TUNABLE LASER ASSEMBLY
20210242662 · 2021-08-05
Inventors
- Peter S.J. HEIM (Washington, DC, US)
- Alan DONALDSON (Clarksville, MD, US)
- Jacob Mertz (Elkridge, MD, US)
- Robert ROCHE (Laurel, MD, US)
Cpc classification
H01S5/183
ELECTRICITY
H01S5/02326
ELECTRICITY
H01S5/18366
ELECTRICITY
H01S5/02415
ELECTRICITY
H01S5/02
ELECTRICITY
H01S5/02216
ELECTRICITY
International classification
H01S5/02216
ELECTRICITY
H01S5/02326
ELECTRICITY
Abstract
A tunable laser assembly housed in a single enclosure and a method of control is described that provides high-speed monitoring and control of the spectral properties of widely tunable lasers, such as MEMS-tunable VCSELs, with an optical configuration that does not introduce perturbations into the swept-source laser output spectrum that would cause artifacts in imaging applications such as optical coherence tomography (OCT).
Claims
1. A tunable laser assembly comprising: a tunable semiconductor laser emitting tunable laser radiation; a beam splitter; at least one wavelength monitoring optical element; at least one photodetector; a semiconductor optical amplifier; and at least one optical isolator; wherein the tunable semiconductor laser, the beam splitter, the at least one wavelength monitoring optical element, the at least one photodetector, the semiconductor amplifier, and the at least one optical isolator are mounted on a common baseplate; and wherein the at least one wavelength monitoring element generates a signal that is used to monitor at least one of the absolute wavelength and optical bandwidth of said tunable laser radiation.
2. The tunable laser assembly of claim 1, wherein said tunable semiconductor laser is a tunable micro-electro-mechanical system-vertical cavity semiconductor laser (MEMS-VCSEL).
3. The tunable laser assembly of claim 1, wherein said beam splitter is configured to direct a portion of said tunable laser radiation to said at least one wavelength monitoring optical element without introducing reflection artifacts in the laser output.
4. The tunable laser assembly of claim 1, wherein said beam splitter has a thickness greater than 0.75 mm.
5. The tunable laser assembly of claim 1, wherein said at least one wavelength monitoring optical element comprises a notch filter.
6. The tunable laser assembly of claim 1, wherein said at least one wavelength monitoring optical element comprises a notch filter and an etalon.
7. The tunable laser assembly of claim 5, wherein said at least one photodetector comprises at least two photodetectors mounted on a common substrate.
8. The tunable laser assembly of claim 7, wherein said at least two photodetectors comprise elements of a monolithic multi-element array.
9. The tunable laser assembly of claim 5, wherein said tunable semiconductor laser and said at least one photodetector are mounted on a common substrate.
10. The tunable laser assembly of claim 1, wherein said at least one wavelength monitoring optical element comprises a bandpass filter.
11. The tunable laser assembly of claim 1, wherein said at least one wavelength monitoring optical element comprises a bandpass filter and an etalon.
12. The tunable laser assembly of claim 10, wherein said at least one photodetector comprises at least two photodetectors mounted on a common substrate.
13. The tunable laser assembly of claim 12, wherein said at least two photodetectors comprise elements of a monolithic multi-element array.
14. The tunable laser assembly of claim 10, wherein said tunable semiconductor laser and said at least one photodetector are mounted on a common substrate.
15. The tunable laser assembly of claim 1, wherein said at least one optical isolator is located between the said tunable semiconductor laser and the said beam splitter.
16. The tunable laser assembly of claim 1, wherein said at least one optical isolator comprises a quarter-wave polarization waveplate and a polarizer.
17. The tunable laser assembly of claim 1, wherein said at least one wavelength monitoring optical element provide pulses that enable control of the absolute wavelength and optical bandwidth of said laser radiation by observing the timing and number of the pulses as the laser sweeps across the wavelength range.
18. The tunable laser assembly of claim 1, wherein the temperature of said common baseplate is maintained through a feedback loop comprising a thermo-electric cooler (TEC) and a temperature sensor attached to said common baseplate.
19. The tunable laser assembly of claim 1, wherein said tunable semiconductor laser is optically pumped.
20. The tunable laser assembly of claim 19, wherein said tunable semiconductor laser is optically pumped by a single-frequency laser.
