction.
[0052] As an example, referring to views (A), (B), (C), and (D) of
[0053] In the shown example, offset Δ.sub.ij is relatively significant in the extraction cell 104.sub.ij closest to the input end of guide 102.sub.i, and tends to decrease as the distance to said input end of guide 102.sub.i increases. As an example, offset Δ.sub.ij is maximum, for example, equal to T/2 (where T designates the period of gratings D1 and D2) in the cell 104.sub.i1 closest to the input end of guide 102.sub.i, and is minimum, for example, null, in the cell 104.sub.iM most distant from the end of guide 102.sub.i.
[0054] It will be within the abilities of those skilled in the art to adapt the values of the offset Δ.sub.ij of extraction cells 104.sub.ij along each guide 102.sub.i, according to the desired light extraction profile. Indeed, an advantage of the extraction cells 104.sub.ij described in relation with
[0055] In the shown example, the offset values Δ.sub.ij of the extraction cells 104.sub.ij of same rank j of the different waveguides 102.sub.i are identical. More particularly, in this example, the strips b1 and b2 of the diffraction gratings D1 and D2 of the extraction cells 104.sub.ij of same rank j of the different waveguides 102.sub.i are common and each extend, with no discontinuity, above the N waveguides 102.sub.i of the device. This simplifies the manufacturing of the device. This may further enable to increase the integration density of the guides. The described embodiments are however not limited to this specific case.
[0056] In the example of
[0057] Further, in the example of
[0058] Embodiments of a distributed light projection device, enabling to accurately control the intensity profile of the projected light all along the length of the light extraction area has been described hereabove.
[0059] Non-limiting examples of applications capable of taking advantage of such a device will now be described.
[0060]
[0061] In the example of
[0062] In the example of
[0063] The device 400 of
[0064] The forming of control elements 120.sub.ij and of holographic orientation elements 130.sub.ij has not been detailed, embodiments of these elements being described in above-mentioned patent application US2015/0370073 and/or in Christophe Martinez et al.'s above-mentioned article.
[0065]
[0066] The device 500 of
[0067] Device 500 is a simplified device, enabling to only display a static image, for example, a pictogram, previously recorded in the holographic layer containing elements 130.sub.ij. The display or not of the prerecorded image is controlled by varying the activation or not of the laser source supplying the waveguides.
[0068]
[0069] In each of these two variants, devices 500 comprises a plurality (five in the shown example) of individually-controllable laser sources 140, each supplying a specific network 150 of one or a plurality of waveguides 102.sub.i. In
[0070] In the example of
[0071] In the example of
[0072] Another example of application capable of taking advantage of a distributed light projection device of the type described in relation with
[0073]
[0074] Device 800 comprises an assembly 180 of waveguides (not detailed), for example, parallel to one another, supplied by a same laser source 170. These guides are coupled to a controllable device 190 to modify the phase of the light propagating in each of the guides. Device 190 for example introduces a linear phase shift between successive guides.
[0075] The light is then extracted from the guides, towards the free space, in an extraction area 200 located downstream of phase-shift device 190.
[0076] In the same way as a beam crossing a prism is deviated according to an angle proportional to the angle of the prism, the introduction of a linear slope on the phase generates on the beam extracted from the guides a far-field angular deviation. The higher the number of guides, the better the accuracy on the value of the slope of the phase will be, and the better the accuracy of the angular deviation will be. However, when the light extraction area is short (that is, has a small dimension in the longitudinal direction of the guides), the increase in the number of guides results in obtaining an emission area of elongated shape, for example, in the shape of a line. In far field, the light signal extracted from the device then resembles a diffraction pattern of a slot, such as schematically illustrated in
[0077] In
[0078] The strong dissymmetry of the beam linked to the elongated shape of light extraction area 200 may be disturbing, for example, when a second deflection is introduced by another element, for example, a mobile mirror in direction β. The resolution is then degraded in this direction. It would thus be preferable to obtain a symmetrical diffracted beam which is the smallest possible in far field.
[0079]
[0080] The device 900 of
[0081] As illustrated in
[0082] Various embodiments and variants have been described. Those skilled in the art will understand that certain features of these embodiments can be combined and other variants will readily occur to those skilled in the art. In particular, the described embodiments are not limited to the examples of dimensions and of materials mentioned in the present disclosure. Further, the described embodiments are not limited to the examples of uses of the distributed light projection device mentioned in the present disclosure.
[0083] Finally, the practical implementation of the described embodiments and variations is within the abilities of those skilled in the art based on the functional indications given hereabove. In particular, on reading of the present disclosure, it will be within the abilities of those skilled in the art to implement the sizing and the manufacturing of the distributed projection device by using usual integrated optical device simulation and/or manufacturing tools.