21. The tunable laser assembly of claim 20, wherein said single-frequency pump laser comprises one of a distributed feedback laser (DFB), a distributed Bragg reflector laser (DBR), a Y-branch laser, or a volume holographic grating (VHG) stabilized laser.
22. The tunable laser assembly of claim 19, wherein said tunable semiconductor laser is an optically pumped MEMS-VCSEL.
23. A method for controlling the absolute wavelength and the optical bandwidth of a swept-source tunable laser that uses the timing information from a signal generated by a reference optical wavelength filter and an optical element that generates signal pulses corresponding to nearly equally spaced wavenumbers.
24. The method of claim 23 wherein the optical element that generates signal pulses corresponding to nearly equally spaced wavenumber comprises an etalon.
25. The method of claim 23 wherein the optical element that generates signal pulses corresponding to nearly equally spaced wavenumber comprises a Mach-Zehnder interferometer.
26. The method of claim 23 wherein the optical element that generates signal pulses corresponding to nearly equally spaced wavenumber comprises a fiber Bragg grating (FBG) with multiple transmission peaks.
27. A stabilized laser comprising: a tunable semiconductor laser emitting tunable laser radiation; a beam splitter; at least one wavelength monitoring optical element; at least one photodetector; a semiconductor optical amplifier; at least one optical isolator; and a closed loop controller; wherein the tunable semiconductor laser, the beam splitter, the at least one wavelength monitoring optical element, the at least one photodetector, the semiconductor amplifier, and the at least one optical isolator are mounted on a common baseplate; and wherein the at least one wavelength monitoring optical element generates a signal that is input to the closed-loop controller and the closed-loop controller stabilizes the absolute wavelength and optical bandwidth of said tunable laser radiation.
28. The stabilized laser of claim 27, wherein said tunable semiconductor laser is a tunable micro-electro-mechanical system-vertical cavity semiconductor laser (MEMS-VCSEL).
29. The stabilized laser of claim 27, wherein said tunable semiconductor laser is an optically-pump MEMS-VCSEL.
30. The stabilized laser of claim 27, wherein said closed-loop controller implements a proportional-integral-derivative (PID) algorithm based on timing information from said signal generated by said at least one wavelength monitoring optical element.
31. The stabilized laser of claim 30, wherein said at least one wavelength monitoring optical element comprises a reference optical wavelength filter and an optical element that generates signal pulses corresponding to nearly equally spaced wavenumbers.
32. The stabilized laser of claim 31, wherein said optical element that generates signal pulses corresponding to nearly equally spaced wavenumber comprises an etalon.
33. The stabilized laser of claim 31, wherein said optical element that generates signal pulses corresponding to nearly equally spaced wavenumber comprises a Mach-Zehnder interferometer.
34. The stabilized laser of claim 27, wherein said beam splitter is configured to direct a portion of said tunable laser radiation to said at least one wavelength monitoring optical element without introducing reflection artifacts in the laser output.
35. The stabilized laser of claim 27, wherein said beam splitter has a thickness greater than 0.75 mm.
36.-44. (canceled)
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0031] The description of illustrative embodiments according to principles of the present invention is intended to be read in connection with the accompanying drawings, which are to be considered part of the entire written description. In the description of embodiments of the invention disclosed herein, any reference to direction or orientation is merely intended for convenience of description and is not intended in any way to limit the scope of the present invention. Relative terms such as “lower,” “upper,” “horizontal,” “vertical,” “above,” “below,” “up,” “down,” “top” and “bottom” as well as derivative thereof (e.g., “horizontally,” “downwardly,” “upwardly,” etc.) should be construed to refer to the orientation as then described or as shown in the drawing under discussion. These relative terms are for convenience of description only and do not require that the apparatus be constructed or operated in a particular orientation unless explicitly indicated as such. Terms such as “attached,” “affixed,” “connected,” “coupled,” “interconnected,” and similar refer to a relationship wherein structures are secured or attached to one another either directly or indirectly through intervening structures, as well as both movable or rigid attachments or relationships, unless expressly described otherwise. Moreover, the features and benefits of the invention are illustrated by reference to the exemplified embodiments. Accordingly, the invention expressly should not be limited to such exemplary embodiments illustrating some possible non-limiting combination of features that may exist alone or in other combinations of features; the scope of the invention being defined by the claims appended hereto.
[0032] This disclosure describes the best mode or modes of practicing the invention as presently contemplated. This description is not intended to be understood in a limiting sense, but provides an example of the invention presented solely for illustrative purposes by reference to the accompanying drawings to advise one of ordinary skill in the art of the advantages and construction of the invention. Although some elements disclosed herein are implemented on a chip or chipset without loss of generality, it is understood that many of these elements may also be implemented, for example, on one or more chips and/or one or more optical elements. In the various views of the drawings, like reference characters designate like or similar parts.
[0033]
[0034] In order to monitor both the absolute wavelength and the bandwidth of the tunable optical spectrum, two optical monitoring paths are provided that include wavelength monitoring optical elements comprised of a notch filter 130 and etalon 195 . A beam splitter 120 directs a portion of the laser radiation from the tunable VCSEL so that it is incident on notch filter (NF) 130 at an angle. The majority of the tunable optical spectrum is transmitted through the notch filter, except for a narrow band that is reflected and made incident on a photodetector 151. The signal from photodetector 151 is connected to an external absolute wavelength monitor circuit by an electrical connection 153 to an external package pin 251. The absolute wavelength is determined by reference to the narrow band notch reflection profile which can be calibrated against an external source. By holding the relative timing of the photo-detected narrow-band notch reflection profile relative to a known timing reference such as the electronic sweep trigger, the absolute wavelength of a specific portion of the tunable optical spectrum (e.g., the center wavelength) can be held constant in time relative to the trigger. The temperature dependence of the narrow-band notch reflection profile is minimized by TEC control of the baseplate temperature. Those skilled in the art will understand that control of the center wavelength doesn't mean that the exact center wavelength must be monitored, any portion of the tunable laser spectrum can used for the reference, although those wavelengths near the center are preferred as there is larger control signal. Those skilled in the art will also recognize that several methods exist for creating notch filters, that is, a filter that transmits the majority of its specified wavelength spectrum and highly reflects a narrow-band portion of the spectrum. Bragg grating are the most prevalent design for notch filters and can be implemented using conventional dielectric thin-film deposition or holographic techniques such as in Volume Holographic Gratings (VHG), which are also known as Volume Bragg Gratings (VBG). The optical-fiber version of a notch filter, a fiber Bragg gratings (FBG), has often been used in tunable lasers to provide an absolute wavelength reference for trigger/controlling the sweep. The advantage of the free-space notch filter in the present embodiments compared to an FBG, is the smaller size, compatibility with free-space integration, and the fact that it is temperature controlled simply by being mounted on the common baseplate with the other optical components. It is more difficult, bulky and expensive to temperature stabilize an FBG.
[0035] To monitor the bandwidth of the tunable optical spectrum (the ‘optical bandwidth’, or ‘bandwidth’), the optical signal that is transmitted through the notch filter 130 is made incident at an angle on a partially-reflecting mirror (M) 140. The reflected signal from the mirror propagates through etalon 195, having a physical length L, and is made incident on a photodetector 152. The signal from photodetector 152 is connected to an external optical bandwidth monitor circuit by an electrical connection 154 to an external package pin 250. As the tunable VCSEL sweeps over the optical spectrum, the output signal from photodetector 152 consists of a series of pulses with the optical frequency spacing (Δf) between the adjacent maxima determined by the free spectral range (FSR) of the etalon: Δf=c/2nL, where c is the speed of light in vacuum and n is the index of refraction of the etalon. The corresponding wavelength spacing (Δλ) is given by Δλ=λ.sup.2/2nL, which is not constant but varies as the laser tunes. For a tunable laser operating with a center wavelength of 1300 nm, the approximate wavelength spacing for an etalon made out of BK-7 glass (n=1.5) and having L=2.0 mm is 0.28 nm. Thus the series of pulses generated by the etalon provides a means to measure the bandwidth of the optical signal with a resolution determined by the FSR of the etalon. By controlling the timing of a defined number of pulses that occur relative to a known reference such as the internal sweep trigger or the absolute wavelength reference from the narrow-band notch filter reflection profile, the external circuit can control and hold constant the optical bandwidth of the tunable laser. Other materials that have higher refractive index than glass, such as LiNbO.sub.3, GaAs, Si, or InP can be used for the etalon and have the advantage of more compact size and higher fringe contrast.
[0036] In addition to monitoring the absolute wavelength and the bandwidth of the tunable optical spectrum, it is also desirable to monitor the output power from the tunable VCSEL. A signal proportional to the optical output power can be obtained from etalon-generated signal from photodetector 152. However, to obtain a signal that is not distorted by the etalon, a partially-reflecting mirror 140, as shown in
[0037] The wavelength monitoring optical elements must be designed to prevent introducing reflections in the optical path that create perturbations in the wavelength tuning spectrum. Any multiple propagation paths in the optical beam that make their way into the laser output signal will appear as artifacts in any OCT imaging system. The beam splitter 120 is particularly sensitive component as it is placed directly in the main laser beam optical path. In order to prevent multi-path reflections from the beam splitter, the beam splitter thickness must be large enough to prevent secondary reflections within the beam splitter from coupling into the laser output signal. In the embodiment shown in
[0038] In another embodiment of the present invention, shown in
[0039] In another embodiment of the present invention, shown in
[0040] In another embodiment of the present invention, shown in
[0041] In another embodiment of the present invention, shown in
[0042] In another embodiment of the present invention, shown in
[0043] In another embodiment of the present invention, shown in
[0044] There are several possible methods to use the signals generated by the notch/bandpass filter and etalon to control the absolute wavelength (center wavelength) and tuning optical bandwidth, respectively. Open loop operation of a MEMS-VCSEL swept laser source presents many challenges in maintaining a stable output over long operating time frames and/or changing environmental conditions. Long term charging effects in the MEMS structure lead to changes in the effective voltage that is applied to the device. As the MEMS structure is an electrostatically controlled moving membrane the relationship between the voltage on the electrodes and the mirror position is highly non-linear. Slight changes in operating DC level can result in large changes to the sweep profile and ultimately the overall bandwidth that is contained within a given time window. Additionally, the mechanical damping of the device is highly sensitive to the surrounding environment. Open-loop calibration/corrections can be applied, but these require extensive production characterization procedures and long-term testing.
[0045] To enable robust and long-term operation it is desired that an optical reference signal be used to monitor and subsequently control the high voltage drive signals to the tunable MEMS-element such that the swept bandwidth is maintained under all operating conditions and timeframes. This optical signal is used to generate timing information which has a direct correlation to the optical bandwidth and overall sweep trajectory. The typical mechanism for bandwidth loss or gain is mainly that the sweep velocity changes, as illustrated in
[0046] An optical etalon can be used to generate electrical pulses (via zero crossing detection) each of which corresponds to nearly equally spaced wavenumbers. An electronic counter circuit can then be used to generate a measure of the time (deltaT) required for the device to move from a starting wavenumber to an ending wavenumber, as shown in
[0047] The application of the optical bandwidth control method described in the preceding sections is demonstrated in
[0048] Optical Coherence Tomography (OCT) is a non-invasive, interferometric optical imaging technique that can generate micron resolution 2D and 3D images of tissue and other scattering or reflective materials. With applications in medicine, biological research, industrial inspection, metrology, and quality assurance, OCT can be used for subsurface imaging, surface profiling, motion characterization, fluid flow characterization, index of refraction measurement, birefringence characterization, scattering characterization, distance measurement, and measurement of dynamic processes. The most common implementation of OCT is spectral/Fourier domain OCT (SD-OCT), which uses a broadband light source, interferometer, and spectrometer. An alternate implementation of OCT is swept source OCT (SS-OCT). SS-OCT uses a tunable laser (sometimes called a wavelength swept laser), interferometer, OCT detector, and high speed analog to digital (A/D) converter. The tunable laser sweeps an emission wavelength in time which is used as input to an OCT interferometer. An OCT interferogram is formed by interfering and detecting light from a sample arm with light from a reference arm in the OCT interferometer, which is detected by the OCT detector and digitized by the A/D converter. Processing the digitized interferogram generates a reflectivity vs. depth profile of the sample, called an A-scan. Multiple A-scans can be obtained to generate two dimensional OCT images or three dimensional OCT volumes.
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[0050] The present invention has been described at some length and with some particularity with respect to the several described embodiments, it is not intended that it should be limited to any such particulars or embodiments or any particular embodiment, but it is to be construed with references to the appended claims so as to provide the broadest possible interpretation of such claims in view of the prior art and, therefore, to effectively encompass the intended scope of the invention. Furthermore, the foregoing describes the invention in terms of embodiments foreseen by the inventor for which an enabling description was available, notwithstanding that insubstantial modifications of the invention, not presently foreseen, may nonetheless represent equivalents thereto.
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